Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2011
08/24/2011EP1509634B1 Surface treatment system, surface treatment method and product produced by surface treatment method
08/24/2011EP1181095B1 The surface modification of solid supports through the thermal decomposition and functionalization of silanes
08/24/2011CN201942749U 一种气相沉积设备用的载盘结构 A vapor-phase deposition apparatus with a carrier disc structure
08/24/2011CN201942748U 适用于大型化学气相沉积炉的进气管系统 For large chemical vapor deposition furnace intake pipe system
08/24/2011CN201942747U 一种金属有机化学气相沉积反应器喷淋装置 Metal organic chemical vapor deposition reactor sprinkler
08/24/2011CN1949458B Reaction chamber with opposing pockets for gas injection and exhaust
08/24/2011CN1752281B RF grounding of cathode in process chamber
08/24/2011CN1726303B Atomic layer deposition using metal amidinates
08/24/2011CN102165100A Film formation device and substrate processing apparatus
08/24/2011CN102165099A Chemical vapor deposition reactor for depositing layers made of a reaction gas mixture onto workpieces
08/24/2011CN102165098A Surface treatment nozzle device
08/24/2011CN102165097A Method for production of zinc oxide (ZnO) film or magnesium zinc oxide (ZnMgO) film, and apparatus for production of zinc oxide film or magnesium zinc oxide film
08/24/2011CN102165096A Method for production of metal oxide film, and apparatus for production of metal oxide film
08/24/2011CN102165095A Shadow mask held magnetically on a substrate support
08/24/2011CN102163530A Plasma processing apparatus
08/24/2011CN102162115A Color regulation and control method based on porous alumina and single atom deposition technology
08/24/2011CN102162098A Preparation method of silicon film/titanium dioxide nanotube array composite structure
08/24/2011CN102162092A Method for constant concentration evaporation and a device using the same
08/24/2011CN102162091A Low k precursors providing superior integration attributes
08/24/2011CN102162090A Alumina coating, coated product and method of making the same
08/24/2011CN102162089A Film formation method, film formation apparatus, and method for using film formation apparatus
08/24/2011CN102161107A Diamond coating tool with excellent anti-chipping property
08/24/2011CN101802257B Substrate placing mechanism and substrate processing apparatus
08/24/2011CN101714518B Method for fabricating semiconductor device
08/24/2011CN101565822B Release method of residual compression stress in nanocrystalline cubic boron nitride pellicle
08/24/2011CN101542016B Method of forming film and film forming apparatus
08/24/2011CN101333651B Diffuser support
08/24/2011CN101180135B Chemical vapor deposition of chalcogenide materials
08/24/2011CN101135048B Plasma film coating device and method
08/24/2011CN101115860B Production method for vacuum component, resin coating forming device and vacuum film forming system
08/24/2011CN101113514B Substrate processing apparatus
08/23/2011US8005351 Irradiance pulse heat-treating methods and apparatus
08/23/2011US8003814 Metal alkoxide compound, material for forming thin film, and method for producing thin film
08/23/2011US8003535 Semiconductor device manufacturing method and target substrate processing system
08/23/2011US8003225 Decorative article having a white coating
08/23/2011US8003167 Method of making heat treated coated article using diamond-like carbon (DLC) coating and protective film
08/23/2011US8003164 Method of making a scratch-and etch-resistant coated glass article
08/23/2011US8003162 Metal organic chemical vapor deposition; atomic layer deposition
08/23/2011US8002947 Plasma treatment system and cleaning method of the same
08/23/2011US8002946 Mask etch plasma reactor with cathode providing a uniform distribution of etch rate
08/23/2011US8002930 Decorative tire cover and transfer pattern and method for use therewith
08/23/2011US8002896 Shadow frame with cross beam for semiconductor equipment
08/23/2011US8002895 Heat processing apparatus for semiconductor process
08/23/2011US8002894 Processing apparatus and processing method
08/23/2011US8001927 Plasma spraying device and a method for introducing a liquid precursor into a plasma gas stream
08/23/2011US8001808 Disassemblable burner for a vapor deposition process
08/18/2011WO2011100527A1 Method for texturing ceramic components
08/18/2011WO2011100200A2 Anti-arc zero field plate
08/18/2011WO2011099858A1 Method and apparatus for depositing atomic layers on a substrate
08/18/2011WO2011099676A1 Thin-film deposition apparatus
08/18/2011WO2011099467A1 Material for forming ruthenium film and method for forming ruthenium film
08/18/2011WO2011099227A1 Flexible substrate position control device
08/18/2011WO2011099205A1 Film formation device
08/18/2011WO2011098665A1 Process for coating cobalt nonoparticles with copper and copper oxide
08/18/2011WO2011098420A1 Gas inlet member with baffle plate arrangement
08/18/2011WO2011097745A1 Method for manufacturing a solar panel
08/18/2011WO2011072932A9 Hot-trap assembly
08/18/2011US20110201145 Process for producing photovoltaic device and deposition apparatus
08/18/2011US20110200822 Atomic layer deposition powder coating
08/18/2011US20110200820 Polyfluoroether based polymers
08/18/2011US20110200763 Process and installation for depositing films simultaneously onto both sides of a substrate
08/18/2011US20110200749 Film deposition apparatus and method
08/18/2011US20110200748 Method for producing parts made of a thermostructural composite material
08/18/2011US20110200741 Organic thin film deposition device, organic el element manufacturing device, and organic thin film deposition method
08/18/2011US20110200739 Method for Testing the Quality of a Metallic Coating
08/18/2011US20110200481 WATER-COLLAPSIBLE Al COMPOSITE MATERIAL, Al FILM AND Al POWDER CONSISTING OF THIS MATERIAL, AND METHODS FOR PREPARATION THEREOF, AS WELL AS COMPONENT MEMBERS FOR CONSTITUTING FILM-FORMING CHAMBERS AND METHOD FOR THE RECOVERY OF FILM-FORMING MATERIALS
08/18/2011US20110198736 Reactive site deactivation against vapor deposition
08/18/2011US20110198034 Gas distribution showerhead with coating material for semiconductor processing
08/18/2011US20110197816 Method for vaporizing liquid material capable of vaporizing liquid material at low temperature and vaporizer using the same
08/18/2011US20110197815 Method of manufacturing semiconductor device, film deposition method, and film deposition apparatus
08/18/2011US20110197813 Film forming apparatus
08/18/2011US20110197659 Method for determining an overall leakage rate of a vacuum system and vacuum system
08/18/2011DE102010000447A1 Beschichtungsvorrichtung sowie Verfahren zum Betrieb einer Beschichtungsvorrichtung mit einer Schirmplatte Coating apparatus and method for operating a coating device comprising a faceplate
08/18/2011DE102005059706B4 Verfahren zum Herstellen einer Trennschicht sowie Substratoberfläche mit Trennschicht A method for producing a separating layer and the substrate surface with separating layer
08/18/2011DE102005035247B4 Fluidverteiler mit binärer Struktur Fluid distribution with binary structure
08/17/2011EP2357675A1 Method for manufacturing solar cell, etching device, and cvd device
08/17/2011EP2356673A2 System and method for recycling a gas used to deposit a semiconductor layer
08/17/2011EP2356672A2 Chemical vapor deposition flow inlet elements and methods
08/17/2011EP2356671A2 Chemical vapor deposition with elevated temperature gas injection
08/17/2011EP2356065A2 Hydrophobic surface coating systems and methods for metals
08/17/2011EP1371751B1 Film forming device
08/17/2011CN201933154U 直流电弧等离子体硼掺杂金刚石膜沉积装置 Diamond film deposition apparatus DC arc plasma boron doping
08/17/2011CN201933153U 用于金属有机化学气相沉积反应器的气体分布装置及反应器 Gas used in metal organic chemical vapor deposition reactor and reactor distribution unit
08/17/2011CN201933152U 一种适用于大型化学气相沉积炉的沉积气路系统 One for large-scale chemical vapor deposition furnace deposition gas system
08/17/2011CN201933151U 大型真空化学气相沉积石墨化处理多功能炉 Large vacuum chemical vapor deposition graphitizing furnace multifunction
08/17/2011CN1972879B Selective doping of a material
08/17/2011CN1956151B Manufacturing method for semiconductor and accessorial device
08/17/2011CN1936068B Article having patterned decorative coating
08/17/2011CN1702024B Vacuum treating device
08/17/2011CN102160183A Semiconductor device
08/17/2011CN102160141A Device and method for producing dielectric layers in microwave plasma
08/17/2011CN102159750A Diamond electrode and method for manufacturing diamond electrode
08/17/2011CN102157617A Preparation method of silicon-based nano-wire solar cell
08/17/2011CN102157577A Nanometer silicon/monocrystalline silicon heterojunction radial nanowire solar cell and preparation method thereof
08/17/2011CN102157570A Composite passivated anti-reflection film used for crystalline silicon solar battery and preparation method thereof
08/17/2011CN102157425A Ring assembly for substrate processing chamber
08/17/2011CN102157423A Substrate mounting table and method for manufacturing the same, and substrate processing apparatus
08/17/2011CN102154672A Non-metallic film with high heat conduction efficiency and anti-fouling capability and preparation method thereof
08/17/2011CN102154631A Gas gate for isolating regions of differing gaseous pressure
08/17/2011CN102154630A Method for manufacturing plasma reaction chamber, method for manufacturing and equipment and parts of same and method for treating substrate