Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
08/2011
08/31/2011CN102166513A Antimony, ytterbium and indium based composite magnetic particle photocatalyst with core-shell structure, preparation and application
08/31/2011CN101872719B Epitaxial growth method for improving In component uniformity of InGaN quantum well
08/31/2011CN101812674B Gas distribution device for metal organic chemical vapor deposition equipment
08/31/2011CN101665903B Mask assembly and film coating equipment
08/31/2011CN101407902B Electrical contact strengthening apparatus and method for improving binding force of coating and workpiece
08/31/2011CN101261952B Substrate carrying bench and substrate treatment device
08/30/2011US8009387 Forming an aluminum alloy oxynitride underlayer and a diamond-like carbon overcoat to protect a magnetic recording head and/or media
08/30/2011US8008743 Vapor deposition of silicon dioxide nanolaminates
08/30/2011US8008602 Electrostatic chuck heater
08/30/2011US8008174 Continuous feed chemical vapor deposition
08/30/2011US8007909 Carbon film
08/30/2011US8007871 Electrospray deposition: devices and methods thereof
08/30/2011US8007865 Atomic layer deposition (ALD) method and reactor for producing a high quality layer
08/30/2011US8007644 Inclined carrier transferring apparatus
08/30/2011US8007633 Surface processing apparatus
08/30/2011US8007632 Semiconductor manufacturing apparatus and manufacturing method of semiconductor device
08/30/2011US8007591 Substrate holder having a fluid gap and method of fabricating the substrate holder
08/30/2011US8007590 Electronic device including a guest material within a layer and a process for forming the same
08/30/2011US8007589 Apparatus and method for compounding carbon nanotubes
08/30/2011US8006641 Installation for depositing, by means of a microwave plasma, an internal barrier coating in thermoplastic containers
08/30/2011US8006640 Plasma processing apparatus and plasma processing method
08/30/2011US8006639 Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure
08/26/2011DE202009018248U1 Neuartige, stoßgedämpfte Räder oder Rollen Novel, shock-absorbing wheels or rollers
08/26/2011CA2732542A1 Precompression effect in pump body
08/25/2011WO2011103589A2 Fluidized bed pyrocarbon coating
08/25/2011WO2011103282A2 VAPOR DEPOSITION METHODS OF SiCOH LOW-K FILMS
08/25/2011WO2011102718A1 Continuous patterned layer deposition
08/25/2011WO2011102584A1 Novel metal dialkyl glycine compound and manufacturing method thereof
08/25/2011WO2011102474A1 Single crystal diamond movable structure and manufacturing method thereof
08/25/2011WO2011102274A1 Thin film manufacturing apparatus, thin film manufacturing method, and method for maintaining thin film manufacturing apparatus
08/25/2011WO2011102263A1 Vacuum processing device
08/25/2011WO2011102083A1 Plasma processing device and plasma processing method
08/25/2011WO2011102045A1 Epitaxial substrate and method for producing same
08/25/2011WO2011102044A1 Epitaxial substrate and method for producing same
08/25/2011WO2011101934A1 Mixture gas supply device
08/25/2011WO2011101929A1 Semiconductor light-emitting device and method for manufacturing the same
08/25/2011WO2011101361A1 Gas mixer for vapor deposition
08/25/2011WO2011101326A1 Constant volume closure valve for vapor phase deposition source
08/25/2011WO2011101325A1 Heating system for a vapor-phase deposition source
08/25/2011WO2011101273A1 Coating device, and method for operating a coating device with a shielding plate
08/25/2011WO2011060021A3 Coated cutting insert and method for making the same
08/25/2011WO2011057780A3 Process for preparing ruthenium(0)-olefin complexes
08/25/2011US20110207332 Thin film coated process kits for semiconductor manufacturing tools
08/25/2011US20110207299 Compound semiconductor manufacturing device, compound semiconductor manufacturing method, and jig for manufacturing compound semiconductor
08/25/2011US20110207283 High temperature atomic layer deposition of dielectric oxides
08/25/2011US20110207256 In-situ acceptor activation with nitrogen and/or oxygen plasma treatment
08/25/2011US20110206937 Composite article having a ceramic nanocomposite layer
08/25/2011US20110206921 Porous Organosilicate Layers, and Vapor Deposition Systems and Methods for Preparing Same
08/25/2011US20110206909 Coatings for suppressing metallic whiskers
08/25/2011US20110206900 Manufacturing method of functional film and functional film
08/25/2011US20110206868 Donor substrate and method of manufacturing display
08/25/2011US20110206866 Deposition apparatus and method
08/25/2011US20110206865 Method of and apparatus utilizing carbon cord for evaporation of metals
08/25/2011US20110206864 Organometallic compounds, processes for the preparation thereof and methods of use thereof
08/25/2011US20110206863 Organometallic compounds having sterically hindered amides
08/25/2011US20110206862 Titanium Nitride Film Deposition by Vapor Deposition Using Cyclopentadienyl Alkylamino Titanium Precursors
08/25/2011US20110206846 Method for depositing transparent conducting oxides
08/25/2011US20110206845 Organometallic compounds and processes for preparation thereof
08/25/2011US20110206844 Chromium-free passivation of vapor deposited aluminum surfaces
08/25/2011US20110206843 Processing methods and apparatus with temperature distribution control
08/25/2011US20110206842 CVD-Siemens Reactor Process Hydrogen Recycle System
08/25/2011US20110206841 Method and device for conditioning paper
08/25/2011US20110206829 Composition for stripping and stripping method
08/25/2011US20110206754 Implant device
08/25/2011US20110206590 Silicon oxide film, method for forming silicon oxide film, and plasma cvd apparatus
08/25/2011US20110205643 Extending the stability of uv curable adhesives in 193nm laser systems
08/25/2011US20110205615 Mems devices with multi-component sacrificial layers
08/25/2011US20110204466 Photoelectric conversion device manufacturing method, photoelectric conversion device, and photoelectric conversion device manufacturing system
08/25/2011US20110204408 High thermal performance packaging for optoelectronics devices
08/25/2011US20110204385 Vapor Deposition of a Layer
08/25/2011US20110204329 NON-POLAR (Al,B,In,Ga)N QUANTUM WELL AND HETEROSTRUCTURE MATERIALS AND DEVICES
08/25/2011US20110204247 Scintillator panel, radiation detector, and method for manufacturing the same
08/25/2011US20110204029 Processing system and method for chemically treating a substrate
08/25/2011US20110203831 Metal/cnt and/or fullerene composite coating on strip materials
08/25/2011US20110203714 Nano-laminate-based ignitors
08/25/2011US20110203524 Ald film-forming apparatus and method of fabricating semiconductor device
08/25/2011US20110203523 Method and apparatus for atomic layer deposition
08/25/2011US20110203101 Chuck and bridge connection points for tube filaments in a chemical vapor deposition reactor
08/25/2011DE102010002342A1 Verwendung der spezifischen Widerstandsmessung zur indirekten Bestimmung der Reinheit von Silanen und Germanen und ein entsprechendes Verfahren Use of the resistivity measurement for the indirect determination of the purity of silanes and Germans and method
08/25/2011DE102010000480A1 Device for producing an aerosol, comprises an injector for introducing small material particles into a carrier gas stream, a thinner, which is line-connected with the injector, and an evaporator, which is line-connected with the thinner
08/25/2011DE102010000479A1 Vorrichtung zur Homogenisierung eines verdampften Aerosols sowie Vorrichtung zum Abscheiden einer organischen Schicht auf einem Substrat mit einer derartigen Homogenisierungseinrichtung An apparatus for homogenizing a vaporized aerosol and apparatus for depositing an organic layer on a substrate having such a homogenizing device
08/25/2011DE102007051447B4 Gasdiffusionsverfahren und Diffusionsofen zur Durchführung des Verfahrens Gas diffusion method and the diffusion furnace for performing the method
08/25/2011CA2786273A1 Constant volume closure valve for vapor phase deposition source
08/25/2011CA2786249A1 Heating system for a vapor-phase deposition source
08/24/2011EP2360761A1 Sealing structure and fuel cell comprising the sealing structure
08/24/2011EP2360719A1 Epitaxial substrate for electronic devices and manufacturing method therefor
08/24/2011EP2360716A1 Plasma processing apparatus
08/24/2011EP2360297A2 Vapor deposition system, method of manufacturing light emitting device and light emitting device
08/24/2011EP2360293A1 Method and apparatus for depositing atomic layers on a substrate
08/24/2011EP2360292A1 Parallel plate reactor for uniform thin film deposition with reduced tool foot-print
08/24/2011EP2360291A1 Method and device for quick heating and cooling of a substrate and immediately coating same in a vacuum
08/24/2011EP2360289A1 Device and method for deposing a layer composed of at least two components on a substrate
08/24/2011EP2359923A1 Method of preparing organometallic compounds
08/24/2011EP2359922A1 Method of preparing organometallic compounds
08/24/2011EP2359388A1 Device and method for coating a substrate using cvd
08/24/2011EP2358483A1 Cleaning method for coating systems
08/24/2011EP1620577B1 Control or modeling of a method for chemical infiltration in a vapor phase for the densification of porous substrates by carbon
08/24/2011EP1612856B1 Device for cleaning cvd device and method of cleaning cvd device
08/24/2011EP1592053B1 Wiring fabricating method
08/24/2011EP1590826B1 Plasma reactor including helical electrodes