| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 09/08/2011 | US20110214609 Atmospheric plasma apparatus |
| 09/07/2011 | EP2363619A2 Saturated aircraft brake preform including coal tar pitch and preparation thereof |
| 09/07/2011 | EP2363512A1 Methods to prepare silicon-containing films |
| 09/07/2011 | EP2363511A2 Gas barrier film, film deposition method, and film deposition device |
| 09/07/2011 | EP2363446A2 Mesophase pitch and preparation from quinoline insoluble free coal tar pitch distillate |
| 09/07/2011 | EP2363199A1 Method and apparatus to help promote contact of gas with vaporized material |
| 09/07/2011 | EP2043781B1 Arrangement comprising nanoparticles, and method for the production thereof |
| 09/07/2011 | CN201962362U 一种等离子体汽相沉积装置的电极 A plasma vapor deposition apparatus of an electrode |
| 09/07/2011 | CN201962361U 加热器底座及加热器 Heater base and heater |
| 09/07/2011 | CN201962360U 一种下镀膜挂钩 Under one kind of coating hook |
| 09/07/2011 | CN201962359U 一种石墨舟载体 Graphite boat carrier |
| 09/07/2011 | CN201962358U 一种上镀膜挂钩 One kind of coating on the hook |
| 09/07/2011 | CN201962357U 化学气相沉积设备 Chemical vapor deposition apparatus |
| 09/07/2011 | CN201962356U 西门子还原沉积硅芯的夹持装置 Siemens reducing deposition of silicon core holding device |
| 09/07/2011 | CN201962355U Reaction chamber for chemical vapor deposition |
| 09/07/2011 | CN201962354U Pecvd沉积腔体吹扫系统 Pecvd deposition chamber purge system |
| 09/07/2011 | CN201962353U 用于化学气相沉积设备的连接管道 Connecting pipes for the chemical vapor deposition apparatus |
| 09/07/2011 | CN201962352U 旋转式空间隔离化学气相淀积设备 Rotary spatial isolation chemical vapor deposition equipment |
| 09/07/2011 | CN201962351U 一种原位清洁第iii族元素和第v族元素化合物沉积反应腔的装置 An in-situ cleaning section iii elements and element compound v deposition reaction chamber device |
| 09/07/2011 | CN201962350U 一种原位清洁第iii族元素和第v族元素化合物沉积反应腔的装置 An in-situ cleaning section iii elements and element compound v deposition reaction chamber device |
| 09/07/2011 | CN201962349U 高界面强度类金刚石薄膜材料的常温沉积设备 High interfacial strength at room temperature deposition equipment DLC thin films |
| 09/07/2011 | CN1926259B Reactive metal sources and deposition method for thioaluminate phosphors |
| 09/07/2011 | CN102177275A Epitaxial reactor for silicon deposition |
| 09/07/2011 | CN102177274A Vapor phase deposition system |
| 09/07/2011 | CN102177163A Niobium and vanadium organometallic precursors for thin film deposition |
| 09/07/2011 | CN102176471A Textured structural ZnO:B (BZO)/ZnO:Ga/H (HGZO) composite thin film and application |
| 09/07/2011 | CN102176410A Method for synthesizing Si/IIB-VIB group semiconductor nano p-n junction with one-step method |
| 09/07/2011 | CN102174693A Gas treatment systems |
| 09/07/2011 | CN102174692A Method for producing an epitaxially coated semiconductor wafer |
| 09/07/2011 | CN102174691A Quick base material temperature raising and reducing technology in large-scale production of thin film photovoltaic battery |
| 09/07/2011 | CN102174690A MOCVD (metal-organic chemical vapor deposition) graphite disc cleaning device |
| 09/07/2011 | CN101805895B Helicon wave plasma enhanced chemical vapor deposition unit |
| 09/07/2011 | CN101760725B Preparation method of zinc sulphide head cap with high optical quality |
| 09/07/2011 | CN101654774B Method for inhibiting corrosion of metal pad |
| 09/07/2011 | CN101223298B Deposition method containing ruthenium membrane |
| 09/06/2011 | US8013371 Ultra thin TCS (SiCl4) cell nitride for DRAM capacitor with DCS (SiH2Cl2) interface seeding layer |
| 09/06/2011 | US8013312 Vapor delivery system useful with ion sources and vaporizer for use in such system |
| 09/06/2011 | US8012887 Precursor addition to silicon oxide CVD for improved low temperature gapfill |
| 09/06/2011 | US8012884 Semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 09/06/2011 | US8012610 Visible-light-responsive photoactive coating, coated article, and method of making same |
| 09/06/2011 | US8012537 Controlling the vaporization of organic material |
| 09/06/2011 | US8012536 Method of forming metal-containing layer using organometallic compounds |
| 09/06/2011 | US8012535 Method for producing a coated substrate body, substrate body comprising a coating and use of the coated substrate body |
| 09/06/2011 | US8012306 Plasma processing reactor with multiple capacitive and inductive power sources |
| 09/06/2011 | US8012304 Plasma reactor with a multiple zone thermal control feed forward control apparatus |
| 09/06/2011 | US8012261 ALD apparatus and method |
| 09/06/2011 | US8012260 Apparatus and method for coating an areal substrate |
| 09/06/2011 | US8012259 Substrate processing apparatus |
| 09/06/2011 | US8011320 Rotary pressure distributor and carousel-type hollow body treatment machine equipped therewith |
| 09/06/2011 | US8011315 Thin film forming apparatus |
| 09/01/2011 | WO2011106304A1 Chromium -free passivation process of vapor deposited aluminum surfaces |
| 09/01/2011 | WO2011106235A2 Methods and apparatus for deposition processes |
| 09/01/2011 | WO2011106218A2 Ultra low dielectric materials using hybrid precursors containing silicon with organic functional groups by plasma-enhanced chemical vapor deposition |
| 09/01/2011 | WO2011106072A2 Use of ruthenium tetroxide as a precursor and reactant for thin film depositions |
| 09/01/2011 | WO2011105908A1 Apparatus and method for reactive ion etching |
| 09/01/2011 | WO2011105898A1 Method and device for layer deposition |
| 09/01/2011 | WO2011105530A1 Carbon film laminate |
| 09/01/2011 | WO2011105392A1 Multilayer film laminate using aluminum or aluminum alloy as substrate, and lamination method therefor |
| 09/01/2011 | WO2011105370A1 Semiconductor device manufacturing method, substrate manufacturing method, and substrate processing apparatus |
| 09/01/2011 | WO2011105163A1 Plasma film-forming apparatus and plasma film-forming method |
| 09/01/2011 | WO2011105158A1 Plasma processing apparatus |
| 09/01/2011 | WO2011105010A1 Semiconductor substrate support susceptor for vapor-phase epitaxy, epitaxial wafer manufacturing device, and epitaxial wafer manufacturing method |
| 09/01/2011 | WO2011104803A1 Plasma generator |
| 09/01/2011 | WO2011104740A1 Cvd processing method and cvd device using said method |
| 09/01/2011 | WO2011104235A1 Devices and method for precipitating a layer on a substrate |
| 09/01/2011 | WO2011104232A1 Method and device for rapidly heating and cooling a substrate and immediately subsequently coating the same under vacuum |
| 09/01/2011 | WO2011042882A3 HIGH DEPOSITION RATE OF SiO2 USING ATOMIC LAYER DEPOSITION AT EXTRA LOW TEMPERATURE |
| 09/01/2011 | US20110212628 Sequential pulse deposition |
| 09/01/2011 | US20110212626 Substrate processing apparatus and semiconductor device producing method |
| 09/01/2011 | US20110212625 Substrate processing apparatus and method of manufacturing semiconductor device |
| 09/01/2011 | US20110212605 Method for manufacturing semiconductor element and deposition apparatus |
| 09/01/2011 | US20110212599 Method of manufacturing semiconductor device, method of manufacturing substrate and substrate processing apparatus |
| 09/01/2011 | US20110212346 Perpendicular magnetic recording medium and process for manufacture thereof |
| 09/01/2011 | US20110212256 Deposition rate control |
| 09/01/2011 | US20110210425 Formation of group iii-v material layers on patterned substrates |
| 09/01/2011 | US20110209664 Substrate processing apparatus |
| 09/01/2011 | US20110209663 Multi-Region Processing System and Heads |
| 09/01/2011 | US20110209662 Vacuum processing chamber manufactured by aluminum casting |
| 09/01/2011 | US20110209660 Methods and apparatus for deposition processes |
| 09/01/2011 | DE102009059097B4 Verfahren und Vorrichtung zur Auswertung des von einem Plasma emittierten Lichtes zur Regelung von plasmagestützten Vakuumprozessen Method and apparatus for evaluation of light emitted from a plasma light to the regulation of plasma-assisted vacuum processes |
| 08/31/2011 | EP2362411A1 Apparatus and method for reactive ion etching |
| 08/31/2011 | EP2362003A2 Methods of depositing SiO2 films |
| 08/31/2011 | EP2362002A1 Continuous patterned layer deposition |
| 08/31/2011 | EP2362001A1 Method and device for layer deposition |
| 08/31/2011 | EP2361882A1 Conductive member provided with amorphous carbon film, process for its manufacture and fuel cell separator |
| 08/31/2011 | EP2361881A1 Sliding member and process for producing same |
| 08/31/2011 | EP2361672A2 Vaporizer delivery ampoule |
| 08/31/2011 | EP2361378A1 Gravimetric sensor having a sensitive layer containing a diamond nanopowder |
| 08/31/2011 | EP2361322A1 Device and method for coating a substrate using cvd |
| 08/31/2011 | EP1659130B1 Rare earth metal complex, material for thin-film formation, and process for producing thin film |
| 08/31/2011 | CN201952487U 真空基片加热装载设备 Vacuum heating the substrate loading apparatus |
| 08/31/2011 | CN1745453B Method and apparatus for plasma treatment of surface in vacuum |
| 08/31/2011 | CN102171384A Silicon carbide-based antireflective coating |
| 08/31/2011 | CN102171381A Films containing an infused oxygenated gas and methods for their preparation |
| 08/31/2011 | CN102171116A Conveyor assembly and method for conveying a substrate carrier |
| 08/31/2011 | CN102169925A Method for manufacturing buffer layer of amorphous silicon thin-film solar cell |
| 08/31/2011 | CN102168269A Method for preparing accelerated carburizing plasma nitrocarburizing and titanium carbonitride composite membrane layer |
| 08/31/2011 | CN102168268A Preparation method of metal nanocrystal |
| 08/31/2011 | CN102168256A ZnO:B film grown by utilizing MOCVD (Metal Organic Chemical Vapor Deposition) gradient doping technology and application |
| 08/31/2011 | CN102168255A Method and apparatus for forming laminated structure including amorphous carbon film |