Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
09/2011
09/15/2011US20110223401 Fibrous product having a barrier layer and method of producing the same
09/15/2011US20110223358 Method of manufacturing gas barrier film
09/15/2011US20110223356 Coating apparatus and method with indirect thermal stabilization
09/15/2011US20110223355 Thermal stabilization of coating material vapor stream
09/15/2011US20110223354 High pressure pre-oxidation for deposition of thermal barrier coating
09/15/2011US20110223353 High pressure pre-oxidation for deposition of thermal barrier coating with hood
09/15/2011US20110223334 Atomic layer deposition chamber with multi inject
09/15/2011US20110223333 Method of treating catalyst for nanocarbon production and method of manufacturing nanocarbon
09/15/2011US20110223332 Method for depositing cubic boron nitride thin film
09/15/2011US20110223320 Methods Of Forming Material Over A Substrate And Methods Of Forming Capacitors
09/15/2011US20110223317 Direct thermal stabilization for coating application
09/15/2011US20110223315 Motorized Rotating And/Or Oscillating Applicator
09/15/2011US20110223065 Biomolecular sensor with plural metal plates and manufacturing method thereof
09/15/2011US20110222840 Heating Configuration For Use in Thermal Processing Chambers
09/15/2011US20110222178 Adaptive deformable mirror for compensation of defects of a wavefront
09/15/2011US20110220382 Method for producing a layer system on a substrate and layer system
09/15/2011US20110220289 Member for plasma treatment apparatus and production method thereof
09/15/2011US20110220285 Methods and systems for texturing ceramic components
09/15/2011US20110220026 Plasma processing device
09/15/2011US20110220024 Device for the synthesis of nanoparticles by fluidized-bed chemical vapour deposition
09/15/2011US20110220023 Nitrogen gas injection apparatus
09/15/2011US20110220021 Apparatus for vapor phase processing ophthalmic devices
09/15/2011DE102010012501A1 Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken Method and apparatus for plasma treatment of workpieces
09/15/2011DE102010010819A1 Verfahren und Vorrichtung zur Herstellung einer Parylen-Beschichtung Method and apparatus for producing a parylene coating
09/15/2011DE102010002839A1 Coating semiconductor wafer in coating system, comprises coating the wafers within functional area, and placing individual wafers in two rows next to each other and in two rows one behind other directly on conveyor belt of transport device
09/15/2011DE102010002688A1 Schraubendruckfeder für einen Ölabstreifring eines Kolbens in einem Verbrennungsmotor und Verfahren zur Beschichtung einer Schraubendruckfeder Helical compression spring for an oil scraper ring of a piston in an internal combustion engine and method for coating a helical compression spring
09/15/2011DE102010002687A1 Verfahren zur Beschichtung zumindest der Innenfläche eines Kolbenrings sowie Kolbenring A method of coating at least the inner surface of a piston ring and piston ring
09/15/2011DE102010002686A1 Gleitelement, insbesondere Kolbenring, und Verfahren zur Beschichtung eines Gleitelements Sliding element, in particular piston ring, and methods for coating a sliding member
09/15/2011DE102009056162A1 Manufacturing defectless crystalline silicon layer on substrate by chemical or physical gas phase deposition, comprises supplying less amount of nitrogen during the coating of the substrate, and supplying other element as dopant material
09/15/2011DE102008020468B4 Verfahren zur Beschichtung von Oberflächen mit einer elektrisch leitfähigen diamantähnlichen Schicht, elektrisch leitfähige diamantähnliche Schicht, hergestellt durch das Verfahren, Werkstück mit der nach dem Verfahren hergestellten elektrisch leitfähigen diamantähnlichen Schicht, Verfahren zur Herstellung des Werkstücks mit der elektrisch leitfähigen diamantähnlichen Schicht und Verfahren zur Bestimmung der Position des Werkstücks A process for coating surfaces with an electrically conductive diamond-like layer, electrically conductive diamond-like layer produced by the method, the workpiece with the produced according to the method electroconductive diamond-like layer, methods of making the workpiece with the electrically conductive diamond-like layer and procedures for determining the position of the workpiece
09/15/2011CA2795442A1 Coated ceramic cutting insert and method of making the same
09/14/2011EP2365111A2 Method of manufacturing of a nano-crystal diamond film and devices using the nano-crystal diamond film
09/14/2011EP2365105A1 Gas barrier film, film deposition method and film deposition device
09/14/2011EP2364380A2 High rate deposition of thin films with improved barrier layer properties
09/14/2011EP1752567B1 Process for producing wafer of silicon carbide single-crystal
09/14/2011EP1626439B1 Method of forming fluorinated carbon film
09/14/2011EP1489646B1 Cvd apparatus and method of cleaning the cvd apparatus
09/14/2011EP1401014B1 Plasma processing device, and method of cleaning the same
09/14/2011CN201971893U 用于等离子体增强化学气相沉积设备的多腔室气路系统 For plasma-enhanced chemical vapor deposition equipment multi-chamber air system
09/14/2011CN1795058B Cleaning a component of a process chamber
09/14/2011CN1718334B Insert for metal cutting
09/14/2011CN102187014A Wear and corrosion resistant layered composite
09/14/2011CN102187011A Cvd precursors
09/14/2011CN102185217A Connecting member and method for radio-frequency power supply in silicon-based film battery deposition clamp
09/14/2011CN102185012A Method for plating silicon nitride anti-reflecting film
09/14/2011CN102185006A Method for preparing antireflective film of polycrystalline silicon solar cell as well as polycrystalline silicon solar cell
09/14/2011CN102184977A Film for solar battery and preparation method thereof
09/14/2011CN102184858A Preparation method of graphene field effect transistor
09/14/2011CN102183509A Plasma monitoring method and plasma monitoring device
09/14/2011CN102181941A Method for preparing textured surface of polycrystalline silicon
09/14/2011CN102181940A Preparation method of multicrystalline silicon texture
09/14/2011CN102181846A Cavity-type graphite boat
09/14/2011CN102181845A Chemical vapor deposition furnace
09/14/2011CN102181844A Cleaning device and method, and film growth reactor and method
09/14/2011CN102181843A Polycrystalline graphene film preparation technique, transparent electrode and preparation of graphene-base device
09/14/2011CN102181827A Method for preparing nano vanadium dioxide film with phase change property on metal substrate
09/14/2011CN101866834B Method for preparing SiGe material of high-Ge content
09/14/2011CN101818336B Processing apparatus and heater unit
09/14/2011CN101764042B Air sucking device and semiconductor processing device
09/14/2011CN101656194B Plasma cavity and temperature control method thereof
09/14/2011CN101452821B Plasma treatment apparatus and shield ring thereof
09/14/2011CN101359586B Manufacturing method of semiconductor integrated circuit device
09/14/2011CN101042570B Micro-mechanical piece made from insulating material and method of manufacture therefor
09/13/2011US8017197 Plasma processing method and plasma processing apparatus
09/13/2011US8017196 Method for plasma coating an object of elastomeric material
09/13/2011US8017184 β-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same
09/13/2011US8017183 Organosiloxane materials for selective area deposition of inorganic materials
09/13/2011US8017182 Method for depositing thin films by mixed pulsed CVD and ALD
09/13/2011US8016974 Plasma treatment apparatus
09/13/2011US8016948 Method of removing contaminants from a coating surface comprising an oxide or fluoride of a group IIIB metal
09/13/2011US8016945 Hafnium oxide ALD process
09/09/2011WO2011108640A1 Crystal growing apparatus, method for manufacturing nitride compound semiconductor crystal, and nitride compound semiconductor crystal
09/09/2011WO2011108625A1 Method for fixation onto layer comprising amorphous carbon film, and laminate
09/09/2011WO2011108609A1 Layered product and process for producing same
09/09/2011WO2011108545A1 Method of manufacturing carbon nanotube, monocrystal substrate for manufacturing carbon nanotube, and carbon nanotube
09/09/2011WO2011108519A1 Semiconductor epitaxial substrate
09/09/2011WO2011108456A1 Inter-low-permittivity layer insulating film, and method for forming inter-low-permittivity layer insulating film
09/09/2011WO2011108219A1 Thin film forming apparatus
09/09/2011WO2011107924A1 Cleaning solvent and cleaning method for metallic compound
09/09/2011WO2011107373A1 Device and method for substrate processing
09/09/2011WO2011065965A3 An electrostatic chuck with an angled sidewall
09/09/2011WO2011063007A3 Fluid bed reactor
09/08/2011US20110217849 Device and method for producing dielectric layers in microwave plasma
09/08/2011US20110217806 Radiofrequency plasma reactor and method for manufacturing vacuum process treated substrates
09/08/2011US20110217802 Fabrication System and Manufacturing Method of Light Emitting Device
09/08/2011US20110217533 Gas barrier film, film deposition method, and film deposition device
09/08/2011US20110217527 Gas barrier film, film deposition method and film deposition device
09/08/2011US20110217486 Method for processing a chemical vapor deposition (cvd) and a cvd device using the same
09/08/2011US20110217485 Method for coating a metal crucible element with a mixture of glass and ceramic
09/08/2011US20110217469 Methods and Systems of Transferring, Docking and Processing Substrates
09/08/2011US20110217466 Apparatus and methods for chemical vapor deposition
09/08/2011US20110217465 Shields for substrate processing systems
09/08/2011US20110217464 Method for applying a thermal barrier coating
09/08/2011US20110217449 Controlled vapor deposition of biocompatible coatings for medical devices
09/08/2011US20110215445 Methods to Prepare Silicon-Containing Films
09/08/2011US20110215071 Wafer carrier with sloped edge
09/08/2011US20110214812 Gas distributing means and substrate processing apparatus including the same
09/08/2011US20110214811 Automatic matching method, computer-readable storage medium, automatic matching unit, and plasma processing apparatus
09/08/2011US20110214611 Film deposition apparatus
09/08/2011US20110214610 Manufacturing method and manufacturing apparatus of semiconductor substrate