Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2011
10/04/2011US8029873 Film deposition method and film deposition apparatus of metal film
10/04/2011US8029864 Heat treatable coated article with diamond-like carbon (DLC) and/or zirconium in coating
10/04/2011US8029863 Method for fabricating a microfluidic component comprising at least one microchannel filled with nanostructures
10/04/2011US8029859 Method of depositing Ge-Sb-Te thin film
10/04/2011US8029858 First species monolayer is chemisorbed onto a substrate within a chamber from a gaseous first precursor, exposing the substrate having the discontinuous first species monolayer to a gaseous second precursor, exposing the substrate having the second species monolayer and the reaction product to gas
10/04/2011US8029621 Raw material feeding device, film formation system and method for feeding gaseous raw material
10/04/2011US8028655 Plasma processing system with locally-efficient inductive plasma coupling
10/04/2011US8028654 Planar controlled zone microwave plasma system
10/04/2011US8028653 System, method and apparatus for filament and support used in plasma-enhanced chemical vapor deposition for reducing carbon voids on media disks in disk drives
10/04/2011US8028652 Batch-type remote plasma processing apparatus
09/2011
09/29/2011WO2011119175A1 Germanium antimony telluride materials and devices incorporating same
09/29/2011WO2011119041A1 Proton, or mixed proton and electronic conducting thin films
09/29/2011WO2011118742A1 Surface treatment apparatus
09/29/2011WO2011118408A1 Plasma treatment device
09/29/2011WO2011117234A2 Method for the supply of fluorine
09/29/2011WO2011117064A1 Process and apparatus for deposition of multicomponent semiconductor layers
09/29/2011WO2011116990A1 Electrode arrangement
09/29/2011WO2011116510A1 Method for depositing thin film
09/29/2011WO2011080659A4 Inline coating installation
09/29/2011WO2011001394A3 Method of removing residual fluorine from deposition chamber
09/29/2011WO2010114386A8 Thin films containing molybdenum oxide
09/29/2011US20110237085 Methods of modifying interlayer adhesion
09/29/2011US20110237076 Film-forming method and film-forming apparatus
09/29/2011US20110237023 Method of fabricating solar cell using microwave and apparatus for the same
09/29/2011US20110236654 Method of surface treatment and surface treated article provied by the same
09/29/2011US20110236599 Plasma processing including asymmetrically grounding a susceptor
09/29/2011US20110236598 Film deposition apparatus, film deposition method, and computer readable storage medium
09/29/2011US20110236594 In-Situ Deposition of Film Stacks
09/29/2011US20110236576 Housing and surface treating method for making the same
09/29/2011US20110236575 Semi-Continuous Vapor Deposition Process for the Manufacture of Coated Particles
09/29/2011US20110233170 Plasma processing apparatus and plasma processing method
09/29/2011US20110232846 Magnetic field generator for magnetron plasma
09/29/2011US20110232573 Catalytic Chemical Vapor Deposition Apparatus
09/29/2011US20110232572 Plasma film-coating apparatus
09/29/2011US20110232571 Film formation apparatus, method for forming film, and method for manufacturing photoelectric conversion device
09/29/2011US20110232570 System and method for depositing a material on a substrate
09/29/2011US20110232569 Segmented substrate loading for multiple substrate processing
09/29/2011US20110232568 Hybrid gas injector
09/29/2011US20110232567 Method of cleaning the filament and reactor's interior in facvd
09/29/2011DE19956472B4 Flüssigkeits-Abgabesystem und Verfahren zur Dampfabscheidung Liquid dispensing system and method for vapor deposition
09/29/2011DE112008004012T5 Verfahren zur Erzeugung eines Metalloxidfilmes und Anlage zur Erzeugung eines Metalloxidfilmes A method for producing a metal oxide film and installation for the production of a metal oxide film
09/29/2011DE102010013043A1 Elektrodenanordnung Electrode assembly
09/28/2011EP2369039A1 Film formation apparatus
09/28/2011EP2369038A2 A system for depositing a coating on a surface of an article and a tyre coated mould.
09/28/2011EP2368860A1 Method and device for substrate processing
09/28/2011EP2368846A1 Method for producing crack-free polycrystalline silicon rods
09/28/2011EP2368824A1 Flexible substrate processing device
09/28/2011EP2368263A2 Electrostatic chuck
09/28/2011EP2367964A1 Reaction chamber of an epitaxial reactor
09/28/2011EP2247769B1 Solid precursor sublimator
09/28/2011EP2118332B1 Method for the production of a coating
09/28/2011EP1794346B1 Apparatus and method for depositing a material on a substrate
09/28/2011EP1789604B1 Adhesion layer for thin film transistors
09/28/2011EP1443130B1 Natural superlattice homologous single crystal thin film, method for preparation thereof, and device using said single crystal thin film
09/28/2011EP1409763B1 Method and device for depositing thin films
09/28/2011EP1292970B1 Thin film forming method
09/28/2011CN201994322U 太阳能电池沉积用放电电极板阵列 Solar panel array discharge electrode deposition
09/28/2011CN201990728U 低压化学气相沉积反应设备 Low pressure chemical vapor deposition reactor equipment
09/28/2011CN201990727U 用于硅片镀膜的承载装置 Carrying device for wafer coating
09/28/2011CN201990726U 一种用于防止pecvd镀膜边缘发红的装置 A method for preventing red edge coating apparatus pecvd
09/28/2011CN201990725U Pecvd设备用气源柜及pecvd设备 Pecvd equipment cabinets and pecvd gas source equipment
09/28/2011CN201990724U 用于化学气相沉积设备的射频电源连接机构 RF power supply connecting means for the chemical vapor deposition apparatus
09/28/2011CN1769518B Endpoint detector and particle monitor
09/28/2011CN102203909A Plasma processing apparatus
09/28/2011CN102203317A Electrode circuit, film formation device, electrode unit, and film formation method
09/28/2011CN102203316A Gas delivery device
09/28/2011CN102201550A Unit mask, mask assembly and method for manufacturing display device
09/28/2011CN102199762A Method for increasing hardness and abrasion resistance of surface of iron and steel material
09/28/2011CN102199761A Thin film deposition apparatus
09/28/2011CN102199760A Preparation method for double-layer silicon nitride anti-reflection film
09/28/2011CN102199757A Sample rotary supporting apparatus used for vapor deposition equipment
09/28/2011CN102198523A Diamond coating and cutting element
09/28/2011CN101956162B Heating platform
09/28/2011CN101921993B Polymer film nano doping device and method
09/28/2011CN101565829B Method for forming noble metal layer using ozone reaction gas
09/28/2011CN101522941B Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body
09/28/2011CN101423937B Multi-gas concentric injection showerhead
09/28/2011CN101321893B Gas head and thin-film manufacturing device
09/27/2011US8027746 Atomic layer deposition apparatus
09/27/2011US8027554 Thermo-optic phase shifter and method for manufacturing same
09/27/2011US8026159 Method of manufacturing semiconductor device and substrate processing apparatus
09/27/2011US8025931 Film formation apparatus for semiconductor process and method for using the same
09/27/2011US8025925 Heating apparatus, coating and development apparatus, and heating method
09/27/2011US8025922 Enhanced deposition of noble metals
09/27/2011US8025917 Liquid material drawing method, color filter manufacturing method, and organic EL element manufacturing method
09/27/2011US8025735 Multiple vacuum evaporation coating device and method for controlling the same
09/27/2011US8025734 Method for controlling the volume of a molecular beam
09/27/2011US8025733 Heating crucible and deposition apparatus using the same
09/27/2011US8025731 Gas injection system for plasma processing
09/27/2011US8025730 Apparatus and method for coating internal surfaces of a turbine engine component
09/22/2011WO2011116273A2 System and method for polycrystalline silicon deposition
09/22/2011WO2011116013A1 Wafer carrier track
09/22/2011WO2011116009A2 Vapor deposition reactor system
09/22/2011WO2011115889A2 Bromine-sensitized solar photolysis of carbon dioxide
09/22/2011WO2011115878A1 Methods for preparing thin fillms by atomic layer deposition using hydrazines
09/22/2011WO2011115834A1 Process chamber liner with apertures for particle containment
09/22/2011WO2011115250A1 Film forming device, film forming method, rotational frequency optimisation method, and storage medium
09/22/2011WO2011115197A1 Manufacturing method for transparent conductive carbon film, and transparent conductive carbon film
09/22/2011WO2011115188A1 Variable resistance element, semiconductor device including same, and method for manufacturing the element and the device
09/22/2011WO2011114999A1 Method for producing gan semiconductor