C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2011
10/12/2011	CN102212798A Showerhead mounting to accommodate thermal expansion
10/12/2011	CN102212797A Hydrogen-free diluting preparation method of high-quality amorphous silicon intrinsic layer
10/12/2011	CN102212796A Non-magnetic ions Zn<2+>, Mg<2+> and Al<3+> doped SnO2-based magnetic semiconductor film material and preparation method thereof
10/12/2011	CN102212795A Growth method of high-compactness nano diamond film
10/12/2011	CN102212794A Copper plating substrate-based method for preparing large-area graphene film
10/12/2011	CN102211218A Diamond coated cutter and application thereof to processing of fiber composite material
10/12/2011	CN102211184A Method for preparing tin nanometer rod completely covered by carbon nanometer tube
10/12/2011	CN101864560B High power microwave plasma diamond film deposition device
10/12/2011	CN101760724B Method for preparing graphene membrane electrode with overlarge area and high quality
10/12/2011	CN101755073B Reactor for depositing thin film on wafer
10/12/2011	CN101655315B Inner plate and crucible assembly for deposition having the same
10/12/2011	CN101465284B Substrate processing appratus
10/12/2011	CN101410958B Plasma CVD apparatus, method for forming thin film and semiconductor device
10/11/2011	US8034728 Systems and methods for forming metal oxides using metal diketonates and/or ketoimines
10/11/2011	US8034459 Erosion resistant coatings
10/11/2011	US8034418 Method for forming thin film and apparatus therefor
10/11/2011	US8034411 Method of preventing abnormal large grains from being included into thin nano-crystalline diamond film
10/11/2011	US8034410 Protective inserts to line holes in parts for semiconductor process equipment
10/11/2011	US8034409 Methods, apparatuses, and systems for fabricating three dimensional integrated circuits
10/11/2011	US8034408 One-dimensional metal and metal oxide nanostructures
10/11/2011	US8034407 Chemical vapor deposition of high conductivity, adherent thin films of ruthenium
10/11/2011	US8034406 for integrated substrate processing in Cu metallization. The method includes providing a substrate in a vacuum processing tool containing a plurality of processing systems configured to process the substrate and a substrate transfer system configured to transfer the substrate under vacuum conditions
10/11/2011	US8034401 Pattern forming method and pattern forming apparatus
10/11/2011	US8034300 Apparatus for producing trichlorosilane
10/11/2011	US8034213 Plasma processing apparatus and plasma processing method
10/11/2011	US8034182 Apparatus for forming a film and an electroluminescence device
10/11/2011	US8034181 Plasma processing apparatus
10/11/2011	US8034180 Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
10/11/2011	US8034178 Apparatus and method for manufacturing an organic electroluminescence display
10/11/2011	US8034177 Inner electrode for barrier film formation and apparatus for film formation
10/11/2011	US8034176 Gas distribution system for a post-etch treatment system
10/11/2011	US8034175 Apparatus and method for manufacturing semiconductor device, and electronic apparatus
10/11/2011	US8033772 Transfer chamber for vacuum processing system
10/11/2011	US8033246 Arc suppression
10/11/2011	US8033245 Substrate support bushing
10/06/2011	WO2011123675A1 Cyclic metal amides and vapor deposition using them
10/06/2011	WO2011123217A2 Silicon-ozone cvd with reduced pattern loading using incubation period deposition
10/06/2011	WO2011123200A1 Method of processing multilayer film
10/06/2011	WO2011121922A1 Glass plate provided with transparent conductive film and method for manufacturing the glass plate
10/06/2011	WO2011121778A1 Thin film polycrystalline silicon and process for production thereof, and plasma device for production of thin film polycrystalline silicon
10/06/2011	WO2011121665A1 Electronic device manufacturing apparatus and electronic device manufacturing method using same
10/06/2011	WO2011121508A1 Modular gas injection device
10/06/2011	WO2011121507A1 Gas injection device with uniform gas velocity
10/06/2011	WO2011077153A3 Deposition process
10/06/2011	US20110245411 Method for producing sprayable lacquer
10/06/2011	US20110244693 Component for semiconductor processing apparatus and manufacturing method thereof
10/06/2011	US20110244210 Graphene sheet and method of preparing the same
10/06/2011	US20110244206 Extruded plastic film filled with metal particles, method of production and uses thereof
10/06/2011	US20110244142 Nitrogen doped amorphous carbon hardmask
10/06/2011	US20110244130 Method for Producing Photocatalytically Active Titanium Dioxide Layers
10/06/2011	US20110244129 Method of making cutting tool inserts with high demands on dimensional accuracy
10/06/2011	US20110244128 Flow plate utilization in filament assisted chemical vapor deposition
10/06/2011	US20110244126 Method for selectively removing hydrogen from molecules
10/06/2011	US20110244124 Methods for producing polycrystalline silicon that reduce the deposition of silicon on reactor walls
10/06/2011	US20110241269 Atmospheric plasma treatment of reinforcement cords and use in rubber articles
10/06/2011	US20110240350 Providing a plastic substrate with a metallic pattern
10/06/2011	US20110240222 Plasma processing apparatus
10/06/2011	US20110240108 Method To Synthesize Colloidal Iron Pyrite (FeS2) Nanocrystals And Fabricate Iron Pyrite Thin Film Solar Cells
10/06/2011	US20110239941 Evaporation apparatus
10/06/2011	US20110239940 Vapor phase deposition system
10/06/2011	US20110239936 Producing method of semiconductor device and substrate processing apparatus
10/06/2011	DE102010013324A1 Producing optoelectronic device e.g. solar cell, comprises supplying substrate into coating chamber, supplying gas into coating chamber, generating plasma in gas by supply energy via to electrodes, and depositing material for layer
10/05/2011	EP2372817A1 Negative electrode material for secondary battery with non-aqueous electrolyte, method for manufacturing negative electrode material for secondary battery with non-aqueous electrolyte, and lithium ion secondary battery
10/05/2011	EP2372753A1 Gas Compositions for Cleaning the Interiors of Reactors as Well as for Etching Films of Silicon-Containing Compounds
10/05/2011	EP2371993A1 Method of surface treatment and surface treated article provided by the same
10/05/2011	EP2371832A1 Ruthenium compound, process for producing same, process for producing ruthenium-containing thin film using same, and ruthenium-containing thin film
10/05/2011	EP2370612A1 In-line vacuum coating system
10/05/2011	EP2102381B1 Method for the production of an antimicrobial material
10/05/2011	EP1706908B1 Production method for tandem solar cells comprising microcrystalline silicon layers
10/05/2011	EP1543537B1 Plasma apparatus with device for reducing polymer deposition on a substrate and method for reducing polymer deposition
10/05/2011	EP1404892B1 Manufacture of silica waveguides with minimal absorption
10/05/2011	EP1388891B1 System for heat treating semiconductor
10/05/2011	EP1337683B1 Method for automatic organisation of microstructures or nanostructures and related device obtained
10/05/2011	EP1335829B1 Multilayered optical structures
10/05/2011	CN201999989U Pipe heating and heat-insulating device
10/05/2011	CN201999988U Detachable gas inlet and outlet structure
10/05/2011	CN102209800A Systems, apparatus and methods for coating the interior of a container using a photolysis and/or thermal chemical vapor deposition process
10/05/2011	CN102208441A Film transistor active layer and growth method thereof
10/05/2011	CN102206856A Method for growing zinc oxide material by modulating temperature periodically
10/05/2011	CN102206815A Plasma film coating device
10/05/2011	CN102206814A Semiconductor film growth control device and semiconductor film growth control method
10/05/2011	CN102206813A Apparatus, method and system of gas mixing in PECVD (Plasma Enhanced Chemical Vapor Deposition) system
10/05/2011	CN102206812A InGaN thin film with larger band gap and preparation method thereof
10/05/2011	CN102206811A InGaN film with small band gap and preparation method thereof
10/05/2011	CN102206810A Surface treatment method and articles having surfaces treated with the method
10/05/2011	CN102206809A High temperature vacuum baking furnace and operation method thereof
10/05/2011	CN101831628B Method for growing high-quality In ingredient enriched InGaN thin film material
10/05/2011	CN101748376B Cuprous compounds and preparation methods of copper thin film by chemical vapor deposition using same
10/05/2011	CN101463485B Divided electrochemical cell and low cost high purity hydride gas production process
10/05/2011	CN101459037B Substrate rack control device, substrate rack mobility control method and sediment apparatus
10/05/2011	CN101395298B Method of densifying porous articles
10/05/2011	CN101368266B Chemical vapor deposition apparatus for flat display
10/05/2011	CN101365821B Method for depositing metallic film
10/05/2011	CN101296745B Plasma abatement device
10/05/2011	CN101023201B Apparatus for the optimization of atmospheric plasma in a plasma processing system
10/04/2011	USRE42770 Nitride semiconductor device having a nitride semiconductor substrate and an indium containing active layer
10/04/2011	US8030599 Substrate processing apparatus, heating device, and semiconductor device manufacturing method
10/04/2011	US8030597 Partition-type heating apparatus
10/04/2011	US8030191 Method of manufacturing micro structure, and method of manufacturing mold material
10/04/2011	US8029923 Vaporizing material for producing highly refractive optical layers

1 ... 132 133 134 135 136 137 138 139 140 141 142 143 144 145 146 147 148 149 150 151 152 ... 719