C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2011
10/20/2011	US20110253046 Apparatus for providing uniform gas delivery to a reactor
10/20/2011	US20110252969 Hot-trap assembly for trapping unreacted gas by- products
10/20/2011	DE102010016511A1 Substrate processing system comprises a process chamber, where a thermal insulation is provided at an inner side of a process chamber wall and has a layer of individual profiles, which are parallely arranged insulating tubes or rods
10/20/2011	DE102010016477A1 Thermisches Behandlungsverfahren mit einem Aufheizschritt, einem Behandlungsschritt und einem Abkühlschritt Thermal treatment method with a heating step, a treatment step and a cooling step
10/20/2011	DE102010016471A1 Vorrichtung und Verfahren zum gleichzeitigen Abscheiden mehrerer Halbleiterschichten in mehreren Prozesskammern Apparatus and method for simultaneously depositing a plurality of semiconductor layers in multiple process chambers
10/20/2011	DE102010015470A1 Verfahren zur Innenbeschichtung von Funktionsschichten mit einem Vergütungsmaterial Method for coating the inside of functional layers with a compensation material
10/20/2011	DE102010015149A1 Vorrichtung zum Beschichten eines Substrates innerhalb einer Vakuumkammer mittels plasmaunterstützter chemischer Dampfabscheidung An apparatus for coating a substrate within a vacuum chamber by means of plasma enhanced chemical vapor deposition
10/20/2011	CA2795332A1 Coating for a cocrmo substrate
10/19/2011	EP2377975A1 Method of growing gallium nitride crystals and process for producing gallium nitride crystals
10/19/2011	EP2376672A1 Dielectric barrier deposition using oxygen containing precursor
10/19/2011	EP2376671A1 Method for making diamond composite materials
10/19/2011	EP2222901B1 Epitaxial barrel susceptor producing improved thickness uniformity in an epitaxial coating
10/19/2011	EP1921061B1 Metal-containing compound, process for producing the same and method of forming a metal-containing thin film
10/19/2011	CN202011903U Strengthened diffusion plate
10/19/2011	CN102224571A Substrate processing method and substrate processing apparatus
10/19/2011	CN102224570A Substrate processing apparatus
10/19/2011	CN102224277A Reaction chamber of an epitaxial reactor
10/19/2011	CN102223956A Cleaning method for coating systems
10/19/2011	CN102222738A Method for manufacturing GaN (gallium nitride) substrate material
10/19/2011	CN102222733A Preparation method of double-layer silicon nitride anti-reflecting film
10/19/2011	CN102220570A PECVD susceptor support construction
10/19/2011	CN102220569A Vertical air flow type MOCVD (Metal Organic Chemical Vapor Deposition) gas transport spray-nozzle device
10/19/2011	CN102220568A Method for preparing silicon-nanoparticle-containing silicon nitride thin films
10/19/2011	CN102220567A Flat PECVD (plasma-enhanced chemical vapor deposition) silicon nitride coating system
10/19/2011	CN102220566A Method for preparing single-layer or multi-layer graphene through chemical vapor deposition
10/19/2011	CN102220565A Chemical vapor deposition equipment used for studying light trapping structure of silicon thin-film cell
10/19/2011	CN102219218A Conical graphite electrode with raised edge
10/19/2011	CN101901761B MOCVD growth method of non-polar m-surface GaN based on gamma-surface LiAlO2 substrate
10/19/2011	CN101325836B Plasma cvd apparatus and film deposition method
10/19/2011	CN101321892B Member for cavitation erosion resistance and method for manufacturing same
10/19/2011	CN101313086B Method for depositing layers in a cvd reactor and gas inlet element for a cvd reactor
10/19/2011	CN101304964B Titanium complexes, process for production thereof, titanium-containing thin films, and method for formation thereof
10/19/2011	CN101003895B Device for delivering reactant to substrate, and process method
10/18/2011	US8041198 Heat treatment apparatus and method for heating substrate by photo-irradiation
10/18/2011	US8039406 Method of gap-filling using amplitude modulation radiofrequency power and apparatus for the same
10/18/2011	US8039062 Methods of atomic layer deposition using hafnium and zirconium-based precursors
10/18/2011	US8039054 Layer deposition methods
10/18/2011	US8039053 Method for making a part of composite material with ceramic matrix and resulting part
10/18/2011	US8039052 Multi-region processing system and heads
10/18/2011	US8039051 Method and apparatus for hydrogenation of thin film silicon on glass
10/18/2011	US8039050 Method and apparatus for strengthening a porous substrate
10/18/2011	US8039049 Treatment of low dielectric constant films using a batch processing system
10/18/2011	US8038837 Ring-shaped component for use in a plasma processing, plasma processing apparatus and outer ring-shaped member
10/18/2011	US8038836 Plasma processing apparatus
10/18/2011	US8038835 Processing device, electrode, electrode plate, and processing method
10/18/2011	US8038834 Method and system for controlling radical distribution
10/18/2011	US8038833 Plasma processing apparatus
10/18/2011	US8038815 Fluorescent dye to improve primer coverage accuracy for bonding applications
10/18/2011	US8038797 Apparatus and method for manufacturing magnetic recording medium
10/13/2011	WO2011127258A1 Fabrication of large-area hexagonal boron nitride thin films
10/13/2011	WO2011127207A2 Simple method for producing superhydrophobic carbon nanotube array
10/13/2011	WO2011127122A2 Titanium-containing precursors for vapor deposition
10/13/2011	WO2011126757A2 Hip implant
10/13/2011	WO2011126748A2 Depositing conformal boron nitride films
10/13/2011	WO2011126553A1 Apparatus and method for depositing alkali metals
10/13/2011	WO2011126145A1 Process for producing epitaxial single-crystal silicon carbide substrate and epitaxial single-crystal silicon carbide substrate obtained by the process
10/13/2011	WO2011125704A1 Plasma processing device and plasma processing method
10/13/2011	WO2011125654A1 Heating control system, deposition device provided therewith, and temperature control method
10/13/2011	WO2011125471A1 Plasma processing device and plasma processing method
10/13/2011	WO2011125470A1 Plasma processing device and plasma processing method
10/13/2011	WO2011125395A1 Process for production of semiconductor device, method for treatment of substrate, and device for treatment of substrate
10/13/2011	WO2011124913A1 Process for preparing a device
10/13/2011	WO2011124642A2 Method for the manufacture of electronic devices with purified fluorine
10/13/2011	WO2011124568A1 Method for manufacturing a porous synthetic diamond material
10/13/2011	WO2011049816A3 Processes for passivating dielectric films
10/13/2011	WO2011041389A3 Precursor vapor generation and delivery system with filters and filter monitoring system
10/13/2011	WO2011015330A3 Flange for a cvd reactor housing, use of a camera in a cvd method, and cvd method for producing silicon rods
10/13/2011	US20110250763 Plasma oxidation method and plasma oxidation apparatus
10/13/2011	US20110250466 Metallic component, in particular rolling bearing, engine or transmission component
10/13/2011	US20110250400 Method of fabricating injection-molded product
10/13/2011	US20110250394 Diamond coated tool
10/13/2011	US20110250376 Simple method for producing superhydrophobic carbon nanotube array
10/13/2011	US20110250367 Deposition apparatus with preheating chamber having thermal hood
10/13/2011	US20110250366 Bell jar for siemens reactor including thermal radiation shield
10/13/2011	US20110250354 Titanium-containing precursors for vapor deposition
10/13/2011	US20110248186 Scintillator panel
10/13/2011	US20110247859 Method for manufacturing a submillimetric electrically conductive grid, and submillimetric electrically conductive grid
10/13/2011	US20110247562 Vaporizing Material at a Uniform Rate
10/13/2011	US20110247561 Thermal Chemical Vapor Deposition Methods, and Thermal Chemical Vapor Deposition Systems
10/13/2011	US20110247560 Substrate processing apparatus
10/13/2011	US20110247559 Gas distribution shower module and film deposition apparatus
10/13/2011	US20110247558 Coating holder and coating device having same
10/13/2011	US20110247557 Device for sealing a chamber inlet or a chamber outlet for a flexible substrate, substrate processing apparatus, and method for assembling such a device
10/13/2011	US20110247556 Tapered Horizontal Growth Chamber
10/13/2011	CA2795344A1 Hip implant
10/13/2011	CA2776752A1 Cnt-tailored composite sea-based structures
10/12/2011	EP2374915A1 Catalyst chemical vapor deposition apparatus
10/12/2011	EP2373830A1 Cvd precursors
10/12/2011	EP2373829A1 Method for producing fittings, lateral grids and shelves for high temperature applications and metal component
10/12/2011	EP2074239B1 Low temperature method of making a zinc oxide coated article
10/12/2011	CN202007269U Window plated with membrane
10/12/2011	CN102217153A Nitride semiconductor device
10/12/2011	CN102217054A Wafer heating apparatus, electrostatic chuck, and method for manufacturing wafer heating apparatus
10/12/2011	CN102217045A Method and apparatus for controlling ion energy distribution
10/12/2011	CN102217044A Plasma processing device and plasma processing method
10/12/2011	CN102216656A Sealing apparatus for a process chamber
10/12/2011	CN102212878A Method for preparing acicular and fungiform Bi2O3 nano materials
10/12/2011	CN102212877A MOCVD (Metal-organic Chemical Vapor Deposition) system with multiple extensional reaction cavities and operation method thereof
10/12/2011	CN102212800A Multi-stock-column type industrial furnace for chemical vapour infiltration densification
10/12/2011	CN102212799A Reaction chamber with high reaction rate

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