C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
10/2011
10/27/2011	US20110263123 Placing table structure
10/27/2011	US20110263111 Group iii-nitride n-type doping
10/27/2011	US20110263107 Method of forming polycrystalline silicon layer and atomic layer deposition apparatus used for the same
10/27/2011	US20110263105 Amorphous silicon film formation method and amorphous silicon film formation apparatus
10/27/2011	US20110263098 Hybrid deposition chamber for in-situ formation of group iv semiconductors & compounds with group iii-nitrides
10/27/2011	US20110263073 Physical Vapour Deposition Processes
10/27/2011	US20110262807 Carbon Nanotube Augmented Sulfur Cathode for an Elemental Sulfur Battery
10/27/2011	US20110262768 Method for producing fittings, lateral grids and shelves for high temperature applicatons and metal component
10/27/2011	US20110262740 Metal and electronic device coating process for marine use and other environments
10/27/2011	US20110262725 Solar Control Glasses
10/27/2011	US20110262679 Gas barrier film and organnic device using the same
10/27/2011	US20110262660 Chalcogenide-containing precursors, methods of making, and methods of using the same for thin film deposition
10/27/2011	US20110262650 Vaporizing or atomizing of electrically charged droplets
10/27/2011	US20110262644 Method and system for mask handling in high productivity chamber
10/27/2011	US20110262642 Process for Producing Silicon and Oxide Films from Organoaminosilane Precursors
10/27/2011	US20110262641 Inline chemical vapor deposition system
10/27/2011	US20110262628 Method and system for inline chemical vapor deposition
10/27/2011	US20110262315 Substrate support having dynamic temperature control
10/27/2011	US20110262233 Coated tool and a method of making thereof
10/27/2011	US20110261430 Processes for producing electrochromic substrates and electrochromic articles made therefrom
10/27/2011	US20110260210 Gan-based leds on silicon substrates with monolithically integrated zener diodes
10/27/2011	US20110259879 Multi-Zone Induction Heating for Improved Temperature Uniformity in MOCVD and HVPE Chambers
10/27/2011	US20110259851 System, method and apparatus for controlling ion energy distribution
10/27/2011	US20110259522 Vacuum Processing Apparatus
10/27/2011	US20110259432 Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature cvd systems
10/27/2011	US20110259269 Small form factor plasma source for high density wide ribbon ion beam generation
10/27/2011	US20110259268 Method for measuring dopant concentration during plasma ion implantation
10/27/2011	US20110259242 Additives to Prevent Degradation of Cyclic Alkene Derivatives
10/27/2011	US20110258924 Multi-level markers
10/27/2011	DE102011018704A1 Vorrichtung und Verfahren zum Beschichten von rotierenden Oberflächen Apparatus and method for coating the rotating surfaces
10/26/2011	EP2381483A1 Film-forming device and film-forming method for forming passivation films as well as manufacturing method for solar cell elements
10/26/2011	EP2381466A2 Method for decontaminating semi-conductor wafers
10/26/2011	EP2381013A2 Carbon component and method for manufacturing the same
10/26/2011	EP2379778A1 Improved coated cutting insert for rough turning
10/26/2011	EP2379769A1 Method of making cutting tool inserts with high demands on dimensional accuracy
10/26/2011	EP2361882A9 Conductive member provided with amorphous carbon film, process for its manufacture and fuel cell separator
10/26/2011	EP1750833B1 Method and apparatus to help promote contact of gas with vaporized material
10/26/2011	EP1719167B1 Substrate support system for reduced autodoping and backside deposition
10/26/2011	CN202017048U Maintenance tool for PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment
10/26/2011	CN202017047U Vertical graphite boat
10/26/2011	CN102227008A Preparation method of P type GaN layer of LED chip
10/26/2011	CN102226273A Elastic tensioning device for growth of diamond film electrode
10/26/2011	CN102226272A Holder for multiple substrates and chamber with the same
10/26/2011	CN102226271A Double-layer quartz tube
10/26/2011	CN102226270A Method for depositing gate dielectric, method for preparing MIS capacitor and MIS capacitor
10/26/2011	CN101696492B Device and method for preparing aluminum-doped zinc oxide transparent conductive film
10/26/2011	CN101649449B Preparation method of ZnS/ZnSe composite infrared transmission material
10/26/2011	CN101484609B Film deposition method and film deposition apparatus
10/26/2011	CN101481798B Film forming method and film forming device using plasma CVD
10/26/2011	CN101253004B Coated articles
10/25/2011	US8044508 Method and apparatus for integrated-circuit battery devices
10/25/2011	US8044493 GaAs semiconductor substrate for group III-V compound semiconductor device
10/25/2011	US8043971 Plasma processing apparatus, ring member and plasma processing method
10/25/2011	US8043912 Manufacturing method of a semiconductor device having polycide wiring layer
10/25/2011	US8043710 Ultra-hydrophilic and antibacterial thin film coated metal product, and it's manufacturing method
10/25/2011	US8043692 Alloyed tungsten produced by chemical vapour deposition
10/25/2011	US8043669 Composite material and process for the production thereof
10/25/2011	US8043660 Method for manufacturing polycrystalline silicon
10/25/2011	US8043659 Substrate processing apparatus and substrate processing method
10/25/2011	US8043652 Method and apparatus for aligning patterns on a substrate
10/25/2011	US8043472 Substrate processing apparatus and focus ring
10/25/2011	US8043471 Plasma processing apparatus
10/25/2011	US8043470 Electrode/probe assemblies and plasma processing chambers incorporating the same
10/25/2011	US8043438 Device for cleaning CVD device and method of cleaning CVD device
10/25/2011	US8043432 Atomic layer deposition systems and methods
10/25/2011	US8043431 Substrate processing apparatus and method for manufacturing a semiconductor device
10/25/2011	US8043430 Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber
10/20/2011	WO2011130506A1 Coating for a cocrmo substrate
10/20/2011	WO2011130326A2 Plasma activated conformal film deposition
10/20/2011	WO2011130174A1 Gas and liquid injection methods and apparatus
10/20/2011	WO2011129246A1 Single-crystal substrate, single-crystal substrate having crystalline film, crystalline film, method for producing single-crystal substrate having crystalline film, method for producing crystalline substrate, and method for producing element
10/20/2011	WO2011128260A1 Heat treatment method having a heating step, a treatment step, and a cooling step
10/20/2011	WO2011128226A1 Device and method for simultaneously precipitating a plurality of semiconductor layers in a plurality of process chambers
10/20/2011	WO2011128044A1 Device for coating a substrate inside a vacuum chamber by means of plasma-assisted chemical vapor deposition
10/20/2011	WO2011127896A1 Process for internally coating functional layers with a through-hardened material
10/20/2011	WO2011127619A1 A method and apparatus for depositing a microcrystalline material in photovoltaic applications
10/20/2011	WO2011106072A3 Use of ruthenium tetroxide as a precursor and reactant for thin film depositions
10/20/2011	WO2011094311A3 Balancing rf bridge assembly
10/20/2011	US20110256718 Thin films
10/20/2011	US20110256692 Multiple precursor concentric delivery showerhead
10/20/2011	US20110256659 Method for manufacturing solar cell, etching device, and cvd device
10/20/2011	US20110256654 Double-sided reusable template for fabrication of semiconductor substrates for photovoltaic cell and microelectronics device manufacturing
10/20/2011	US20110256645 Multiple precursor showerhead with by-pass ports
10/20/2011	US20110256386 Fabrication of Large-Area Hexagonal Boron Nitride Thin Films
10/20/2011	US20110256377 Photovoltaic structures produced with silicon ribbons
10/20/2011	US20110256371 Hard Carbon Coating and Method of Forming The Same
10/20/2011	US20110256347 Method for making diamond composite materials
10/20/2011	US20110256336 Composite carbon and manufacturing method therefor
10/20/2011	US20110256325 Coated glazing
10/20/2011	US20110256323 Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system
10/20/2011	US20110256315 Showerhead assembly with gas injection distribution devices
10/20/2011	US20110256314 Methods for deposition of group 4 metal containing films
10/20/2011	US20110254078 Method for depositing silicon nitride film, computer-readable storage medium, and plasma cvd device
10/20/2011	US20110253973 Semiconductor layer
10/20/2011	US20110253674 Method and Chamber for Inductively Coupled Plasma Processing for Cylinderical Material With Three-Dimensional Surface
10/20/2011	US20110253311 Substrate processing apparatus for performing plasma process
10/20/2011	US20110253310 Methods and apparatus for an induction coil arrangement in a plasma processing system
10/20/2011	US20110253049 Semiconductor processing apparatus
10/20/2011	US20110253048 Wafer holder and method of holding a wafer
10/20/2011	US20110253047 System and Method for Improved Thin Film Deposition

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