C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2011
11/08/2011	US8052833 Chemical treatment apparatus
11/08/2011	US8052825 Method for making composite material having carbon nanotube array
11/08/2011	US8052798 Particle removal apparatus and method and plasma processing apparatus
11/08/2011	US8052796 CVD reactor comprising a photodiode array
11/08/2011	US8052795 Catalyst enhanced chemical vapor deposition apparatus and deposition method using the same
11/08/2011	US8051870 Pressure reduction process device, pressure reduction process method, and pressure regulation valve
11/08/2011	US8051556 Method of manufacturing apparatus for spatial and temporal control of temperature on a substrate
11/03/2011	WO2011137373A2 Vertical inline cvd system
11/03/2011	WO2011137127A1 Vaporizing or atomizing of electrically charged droplets
11/03/2011	WO2011136338A1 Method for forming carbon nanotubes, and carbon nanotube film-forming apparatus
11/03/2011	WO2011136077A1 Vapor deposition device, vapor deposition method, and semiconductor element manufacturing method
11/03/2011	WO2011136075A1 Vacuum processing device, method for moving substrate and alignment mask, alignment method, and film forming method
11/03/2011	WO2011135190A1 Source and arrangement for processing a substrate
11/03/2011	WO2011135100A1 Coated body and a process for coating a body
11/03/2011	WO2011065776A3 Tray and substrate processing apparatus using same and method for manufacturing tray
11/03/2011	WO2011062450A3 Sputtering target of multi-component single body and method for preparation thereof, and method for producing multi-component alloy-based nanostructured thin films using same
11/03/2011	US20110269315 Thin film formation method and film formation apparatus
11/03/2011	US20110269299 Direct chemical vapor deposition of graphene on dielectric surfaces
11/03/2011	US20110269256 Vapor deposition apparatus and process for continuous indirect deposition of a thin film layer on a substrate
11/03/2011	US20110268983 Film-forming treatment jig, plasma cvd apparatus, metal plate and osmium film forming method
11/03/2011	US20110268943 Substrate coating and method of forming the same
11/03/2011	US20110268892 Process for producing polycrystalline silicon
11/03/2011	US20110268891 Gas delivery device
11/03/2011	US20110268889 Preparation of Mist, Process and Apparatus for Forming New Materials by Mist Gas Discharge
11/03/2011	US20110268881 Novel Germanium Complexes with Amidine Derivative Ligand and Process for Preparing the Same
11/03/2011	US20110268880 Reactor clean
11/03/2011	US20110268879 Apparatus and method for high-throughput atomic layer deposition
11/03/2011	US20110268878 Organoruthenium compound for use in chemical vapor deposition and chemical vapor deposition using the same
11/03/2011	US20110268869 Imprint lithography
11/03/2011	US20110268868 Imaging Systems Having Ray Corrector, And Associated Methods
11/03/2011	US20110267618 Passive reflective tracking media compositions and methods for covertly tracking objects
11/03/2011	US20110266944 Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
11/03/2011	US20110266660 Insulating film for semiconductor device, process and apparatus for producing insulating film for semiconductor device, semiconductor device, and process for producing the semiconductor device
11/03/2011	US20110266256 Methods for processing substrates in process systems having shared resources
11/03/2011	US20110266139 Film forming apparatus and method of producing substrate using same
11/03/2011	US20110265951 Twin chamber processing system
11/03/2011	US20110265950 Semiconductor device manufacturing method and target substrate processing system
11/03/2011	US20110265938 Encapsulated Switches Employing Mercury Substitute and Methods of Manufacture Thereof
11/03/2011	US20110265725 Film deposition device and substrate processing device
11/03/2011	US20110265724 Metal-organic chemical vapor deposition apparatus
11/03/2011	US20110265723 Metal-organic chemical vapor deposition apparatus
11/03/2011	US20110265722 Wafer tray for cvd device, heating unit for cvd device and cvd device
11/03/2011	US20110265721 Process chamber lid design with built-in plasma source for short lifetime species
11/03/2011	US20110265720 Gas deposition reactor
11/03/2011	US20110265719 Reaction chamber
11/03/2011	US20110265717 Coated coating machine component, particularly bell plate,and corresponding production method
11/02/2011	EP2383774A1 Film deposition device and gas ejection member
11/02/2011	EP2383368A2 Plasma deposition apparatus and method for making solar cells
11/02/2011	EP2383367A1 Substrate support stage of plasma processing apparatus
11/02/2011	EP2383366A1 Method for producing diamond-like carbon membrane
11/02/2011	EP2383049A1 Apparatus for cleaning deposition chamber parts using selective spray etch
11/02/2011	EP2382157A2 Providing gas for use in forming a carbon nanomaterial
11/02/2011	EP1954853B1 Cvd reactor with a gas inlet member
11/02/2011	CN202022979U Large-capacity graphite wafer carrier
11/02/2011	CN202022978U Gaseous phase deposition system
11/02/2011	CN202022977U Graphite boat electrode structure
11/02/2011	CN202022976U Low-pressure chemical vapor deposition reaction equipment
11/02/2011	CN202022971U Graphite boat adopting bottom electrode contact
11/02/2011	CN1900359B Hybrid PVD-CVD system
11/02/2011	CN102232240A Film-forming apparatus and film-forming method
11/02/2011	CN102232125A Dielectric barrier deposition using oxygen containing precursor
11/02/2011	CN102231416A Chemical vapor deposition reaction equipment
11/02/2011	CN102231291A Preparation apparatus and preparation method of coating layer
11/02/2011	CN102230168A Film deposition device
11/02/2011	CN102230167A Chemical vapor deposition apparatus
11/02/2011	CN102230166A Double-layer gas inlet shower nozzle device of MOCVD (Metal Organic Chemical Vapor Deposition) equipment
11/02/2011	CN102230165A Spray header structure for chemical vapor deposition epitaxial equipment
11/02/2011	CN102230155A Decoupled chamber body
11/02/2011	CN101876075B Preparation method and device thereof of surface structuration composite coating
11/02/2011	CN101752457B Method and equipment for manufacturing solar battery
11/02/2011	CN101604624B Gas ring, apparatus for processing semiconductor substrate, and method of processing semiconductor substrate by using the apparatus
11/02/2011	CN101435075B Plasma processing gas supply member
11/02/2011	CN101316946B Plasma treatment device
11/02/2011	CN101165207B Semiconductor processing apparatus and method for using same
11/01/2011	USRE42887 Silicon carbide and other films and method of deposition
11/01/2011	US8049862 Indium tin oxide (ITO) layer forming
11/01/2011	US8049144 Plasma arc coating system
11/01/2011	US8048494 Diamond shell fabricated by using porous particle and the fabrication method thereof
11/01/2011	US8048485 growing carbon nanotubes on a continuous, elongate, heated catalytic substrate using chemical vapor deposition to form a coated substrates, used in fuel cells for hydrogen storage
11/01/2011	US8048484 Method for the deposition of a film by CVD or ALD
11/01/2011	US8048476 Method of manufacturing plasma display panel
11/01/2011	US8048284 Mixture of metal compound and polyamideether copolymer; electrical or decorative article; printed circuits; improved leveling and throwing power
11/01/2011	US8048260 Magnetic neutral line discharge plasma processing system
11/01/2011	US8048259 Vacuum processing apparatus
11/01/2011	US8048230 Metering and vaporizing particulate material
11/01/2011	US8048229 Apparatus for depositing an organic layer and method for controlling a heating unit thereof
11/01/2011	US8048228 Masking apparatus and method of fabricating electronic component
11/01/2011	US8048227 Compensation plate used in a film coating device
11/01/2011	US8048226 Method and system for improving deposition uniformity in a vapor deposition system
11/01/2011	US8048199 Method of making a leak stable gas separation membrane system
11/01/2011	US8047158 Substrate processing apparatus and reaction container
11/01/2011	CA2445856C Synthesis of bis(cyclopendadienyl) and bis(indenyl) ruthenium complexes
10/2011
10/27/2011	WO2011133807A2 System, method, and apparatus for microscale plasma actuation
10/27/2011	WO2011133562A2 Methods and apparatus for an induction coil arrangement in a plasma processing system
10/27/2011	WO2011133207A2 A coating method for gas delivery system
10/27/2011	WO2011132775A1 Method for manufacturing a thin-film solar cell
10/27/2011	WO2011132454A1 Plasma processing device, plasma processing method, and method for producing semiconductor element
10/27/2011	WO2011132116A1 Ruthenium-containing precursors for cvd and ald
10/27/2011	WO2011131825A1 Coating method and apparatus
10/27/2011	WO2011084427A3 Methods and systems for producing silicon, e.g., polysilicon, including recycling byproducts

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