C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2011
11/16/2011	CN101760726B Preparation method of B and N codope ZnO film
11/16/2011	CN101696494B Reactant deposition method
11/16/2011	CN101646801B Method for low temperature thermal cleaning
11/16/2011	CN101448972B Hot source
11/16/2011	CN101426951B Method and apparatus for coating glass
11/16/2011	CN101381863B Source gas supply device
11/16/2011	CN101359583B Plasma processing apparatus of batch type
11/16/2011	CN101166583B Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system
11/16/2011	CN101107695B Transparent conductive film deposition apparatus, multilayer transparent conductive film continuously deposition apparatus and method of film deposition therewith
11/16/2011	CN101100743B Metal organic chemical vapor deposition equipment
11/15/2011	USRE42917 RF power control device for RF plasma applications
11/15/2011	US8057856 Method for gettering oxygen and water during vacuum deposition of sulfide films
11/15/2011	US8057855 Non-pressure gradient single cycle CVI/CVD apparatus and method
11/15/2011	US8057854 Surface treatment method for coated cutting insert
11/15/2011	US8057845 Method for glazing a sash
11/15/2011	US8057633 Post-etch treatment system for removing residue on a substrate
11/15/2011	US8057602 Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber
11/15/2011	US8057601 Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber
11/15/2011	US8057600 Method and apparatus for an improved baffle plate in a plasma processing system
11/15/2011	US8057599 Substrate processing apparatus and method for manufacturing a semiconductor device
11/15/2011	US8057564 Exhaust trap device
11/15/2011	US8056504 Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates
11/15/2011	US8056503 Plasma procesor and plasma processing method
11/15/2011	CA2461406C Procedure of forming on a metal a protective coating that contains aluminum and zirconium
11/10/2011	WO2011140528A1 Substrates and methods of forming film structures to facilitate silicon carbide epitaxy
11/10/2011	WO2011139526A2 Improved solar control glass products
11/10/2011	WO2011139472A2 Inline chemical vapor deposition system
11/10/2011	WO2011139036A2 Atmospheric pressure plasma apparatus
11/10/2011	WO2011138898A1 Stage heater and method for producing shaft
11/10/2011	WO2011138315A1 Storage magazine of a cvd plant
11/10/2011	WO2011138019A1 Method for the production of biaxially textured films and films obtained using such a method
11/10/2011	WO2011137975A1 Method for the plasma-enhanced treatment of internal surfaces of a hollow body, fluid separator, and use thereof
11/10/2011	WO2011094142A3 Apparatus for controlling temperature uniformity of a substrate
11/10/2011	WO2011078626A3 Strip passing apparatus, apparatus for treating surface of strip with the same, and method for treating surface of strip
11/10/2011	US20110276306 Display element manufacturing method and manufacturing apparatus
11/10/2011	US20110275462 Ball for ball game and method of manufacturing the same
11/10/2011	US20110275166 Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
11/10/2011	US20110274926 Polycrystalline silicon rod and apparatus for producing the same
11/10/2011	US20110274854 Method of making window unit including diamond-like carbon (DLC) coating
11/10/2011	US20110274851 Apparatus for producing polycrystalline silicon
11/10/2011	US20110274850 Hydrothermal synthesis of active materials and in situ spraying deposition for lithium ion battery
11/10/2011	US20110274838 System and process for the continuous vacuum coating of a material in web form
11/10/2011	US20110274837 Ald reactor, method for loading ald reactor, and production line
11/10/2011	US20110274836 Removal of trapped silicon with a cleaning gas
11/10/2011	US20110274826 Method of manufacturing polarizing member
11/10/2011	US20110272827 Adhesive Flexible Barrier Film, Method Of Forming Same, And Organic Electronic Device Including Same
11/10/2011	US20110272682 Flexible Barrier Film, Method Of Forming Same, And Organic Electronic Device Including Same
11/10/2011	US20110272134 High frequency surface treatment methods and apparatus to extend downhole tool survivability
11/10/2011	US20110272099 Plasma processing apparatus and method for the plasma processing of substrates
11/10/2011	US20110272024 MULTI-LAYER SiN FOR FUNCTIONAL AND OPTICAL GRADED ARC LAYERS ON CRYSTALLINE SOLAR CELLS
11/10/2011	US20110271909 Coating apparatus
11/10/2011	US20110271908 linear-type microwave-excited plasma source using a slotted rectangular waveguide as the plasma exciter
11/10/2011	US20110271907 Device for processing a substrate, method of processing a substrate and method of manufacturing semiconductor device
11/10/2011	US20110271872 Wear protection layer and method for the manufacture thereof
11/10/2011	DE102011050112A1 Producing coated particle, comprises evaporating a first starting material, and condensing below formation of particles, which are subsequently coated below supply of a second starting material
11/10/2011	DE102010020074A1 Cutting tool comprises a base body having substrate hardness, a clamping surface layer, preferably clamping surface coating, a clamping surface and a clearance surface, which is formed at the base body
11/10/2011	DE102010016792A1 Bevorratungsmagazin einer CVD-Anlage Storage magazine of a CVD system
11/10/2011	DE102005029360B4 Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen Two methods for the continuous atmospheric pressure plasma treatment of workpieces, in particular material plates or webs
11/09/2011	EP2385159A1 Method for producing sic epitaxial substrate
11/09/2011	EP2385153A1 Cvd apparatus
11/09/2011	EP2385152A1 Substrate coating and method of forming the same
11/09/2011	EP2385150A1 Method for the production of biaxially textured films and films obtained using such a method
11/09/2011	EP1894449B1 Method for treating plasma under continuous atmospheric pressure of work pieces, in particular, material plates or strips
11/09/2011	CN202030823U Graphite button
11/09/2011	CN202030822U Exhaust pipe system suitable for large chemical vapor deposition furnace
11/09/2011	CN202030821U Cleaning device and film growth reaction unit
11/09/2011	CN102239545A Film-forming method, semiconductor element manufacturing method, insulating film and semiconductor element
11/09/2011	CN102239544A Plasma processing apparatus and gas supply mechanism for plasma processing apparatus
11/09/2011	CN102239283A Method of growing gallium nitride crystals and process for producing gallium nitride crystals
11/09/2011	CN102239278A High rate deposition of thin films with improved barrier layer properties
11/09/2011	CN102239277A Method and apparatus for chemical vapor deposition
11/09/2011	CN102239275A Organic compound steam generator and apparatus for producing organic thin film
11/09/2011	CN102237443A Hazy zinc oxide film for shaped CIGS/CIS solar cells
11/09/2011	CN102237304A Method for inhibiting porous low dielectric constant medium from absorbing water vapor
11/09/2011	CN102234838A Methods of dynamically controlling film microstructure formed in a microcrystalline layer
11/09/2011	CN102234793A Carbon component and method for manufacturing the same
11/09/2011	CN102234792A Suspended spraying type metal organic chemical vapor deposition (MOCVD) reactor
11/09/2011	CN102234791A Gas distribution shower module and coating equipment
11/09/2011	CN102234790A Precursor delivery system
11/09/2011	CN102234789A Vapor deposition apparatus and process for continuous indirect deposition of a thin film layer on a substrate
11/09/2011	CN102234788A Vapor phase deposition system and cooling water device
11/09/2011	CN102234787A Gas barrier film and organic device using the same
11/09/2011	CN102234786A Amorphous silicon film formation method and amorphous silicon film formation apparatus
11/09/2011	CN102234785A Substrate coating and forming method thereof
11/09/2011	CN102234759A Coating method for manufacturing thin film solar cell
11/09/2011	CN101787522B Method for preparing ordered magnetic nanoparticle composite film with super-high density
11/09/2011	CN101635255B A method of forming a semiconductor structure
11/09/2011	CN101460658B Method of forming mixed rare earth oxide and aluminate films by atomic layer deposition
11/09/2011	CN101414537B Tunable multi-zone gas injection system
11/09/2011	CN101298664B Apparatus for carrying out plasma chemical vapour deposition and method of manufacturing an optical precast product
11/09/2011	CN101052754B Method of surface reconstruction for silicon carbide substrate
11/08/2011	US8055372 Processing system, processing method, and computer program
11/08/2011	US8053372 Method of reducing plasma stabilization time in a cyclic deposition process
11/08/2011	US8053338 Plasma CVD apparatus
11/08/2011	US8053324 Method of manufacturing a semiconductor device having improved transistor performance
11/08/2011	US8053174 Manufacturing method for wiring
11/08/2011	US8053037 Device and method for patterning structures on a substrate
11/08/2011	US8053036 Method for designing shower plate for plasma CVD apparatus
11/08/2011	US8053029 Method for fabricating CuInS2 thin film by metal organic chemical vapor deposition, CuInS2 thin film fabricated by the same and method for fabricating In2S3 thin film therefrom
11/08/2011	US8052887 Substrate processing apparatus

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