Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
11/2011
11/24/2011US20110283941 Stable wafer-carrier system
11/24/2011DE102011006829A1 Zylinderbohrung und Verfahren zu deren Herstellung Cylinder bore and processes for their preparation
11/24/2011CA2740709A1 Method and apparatus for nitriding metal articles
11/23/2011EP2388802A1 Inside reforming substrate for epitaxial growth; crystal film forming element, device, and bulk substrate produced using the same; and method for producing the same
11/23/2011EP2387626A2 Metal complexes for chemical vapour deposition of platinum
11/23/2011EP1468128B1 Method for manufacturing a free-standing substrate made of monocrystalline semi-conductor material
11/23/2011CN202047131U Reaction device for growing film on substrate
11/23/2011CN1777691B Method and apparatus for reducing substrate backside deposition during processing
11/23/2011CN102257190A Substrate, substrate provided with thin film, semiconductor device, and method for manufacturing semiconductor device
11/23/2011CN102257176A Diamond-coated tool
11/23/2011CN102255009A Light-emitting diode (LED) chip manufacturing method
11/23/2011CN102253446A High-concentration erbium aluminum co-doped amplifying optical fiber based on atomic layer deposition technology and manufacturing method thereof
11/23/2011CN102251231A Preparation method for nano diamond film
11/23/2011CN102251230A Method for increasing growth rate of diamond film prepared by microwave process
11/23/2011CN102251229A Film depositon appratus and method
11/23/2011CN102251228A Method for cleaning gas conveying device, and method and reaction device for film growth
11/23/2011CN102251227A Diffuser support
11/23/2011CN102251226A Substrate processing appratus, control device thereof, and control method thereof
11/23/2011CN102251225A Treatment method and coating pretreatment liquid for reducing coking of furnace tube of hydrocarbon cracking furnace
11/23/2011CN101748377B Reaction chamber of metal organism chemical deposition equipment
11/23/2011CN101728206B Vacuum processing chamber for very large area substrates
11/23/2011CN101715605B Electrode assembly and plasma processing chamber utilizing thermally conductive gasket and o-rings
11/23/2011CN101696493B Reactor for chemical vapor deposition process
11/23/2011CN101646804B Cvd film-forming apparatus
11/23/2011CN101617065B Methods for forming a ruthenium-based film on a substrate
11/23/2011CN101376968B Normal atmosphere plasma strip steel film coating process
11/23/2011CN101113517B Substrate processing apparatus
11/23/2011CN101016622B Chemical vapor deposition apparatus for flat display
11/22/2011US8063237 Sulfur modified silanes for the elaboration of high refractive index materials
11/22/2011US8062716 Method for forming thin film, apparatus for forming thin film, and method for monitoring thin film forming process
11/22/2011US8062707 Gas barrier film, gas barrier film manufacturing method, resin substrate for organic electroluminescent device using the aforesaid gas barrier film, and organic electroluminescent device using the aforementioned gas barrier film
11/22/2011US8062706 Recovery of monobutyltin trichloride
11/22/2011US8062487 Wafer supporting device of a sputtering apparatus
11/22/2011US8062473 Plasma processing apparatus and method
11/22/2011US8062472 Method of correcting baseline skew by a novel motorized source coil assembly
11/22/2011US8062470 Method and apparatus for application of thin coatings from plasma onto inner surfaces of hollow containers
11/22/2011US8062427 Particulate material metering and vaporization
11/22/2011US8062426 CVD reactor with RF-heated process chamber
11/22/2011US8062425 Vapor deposition system and vapor deposition method
11/22/2011US8062422 Method and apparatus for generating a precursor for a semiconductor processing system
11/22/2011US8061299 Formation of photoconductive and photovoltaic films
11/17/2011WO2011143509A1 Vessel outgassing inspection methods
11/17/2011WO2011142470A1 Epitaxial silicon carbide single-crystal substrate and method for producing the same
11/17/2011WO2011142443A1 Microcrystalline silicon film, manufacturing method thereof, semiconductor device, and manufacturing method thereof
11/17/2011WO2011142402A1 Method for producing gallium trichloride gas and method for producing nitride semiconductor crystal
11/17/2011WO2011142074A1 Silicon carbide epitaxial wafer and process for production thereof, silicon carbide bulk substrate for epitaxial growth purposes and process for production thereof, and heat treatment apparatus
11/17/2011WO2011141986A1 Plasma film formation device and film formation method
11/17/2011WO2011141628A1 A method for producing a deposit and a deposit on a surface of a silicon substrate
11/17/2011WO2011087698A3 Pecvd multi-step processing with continuous plasma
11/17/2011WO2011075437A3 Multifunctional heater/chiller pedestal for wide range wafer temperature control
11/17/2011WO2011060090A3 Multilayer growth by gas phase deposition
11/17/2011US20110281443 Film formation method and film formation apparatus
11/17/2011US20110281417 Vapor deposition of silicon dioxide nanolaminates
11/17/2011US20110281156 Vertically Aligned Carbon Nanotube Augmented lithium Ion Anode for Batteries
11/17/2011US20110281128 Thermoplastic Product and Method for the Production of a Composite Product
11/17/2011US20110281106 Gas barrier sheet and manufacturing method thereof
11/17/2011US20110281031 Industrial Vapour Generator For Depositing An Alloy Coating On A Metal Strip
11/17/2011US20110281029 Method for forming thin film
11/17/2011US20110280796 Zinc Oxide Nanorod Thin Film and Method for Making Same
11/17/2011US20110279979 Constructions Comprising Rutile-Type Titanium Oxide; And Methods Of Forming And Utilizing Rutile-Type Titanium Oxide
11/17/2011US20110279900 Optical films and methods of making the same
11/17/2011US20110279895 Polarizing film, polarizing plate, method of preparing the polarizing film and organic light-emitting apparatus including the polarizing plate
11/17/2011US20110278260 Inductive plasma source with metallic shower head using b-field concentrator
11/17/2011US20110277934 Methods of selectively depositing an epitaxial layer
11/17/2011US20110277690 Multi-channel gas-delivery system
11/17/2011US20110277689 Substrate processing chamber with off-center gas delivery funnel
11/17/2011US20110277688 Dynamic support system for quartz process chamber
11/17/2011US20110277681 Gas injectors for cvd systems with the same
11/17/2011US20110277631 Method for modifying a polyimide membrane
11/17/2011DE102011007625A1 Trübe Zinkoxid-Schicht für geformte CIGS/CIS-Solarzellen Cloudy zinc oxide layer formed CIGS / CIS solar cells
11/17/2011DE102010016911A1 Metallisches Bauteil, Verfahren zur Herstellung eines metallischen Bauteils und Beschlag, Möbel und/oder Haushaltsgerät Metallic component, method for producing a metallic component and fittings, furniture and / or household appliance
11/17/2011DE10109507B4 Halbleiterherstellungsverfahren Semiconductor manufacturing processes
11/17/2011CA2799220A1 Vessel outgassing inspection methods
11/16/2011EP2152787B1 Coated object
11/16/2011EP1664377B1 Method and an apparatus for applying a coating on a substrate
11/16/2011CN202039126U Fixed piece, graphite boat slice and graphite boat provided with same
11/16/2011CN1752279B Apparatus for treating thin film and method of treating thin film
11/16/2011CN1662114B Plasma antenna
11/16/2011CN102245934A Rack and pinion system, vacuum processing device, drive control method for rack and pinion system, drive control program, and recording medium
11/16/2011CN102245814A Method for producing nitride compound semiconductor substrate, and nitride compound semiconductor free-standing substrate
11/16/2011CN102245811A Improved coated cutting insert for rough turning
11/16/2011CN102245803A Catalyst chemical vapor deposition apparatus
11/16/2011CN102245802A Film-forming method, film-forming apparatus, and storage medium
11/16/2011CN102245801A Method of making cutting tool inserts with high demands on dimensional accuracy
11/16/2011CN102244152A Method for depositing amorphous silicon thin film in production of solar cells
11/16/2011CN102244143A Preparation method of crystalline silicon solar cell
11/16/2011CN102244051A High-performance directional heat conduction copper-base diamond composite material and preparation method thereof
11/16/2011CN102243992A Method for manufacturing microcrystalline semiconductor film and method for manufacturing semiconductor device
11/16/2011CN102242374A Production method of titanium-based boron-doping diamond coating electrode
11/16/2011CN102242353A Metal-organic chemical vapor deposition machine
11/16/2011CN102242352A Organometallic chemical vapor deposition machine
11/16/2011CN102242351A Nozzle and device for manufacturing semiconductor substrate having the nozzle
11/16/2011CN102242350A Film formation method and film formation apparatus
11/16/2011CN102242349A Detachable air inlet-outlet structure and conducting film forming device thereof
11/16/2011CN102242348A Preparation method of silicon carbide composite film of reflector used in space
11/16/2011CN102242347A Method for preparing tungsten tube for heating body
11/16/2011CN102242336A Film preparation method for reducing stress of hard film
11/16/2011CN101864561B Technology for shaping antireflection coating on inner wall of cover glass tube
11/16/2011CN101825741B Coaxial dual-waveguide structured optical fiber with annular waveguide layer and preparation method thereof
11/16/2011CN101812675B Vacuum processing apparatus