C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2011
12/01/2011	US20110294283 Mocvd reactor having cylindrical gas inlet element
12/01/2011	US20110294010 Power storage device and manufacturing method thereof
12/01/2011	US20110293854 Atomic layer growing apparatus and thin film forming method
12/01/2011	US20110293853 Thin film forming apparatus and thin film forming method
12/01/2011	US20110293852 Organometallic precursor compounds
12/01/2011	US20110293845 Methods of bonding pure rhenium to a substrate
12/01/2011	US20110293832 Method and apparatus for depositing thin layers of polymeric para-xylylene or substituted para-xylylene
12/01/2011	US20110293831 Linear batch chemical vapor deposition system
12/01/2011	US20110293830 Precursors and methods for atomic layer deposition of transition metal oxides
12/01/2011	US20110293829 Coating method and apparatus, a permanent magnet, and manufacturing method thereof
12/01/2011	US20110293828 Method for manufacturing a complexly shaped composite material part
12/01/2011	US20110293826 Apparatus and Method for Coating Internal Surfaces of a Turbine Engine Component
12/01/2011	US20110293825 Method and an arrangement for vapour phase coating of an internal surface of at least one hollow article
12/01/2011	US20110292508 Exposed lens retroreflective article
12/01/2011	US20110290551 Protective structure enclosing device on flexible substrate
12/01/2011	US20110290419 Plasma processing apparatus
12/01/2011	US20110290186 Method and device for producing and processing layers of substrates under a defined processing atmosphere
12/01/2011	US20110290185 Substrate cooling device and substrate treatment system
12/01/2011	US20110290184 Poly silicon deposition device
12/01/2011	US20110290183 Plasma Uniformity Control By Gas Diffuser Hole Design
12/01/2011	US20110290182 Method of manufacturing semiconductor device, cleaning method, and substrate processing apparatus
12/01/2011	DE102011017566A1 Substrate holder useful for a substrate treatment system, comprises a flat frame with a substrate reception for the substrate to be treated, and contacting unit for electrical contacting of the substrate holder and a coupling plate
12/01/2011	DE102010022277A1 Vorrichtung und Verfahren zur Reaktivgastrennung in in-line-Beschichtungsanlagen Apparatus and method for reactive gas separation in in-line coating systems
12/01/2011	DE102010021691A1 Schichtverbund mit einer eindimensionalen Kompositstruktur Layer composite with a one-dimensional composite
12/01/2011	DE102010017082A1 Vorrichtung und Verfahren zum Be- und Entladen, insbesondere einer Beschichtungseinrichtung Apparatus and method for loading and unloading, in particular a coating device
12/01/2011	CA2800287A1 Metallic articles with hydrophobic surfaces
11/2011
11/30/2011	EP2390898A2 Plasma processing apparatus and processing gas supply structure thereof
11/30/2011	EP2390897A2 Plasma processing apparatus
11/30/2011	EP2390382A2 Pulsed mass flow delivery system and method
11/30/2011	EP2390381A2 Method of producing coated member
11/30/2011	EP2390012A2 Plasma Deposition Apparatus
11/30/2011	EP2389459A1 Methods and systems for control of a surface modification process
11/30/2011	EP1920080B1 High colour diamond
11/30/2011	EP1678746B1 Method for forming a dielectric on a copper-containing metallisation
11/30/2011	EP1361610B1 Vaporizer and deposition device using the same
11/30/2011	CN202054896U 一种单晶硅太阳能电池pecvd后快速散热的装置 The latter monocrystalline silicon solar cells pecvd rapid cooling device
11/30/2011	CN202054895U 石墨舟用硅片定位结构 Graphite boat positioning structure with silicon
11/30/2011	CN202054894U 太阳能电池片用板框 Solar cells with a frame
11/30/2011	CN202054893U 用于化学气相沉积的供气管和反应装置 For the chemical vapor deposition gas supply pipe and a reaction apparatus
11/30/2011	CN202054892U 用于镀膜工艺的喷淋头调平装置 Sprinkler coating process for leveling device
11/30/2011	CN102264944A Cvd装置 Cvd device
11/30/2011	CN102264943A 用于碳纳米管生长的装置和方法 Apparatus and method for the growth of carbon nanotubes
11/30/2011	CN102264754A 钌化合物、其制造方法、使用其制造含钌薄膜的方法、以及含钌薄膜 Ruthenium compound, its manufacturing method using the manufacturing method of a thin film containing ruthenium, ruthenium-containing thin film and
11/30/2011	CN102264639A 复合型碳及其制造方法 Composite carbon and its manufacturing method
11/30/2011	CN102261347A 一种类金刚石薄膜在叶轮上的应用 An application of DLC films on the impeller
11/30/2011	CN102260862A 等离子处理装置及供气构件支撑装置 The plasma processing apparatus and the gas supply member support means
11/30/2011	CN102260861A 化学气相沉积的装置和方法 Apparatus and method for chemical vapor deposition
11/30/2011	CN102260860A 一种sonos结构中氮化硅的生长工艺 One kind sonos structure of silicon nitride growth process
11/30/2011	CN102260859A 制造涂覆构件的方法 The method of manufacturing a coated component
11/30/2011	CN102260858A 一种在各种基底上直接生长石墨烯的方法 A direct method for the growth of graphene on various substrates
11/30/2011	CN102260857A 一种晶硅表面镀膜及其制备方法 A crystalline silicon surface coating and preparation method
11/30/2011	CN102260856A 抗刻蚀层、半导体处理装置及制作方法 Anti-etch layer, a semiconductor processing apparatus and method for making
11/30/2011	CN102260855A 抗刻蚀层、半导体处理装置及制作方法 Anti-etch layer, a semiconductor processing apparatus and method for making
11/30/2011	CN102260845A 镜筒镀膜辅助治具 Tube Coating Auxiliary fixture
11/30/2011	CN101874293B 等离子体成膜方法以及等离子体cvd装置 The plasma film forming method and apparatus of a plasma cvd
11/30/2011	CN101783289B 反型外延片制备方法 Anti-type wafer preparation
11/30/2011	CN101705476B 一种cvd热板法快速制备高密度各向同性炭的方法 A method of hot-plate method for rapid preparation of high-density isotropic carbon cvd
11/30/2011	CN101689499B 气化器和成膜装置 Gasifier and film forming apparatus
11/30/2011	CN101646803B 气体供给方法和气体供给装置 Gas supply method and the gas supply means
11/30/2011	CN101636522B 真空涂覆装置 Vacuum coating equipment
11/30/2011	CN101466252B 电磁屏蔽层及其制备方法 Electromagnetic shielding layer and its preparation method
11/30/2011	CN101405431B 有凹口的沉积环 There deposition ring recess
11/30/2011	CN101374973B 基板处理装置以及基板载置台 Substrate processing apparatus and substrate stage
11/30/2011	CN101274493B 织构强化的α-氧化铝涂层工具 Texture enhanced α- alumina coating tool
11/29/2011	US8067626 Processes for polymeric precursors for CAIGS silver-containing photovoltaics
11/29/2011	US8067297 Process for deposition of semiconductor films
11/29/2011	US8067067 Clean, dense yttrium oxide coating protecting semiconductor processing apparatus
11/29/2011	US8067062 Carbon nano tube electrode formed by directly growing carbon nano tube on surface of carbon paper and supporting platinum-based nano catalyst on carbon nano tube using CVD method and manufacturing method thereof
11/29/2011	US8067061 Reaction apparatus having multiple adjustable exhaust ports
11/29/2011	US8067057 Dispenser for liquid crystal display panel and method for controlling gap between substrate and nozzle using the same
11/29/2011	US8066937 Diamond particles contain in metal matrix composite; diffusion bonding through interface of silicon carbide; high speed solidification under pressure
11/29/2011	US8066815 Multi-workpiece processing chamber
11/29/2011	US8066806 Sintered silicon oxide for film vapor deposition, its production method, and method for producing silicon oxide vapor deposition film
11/29/2011	US8066805 Metal inks, methods of making the same, and methods for printing and/or forming metal films
11/24/2011	WO2011146547A1 Chemical vapor deposition of metal layers for improved brazing
11/24/2011	WO2011146460A1 Production of large, high purity single crystal cvd diamond
11/24/2011	WO2011146078A1 Encapsulated particles for enteric release
11/24/2011	WO2011146077A1 Encapsulated particles for amorphous stability enhancement
11/24/2011	WO2011145430A1 Plasma device
11/24/2011	WO2011144324A1 Apparatus and method for supplying electric power to a cvd - reactor
11/24/2011	WO2011123217A3 Silicon-ozone cvd with reduced pattern loading using incubation period deposition
11/24/2011	WO2011112617A3 Atomic layer deposition chamber with multi inject
11/24/2011	WO2009086257A3 Susceptor with support bosses
11/24/2011	US20110287631 Plasma processing apparatus and method of manufacturing semiconductor device
11/24/2011	US20110287227 Method for producing a metal-oxide-coated workpiece surface with predeterminable hydrophobic behaviour
11/24/2011	US20110287223 Metallic articles with hydrophobic surfaces
11/24/2011	US20110287194 Device and method for coating a substrate using cvd
11/24/2011	US20110287193 Apparatus and method for treating an object
11/24/2011	US20110287192 Device and method for coating a substrate using cvd
11/24/2011	US20110287188 Processes for applying a conversion coating with conductive additive(s) and the resultant coated articles
11/24/2011	US20110287184 Precursor compositions and methods
11/24/2011	US20110287172 Substrate processing apparatus, control device thereof, and control method thereof
11/24/2011	US20110286896 Patterning Of Surfaces To Control The Storage, Mobility And Transport Of Liquids For Microfluidic Applications
11/24/2011	US20110285992 Methods of fabricating surface enhanced raman scattering substrates
11/24/2011	US20110285547 External Conditions Audio Playback System and Method
11/24/2011	US20110284497 Plasma processing apparatus and method of manufacturing magnetic recording medium
11/24/2011	US20110284164 Plasma generating apparatus
11/24/2011	US20110283944 Cvd apparatus
11/24/2011	US20110283943 Vapor deposition apparatus
11/24/2011	US20110283942 Film forming apparatus and gas injection member

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