Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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12/08/2011 | WO2011151889A1 Apparatus for forming metal oxide film, method for forming metal oxide film, and metal oxide film |
12/08/2011 | WO2011151561A1 Method for diffusing metal particles within a composite layer |
12/08/2011 | WO2011151057A1 Device and method for reactive gas separation in inline coating installations |
12/08/2011 | WO2011151041A1 Vacuum processing device |
12/08/2011 | WO2011127122A3 Titanium-containing precursors for vapor deposition |
12/08/2011 | WO2011115878A4 Methods for preparing thin fillms by atomic layer deposition using hydrazines |
12/08/2011 | US20110300722 Substrate processing apparatus |
12/08/2011 | US20110300719 Film formation method and film formation apparatus |
12/08/2011 | US20110300695 Method of manufacturing semiconductor device and substrate processing apparatus |
12/08/2011 | US20110300694 Electrode circuit, film formation device, electrode unit, and film formation method |
12/08/2011 | US20110300445 Power storage device and method for manufacturing the same |
12/08/2011 | US20110300413 Battery-operated wireless-communication apparatus and method |
12/08/2011 | US20110300310 Method and Device for Coating Functional Surfaces |
12/08/2011 | US20110300309 Plasma film deposition method |
12/08/2011 | US20110300297 Multi-wafer rotating disc reactor with inertial planetary drive |
12/08/2011 | US20110300289 Coating method and manufacturing method of organic el display |
12/08/2011 | US20110299996 Anti-erosion coating system for gas turbine components |
12/08/2011 | US20110298099 Silicon dioxide layer deposited with bdeas |
12/08/2011 | US20110297321 Substrate support stage of plasma processing apparatus |
12/08/2011 | US20110297089 Method For Forming Thin Film And Apparatus Therefor |
12/08/2011 | US20110297088 Thin edge carrier ring |
12/08/2011 | US20110297087 Vacuum metallization device with means to create metal-free areas |
12/08/2011 | US20110296873 Multi-coated metallic articles and methods of making same |
12/07/2011 | EP2392691A1 Organoaminosilane precursors and methods for depositing films comprising the same |
12/07/2011 | EP2392578A1 Cyclooctatetraenetricarbonylruthenium complex, process for producing same, and process for producing film using the complex as raw material |
12/07/2011 | EP2392412A1 Plasma film deposition method |
12/07/2011 | EP2391743A2 Method of depositing an electrically conductive titanium oxide coating on a substrate |
12/07/2011 | EP2391581A2 Arrangement and method for measurement of the temperature and of the thickness growth of silicon rods in a silicon deposition reactor |
12/07/2011 | EP1390964B1 Dipole ion source |
12/07/2011 | EP1388159B1 Magnetic mirror plasma source |
12/07/2011 | CN202067905U 一种传送微波的导线 A microwave transmission wire |
12/07/2011 | CN202063994U 一种石墨舟 Graphite boat |
12/07/2011 | CN202063993U Large-scale MOCVD (metal organic chemical vapor deposition) system for film photovoltaic device |
12/07/2011 | CN202063992U Chemical vapor deposition furnace |
12/07/2011 | CN202063989U 靶材背板结构 Target backplane structure |
12/07/2011 | CN202061405U Three-level filtering system for vapor phase deposition furnace |
12/07/2011 | CN1789485B 为室门提供浮动密封的方法和装置 Methods and apparatus for providing a floating seal compartment door |
12/07/2011 | CN102272898A 喷淋型气相生长装置及其气相生长方法 Apparatus and vapor growth method spray type vapor phase growth |
12/07/2011 | CN102272897A 等离子体处理装置以及等离子体cvd成膜方法 Cvd plasma deposition apparatus and plasma processing method |
12/07/2011 | CN102272896A 等离子体处理装置 The plasma processing apparatus |
12/07/2011 | CN102272894A 等离子体处理装置 The plasma processing apparatus |
12/07/2011 | CN102272891A 外延生长用内部改性衬底和使用其制造的晶体成膜体、器件、块状衬底以及它们的制造方法 Internal reforming epitaxial growth using the crystal substrate and the film-forming substance, device, bulk substrate manufacturing method thereof and its manufacture |
12/07/2011 | CN102272416A 不粘设备 Non-stick device |
12/07/2011 | CN102272352A Cvd装置 Cvd device |
12/07/2011 | CN102272351A 试剂分配装置及输送方法 Reagent dispensing device and delivery method |
12/07/2011 | CN102272350A 等离子cvd装置 Plasma cvd means |
12/07/2011 | CN102272349A 含金属薄膜的制造方法中的残存水分子除去工艺及清洗溶剂 Metal-containing thin film manufacturing method a process of removing the residual water molecules and cleaning solvent |
12/07/2011 | CN102272344A 用于半导体应用的热喷涂层 Thermal spray coatings for semiconductor applications |
12/07/2011 | CN102270738A 包含电阻器的存储单元的制造方法 The method of manufacturing a resistor comprising a storage unit |
12/07/2011 | CN102268656A Mocvd设备的喷淋头及其制作方法、使用方法 Sprinkler Mocvd device and manufacturing method thereof, using methods |
12/07/2011 | CN102268655A 一种纳米晶碳氮薄膜的制备方法及装置 A method for preparing nanocrystalline carbon nitride films and devices |
12/07/2011 | CN102268654A 一种解决mocvd机台灯丝翘起变形的方法 An mocvd machine filament tilt deformation solution |
12/07/2011 | CN102268653A Preparation method of hard alloy tool diamond interlayer |
12/07/2011 | CN102268026A 有机膦稳定的烷基取代酰亚胺银配合物及其合成方法与应用 Imide silver complex and synthetic methods and application of stable alkyl-substituted organic phosphine |
12/07/2011 | CN101967638B 压裂井口金刚石膜内壁的制备方法 Preparation of the inner wall of diamond films fracturing wellhead |
12/07/2011 | CN101879612B Hard alloy coated blade for steel product turning |
12/07/2011 | CN101870003B Hard alloy coated tool for milling steel and stainless steel |
12/07/2011 | CN101831623B 化学气相增密炉炉膛 Chemical vapor densification Furnace |
12/07/2011 | CN101748378B 成膜载板及太阳能电池的生产方法 Film-forming vehicle and solar cell panel manufacturing method |
12/07/2011 | CN101736315B 射频发生器的离线检测装置 Offline detection device RF generator |
12/07/2011 | CN101680092B 用于cvd反应器中的基板的表面温度的温度控制的装置 Means for the surface temperature cvd reactor temperature control of the substrate |
12/07/2011 | CN101634017B Pecvd用硅片载片器的挂钩 Pecvd wafers slide the hook |
12/07/2011 | CN101591776B 操作化学气相沉积室的方法 The method of operation of a chemical vapor deposition chamber |
12/07/2011 | CN101522766B 用于塑料容器的picvd涂层 Picvd coating for plastic containers |
12/07/2011 | CN101495672B 对于金属薄膜的cvd/ald有用的锑及锗复合物 For the metal thin film cvd / ald useful complexes of antimony and germanium |
12/07/2011 | CN101460659B 利用压差测量的气流控制 The use of differential pressure measurement of air flow control |
12/07/2011 | CN101352108B 台装置和等离子体处理装置 Station apparatus and a plasma processing apparatus |
12/07/2011 | CN101194049B 电沉积青铜的方法 Electric deposited bronze |
12/07/2011 | CN101191200B 用于半导体工艺腔室的烟气挡板及分布器 Flue baffle and distributor for semiconductor process chamber |
12/06/2011 | US8073316 Oven for semiconductor wafer |
12/06/2011 | US8071916 Wafer heating apparatus and semiconductor manufacturing apparatus |
12/06/2011 | US8071477 Method of manufacturing semiconductor device and substrate processing apparatus |
12/06/2011 | US8071237 Negative electrode active material and negative electrode using the same and lithium ion secondary battery |
12/06/2011 | US8071167 Surface pre-treatment for enhancement of nucleation of high dielectric constant materials |
12/06/2011 | US8071166 Method of making heat treated coated article using diamond-like carbon (DLC) coating and protective film |
12/06/2011 | US8071165 Chemical vapor deposition method and system for semiconductor devices |
12/06/2011 | US8071164 Method for lubricating contacting surfaces |
12/06/2011 | US8071163 ligands such as 1-methoxy-2-methyl-2-propanolate increase volatility; chemical vapor deposition; atomic layer deposition |
12/06/2011 | US8071160 Surface coating process |
12/06/2011 | US8070929 Catalyst particles on a tip |
12/06/2011 | US8070926 Multi-chamber workpiece processing |
12/06/2011 | US8070911 Capacitive coupling plasma processing apparatus |
12/06/2011 | US8070910 Shower head structure and treating device |
12/06/2011 | US8070880 Substrate processing apparatus |
12/06/2011 | US8070879 Apparatus and method for hybrid chemical processing |
12/06/2011 | US8070476 Thermal insulation stamper and production method of same |
12/06/2011 | US8069817 Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses |
12/01/2011 | WO2011149705A2 Hydrophilic marking film having plasma chemical vapor deposition treated protective layer |
12/01/2011 | WO2011149678A2 Linear batch chemical vapor deposition system |
12/01/2011 | WO2011149615A2 Hybrid hotwire chemical vapor deposition and plasma enhanced chemical vapor deposition method and apparatus |
12/01/2011 | WO2011149127A1 Novel non-metallic heat emitter composition, a method for producing a non-metallic heat emitter by using the composition, and a non-metallic heat emitter produced therefrom |
12/01/2011 | WO2011148924A1 Film forming device |
12/01/2011 | WO2011148831A1 Method and apparatus for producing silicon nitride film |
12/01/2011 | WO2011148830A1 Silicon nitride film of semiconductor element, and method and apparatus for producing silicon nitride film |
12/01/2011 | WO2011147808A1 Sliding element |
12/01/2011 | WO2011147756A1 Metallic articles with hydrophobic surfaces |
12/01/2011 | WO2011126748A3 Depositing conformal boron nitride films |
12/01/2011 | WO2011123792A3 Metal nitride containing film deposition using combination of amino-metal and halogenated metal precursors |
12/01/2011 | US20110294672 Metal Complexes for Chemical Vapour Deposition of Platinum |
12/01/2011 | US20110294303 Confined process volume pecvd chamber |