C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2011
12/15/2011	US20110305846 Apparatus and method for surface processing
12/15/2011	US20110305837 Poly(ethylene glycol) and poly(ethylene oxide) by initiated chemical vapor deposition
12/15/2011	US20110305836 Atomic layer deposition apparatus and thin film forming method
12/15/2011	US20110305835 Systems and methods for a gas treatment of a number of substrates
12/15/2011	US20110305834 Multiple vacuum evaporation coating device and method for controlling the same
12/15/2011	US20110305833 Apparatus for treating and/or coating the surface of a substrate component
12/15/2011	US20110305832 Surface treating method for making a housing
12/15/2011	US20110305831 Method for chemical vapor deposition control
12/15/2011	US20110305820 Fiber modified layer and methods of making and using same
12/15/2011	US20110303536 Sputtering apparatus with magnetic module
12/15/2011	US20110303364 Plasma processing apparatus
12/15/2011	US20110303154 Susceptor and chemical vapor deposition apparatus including the same
12/15/2011	US20110303153 Device and method for fabricating thin films by reactive evaporation
12/15/2011	US20110303152 Support structure, processing container structure and processing apparatus
12/15/2011	US20110303151 Twin-type coating device with improved separating plate
12/15/2011	US20110303149 Twin-type coating device with improved separating plate
12/15/2011	US20110303148 Full-enclosure, controlled-flow mini-environment for thin film chambers
12/15/2011	US20110303147 Atomic layer deposition apparatus
12/15/2011	US20110303146 Plasma doping apparatus
12/15/2011	US20110303145 Apparatus for chemical vapor deposition control
12/15/2011	DE102011007735A1 System useful for gas treatment of at least one substrate, comprises reaction chamber, substrate support structure for holding one substrate arranged in reaction chamber, static gas injector, and at least one movable gas injector
12/15/2011	DE102010030006A1 Vakuumbeschichtungsanlage in modularer Bauweise Vacuum coating system in modular design
12/15/2011	DE102010023517A1 Beschichtungsanlage und Verfahren zur Beschichtung eines Substrates bei gleichzeitiger Schichtüberwachung Coating system and method for coating a substrate with simultaneous monitoring layer
12/15/2011	DE102010017354A1 Verfahren zum Herstellen eines warmgeformten und gehärteten, mit einer metallischen Korrosionsschutzbeschichtung überzogenen Stahlbauteils aus einem Stahlflachprodukt A method for producing a thermoformed and cured, coated with a metallic anti-corrosion coating the steel member from a steel flat product
12/15/2011	DE102009049839A1 Gasverdampfer für Beschichtungsanlagen Gas evaporator for coating systems
12/15/2011	CA2801912A1 Low-temperature synthesis of silica
12/14/2011	EP2395546A2 Method for processing solar cell substrates in a vertical furnace
12/14/2011	EP2395133A1 Epitaxial silicon carbide single crystal substrate and mehtod for producing same
12/14/2011	EP2395127A1 Cylinder surface treatment for monochlorosilane
12/14/2011	EP2395126A1 Textured alumina layer
12/14/2011	EP2395125A1 Method of manufacturing a coated amorphous metal part
12/14/2011	EP2394154A2 Origami sensor
12/14/2011	EP2393961A1 Ald reactor, method for loading ald reactor, and production line
12/14/2011	EP2393960A1 Reaction chamber
12/14/2011	EP2393959A2 Mesoporous carbon material for energy storage
12/14/2011	EP2393613A1 Plastic substrate comprising a flexible, transparent protective coating and method for producing such a plastic substrate
12/14/2011	EP1797581B1 Precursor for film formation and method for forming ruthenium-containing film
12/14/2011	EP1665354B1 Methods of filling gaps and methods of depositing materials using high density plasma chemical vapor deposition
12/14/2011	EP1484788B1 High-frequency power supply structure and plasma cvd device using the same
12/14/2011	EP1171900B1 Large area atmospheric-pressure plasma jet
12/14/2011	CN202072764U 一种金属有机物化学气相沉积设备放空压力控制装置 Metal organic chemical vapor deposition equipment venting pressure control device
12/14/2011	CN202072763U 自动限位装置 Automatic limit device
12/14/2011	CN202072762U 一种石墨舟 Graphite boat
12/14/2011	CN202072761U 一种适用于等离子体处理机台的气体混合装置以及等离子体处理机台 One for plasma processor sets plasma gas mixing device and processor sets
12/14/2011	CN202070515U 清洗mocvd设备用石墨盘的烤盘炉装置 Cleaning equipment mocvd baking pan with graphite furnace device
12/14/2011	CN1950921B 在介电基片的基础上制造片状工件的方法和用于该制造方法的真空处理设备 Methods based on the dielectric substrate and the vacuum producing a workpiece sheet processing apparatus used for the manufacturing method
12/14/2011	CN1737191B 用于汽相淀积系统的衬底托架 A substrate for vapor deposition system of the carriage
12/14/2011	CN102282916A 等离子体生成装置及方法 Plasma generation device and method
12/14/2011	CN102282291A 化学气相沉积用原料及使用了该原料的含硅薄膜形成方法 Chemical vapor deposition using a silicon-containing raw material and the film-forming method of the raw material
12/14/2011	CN102282096A 用于金属的疏水表面涂覆系统和方法 A hydrophobic surface coating systems and methods for metals
12/14/2011	CN102280384A 功率沟槽式金属氧化物半导体场效应晶体管制作工艺 Power trench metal oxide semiconductor field effect transistor fabrication process
12/14/2011	CN102277570A ZnO/Cu/ZnO透明导电薄膜的制备方法 ZnO / Cu / ZnO transparent conductive film preparation
12/14/2011	CN102277562A 薄膜太阳能电池多级pecvd沉积设备 Thin-film solar cell deposition apparatus multistage pecvd
12/14/2011	CN102277561A 用于多个基板的气体处理的系统和方法 Gas treatment system and method for a plurality of substrates
12/14/2011	CN102277560A 化学气相沉积SiC/C梯度表面涂层提高石墨电极抗氧化性的方法 CVD SiC / C graded surface coating to improve the oxidation resistance of graphite electrodes
12/14/2011	CN101849033B 薄膜形成装置和薄膜的形成方法 Apparatus and method for forming a thin film of film-forming
12/14/2011	CN101809769B 化合物半导体外延晶片及其制造方法 Compound semiconductor epitaxial wafer and its manufacturing method
12/14/2011	CN101748392B 全自动大型平板式pecvd晶硅光伏减反射覆膜制备设备 Automatic Large flatbed pecvd crystalline silicon photovoltaic antireflection coating preparation equipment
12/14/2011	CN101652500B 多层cvd涂层 Cvd multilayer coating
12/14/2011	CN101647110B 半导体器件及其制造方法 Semiconductor device and manufacturing method thereof
12/14/2011	CN101645386B 用于对中空体进行等离子体处理的设备和方法 Apparatus and method for performing plasma treatment of hollow
12/14/2011	CN101556909B 等离子体处理装置及其密封结构、密封方法 Apparatus and sealing structure, a sealing method plasma treatment
12/14/2011	CN101359614B 一种衬垫夹钳 One kind of liner clamp
12/14/2011	CN101285178B 汽化器和半导体处理系统 Carburetor and semiconductor processing system
12/14/2011	CN101278073B 原料供应装置及蒸镀装置 Raw material supply device and the deposition apparatus
12/14/2011	CN101191199B 一种apcvd喷涂新配方 Spray one kind apcvd new recipe
12/14/2011	CN101128084B 等离子体生成装置、等离子体控制方法和基板制造方法 The plasma generating apparatus, the plasma control method and substrate manufacturing method
12/14/2011	CN101124353B 生长第（Ⅲ）族金属氮化物薄膜的方法和装置、以及第（Ⅲ）族金属氮化物薄膜 The first growth (Ⅲ) Method and apparatus for metal nitride films, as well as the first (Ⅲ) metal nitride films
12/13/2011	USRE43025 Mixed composition interface layer and method of forming
12/13/2011	US8076679 Nitride-based semiconductor light-emitting diode and illuminating device
12/13/2011	US8076615 Substrate processing apparatus and method of manufacturing semiconductor device
12/13/2011	US8075954 Coating method and apparatus, a permanent magnet, and manufacturing method thereof
12/13/2011	US8075953 Thin organic alignment layers with a batch process for liquid crystal displays
12/13/2011	US8075952 Power loading substrates to reduce particle contamination
12/13/2011	US8075789 Remote plasma cleaning source having reduced reactivity with a substrate processing chamber
12/13/2011	US8075744 Layered coated cutting tool
12/13/2011	US8075734 Remote inductively coupled plasma source for CVD chamber cleaning
12/13/2011	US8075733 Plasma processing apparatus
12/13/2011	US8075731 Substrate processing apparatus and a substrate processing method
12/13/2011	US8075730 Apparatus for manufacturing a semiconductor device
12/13/2011	US8075729 Method and apparatus for controlling temperature of a substrate
12/13/2011	US8075728 Gas flow equalizer plate suitable for use in a substrate process chamber
12/13/2011	US8075698 Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing
12/13/2011	US8075693 Crucible heating apparatus and deposition apparatus including the same
12/13/2011	US8075692 Fluid bed reactor
12/13/2011	US8075691 Vacuum processing apparatus
12/13/2011	US8075690 Diffuser gravity support
12/13/2011	US8074599 Plasma uniformity control by gas diffuser curvature
12/13/2011	CA2502124C A transparent high-temperature resistant and protective coating for domestic appliances and method for its deposition
12/12/2011	DE202011106157U1 Subtratbehandlungsanlage mit Kammerdeckel Subtratbehandlungsanlage with chamber lid
12/08/2011	WO2011153484A2 Silicon dioxide layer deposited with bdeas
12/08/2011	WO2011153357A1 Method for providing lateral thermal processing of thin films on low-temperature substrates
12/08/2011	WO2011153228A2 Reduction of copper or trace metal contaminants in plasma electrolytic oxidation coatings
12/08/2011	WO2011153016A1 Shadow mask alignment using coded apertures
12/08/2011	WO2011152873A2 Glassy calcium phosphate particulates, coatings and related bone graft materials
12/08/2011	WO2011152470A1 Lubricant composition for low-friction sliding material and sliding mechanism using same
12/08/2011	WO2011152435A1 Method of producing optical element forming mold and optical element forming mold
12/08/2011	WO2011152352A1 Method for manufacturing semiconductor device and substrate processing apparatus
12/08/2011	WO2011152182A1 Method for manufacturing a coated member
12/08/2011	WO2011152122A1 Covered member and process for production thereof

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