C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2011
12/22/2011	US20110311793 Polyurethane Foam Article And Method of Forming Same
12/22/2011	US20110311737 Vapor deposition apparatus for minute-structure and method therefor
12/22/2011	US20110311736 Method and apparatus for forming film
12/22/2011	US20110311734 Two Layer Barrier on Polymeric Substrate
12/22/2011	US20110311726 Method and apparatus for precursor delivery
12/22/2011	US20110311725 Apparatus and methods for safely providing hazardous reactants
12/22/2011	US20110311724 Providing gas for use in forming a carbon nanomaterial
12/22/2011	US20110311717 Vapor deposition method and vapor deposition system
12/22/2011	US20110311716 Plural Component Coating Application System With a Compressed Gas Flushing System and Spray Tip Flip Mechanism
12/22/2011	US20110311715 Apparatus for slot die setup and control during coating
12/22/2011	US20110311714 Fluidized Bed Pyrocarbon Coating
12/22/2011	US20110309050 Plasma processing device, plasma processing method and method of manufacturing element including substrate to be processed
12/22/2011	US20110309049 Techniques for plasma processing a substrate
12/22/2011	US20110308841 Coverlay film, method for manufacturing coverlay film, and flexible printed wiring board
12/22/2011	US20110308735 Vacuum processing apparatus
12/22/2011	US20110308734 Apparatus for large area plasma processing
12/22/2011	US20110308464 Substrate processing apparatus, method for processing substrate, and storage medium
12/22/2011	US20110308463 Chemical vapor deposition reactor with isolated sequential processing zones
12/22/2011	US20110308462 Apparatus for producing aligned carbon nanotube aggregates
12/22/2011	US20110308460 Atomic layer deposition apparatus
12/22/2011	US20110308459 Cvd apparatus
12/22/2011	US20110308458 Thin Film Deposition Apparatus
12/22/2011	US20110308457 Apparatus and method for treating an object
12/22/2011	US20110308456 Coating apparatus
12/22/2011	DE102010023119A1 Vorrichtung zur Plasmabehandlung von Werkstücken Apparatus for plasma treatment of workpieces
12/21/2011	EP2398047A2 Susceptor and Chemical Vapor Deposition Apparatus including the same
12/21/2011	EP2398043A1 Thin film forming apparatus and thin film forming method
12/21/2011	EP2397576A1 Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus
12/21/2011	EP2397575A1 Cvd device
12/21/2011	EP2397574A1 Process for producing multilayered gas-barrier film
12/21/2011	EP2396808A2 Migration and plasma enhanced chemical vapor deposition
12/21/2011	EP2396453A1 Gas deposition reactor
12/21/2011	EP2396452A1 Two layer barrier on polymeric substrate
12/21/2011	EP2396451A1 Two layer barrier on polymeric substrate
12/21/2011	EP2396450A1 A chemical vapour deposition system and process
12/21/2011	EP2396449A1 Plasma deposition
12/21/2011	EP2396448A1 Method for applying a coating to workpieces and/or materials comprising at least one readily oxidizable nonferrous metal
12/21/2011	CN202081165U 一种沉积二氧化硅薄膜的装置 An apparatus for depositing thin films of silica
12/21/2011	CN1720346B 制造碳纳米管的薄膜、层、织物、条带、元件以及制品的方法 A thin film of carbon nanotubes, layer, web, strip, and the product of a member
12/21/2011	CN1671883B 铜膜沉积方法 Cu film deposition method
12/21/2011	CN102292795A 用cvd涂敷基板的装置与方法 Apparatus and method for coating with the substrate cvd
12/21/2011	CN102292466A 利用cvd 涂覆基板的器件和方法 The use of devices and methods cvd coated substrate
12/21/2011	CN102292465A Pt-Al-Hf/Zr涂层及方法 Pt-Al-Hf / Zr coating and Methods
12/21/2011	CN102292287A 提供用于形成碳纳米材料的气体 Providing a gas for forming a carbon nanomaterial
12/21/2011	CN102290366A Support structure and processing apparatus
12/21/2011	CN102290260A 一种电触头及其制备方法 An electrical contacts and its preparation method
12/21/2011	CN102286743A 一种钢铁基镶嵌金刚石涂层及其制备方法 One kind of steel base inlaid diamond coating and its preparation method
12/21/2011	CN102286732A 基座以及包括该基座的化学气相沉积装置 The base and the chemical vapor deposition apparatus comprises a base
12/21/2011	CN102286731A 处理装置及成膜方法 Apparatus and method for processing a film
12/21/2011	CN102286730A Thin film deposition apparatus
12/21/2011	CN102286729A 单腔体多载片离子增长型化学气相沉积装置 Single-chamber slides were ion-growth multiple chemical vapor deposition apparatus
12/21/2011	CN102286728A 基板处理装置及基板处理方法 Substrate processing apparatus and substrate processing method
12/21/2011	CN102286727A 薄膜沉积设备、制造有机发光显示装置的方法及显示装置 Thin film deposition apparatus, the method and apparatus of manufacturing an organic light emitting display device display
12/21/2011	CN101921994B 一种原子层沉积超薄氧化铝薄膜的装置及方法 An apparatus and method for atomic layer deposition of thin films of alumina
12/21/2011	CN101894737B 腔室环境的控制方法 The control method of the chamber environment
12/21/2011	CN101849034B 使用硅烷作为前驱体制备n-型半导体材料的方法 Silane as the precursor preparation method n- type semiconductor material
12/21/2011	CN101831622B 石墨烯泡沫及其制备方法 Graphene foam and its preparation method
12/21/2011	CN101689490B 成膜方法和处理系统 Film-forming method and processing system
12/21/2011	CN101680561B 流体控制装置 Fluid control apparatus
12/21/2011	CN101572232B 形成高质量的低温氮化硅层的方法 The method of forming a high quality low temperature silicon nitride layer
12/21/2011	CN101239515B 基于植入式纳米线电极的介电可调薄膜及其制备方法 Film and preparation method adjustable dielectric nanowire electrodes implanted on
12/21/2011	CN101167165B 增加pecvd氮化硅膜层的压缩应力的方法 Increasing the compressive stress of the silicon nitride film method pecvd
12/21/2011	CN101135046B 半导体处理用的成膜方法和装置 The semiconductor processing method and apparatus used in the film forming
12/21/2011	CN101127298B 热处理装置和热处理方法 Heat treatment apparatus and heat treatment method
12/21/2011	CN101050523B 形成氧化物膜的方法和氧化物沉积设备 The method of forming the oxide film and the oxide deposition apparatus
12/20/2011	US8080765 Apparatus and method for heating substrate and coating and developing system
12/20/2011	US8080477 Film formation apparatus and method for using same
12/20/2011	US8080290 Film formation method and apparatus for semiconductor process
12/20/2011	US8080289 Method for making an aligned carbon nanotube
12/20/2011	US8080283 Method for forming a yttria-stabilized zirconia coating with a molten silicate resistant outer layer
12/20/2011	US8080282 Method for forming silicon carbide film containing oxygen
12/20/2011	US8080281 Growth and applications of ultralong carbon nanotubes
12/20/2011	US8080280 Nanostructure templating using low temperature atomic layer deposition
12/20/2011	US8080125 Gas-permeable plasma electrode, method for production of the gas-permeable plasma electrode, and a parallel-plate reactor
12/20/2011	US8080108 Method for cleaning a substrate
12/20/2011	US8080107 Showerhead electrode assembly for plasma processing apparatuses
12/20/2011	US8079428 Hardfacing materials including PCD particles, welding rods and earth-boring tools including such materials, and methods of forming and using same
12/20/2011	CA2647595C Microcrystalline silicon film forming method and solar cell
12/20/2011	CA2337271C Primary target for forming fission products
12/15/2011	WO2011156749A2 Graphene deposition
12/15/2011	WO2011156625A1 Full-enclosure, controlled-flow mini-environment for thin film chambers
12/15/2011	WO2011156484A2 Low-temperature synthesis of silica
12/15/2011	WO2011156055A1 Apparatus and method for chemical vapor deposition control
12/15/2011	WO2011155408A1 Plasma processing apparatus
12/15/2011	WO2011155353A1 Hydrosilane derivative, method for producing same, and method for producing silicon-containing thin film
12/15/2011	WO2011154747A1 Method and apparatus for deposition
12/15/2011	WO2011154392A1 Textured alumina layer
12/15/2011	WO2011154312A1 Method for producing a coated amorphous metal part
12/15/2011	WO2011153993A1 Device for plasma treatment of workpieces
12/15/2011	WO2011153674A1 Deposition box for silicon-based thin film solar cell
12/15/2011	WO2011153673A1 Surface feed-in electrode for deposition of thin film solar battery and signal feed-in method thereof
12/15/2011	WO2011153672A1 Movable jig for silicon-based thin film solar cell
12/15/2011	WO2011153670A1 Clamping unit for depositing thin film solar cell and signal feed-in method
12/15/2011	WO2011130326A3 Plasma activated conformal film deposition
12/15/2011	US20110307089 Method and system for performing a chemical oxide removal process
12/15/2011	US20110306258 flame retardation of textiles by halogenated aryl phosphonates
12/15/2011	US20110306217 Thin film forming apparatus and method
12/15/2011	US20110306187 Method and apparatus for silicon refinement
12/15/2011	US20110306179 MOCVD for Growing III-V Compound Semiconductors on Silicon Substrates
12/15/2011	US20110305847 Linear plasma system

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