C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes

Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
12/2011
12/29/2011	US20110318488 Organoruthenium compound for chemical deposition and chemical deposition process using the organoruthenium compound
12/29/2011	US20110318487 Substrate for producing aligned carbon nanotube aggregates and method for producing the aligned carbon nanotube aggregates
12/29/2011	US20110315320 Gas distributing device and substrate processing apparatus including the same
12/29/2011	US20110315082 Film coating apparatus
12/29/2011	US20110315081 Susceptor for plasma processing chamber
12/29/2011	US20110315080 Lift pin, and wafer-processing apparatus comprising same
12/29/2011	US20110315079 Process Device for Coating Particles
12/29/2011	US20110315078 Coating system
12/29/2011	DE102010030608A1 Device useful for plasma-assisted substrate treatment, comprises a hollow-cathode electrode, a transport device for a substrate in a relative motion to each other, a gas inlet system and a gas removal system
12/29/2011	DE102010030563A1 Producing molded body made of carbon fiber reinforced carbon, comprises e.g. providing layer of fabric, scrim or nonwoven fabric made of carbon containing material, and applying powdered carbon matrix precursor to one side of the layer
12/29/2011	CA2803130A1 Surface treatment of rubber using low pressure plasma
12/28/2011	EP2400535A1 Substrate support table of plasma processing device
12/28/2011	EP2400532A2 Diamond semiconductor element and process for producing the same
12/28/2011	EP2400531A2 Diamond semiconductor element and process for producing the same
12/28/2011	EP2400530A2 Diamond semiconductor element and process for producing the same
12/28/2011	EP2399923A1 Organoruthenium compound for chemical deposition and chemical deposition process using the organoruthenium compound
12/28/2011	EP2399280A1 Preparation unit for lithogrpahy machine
12/28/2011	EP2398933A1 Process to deposit diamond like carbon as protective coating on inner surface of a shaped object.
12/28/2011	EP2398931A2 A method and arrangement for vapour phase coating of an internal surface of at least one hollow article
12/28/2011	EP2398641A2 Techniques for applying mar reducing overcoats to articles having layer stacks disposed thereon
12/28/2011	EP1799877B1 Sioc:h coated substrates and methods for their preparation
12/28/2011	EP1212475B1 Protective gas shield apparatus
12/28/2011	CN202090100U 一种行星式外延生长设备中的托盘装置 One kind of planetary epitaxial growth apparatus tray means
12/28/2011	CN202090056U 多晶硅cvd炉混合气进出量调节装置 Cvd polysilicon furnace gas mixture out of the adjusting device
12/28/2011	CN202090055U 气体输送装置及使用该气体输送装置的反应器 Gas delivery means and a reactor using the gas delivery device
12/28/2011	CN202090054U 一种新型大面积沉积非晶硅的反应盒 A new large-area deposition of amorphous silicon reaction cartridge
12/28/2011	CN202090053U 太阳光谱选择性吸收涂层卷对卷连续镀膜生产线 Solar spectrum selective absorbing coating continuous roll-to-roll coating production line
12/28/2011	CN102301548A 半导体发光装置及其制造方法 The semiconductor light emitting device and manufacturing method thereof
12/28/2011	CN102301510A 通过掺杂得到的高度可烧结的钛酸锶镧互连物 Obtained by doping highly sinterable lanthanum strontium titanate interconnection thereof
12/28/2011	CN102301460A 成膜装置和气体排出部件 Film forming means and gas exhaust member
12/28/2011	CN102301454A 成膜方法和等离子体成膜装置 Plasma film forming apparatus and film forming method
12/28/2011	CN102301043A 外延碳化硅单晶基板及其制造方法 An epitaxial silicon carbide single crystal substrate and manufacturing method
12/28/2011	CN102300383A 一种电感耦合装置及应用该装置的等离子体处理设备 An inductively coupled plasma processing apparatus and its application device of the apparatus
12/28/2011	CN102296355A 碳/碳复合材料导流筒及生产方法 Carbon / carbon composites draft tube and production methods
12/28/2011	CN102296285A 一种线列式有机金属化合物气相淀积系统及方法 A wire-column organometallic compound vapor deposition system and method
12/28/2011	CN102296284A 镀膜装置 Coating device
12/28/2011	CN102296283A 鞋材表面处理方法 Shoes surface treatment methods
12/28/2011	CN102296282A 一种反向连接提高固态源使用效率的方法 A method of using the reverse connection to improve the efficiency of solid source
12/28/2011	CN102296281A 碳纳米管、镍和铝复合粉末增强聚乙烯基复合材料的制备方法 Carbon nanotubes, nickel and aluminum composite powder prepared reinforced polyvinyl Composites
12/28/2011	CN102296280A 成膜方法及成膜装置 Film-forming method and film forming apparatus
12/28/2011	CN102296279A 碳纳米管-氧化铝复合结构增强聚氨酯基复合材料的制备方法 Carbon Nanotubes - alumina composite structural reinforcement preparation of polyurethane-based composite materials
12/28/2011	CN102296278A 一种氮化铝薄膜的制备方法 A process for producing an aluminum nitride thin film
12/28/2011	CN102296277A 等离子处理腔室的基座 Plasma processing chamber base
12/28/2011	CN102295657A 有机氨基硅烷前体及沉积包含该前体的薄膜的方法 The method of organic aminosilane precursor and depositing a thin film containing the precursors
12/28/2011	CN101824618B 超硬类金刚石基纳米复合涂层印刷电路板微钻及其制备方法 Superhard diamond-like nanocomposite coating printed circuit board micro-drilling and preparation method
12/28/2011	CN101768747B 一种在钛合金表面进行表面活化处理的方法 A method of surface activation in the titanium alloy surface treatment
12/28/2011	CN101689592B Ⅲ族氮化物半导体发光元件及其制造方法和灯 Ⅲ nitride semiconductor light emitting device and manufacturing method and light
12/28/2011	CN101684547B 铜膜的成膜方法 Copper film deposition method
12/28/2011	CN101495673B Cvd成膜方法和cvd成膜装置 Cvd cvd film formation method and film forming apparatus
12/28/2011	CN101390199B 无定形碳膜的成膜方法和使用其的半导体装置的制造方法 Amorphous carbon film deposition method and a method of manufacturing a semiconductor device using the same
12/28/2011	CN101385129B 微波等离子体源和等离子体处理装置 A microwave plasma source and a plasma processing apparatus
12/28/2011	CN101384336B Hcd气体的除害装置 Hcd gas abatement system
12/28/2011	CN101348903B 多功能薄膜沉积设备 Multifunctional thin film deposition apparatus
12/28/2011	CN101268538B 空心体内面的等离子体处理的方法和设备 The method and apparatus of the hollow inner surface of a plasma processing
12/28/2011	CN101243204B 金属碳氮化物层和生成金属碳氮化物层的方法 A metal carbonitride layer and form a metal carbonitride layer
12/28/2011	CN101228288B 注射型等离子体处理设备和方法 Injection type plasma treatment apparatus and method
12/28/2011	CN101128621B 由多孔基质和金属或金属氧化物纳米微粒组成的复合材料 Composite of a porous substrate and a metal or metal oxide nanoparticles consisting of
12/27/2011	US8084375 Hot edge ring with sloped upper surface
12/27/2011	US8084104 Atomic composition controlled ruthenium alloy film formed by plasma-enhanced atomic layer deposition
12/27/2011	US8084089 Wear resistant coating for brake disks with unique surface appearance and method for coating
12/27/2011	US8084088 Method of improving the wafer-to-wafer thickness uniformity of silicon nitride layers
12/27/2011	US8084087 Inducing a Volmer-Weber growth method, where islands of nanoparticles are formed on a modified layer of nucleation sites on a porous surface the number of which are controllec by cycles to limit deposits of nanoparticles dielectrics; photonics; thin film phosphors; fuel cell catalysts
12/27/2011	US8084086 Reliant thermal barrier coating system and related methods and apparatus of making the same
12/27/2011	US8084079 Cost reduction; includes technique for recycling gas stream extracted from effluent gas
12/27/2011	US8083922 Tin electrolytic plating solution for electronic parts, method for tin electrolytic plating of electronic parts, and tin electroplated electronic parts
12/27/2011	US8083912 Substrate carrier
12/27/2011	US8083905 Carbon nanotubes for fuel cells, method for manufacturing the same, and fuel cell using the same
12/27/2011	US8083892 Apparatus for generating gas plasma, gas composition for generating plasma and method for manufacturing semiconductor device using the same
12/27/2011	US8083891 Plasma processing apparatus and the upper electrode unit
12/27/2011	US8083889 Apparatus and method for plasma etching
12/27/2011	US8083888 Plasma processing apparatus
12/27/2011	US8083855 Temperature control module using gas pressure to control thermal conductance between liquid coolant and component body
12/27/2011	US8083854 Vacuum pumping circuit and machine for treating containers equipped with same
12/27/2011	US8083853 Plasma uniformity control by gas diffuser hole design
12/27/2011	US8082878 Thermal evaporation apparatus, use and method of depositing a material
12/27/2011	US8082877 Heating device coating plant and method for evaporation or sublimation of coating materials
12/27/2011	US8082876 Manufacturing method of OLED display and apparatus for manufacturing the OLED display
12/22/2011	WO2011160004A1 Method and apparatus for precursor delivery
12/22/2011	WO2011159675A1 Process to form aqueous precursor and aluminum oxide film
12/22/2011	WO2011158890A1 Article covered with diamond-like carbon film
12/22/2011	WO2011158808A1 Inductively coupled plasma generation device
12/22/2011	WO2011158781A1 Film formation device
12/22/2011	WO2011157429A1 Method for producing diamond layers and diamonds produced by the method
12/22/2011	WO2011157425A1 Apparatus for the continuous plasma treatment and/or plasma coating of a piece of material
12/22/2011	WO2011112335A3 Coated pcbn cutting insert, coated pcbn cutting tool using such coated pcbn cutting insert, and method for making the same
12/22/2011	WO2011106235A3 Methods and apparatus for deposition processes
12/22/2011	WO2011100200A3 Anti-arc zero field plate
12/22/2011	WO2011060444A3 Gas delivery for beam processing systems
12/22/2011	US20110313194 Graphene substituted with boron and nitrogen , method of fabricating the same, and transistor having the same
12/22/2011	US20110313184 Insulating film material, and film formation method utilizing the material, and insulating film
12/22/2011	US20110312982 Cancer Treatment Method
12/22/2011	US20110312192 Film formation method and film formation apparatus
12/22/2011	US20110312189 Substrate treating apparatus and substrate treating method
12/22/2011	US20110312188 Processing apparatus and film forming method
12/22/2011	US20110312187 Manufacturing apparatus and method for semiconductor device and cleaning method of manufacturing apparatus for semiconductor
12/22/2011	US20110312167 Plasma processing apparatus, and deposition method an etching method using the plasma processing apparatus
12/22/2011	US20110312162 chemical vapour deposition system and process
12/22/2011	US20110312080 Porous films by a templating co-assembly process
12/22/2011	US20110311837 Covering member for preventing erosion
12/22/2011	US20110311808 Two Layer Barrier on Polymeric Substrate

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