Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/2012
01/05/2012WO2011137975A8 Method for the plasma-enhanced treatment of internal surfaces of a hollow body, fluid separator, and use thereof
01/05/2012US20120003842 Method for forming silicon oxide film and method for manufacturing semiconductor device
01/05/2012US20120003836 Movable ground ring for a plasma processing chamber
01/05/2012US20120003807 Method for forming semiconductor region and method for manufacturing power storage device
01/05/2012US20120003789 Apparatus for Manufacturing Thin Film Photovoltaic Devices
01/05/2012US20120003565 Anode-supported solid oxide fuel cell comprising a nanoporous layer having a pore gradient structure, and a production method therefor
01/05/2012US20120003497 Coating methods, systems, and related articles
01/05/2012US20120003491 Insecticidal Composition and Method
01/05/2012US20120003485 Monolayers of organic compounds on metal oxide surfaces or metal surfaces containing oxide and component produced therewith based on organic electronics
01/05/2012US20120003484 Moisture resistant coating for barrier films
01/05/2012US20120003449 Nano-structured dielectric composite
01/05/2012US20120003397 Method for depositing nanoparticles on a support
01/05/2012US20120003396 Apparatus and method for atomic layer deposition
01/05/2012US20120003395 Method of fabricating an electrochemical device using ultrafast pulsed laser deposition
01/05/2012US20120003392 Fine particles
01/05/2012US20120003389 Mocvd reactor having a ceiling panel coupled locally differently to a heat dissipation member
01/05/2012US20120003388 Methods and apparatus for thermal based substrate processing with variable temperature capability
01/05/2012US20120003381 Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus
01/05/2012US20120003142 Vapor-phase process apparatus, vapor-phase process method, and substrate
01/05/2012US20120000610 Microwave Plasma Processing Apparatus
01/05/2012US20120000609 Power supplying means having shielding means for feeding line and substrate processing apparatus including the same
01/05/2012US20120000608 C-shaped confinement ring for a plasma processing chamber
01/05/2012US20120000607 Mass flow control system, plasma processing apparatus, and flow control method
01/05/2012US20120000606 Plasma uniformity system and method
01/05/2012US20120000605 Consumable isolation ring for movable substrate support assembly of a plasma processing chamber
01/05/2012US20120000425 Apparatus for Processing Substrate
01/05/2012US20120000424 Cooled dark space shield for multi-cathode design
01/05/2012US20120000423 Hdp-cvd system
01/05/2012US20120000422 Apparatuses and methods for atomic layer deposition
01/05/2012DE102010030887A1 Kathodeneinheit für Alkalimetall-Schwefel-Batterie Cathode unit for alkali metal-sulfur battery
01/04/2012EP2403015A1 Thin film article and method for forming a reduced conductive area in transparent conductive films for photovoltaic modules
01/04/2012EP2402480A1 Organic compound steam generator and apparatus for producing organic thin film
01/04/2012EP2402477A1 Beam-Induced Deposition at Cryogenic Temperatures
01/04/2012EP2402475A1 Beam-induced deposition at cryogenic temperatures
01/04/2012EP2402108A1 Apparatus and method for controlling temperature uniformity of substrates
01/04/2012EP2401417A2 Ald systems and methods
01/04/2012EP2401416A1 Low temperature cnt growth using gas-preheat method
01/04/2012EP2401415A1 Apparatus for manufacture of solar cells
01/04/2012EP2401232A1 Coaxial hollow cathode plasma assisted directed vapor deposition and related method thereof
01/04/2012EP1960566B1 High-throughput deposition system for oxide thin film growth by reactive coevaportation
01/04/2012EP1454346B1 Method and apparatus for chemical vapor deposition capable of preventing contamination and enhancing film growth rate
01/04/2012EP1349968B1 Liquid distribution unit for multiple fluids
01/04/2012CN202099382U Gas control device for metallorganic chemical vapor deposition equipment
01/04/2012CN1827847B Methods and devices for monitoring and controlling thin film processing
01/04/2012CN1640832B Apparatus and method for manufacturing a preform by plasma chemical vapour deposition
01/04/2012CN102308368A Chemical vapor deposition flow inlet elements and methods
01/04/2012CN102308023A Gate arrangement, production line and method
01/04/2012CN102308022A Reaction chamber
01/04/2012CN102308021A Ald reactor,method for loading ald reactor, and production line
01/04/2012CN102308020A Insulating film material, and film formation method utilizing the material, and insulating film
01/04/2012CN102306627A Film forming method and film forming apparatus
01/04/2012CN102304702A Exhaust pipe of vacuum pump for chemical vapor deposition machine station and corresponding vacuum pump
01/04/2012CN102304701A Preparation method of silicon carbide film
01/04/2012CN102304700A Preparation method of nitrogen-doped zinc oxide film
01/04/2012CN102304699A Preparation method of Mn-doped AlN diluted magnetic semiconductor nanorod array
01/04/2012CN102304698A Device for growing silicon carbide crystal by high-temperature chemical vapor deposition (HTCVD) method
01/04/2012CN102304697A Method for preparing diamond
01/04/2012CN102304696A Method for preparing diamond
01/04/2012CN101956181B Preparation method of transition metal nickel oxide and cobalt oxide nanowire array
01/04/2012CN101842882B Liquid raw material vaporizer and film forming apparatus using the same
01/04/2012CN101831651B Hard alloy cutter and film plating method of same
01/04/2012CN101736323B Device for preparing boron-doped diamond composite coating on surface of cutter
01/04/2012CN101572994B Method for forming conducting wire on radiating substrate in a vacuum sputtering way
01/04/2012CN101491962B Method of forming bonded body and bonded body
01/04/2012CN101368264B Organic electroluminescent device
01/04/2012CN101356181B Organic ruthenium compound for chemical vapor deposition, and chemical vapor deposition method using the organic ruthenium compound
01/04/2012CN101310971B Ni-base superalloy complex gradient coating and preparation technique thereof
01/04/2012CN101310037B Cyclopentadienyl type hafnium and zirconium precursors and use thereof in atomic layer deposition
01/04/2012CN101064987B Plasma processing apparatus and apparatus for supplying RF power
01/03/2012US8089830 Near-field light generating device including near-field light generating element with edge part opposed to waveguide
01/03/2012US8088440 Hydrophobic coating including underlayer(s) deposited via flame pyrolysis
01/03/2012US8088434 Templated growth of graphenic materials
01/03/2012US8088299 Multiple zone carrier head with flexible membrane
01/03/2012US8088248 Gas switching section including valves having different flow coefficients for gas distribution system
01/03/2012US8088247 Plasma processing apparatus
01/03/2012US8088225 Substrate support system for reduced autodoping and backside deposition
01/03/2012US8088223 System for control of gas injectors
01/03/2012US8087427 Vapor phase epitaxy apparatus and irregular gas mixture avoidance method for use therewith
01/03/2012US8087379 Localized plasma processing
01/03/2012CA2524482C Substrate transfer device for thin-film deposition apparatus
01/03/2012CA2519136C Hydrophilic dlc on substrate with oxygen and/or hot water treatment
01/03/2012CA2514858C Gas gate for isolating regions of differing gaseous pressure
01/03/2012CA2511832C Components for a film-forming device and method for cleaning the same
12/2011
12/29/2011WO2011162297A1 Film-forming apparatus, and method for maintaining film-forming apparatus
12/29/2011WO2011162255A1 Process for production of barrier film, and process for production of metal wiring film
12/29/2011WO2011162219A1 Vapor deposition apparatus
12/29/2011WO2011161318A1 Multi-layer substrate structure and manufacturing method for the same
12/29/2011WO2011161311A1 Coating apparatus
12/29/2011WO2011161296A1 Apparatus and method for coating glass substrate
12/29/2011WO2011160939A1 Surface treatment of rubber using low pressure plasma
12/29/2011WO2011114960A9 Film forming method and film forming apparatus
12/29/2011WO2011112334A3 Coated ceramic cutting insert and method of making the same
12/29/2011WO2011109348A3 Wafer carrier with sloped edge
12/29/2011US20110318937 Method of manufacturing a semiconductor device, method of cleaning a process vessel, and substrate processing apparatus
12/29/2011US20110318909 System and method of semiconductor manufacturing with energy recovery
12/29/2011US20110318505 Method for forming tantalum nitride film and film-forming apparatus for forming the same
12/29/2011US20110318502 Methods of depositing sio2 films
12/29/2011US20110318498 Coaxial Hollow Cathode Plasma Assisted Directed Vapor Deposition and Related Method Thereof
12/29/2011US20110318490 Method for depositing a coating
12/29/2011US20110318489 Substrate processing apparatus, processing tube, substrate holder, fixing part of the substrate holder, substrate processing method, and substrate manufacturing method