Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
01/2012
01/12/2012US20120009764 Method of manufacturing a semiconductor device and substrate processing apparatus
01/12/2012US20120009697 Chemical vapor deposition apparatus and method of forming semiconductor epitaxial thin film using the same
01/12/2012US20120009368 Gas barrier film, electronic device including the same, gas barrier bag, and method for producing gas barrier film
01/12/2012US20120009356 Contamination reducing liner for inductively coupled chamber
01/12/2012US20120009355 Method and apparatus for stabilizing a coating
01/12/2012US20120009347 Precise temperature control for teos application by heat transfer fluid
01/12/2012US20120009344 Process and apparatus for producing composite material
01/12/2012US20120009343 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport
01/12/2012US20120009340 Method for producing deformable corrosion protection layers on metal surfaces
01/12/2012US20120009329 Control function and display for controlling spray gun
01/12/2012US20120009328 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
01/12/2012US20120009231 Apparatus and method for deposition of functional coatings
01/12/2012US20120006785 Wear Resistant Vapor Deposited Coating, Method of Coating Deposition and Applications Therefor
01/12/2012US20120006489 Plasma processing apparatus and plasma processing method
01/12/2012US20120006488 Ring-shaped component for use in a plasma processing, plasma processing apparatus and outer ring-shaped member
01/12/2012US20120006268 Substrate processing apparatus and method for manufacturing a semiconductor device
01/12/2012US20120006267 Apparatus for processing coating material and evaporation deposition device having same
01/12/2012US20120006266 Sputtering apparatus, method of operating the same, and method of manufacturing substrate using the same
01/12/2012US20120006265 Atomic layer deposition apparatus
01/12/2012US20120006263 Film deposition apparatus
01/12/2012DE102005035904B4 Vorrichtung zum Behandeln von Substraten Apparatus for processing substrates
01/12/2012DE102005035247B9 Fluidverteiler mit binärer Struktur Fluid distribution with binary structure
01/11/2012EP2405030A2 Selectively deposited thin film devices and methods for forming selectively deposited thin films
01/11/2012EP2403976A1 Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport
01/11/2012EP2403975A1 Gas injectors for cvd systems with the same
01/11/2012EP2403974A1 Self-supporting cvd diamond film and method for producing a self-supporting cvd diamond film
01/11/2012EP1269258B1 Organic polymeric antireflective coatings deposited by chemical vapor deposition
01/11/2012CN202107764U Fast substrate temperature raising and reducing device in film photovoltaic cell scale manufacture
01/11/2012CN202107763U Purging device and plasma enhancing chemical vapor deposition equipment provided with same
01/11/2012CN202107762U Tube type PECVD (plasma enhanced chemical vapor deposition) charging wagon
01/11/2012CN1906127B Apparatus for manufacturing carbon film by plasma CVD, method for manufacturing the same, and carbon film
01/11/2012CN1788112B High purity electrolytic sulfonic acid solutions
01/11/2012CN1754008B Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition
01/11/2012CN1610765B Improved method for coating a support with a material
01/11/2012CN1550568B 制造装置和发光装置 Devices and light-emitting device manufacturing
01/11/2012CN102318049A Epitaxial substrate for electronic devices and manufacturing method therefor
01/11/2012CN102318039A Method for manufacturing gallium nitride compound semiconductor, and semiconductor light emitting element
01/11/2012CN102317502A Gas deposition reactor
01/11/2012CN102317501A Heat treatment apparatus, and method for controlling the same
01/11/2012CN102317500A A chemical vapour deposition system and process
01/11/2012CN102317499A Method for forming cu film and storage medium
01/11/2012CN102317496A Process for producing multilayered gas-barrier film
01/11/2012CN102315336A Process for depositing photovoltaic absorbing layer during production of amorphous silicon solar cell
01/11/2012CN102315327A Method for producing novel single crystal silicon solar cell
01/11/2012CN102315283A Antireflective film for solar panel and preparation method thereof
01/11/2012CN102315150A Movable ground ring for a plasma processing chamber
01/11/2012CN102314078A Photoetching method
01/11/2012CN102312226A Method of improving hydrophobic stability of nanometer array film
01/11/2012CN102312225A Method for depositing silicon oxide on silicon nitride surface
01/11/2012CN102312224A Beam-induced deposition at cryogenic temperatures
01/11/2012CN102312223A Coating corrector plate and coating device comprising same
01/11/2012CN102312222A Gas transmission device
01/11/2012CN102312221A Atomic layer deposition apparatus employing uniform air intake system
01/11/2012CN102312220A Method for manufacturing semiconductor device
01/11/2012CN102312219A Coating device
01/11/2012CN102312218A Canister for deposition apparatus and deposition apparatus using same
01/11/2012CN102312217A Method for growing semiconductor film by using composite model, and apparatus thereof
01/11/2012CN102312216A Method for forming titanium nitride film on roller surface
01/11/2012CN102312215A Production method of diamond film coating of microbit
01/11/2012CN102312214A Atomic layer deposition using metal amidinates
01/11/2012CN102312213A Method of manufacturing a semiconductor device and substrate processing apparatus
01/11/2012CN102312212A Scanning coating device and scan coating assembly
01/11/2012CN102312197A Copper, indium, gallium and selenide (CIGS) solar battery processing equipment and method
01/11/2012CN101868848B Method for fabricating p-type gallium nitride-based semiconductor, method for fabricating nitride-based semiconductor element, and method for fabricating epitaxial wafer
01/11/2012CN101775041B 2-acyl 1,3-indane dione silver compound with stable organic phosphine, preparation method and application thereof
01/11/2012CN101748382B Method of growing GaN-based luminescent crystalline membrane for molecular beam epitaxy
01/11/2012CN101463472B Deposition apparatus and deposition method
01/11/2012CN101440477B Precursor compositions and methods
01/11/2012CN101330032B Plasma processing apparatus and transition chamber thereof
01/11/2012CN101205605B Apparatus for hot reinforcement and plasma reinforced vapor deposition
01/10/2012US8093490 Method for forming thin film, substrate having transparent electroconductive film and photoelectric conversion device using the substrate
01/10/2012US8093144 Patterning of nanostructures
01/10/2012US8093142 Plasma processing apparatus and plasma processing method
01/10/2012US8092931 Magnetic disk, method of manufacturing the magnetic disk and method of evaluating the magnetic disk
01/10/2012US8092892 Method for producing a plastic membrane device and the thus obtained device
01/10/2012US8092870 Preparation of metal oxide thin film via cyclic CVD or ALD
01/10/2012US8092862 Method for forming dielectric film and method for forming capacitor in semiconductor device using the same
01/10/2012US8092861 Method of fabricating an ultra dielectric constant (K) dielectric layer
01/10/2012US8092721 Deposition of ternary oxide films containing ruthenium and alkali earth metals
01/10/2012US8092642 Plasma processing apparatus
01/10/2012US8092640 Plasma processing apparatus and semiconductor device manufactured by the same apparatus
01/10/2012US8092639 Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
01/10/2012US8092607 Transporting means and vacuum coating installation for substrates of different sizes
01/10/2012US8092606 Deposition apparatus
01/10/2012US8092605 Magnetic confinement of a plasma
01/10/2012US8092604 Solid organometallic compound-filled container and filling method thereof
01/10/2012US8092603 Substrate processing apparatus
01/10/2012US8092602 Thermally zoned substrate holder assembly
01/10/2012US8092601 System and process for fabricating photovoltaic cell
01/10/2012US8092600 Plasma apparatus and plasma processing method
01/10/2012US8092599 Movable injectors in rotating disc gas reactors
01/10/2012US8092598 Apparatus and method for thin film deposition
01/10/2012US8091506 High velocity method for depositing diamond films from a gaseous phase in SHF discharge plasma and a plasma reactor for carrying out said method
01/10/2012US8091505 Active material contaaining metal with oxygen, nitrogen, carbon and current collector; testing by irradiating with x-rays; measuring angle of reflected light
01/10/2012CA2654732C Methods for preparation of high-purity polysilicon rods using a metallic core means
01/10/2012CA2630792C Diamond electrode, method for producing same, and electrolytic cell
01/05/2012WO2012002666A2 Graphene manufacturing apparatus and method
01/05/2012WO2012002282A1 Film forming method and processing system
01/05/2012WO2012002159A1 Substrate treatment device, and method for cleaning of substrate treatment device
01/05/2012WO2012002155A1 Laser lift-off method and laser lift-off apparatus