| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 01/19/2012 | WO2012009653A1 Injection molding process and product produced using the same |
| 01/19/2012 | WO2012009061A1 Multilayer construction |
| 01/19/2012 | WO2012008954A1 Process chamber pressure control system and method |
| 01/19/2012 | WO2012008789A2 Method for producing graphene at a low temperature, method for direct transfer of graphene using same, and graphene sheet |
| 01/19/2012 | WO2012008551A1 Process for producing metamaterial, and metamaterial |
| 01/19/2012 | WO2012008525A1 Plasma processing device and plasma processing method |
| 01/19/2012 | WO2012008523A1 Plasma treatment device |
| 01/19/2012 | WO2012008521A1 Plasma processing apparatus and plasma processing method |
| 01/19/2012 | WO2012008455A1 Film-forming apparatus and method for cleaning film-forming apparatus |
| 01/19/2012 | WO2012008440A1 Film-forming apparatus |
| 01/19/2012 | WO2012008185A1 Surface coating cutting tool |
| 01/19/2012 | WO2012007401A1 Coating for converting radiation energy |
| 01/19/2012 | WO2012007165A1 Method and device for the plasma treatment of flat substrates |
| 01/19/2012 | WO2011139472A3 Inline chemical vapor deposition system |
| 01/19/2012 | WO2011130506A8 Coating for a cocrmo substrate |
| 01/19/2012 | WO2011116273A3 System and method for polycrystalline silicon deposition |
| 01/19/2012 | WO2011115889A3 Bromine-sensitized solar photolysis of carbon dioxide |
| 01/19/2012 | WO2011103589A3 Fluidized bed pyrocarbon coating |
| 01/19/2012 | US20120015525 Method of cleaning a thin film forming apparatus, thin film forming method, and thin film forming apparatus |
| 01/19/2012 | US20120015518 Method for depositing thin tungsten film with low resistivity and robust micro-adhesion characteristics |
| 01/19/2012 | US20120015507 Plasma doping apparatus and plasma doping method |
| 01/19/2012 | US20120015505 Method and device for preparing compound semiconductor film |
| 01/19/2012 | US20120015502 p-GaN Fabrication Process Utilizing a Dedicated Chamber and Method of Minimizing Magnesium Redistribution for Sharper Decay Profile |
| 01/19/2012 | US20120015476 Method for producing semiconductor layers and coated substrates treated with elemental selenium and/or sulfer, in particular flat substrates |
| 01/19/2012 | US20120015279 Dense thin filim, fuel cell using the same and fabrication methods thereof |
| 01/19/2012 | US20120015251 Method for producing cathode active material layer |
| 01/19/2012 | US20120015145 Multilayer printable sheet with a soft or silky touch and manufacturing method thereof |
| 01/19/2012 | US20120015113 Methods for forming low stress dielectric films |
| 01/19/2012 | US20120015106 Method and apparatus for coating |
| 01/19/2012 | US20120015105 Method of cvd-depositing a film having a substantially uniform film thickness |
| 01/19/2012 | US20120015104 Method and Apparatus for Depositing LED Organic Film |
| 01/19/2012 | US20120015097 Method of using image data in the production of thin wall extrusions |
| 01/19/2012 | US20120013273 Solid state lighting devices without converter materials and associated methods of manufacturing |
| 01/19/2012 | US20120012253 Plasma shield for electrode |
| 01/19/2012 | US20120012244 Temporary substrate, transfer method and production method |
| 01/19/2012 | DE102010027224A1 Elektrode zur Erzeugung eines Plasmas, Plasmakammer mit dieser Elektrode und Verfahren zur in situ-Analyse oder -in situ-Bearbeitung einer Schicht oder des Plasmas Electrode to generate a plasma, the plasma chamber with this electrode and method for in situ analysis or -in situ processing of a layer or of the plasma |
| 01/19/2012 | DE102010027063A1 Beschichtung zur Umwandlung von Strahlungsenergie Coating for the conversion of radiation energy |
| 01/19/2012 | CA2805668A1 Injection molding process and product produced using the same |
| 01/18/2012 | EP2408276A1 Plasma processing apparatus |
| 01/18/2012 | EP2408275A1 Plasma processing apparatus |
| 01/18/2012 | EP2408003A1 Atomic layer deposition apparatus and thin film forming method |
| 01/18/2012 | EP2408002A1 Atomic layer deposition apparatus |
| 01/18/2012 | EP2407577A2 Chemical vapor deposition apparatus |
| 01/18/2012 | EP2407576A1 Process for removing residual water molecules in process for producing metallic thin film, and purge solvent |
| 01/18/2012 | EP2406411A1 Mocvd reactor having cylindrical gas inlet element |
| 01/18/2012 | EP2406410A1 Bubbling supply system for stable precursor supply |
| 01/18/2012 | EP1633903B1 Oxygen ion beam and hot water treatment of dlc |
| 01/18/2012 | EP1452626B9 Mixer, and device and method for manufacturing thin film |
| 01/18/2012 | CN202116646U Multi-channel independent gas-supply plasma enhanced chemical vapor deposition (PECVD) gas supply deposition system |
| 01/18/2012 | CN202116645U Multi-zone heating device of metal organic chemical vapor deposition device |
| 01/18/2012 | CN202116644U Heater of metal organic chemical vapor deposition equipment |
| 01/18/2012 | CN202116643U Substrate processing device |
| 01/18/2012 | CN202116642U Water-cooling top cap of metal organic chemical vapor deposition equipment |
| 01/18/2012 | CN202116638U Thin film thickness uniformity adjusting sheet for thin film vapor deposition equipment |
| 01/18/2012 | CN1535082B Sedimented mask frame component element and its manufacturing method organic electroluminous device manufacturing method |
| 01/18/2012 | CN102326457A Plasma apparatus |
| 01/18/2012 | CN102326262A Solar cell and method for manufacturing same |
| 01/18/2012 | CN102326231A Method for forming epitaxial wafer and method for manufacturing semiconductor element |
| 01/18/2012 | CN102325921A Mocvd reactor having cylindrical gas inlet element |
| 01/18/2012 | CN102321877A Electrode introduction device |
| 01/18/2012 | CN102321876A Preparation method of carbon nanotube |
| 01/18/2012 | CN102321875A Method for preparing tungsten conductive anti-abrasion coat on inner wall of wire guide mouth of automatic welder |
| 01/18/2012 | CN102321874A Method for lowering ultrahard multi-layer thin film residual stress based on high-intensity pulsed ion beam technique |
| 01/18/2012 | CN102321867A Carbon layer material with protective layer structure and preparation method thereof |
| 01/18/2012 | CN101892467B Integrating multi-reaction chamber flow process epitaxial growth method and system |
| 01/18/2012 | CN101879611B Hard alloy coated blade for stainless steel turning |
| 01/18/2012 | CN101736307B Plasma vapor deposition method |
| 01/18/2012 | CN101440479B Metalorganic chemical vapor deposition reactor |
| 01/18/2012 | CN101437979B Batch processing chamber with diffuser plate and injector assembly |
| 01/18/2012 | CN101335227B Polyceramic e-chuck |
| 01/18/2012 | CN101076220B Inductance coupling plasma processing device and plasma processing method |
| 01/18/2012 | CN101065390B Organometallic precursor compounds |
| 01/17/2012 | US8097321 Release films |
| 01/17/2012 | US8097303 Methods for producing multilayered, oxidation-resistant structures on substrates |
| 01/17/2012 | US8097302 Electroconductive tin oxide having high mobility and low electron concentration |
| 01/17/2012 | US8097301 Hydrogenating an R (Sc, Y, La, Gd, Dy, Ho, Er, Tm or Lu) film under an inert gas atmosphere which contains a hydrogen gas to form an RH2 film which is then oxidized to form R2O3 film |
| 01/17/2012 | US8097300 Method of forming mixed rare earth oxynitride and aluminum oxynitride films by atomic layer deposition |
| 01/17/2012 | US8097299 Organic ruthenium compound for chemical vapor deposition, and chemical vapor deposition method using the organic ruthenium compound |
| 01/17/2012 | US8097129 Multilayer nitride-containing coatings |
| 01/17/2012 | US8097120 Process tuning gas injection from the substrate edge |
| 01/17/2012 | US8097085 Thermal diffusion chamber |
| 01/17/2012 | US8097084 Vacuum chamber system for semiconductor processing |
| 01/17/2012 | US8097083 Operating method for a large dimension plasma enhanced atomic layer deposition cavity and an apparatus thereof |
| 01/17/2012 | US8097082 Nonplanar faceplate for a plasma processing chamber |
| 01/17/2012 | CA2524487C Vacuum deposition apparatus and method and solar cell material |
| 01/16/2012 | DE202010014176U1 Vorrichtung zum Behandeln von Oberflächen mit Entladungsüberwachung Apparatus for treating surfaces with discharge monitoring |
| 01/13/2012 | DE202011106205U1 Substratträger Substrate carrier |
| 01/12/2012 | WO2012005983A2 Precise temperature control for teos application by heat transfer fluid |
| 01/12/2012 | WO2012005577A1 Method and apparatus for contactlessly advancing substrates |
| 01/12/2012 | WO2012005471A2 Method for the surface treatment of an implant unit using plasma, implant unit manufactured using same, and apparatus for plasma surface treatment of the implant unit. |
| 01/12/2012 | WO2012005326A1 Sliding member |
| 01/12/2012 | WO2012005325A1 Sliding member |
| 01/12/2012 | WO2012005305A1 Manufacturing method for channel plate, channel plate, temperature adjustment plate, cold plate, and shower plate |
| 01/12/2012 | WO2012004364A1 Method for depositing a biocidal coating on a substrate |
| 01/12/2012 | WO2012003715A1 Mocvd system having multiple epitaxial reactor chambers and operation method thereof |
| 01/12/2012 | WO2011139036A3 Atmospheric pressure plasma apparatus |
| 01/12/2012 | WO2011133807A3 System, method, and apparatus for microscale plasma actuation |
| 01/12/2012 | WO2011115197A9 Manufacturing method for transparent conductive carbon film, and transparent conductive carbon film |
| 01/12/2012 | WO2011106218A3 Ultra low dielectric materials using hybrid precursors containing silicon with organic functional groups by plasma-enhanced chemical vapor deposition |
| 01/12/2012 | US20120009765 Compartmentalized chamber |