| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 02/15/2012 | CN102352490A Preparation method for nitrogen-doped carbon nanometer tube |
| 02/15/2012 | CN102352489A Method for preparing anti-fingerprint film for touch screen |
| 02/15/2012 | CN102352488A Antimony and germanium complexes useful for CVD/ALD of metal thin films |
| 02/15/2012 | CN101921996B 一种mocvd设备喷淋头装置 One kind mocvd equipment sprinkler system |
| 02/15/2012 | CN101583837B 具有开缝阵列波导的微波反应器 Microwave reactor having slotted array waveguides |
| 02/14/2012 | US8115141 Heating element |
| 02/14/2012 | US8115140 Heater assembly for high throughput chemical treatment system |
| 02/14/2012 | US8114789 Formation of a tantalum-nitride layer |
| 02/14/2012 | US8114525 Process chamber component having electroplated yttrium containing coating |
| 02/14/2012 | US8114484 Plasma enhanced chemical vapor deposition technology for large-size processing |
| 02/14/2012 | US8114480 Method for self-limiting deposition of one or more monolayers |
| 02/14/2012 | US8114247 Plasma processing apparatus and focus ring |
| 02/14/2012 | US8114246 Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same |
| 02/14/2012 | US8114245 Plasma etching device |
| 02/14/2012 | US8114219 Systems and methods for forming metal oxide layers |
| 02/14/2012 | CA2630716C Tool with a coating |
| 02/10/2012 | DE212009000165U1 Vorrichtung zur Stromversorgung eines CVD-Prozesses bei der Siliziumabscheidung An apparatus for power supply of a CVD process in the deposition of silicon |
| 02/09/2012 | WO2012018970A1 Process gas conduits having increased usage lifetime and related methods |
| 02/09/2012 | WO2012018778A1 Exhaust for cvd reactor |
| 02/09/2012 | WO2012018086A1 Magnesium bis(dialkylamide) compound, and process for production of magnesium-containing thin film using the magnesium compound |
| 02/09/2012 | WO2012018075A1 Surface treatment device and surface treatment method |
| 02/09/2012 | WO2012018024A1 Plasma treatment device |
| 02/09/2012 | WO2012017717A1 Vacuum processing apparatus and plasma processing method |
| 02/09/2012 | WO2011137373A3 Vertical inline cvd system |
| 02/09/2012 | US20120034788 Substrate processing apparatus and producing method of semiconductor device |
| 02/09/2012 | US20120034786 Plasma Processing Chamber with Dual Axial Gas Injection and Exhaust |
| 02/09/2012 | US20120034750 Method for fabricating semiconductor device and plasma doping apparatus |
| 02/09/2012 | US20120034733 System and method for fabricating thin-film photovoltaic devices |
| 02/09/2012 | US20120034572 Surface modification for enhanced silanation of ceramic materials |
| 02/09/2012 | US20120034451 Substrate for flexible display and method of manufacturing the substrate |
| 02/09/2012 | US20120034410 Multiple walled nested coaxial nanostructures |
| 02/09/2012 | US20120034379 Coating method |
| 02/09/2012 | US20120034378 Delivery device and method of use thereof |
| 02/09/2012 | US20120034369 Vaporizing apparatus, substrate processing apparatus, coating and developing apparatus, and substrate processing method |
| 02/09/2012 | US20120034150 Method for Producing Solid Carbon by Reducing Carbon Oxides |
| 02/09/2012 | US20120033223 Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method for Determining a Property of a Substrate |
| 02/09/2012 | US20120031560 Plasma processing apparatus |
| 02/09/2012 | US20120031540 Paint swatch test device and method |
| 02/09/2012 | US20120031340 Reaction apparatus having multiple adjustable exhaust ports |
| 02/09/2012 | US20120031339 Deposition head and film forming apparatus |
| 02/09/2012 | US20120031338 Susceptor and apparatus for cvd with the susceptor |
| 02/09/2012 | US20120031337 Divided annular rib type plasma processing apparatus |
| 02/09/2012 | US20120031336 Chemical vapor deposition device |
| 02/09/2012 | US20120031335 Vertical inline cvd system |
| 02/09/2012 | US20120031334 Gas exhaust system of film-forming apparatus, film-forming apparatus, and method for processing exhaust gas |
| 02/09/2012 | US20120031333 Vertical inline cvd system |
| 02/09/2012 | US20120031332 Water cooled gas injector |
| 02/09/2012 | US20120031331 Semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 02/09/2012 | US20120030884 Supercritical noble gases and coloring methods |
| 02/09/2012 | DE102011084372A1 Device for depositing polycrystalline silicon on thin rods, comprises an electrode for a power supply of thin rods, a quartz element and/or a graphite element present on the electrode and/or a mold body made of silicon |
| 02/09/2012 | DE102011080634A1 Suszeptor und Vorrichtung für chemische Gasphasenabscheidung mit dem Suszeptor Susceptor and apparatus for chemical vapor deposition with the susceptor |
| 02/09/2012 | DE102010033543A1 Coating of components made of steel comprises depositing amorphous carbon layer on hydrocarbon containing tungsten layer that is applied directly on the component surface |
| 02/09/2012 | DE102007025152B4 Verfahren zum Beschichten eines Substrats A method for coating a substrate |
| 02/08/2012 | EP2415901A1 Gas barrier film, electronic device including same, gas barrier bag, and method for manufacturing gas barrier film |
| 02/08/2012 | EP2415900A1 Formation method of coating |
| 02/08/2012 | EP2414571A2 Menthol-derivative compounds and use thereof as oral and systemic active agents |
| 02/08/2012 | EP2414559A1 Recovery of monobutyltin trichloride |
| 02/08/2012 | EP2414558A1 Bodies coated by sic and method for creating sic-coated bodies |
| 02/08/2012 | EP2209927B1 Corrosion-resistant coating |
| 02/08/2012 | EP1518255B1 Thermal sprayed yttria-containing coating for plasma reactor |
| 02/08/2012 | EP1145277B1 Gas injection system for plasma processing |
| 02/08/2012 | CN202139294U Pecvd设备的石墨载板传输装置 Pecvd equipment graphite carrier transmission devices |
| 02/08/2012 | CN202139292U 一种应用于真空涂层领域的新型工件架 Applied to new areas of the workpiece holder vacuum coating |
| 02/08/2012 | CN1743501B 用于释放基材的方法及设备 Method for releasing substrates and equipment |
| 02/08/2012 | CN102349357A Plasma processing apparatus |
| 02/08/2012 | CN102349356A Plasma processing apparatus |
| 02/08/2012 | CN102349138A Method for forming cvd-ru film and method for manufacturing semiconductor devices |
| 02/08/2012 | CN102348832A Bubbling supply system for stable precursor supply |
| 02/08/2012 | CN102348831A Method for forming Cu film and storage medium |
| 02/08/2012 | CN102348830A Method for forming cu film, and storage medium |
| 02/08/2012 | CN102348829A Composition and method for low temperature deposition of ruthenium |
| 02/08/2012 | CN102348777A Method of depositing amorphous hydrocarbon nitride (a-CN:Hx) film, organic EL device, and process for producing same |
| 02/08/2012 | CN102347402A Plasma processing apparatus, plasma processing method and photoelectric conversion element |
| 02/08/2012 | CN102347233A Method and tray for improving thickness evenness of silicon wafer in process of backlining the silicon wafer |
| 02/08/2012 | CN102345169A Array type diamond film and method for making the same |
| 02/08/2012 | CN102345134A Preparation method for wettability controllable porous structure of titanium and titanium alloy surface |
| 02/08/2012 | CN102345115A Method for forming microcrystalline semiconductor film and method for manufacturing semiconductor device |
| 02/08/2012 | CN102345114A MOCVD heating device, formation method thereof and method for forming film by MOCVD |
| 02/08/2012 | CN102345113A Special air tube with detachable spray head |
| 02/08/2012 | CN102345112A Semiconductor processing device and gas spray head cooling plate thereof |
| 02/08/2012 | CN102345111A Film forming method and apparatus |
| 02/08/2012 | CN102345110A Method for self-assembling growth of GaAs nano structure in MOCVD (Metal-Organic Chemical Vapor Deposition) manner |
| 02/08/2012 | CN102345090A Method for coating film |
| 02/08/2012 | CN102344460A Atomic layer deposition using metal amidinates |
| 02/08/2012 | CN102344413A Volatile imidazoles and group 2 imidazole based metal precursors |
| 02/08/2012 | CN102344134A Preparation method of graphite |
| 02/08/2012 | CN102031499B 钢基材表面铬-钛-碳-氮-氧系多元复合陶瓷膜及其制备方法 Steel substrate surface chromium - titanium - carbon - nitrogen - oxygen-based multiple composite ceramic membrane and its preparation method |
| 02/08/2012 | CN101939820B 外延生长用基板、GaN类半导体膜的制造方法、GaN类半导体膜、GaN类半导体发光元件的制造方法以及GaN类半导体发光元件 The method of manufacturing an epitaxial growth substrate, a method of manufacturing GaN-based semiconductor film, GaN-based semiconductor film, GaN-based semiconductor light-emitting element and the GaN-based semiconductor light-emitting element |
| 02/08/2012 | CN101901760B 基于c面SiC衬底上极性c面GaN的MOCVD生长方法 MOCVD growth method on polar c-plane SiC substrate c-plane GaN-based |
| 02/08/2012 | CN101901757B 基于a面6H-SiC衬底上非极性a面GaN的MOCVD生长方法 Based on a surface of the 6H-SiC substrate MOCVD growth method nonpolar a-plane GaN on |
| 02/08/2012 | CN101752244B 等离子体处理方法 The plasma processing method |
| 02/08/2012 | CN101688299B Al-Ti-Ru-NC硬质材料涂层 Al-Ti-Ru-NC Hard material coating |
| 02/08/2012 | CN101671813B Ti膜的成膜方法 The method of forming a Ti film |
| 02/08/2012 | CN101451237B 具有多个等离子体反应区域的包括多个处理平台的等离子体反应室 A plasma reaction chamber comprising a plurality of processing platforms having a plurality of plasma reaction zone |
| 02/08/2012 | CN101121576B 低辐射镀膜玻璃的制造方法及其所用的镀膜溶液 Low-E coated glass manufacturing method and the coating solution used |
| 02/07/2012 | US8112183 Substrate processing apparatus and substrate processing method |
| 02/07/2012 | US8110780 Photoirradiation type heat treatment apparatus |
| 02/07/2012 | US8110435 Method and apparatus for manufacturing semiconductor device |
| 02/07/2012 | US8110171 Method for decolorizing diamonds |
| 02/07/2012 | US8110086 Method of manufacturing a process chamber component having yttrium-aluminum coating |