Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2012
03/06/2012US8129271 Film forming method, film forming apparatus and storage medium
03/06/2012US8128783 Plasma generator and work processing apparatus provided with the same
03/06/2012US8128751 Film-forming apparatus
03/06/2012US8128750 Aluminum-plated components of semiconductor material processing apparatuses and methods of manufacturing the components
03/06/2012US8128073 Method and apparatus to help promote contact of gas with vaporized material
03/01/2012WO2012027575A1 Molybdenum (iv) amide precursors and use thereof in atomic layer deposition
03/01/2012WO2012027357A2 Thermally stable volatile precursors
03/01/2012WO2012026464A1 Sealing film material, sealing film and use thereof
03/01/2012WO2012026349A1 Water-reactive al composite material, water-reactive thermally sprayed al film, process for production of thermally sprayed al film, and structural member for film-forming chamber
03/01/2012WO2012026098A1 Method of producing cutting tool
03/01/2012WO2012025627A1 Method for depositing a coating on a substrate by chemical vapour deposition
03/01/2012WO2012025513A1 Thermal shield for silicon production reactors
03/01/2012WO2012025249A1 Method and control device for cleaning a plasma treatment device and/or a substrate accommodated in a plasma treatment device
03/01/2012WO2011162400A3 Coating liquid, method for manufacturing optical component, and photographic optical system
03/01/2012WO2011153484A3 Silicon dioxide layer deposited with bdeas
03/01/2012WO2011149705A3 Hydrophilic marking film having plasma chemical vapor deposition treated protective layer
03/01/2012US20120052660 Directed reagents to improve material uniformity
03/01/2012US20120052659 Manufacturing method and apparatus for semiconductor device
03/01/2012US20120052657 Method of forming film and substrate processing apparatus
03/01/2012US20120052617 Vapor deposition apparatus and process for continuous deposition of a doped thin film layer on a substrate
03/01/2012US20120052321 Sanitary objects
03/01/2012US20120052279 Diamond insulated circuits and associated methods
03/01/2012US20120052242 Substrate Structure Grown By Plasma Deposition
03/01/2012US20120052216 Gas distribution showerhead with high emissivity surface
03/01/2012US20120052204 Workpiece wetting and cleaning
03/01/2012US20120052203 Substrate processing apparatus and method of processing substrate
03/01/2012US20120052202 Method for metering granular source material in a thin film vapor deposition apparatus
03/01/2012US20120052200 Minimizing blockage of holes in turbine engine components
03/01/2012US20120052189 Vapor deposition system
03/01/2012US20120052188 Systems and methods for assembling a lipid bilayer on a substantially planar solid surface
03/01/2012US20120051192 Method for coating micromechanical parts with high tribological performances for application in mechanical systems
03/01/2012US20120048829 Methods for discretized processing and process sequence integration of regions of a substrate
03/01/2012US20120048467 Component temperature control by coolant flow control and heater duty cycle control
03/01/2012US20120048199 Crucible and evaporation deposition device having same
03/01/2012US20120048198 Vapor phase growth apparatus
03/01/2012US20120048197 Film deposition device
03/01/2012US20120048195 Method for mass production of graphene and carbon tubes by deposition of carbon atoms, on flat surfaces and inside walls of tubes, generated from dissociation of a carbon-containing gas stimulated by a tunable high power pulsed laser
03/01/2012US20120048192 Apparatus for metering granular source material in a thin film vapor deposition apparatus
03/01/2012US20120048180 Film-forming manufacturing apparatus and method
03/01/2012US20120048178 Process for production of polycrystalline silicon
02/2012
02/29/2012EP2423353A1 Film deposition device
02/29/2012EP2423352A1 Thermal shield for silicon production reactors
02/29/2012EP2423351A1 Apparatus for forming thin film and method for forming thin film
02/29/2012EP2423159A1 Methods of forming alpha and beta tantalum films with controlled and new microstructures
02/29/2012EP2423158A1 Methods of forming alpha and beta tantalum films with controlled and new microstructures
02/29/2012EP2422359A2 Enhanced scavenging of residual fluorine radicals using silicon coating on process chamber walls
02/29/2012EP2300633B1 Process and installation for despositing films simultaneously onto both sides of a substrate.
02/29/2012EP2144744B1 Edge healing and field repair of plasma coating
02/29/2012CN102365715A Method for formation of metal silicide film
02/29/2012CN102365389A Semiconductor processing reactor and components thereof
02/29/2012CN102365388A Liquid raw material vaporizer
02/29/2012CN102365387A Gas barrier film, electronic device including same, gas barrier bag, and method for manufacturing gas barrier film
02/29/2012CN102365386A Method for forming metal nitride film, and storage medium
02/29/2012CN102363878A Preheating device for chemical vapor deposition furnace
02/29/2012CN101939463B Vaporization apparatus with precise powder metering
02/29/2012CN101933140B Nanostructures and methods of making the same
02/29/2012CN101842880B Gas feeding device, treating device, treating method
02/29/2012CN101689500B Film forming apparatus and film forming method
02/29/2012CN101627459B Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
02/29/2012CN101491961B Method of forming bonded body and bonded body
02/29/2012CN101483136B Methods of selective deposition of heavily doped epitaxial siGe
02/29/2012CN101071763B Method of gap-filling using amplitude modulation radiofrequency power and apparatus for the same
02/29/2012CN101021005B Deposition apparatus and method for depositing film
02/28/2012US8125038 Nanolaminates of hafnium oxide and zirconium oxide
02/28/2012US8124275 Method of manufacturing catalyst carrier, catalyst carrier, and electrode of fuel cell battery
02/28/2012US8124181 Oxidation method providing parallel gas flow over substrates in a semiconductor process
02/28/2012US8124180 Thin layer substrate coating and method of forming same
02/28/2012US8124179 Thin films prepared with gas phase deposition technique
02/28/2012US8124178 Method and apparatus application of metallic alloy coatings
02/28/2012US8124177 Tailored and uniform coatings in microchannel apparatus
02/28/2012US8124168 Substrate processing method and substrate processing apparatus
02/28/2012US8123903 Plasma reactor having multiple antenna structure
02/28/2012US8123902 Gas flow diffuser
02/28/2012US8123863 Evaporation apparatus
02/28/2012US8123862 Deposition apparatus and manufacturing apparatus
02/28/2012US8123861 Apparatus for making interconnect seed layers and products
02/28/2012US8123860 Apparatus for cyclical depositing of thin films
02/28/2012US8122850 Method and apparatus for processing polysilazane film
02/28/2012US8122849 Apparatus and method for producing a pharmaceutical product
02/23/2012WO2012023760A2 Apparatus for forming gas blocking layer and method thereof
02/23/2012WO2012023557A1 Apparatus for manufacturing compound semiconductor, method for manufacturing compound semiconductor, and compound semiconductor
02/23/2012WO2012022111A1 Epitaxial wafer tray and supportive and rotational connection apparatus matching same
02/23/2012WO2011133207A3 A coating method for gas delivery system
02/23/2012WO2011125704A9 Plasma processing device and plasma processing method
02/23/2012US20120045905 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus
02/23/2012US20120045903 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus
02/23/2012US20120045864 Multilayer film formation method and film deposition apparatus used with the method
02/23/2012US20120045863 Microplasma generator and methods therefor
02/23/2012US20120045700 Atomic layer deposition method for applying boron-containing films
02/23/2012US20120045631 Index modified coating on polymer substrate
02/23/2012US20120045627 Coatings with small particles that effect bulk properties
02/23/2012US20120045593 Plasma cvd apparatus
02/23/2012US20120045592 Process to Deposit Diamond Like Carbon as Surface of a Shaped Object
02/23/2012US20120045591 Plasma processing apparatus, deposition method, method of manufacturing metal plate having dlc film, method of manufacturing separator, and method of manufacturing article
02/23/2012US20120045590 Apparatus and method for plasma treatment of containers
02/23/2012US20120045589 Amidate Precursors For Depositing Metal Containing Films
02/23/2012US20120045581 Substrate processing method and substrate processing apparatus
02/23/2012US20120045572 Carbon nanotube production process and carbon nanotube production apparatus
02/23/2012US20120045567 Flexible substrates having a thin-film barrier
02/23/2012US20120043298 Methods for discretized processing and process sequence integration of regions of a substrate