Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2012
03/14/2012CN202164351U 一种金属有机化学气相沉积反应器 Metal organic chemical vapor deposition reactor
03/14/2012CN202164350U 一种金属有机化学气相沉积反应器 Metal organic chemical vapor deposition reactor
03/14/2012CN1958887B Single crystalline A-plane nitride semiconductor wafer having orientation flat
03/14/2012CN102378826A Apparatus for forming thin film and method for forming thin film
03/14/2012CN102376640A Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus
03/14/2012CN102376549A Film forming apparatus and film forming method
03/14/2012CN102376535A Semiconductor device and fabricating method thereof
03/14/2012CN102373445A Method for monitoring leakage rate in chemical vapor deposition reaction cavity
03/14/2012CN102373444A Coating device and coating method
03/14/2012CN102373443A Plasma processing apparatus and deposition method
03/14/2012CN102373442A Susceptor and apparatus for cvd with the susceptor
03/14/2012CN102373441A Delivery device and method of use thereof
03/14/2012CN102373440A Chemical vapor deposition device
03/14/2012CN102373439A Chemical deposition reactor and spraying device thereof
03/14/2012CN102373438A Chemical vapor deposition device
03/14/2012CN102373437A Formation method of coating
03/14/2012CN102373436A Substrate holder stocker device, substrate processing apparatus, and substrate holder moving method
03/14/2012CN102373435A Film coating equipment
03/14/2012CN102373406A Film plating method
03/14/2012CN101910448B Film-forming apparatus
03/14/2012CN101652501B Method for film formation, and apparatus for film formation
03/14/2012CN101503795B Twin-type coating device with improved separating plate
03/13/2012US8133555 Method for forming metal film by ALD using beta-diketone metal complex
03/13/2012US8133554 Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
03/13/2012US8133532 Method of densifying porous articles
03/13/2012US8133531 Titanium dioxide particles coated via an atomic layer deposition process
03/13/2012US8133349 Rapid and uniform gas switching for a plasma etch process
03/13/2012US8133323 Film forming apparatus and method, gas supply device and storage medium
03/13/2012US8133322 Apparatus for inverted multi-wafer MOCVD fabrication
03/13/2012CA2500386C Novel metal complexes free from fluorine for gas-phase deposition of metals
03/08/2012WO2012031238A2 Uniform multilayer graphene by chemical vapor deposition
03/08/2012WO2012031192A1 Deposition system
03/08/2012WO2012030500A1 System, method and apparatus for controlling ion energy distribution
03/08/2012WO2012029709A1 Amorphous silicon nitride film and method for producing same
03/08/2012WO2012029661A1 Method for manufacturing semiconductor device and substrate treatment device
03/08/2012WO2012029541A1 Thin film laminate
03/08/2012WO2012028784A1 Apparatus and method
03/08/2012WO2012028782A1 Nozzle head
03/08/2012WO2012028781A1 Apparatus
03/08/2012WO2012028780A1 Nozzle head and apparatus
03/08/2012WO2012028779A1 Apparatus
03/08/2012WO2012028777A1 Apparatus
03/08/2012WO2012028776A1 Apparatus
03/08/2012WO2012028775A1 Nozzle head
03/08/2012WO2012028771A1 Apparatus
03/08/2012WO2012028691A1 Method of coating a substrate for manufacturing a solar cell
03/08/2012WO2012028660A1 Gas distribution device for vacuum processing equipment
03/08/2012WO2012028539A1 Growth of al2o3 thin films from trialkyllaluminum for photovoltaic applications
03/08/2012WO2012028534A1 Growth of ai2o3 thin films for photovoltaic applications
03/08/2012WO2012028448A1 Process for applying a bonding layer to a metallic substrate
03/08/2012WO2012028314A1 Method for producing a measuring tip for a scanning probe microscope and measuring probe having a measuring tip produced according to said method
03/08/2012WO2012027858A1 Control of differential pressure in pecvd systems
03/08/2012WO2012012026A3 Metal film deposition
03/08/2012WO2011146571A3 Tightly-fitted ceramic insulator on large-area electrode
03/08/2012US20120058649 Plasma processing apparatus and method thereof
03/08/2012US20120058630 Linear Cluster Deposition System
03/08/2012US20120058352 Metal substrates having carbon nanotubes grown thereon and methods for production thereof
03/08/2012US20120058282 Method of Forming Conformal Film Having Si-N Bonds on High-Aspect Ratio Pattern
03/08/2012US20120058281 Methods for forming low moisture dielectric films
03/08/2012US20120058280 Thermal evaporation process for manufacture of solid state battery devices
03/08/2012US20120058270 Thermally stable volatile film precursors
03/08/2012US20120058251 Film Forming Apparatus And Method Of Manufacturing Light Emitting Device
03/08/2012US20120058113 Cancer treatment method
03/08/2012US20120055633 High throughput physical vapor deposition apparatus and method for manufacture of solid state batteries
03/08/2012US20120055407 Arrangement for processing substrate and substrate carrier
03/08/2012US20120055406 Vapor Phase Deposition Apparatus and Support Table
03/08/2012US20120055405 Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber
03/08/2012US20120055404 Apparatus for continuous coating
03/08/2012US20120055403 Mounting table structure, film forming apparatus and raw material recovery method
03/08/2012US20120055402 Processing apparatus
03/08/2012US20120055401 Substrate processing method and system
03/07/2012EP2426703A1 Plasma processing method and plasma processing apparatus
03/07/2012EP2426702A1 Method of deposition of chemical compound semiconductor and device
03/07/2012EP2426233A1 Growth of Al2O3 thin films for photovoltaic applications
03/07/2012EP2426136A1 Growth of Al2O3 thin films from trialkyllaluminum for photovoltaic applications
03/07/2012EP2425037A1 Optoelectronic component and method for the production thereof
03/07/2012EP2035597B1 Cleaning device and cleaning process for a plasma reactor
03/07/2012EP2024104B1 Machine for plasma treatment of containers comprising an integrated vacuum circuit
03/07/2012EP2013375B1 System and method for transport
03/07/2012EP1994202B1 Protective coating of silver
03/07/2012EP1885909B1 Nanostructure production methods
03/07/2012EP1522611B1 Diamond composite substrate
03/07/2012EP1462540B1 Method for forming thin film.
03/07/2012EP1366508B1 Method of and system for atmospheric pressure reactive atom plasma processing for surface modification
03/07/2012CN102369590A Method for growing crystals of nitride semiconductor, and process for manufacture of semiconductor device
03/07/2012CN102369589A Method and apparatus for growing a thin film onto a substrate
03/07/2012CN102369464A Structure comprising at least one reflecting thin film on a surface of a macroscopic object, method for fabricating a structure, and uses for the same
03/07/2012CN102369308A Mesoporous carbon material for energy storage
03/07/2012CN102369307A Apparatus for manufacture of solar cells
03/07/2012CN102367571A Preparation method for improving surface hydrophilicity of nanometer polyethylene terephthalate (PET) films
03/07/2012CN102367570A Method for preparing diamond-graphene composite film
03/07/2012CN101911266B Semiconductor device manufacturing method, semiconductor manufacturing apparatus and storage medium
03/07/2012CN101894853B Phase change random access memory and manufacturing method
03/07/2012CN101880868B Deposition box for silicon-based film solar cells
03/07/2012CN101457351B Gas distribution system and semi-conductor processing arrangements employing the same
03/07/2012CN101440484B Induction coupling plasma processing apparatus and method
03/07/2012CN101435074B Substrate processing apparatus
03/07/2012CN101341155B Hafnium compound, hafnium thin film-forming material and method for forming hafnium thin film
03/07/2012CN101270473B Arrangement for moving a carrier in a vacuum chamber
03/06/2012US8129663 Vacuum heating apparatus