Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2012
03/21/2012EP2431503A1 Method of manufacturing an organic electroluminescent device or an organic photoelectric receiving device using a nano-crystalline diamond film
03/21/2012EP2430212A2 Corrosion protection and lubrication of mems devices
03/21/2012EP2430211A1 Coating method
03/21/2012EP1306150B1 Coated cutting tool
03/21/2012EP0942459B1 Method of growing nitride semiconductors
03/21/2012CN1934720B Semiconductor light-emitting device and illuminating device
03/21/2012CN1795284B Ultra low residual reflection, low stress lens coating
03/21/2012CN1788107B Cvd涂敷装置 Cvd coating apparatus
03/21/2012CN102388303A Origami sensor
03/21/2012CN102388162A Gas injectors for cvd systems with the same
03/21/2012CN102388161A Method for forming manganese oxide film, method for manufacturing semiconductor device, and semiconductor device
03/21/2012CN102387920A Gas-barrier multilayer film
03/21/2012CN102386253A Interface treatment technology for hetero junction solar cell
03/21/2012CN102383193A Free-standing (Al, Ga, In)N and parting method for forming same
03/21/2012CN102383113A Method and device for improving efficiency of preparing diamond coating on tool surface and coating evenness
03/21/2012CN102383112A Thermal processing apparatus
03/21/2012CN102383111A Solar cell deposition fixture capable of reducing diffraction
03/21/2012CN102383110A Film forming apparatus
03/21/2012CN102383109A Film deposition apparatus and film deposition method
03/21/2012CN102383108A Furnace for carrying out plasma chemical vapour deposition
03/21/2012CN102383107A Film deposition device
03/21/2012CN102383106A Metal organic chemical vapour deposition reaction chamber for fast removing residual reaction gas
03/21/2012CN102383105A Method for preparing quasi-one-dimensional metallic oxide nano material
03/21/2012CN102383089A Manufacturing method of separation deposition membrane layer
03/21/2012CN102380629A Surface-coated cutting tool with hard coating layer having excellent cutting resistance and wear resistance
03/21/2012CN102051591B Vapor phase deposition method of organosilan on surface of polydimethylsiloxane
03/21/2012CN101861641B Plasma processing apparatus and method for plasma processing semiconductor substrate
03/21/2012CN101855698B Device for the plasma treatment of workpieces
03/21/2012CN101809730B Processing method and semiconductor device manufacturing method
03/21/2012CN101796615B Top panel and plasma processing apparatus using the same
03/21/2012CN101638776B Pretreatment method in chemical vapor deposition
03/21/2012CN101409233B Method for depositing group III/V compounds
03/21/2012CN101402147B Coated cutting insert for milling applications
03/21/2012CN101233621B Method for passivating a substrate surface
03/21/2012CN101208295B Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including the same
03/21/2012CN101107384B Gas distributor with pre-chambers arranged in planes
03/20/2012US8140284 System for mapping vehicle mutilation defects
03/20/2012US8138003 Method of manufacturing nitride semiconductor substrates having a base substrate with parallel trenches
03/20/2012US8137826 Composite material part with a silicon-containing ceramic matrix protected against corrosion
03/20/2012US8137765 Method of producing alloyed iron article
03/20/2012US8137764 Mechanical enhancer additives for low dielectric films
03/20/2012US8137763 Method of producing a layer of material on a support
03/20/2012US8137750 Catalytically active gold supported on thermally treated nanoporous supports
03/20/2012US8137745 Hot melt adhesive system and method using machine readable information
03/20/2012US8137739 Apparatus and method for the manufacture of a three-dimensional object
03/20/2012US8137738 Method and apparatus for recognizing a structure to be applied onto a substrate with multiple cameras
03/20/2012US8137501 Bevel clean device
03/20/2012US8137471 Plasma processing apparatus and method
03/20/2012US8137470 Inner plate and crucible assembly for deposition having the same
03/20/2012US8137468 Heated valve manifold for ampoule
03/20/2012US8137467 Temperature controlled showerhead
03/20/2012US8137466 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
03/20/2012US8137465 Single-chamber sequential curing of semiconductor wafers
03/20/2012US8137464 Atomic layer deposition system for coating flexible substrates
03/20/2012US8137463 Dual zone gas injection nozzle
03/20/2012US8137462 Precursor delivery system
03/20/2012US8136481 Device for plasma treatment at atmospheric pressure
03/20/2012US8136480 Physical vapor deposition system
03/20/2012US8136479 Plasma treatment apparatus and plasma treatment method
03/20/2012CA2511833C Components for a film-forming device and method for cleaning the same
03/20/2012CA2373344C Corrosion-resistant metallic member, metallic separator for fuel cell comprising the same, and process for production thereof
03/15/2012WO2012033717A2 Embedded catalyst for atomic layer deposition of silicon oxide
03/15/2012WO2012033639A1 Linear cluster deposition system
03/15/2012WO2012033191A1 Plasma processing apparatus
03/15/2012WO2012032942A1 Microwave introduction mechanism, microwave plasma source and microwave plasma treatment device
03/15/2012WO2012032915A1 Epitaxial substrate for semiconductor element, method for producing epitaxial substrate for semiconductor element, and semiconductor element
03/15/2012WO2012032839A1 Surface-coated cutting tool
03/15/2012WO2012032596A1 Plasma processing apparatus
03/15/2012WO2012031722A1 Cvd reactor/gas converter and electrode unit therefore
03/15/2012WO2011137373A4 Vertical inline cvd system
03/15/2012US20120064730 Producing method of semiconductor device and substrate processing apparatus
03/15/2012US20120064717 Method for forming cvd-ru film and method for manufacturing semiconductor devices
03/15/2012US20120064698 Multiple section showerhead assembly
03/15/2012US20120064665 Deposition apparatus, apparatus for successive deposition, and method for manufacturing semiconductor device
03/15/2012US20120064658 Entrance and Exit Roll Seal Configuration for a Vapor Deposition System
03/15/2012US20120064260 Surface wave plasma cvd apparatus and film forming method
03/15/2012US20120064248 Method for forming cu film and storage medium
03/15/2012US20120064247 Method for forming cu film, and storage medium
03/15/2012US20120064246 Growth and applications of ultralong carbon nanotubes
03/15/2012US20120064245 Ald systems and methods
03/15/2012US20120064227 Cantilever Microprobes For Contacting Electronic Components and Methods for Making Such Probes
03/15/2012US20120064226 Cantilever Microprobes For Contacting Electronic Components and Methods for Making Such Probes
03/15/2012US20120064224 Liquid crystal coating apparatus and liquid crystal coating method
03/15/2012US20120064201 Galvanic package for fruits and vegetables and preservation method
03/15/2012US20120062833 Optical member, plastic lens for eyeglasses, and method for manufacturing the same
03/15/2012US20120061351 Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method
03/15/2012US20120061348 Large Scale Patterned Growth of Aligned One-Dimensional Nanostructures
03/15/2012US20120061234 Deposition Chamber Cleaning Method Including Stressed Cleaning Layer
03/15/2012US20120060759 Falling film plasma reactor
03/15/2012US20120060758 Dynamic system for variable heating or cooling of linearly conveyed substrates
03/15/2012DE202012000858U1 Vorrichtung zum Verdampfen von erwärmten Materialien Apparatus for evaporation of heated materials
03/15/2012DE102010045046A1 Cylindrical precursor container for vaporizer used for e.g. atomic layer deposition method, has pressure spring that presses valve temple with sealing disc on inner end of inner pipe and closes steam and precursor exits and air inlet
03/15/2012DE102010045041A1 CVD-Reaktor/Gaskonverter und Elektrodeneinheit hierfür CVD reactor / gas converter and electrode assembly therefor
03/15/2012DE102010044859A1 Vorrichtung zum Betreiben eines Kreislaufsystems, Verfahren zum Beschichten und Verwendung von Generator- und/oder Turbinenschaufeln und/oder Kondensatorrohrböden eines Kraftwerkskondensators An apparatus for operating a circulating system, method of coating and use of the generator and / or turbine blades and / or tube plates of a capacitor power plant condenser
03/15/2012DE102010040839A1 Verfahren zum Herstellen eines elektronsichen Bauelements und elektronisches Bauelement A process for producing an electrophotographic Sichen component and electronic component
03/14/2012EP2427902A1 Apparatus and method for plasma treatment of containers
03/14/2012EP2427591A1 Medicinal inhalation device
03/14/2012EP2427590A1 Apparatus and methods for forming modified metal coatings
03/14/2012EP2150685B1 Regulation of a plasma-regenerated soot filter
03/14/2012CN202164352U 一种半导体加工设备 A semiconductor processing equipment