Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
03/2012
03/29/2012US20120076935 Method and apparatus for multiple-channel pulse gas delivery system
03/29/2012US20120076928 Polycrystalline monolithic magnesium aluminate spinels
03/29/2012US20120074106 Method for manufacturing a welded component with very high mechanical characteristics from a coated lamination sheet
03/29/2012US20120074100 Plasma processing apparatus and plasma processing method
03/29/2012US20120074096 Methods for discretized processing and process sequence integration of regions of a substrate
03/29/2012US20120074007 Housing shell for portable electrical devices and method for the production thereof
03/29/2012US20120073757 Plasma processing apparatus
03/29/2012US20120073756 Plasma processing apparatus
03/29/2012US20120073751 Manufacturing method of semiconductor device, and semiconductor device
03/29/2012US20120073502 Heater with liquid heating element
03/29/2012US20120073501 Process chamber for dielectric gapfill
03/29/2012US20120073500 Semiconductor device manufacturing method and substrate processing apparatus
03/29/2012US20120073499 Coating device
03/29/2012DE102011110410A1 Multilayer film formation method and film deposition apparatus used with the method Multilayer film-formation method and film deposition apparatus used with the method
03/29/2012DE102010046941A1 Device, preferably tri-bological system, useful for power transmission, comprises first body and second body adapted to stand with the first body in sliding-rolling contact
03/28/2012EP2434531A2 Metal-insulator-metal capacitor and method for manufacturing thereof
03/28/2012EP2434529A1 Metal-insulator-metal capacitor for use in semiconductor devices and manufacuring method therfor
03/28/2012EP2432917A2 Method for coating micromechanical parts with high tribological performances for application in mechanical systems
03/28/2012EP2432916A1 Pt-al-hf/zr coating and method
03/28/2012EP2167270B1 Gas distributor comprising a plurality of diffusion-welded panes and a method for the production of such a gas distributor
03/28/2012EP2010693B1 Cvd reactor having a process chamber lid which can be lowered
03/28/2012CN202178437U 电极对接装置 Electrode docking device
03/28/2012CN202175711U 防高温变形的固定架和炉管 Anti-high temperature deformation and tube holder
03/28/2012CN1792929B Vapor-deposition material for production of layer of high refractive index
03/28/2012CN102396053A Plasma processing apparatus and slow-wave plate used therein
03/28/2012CN102395714A Reaction chamber of an epitaxial reactor and reactor that uses said chamber
03/28/2012CN102395706A Method for manufacturing gas barrier thin film-coated plastic container
03/28/2012CN102395705A Device and method for forming film
03/28/2012CN102395704A Plasma deposition
03/28/2012CN102395703A Method for applying a coating to workpieces and/or materials comprising at least one readily oxidizable nonferrous metal
03/28/2012CN102392229A Atomic layer deposition (ALD) equipment
03/28/2012CN102392228A Air intake method for ALD equipment
03/28/2012CN102392227A Embedded type plasma-enhanced chemical vapor deposition (PECVD) wafer carrying device
03/28/2012CN102392226A Preparation method of grapheme/ boron nitride heterogeneous film
03/28/2012CN102392225A Method for preparing graphene nanoribbon on insulating substrate
03/28/2012CN101964368B Laminated solar battery and manufacturing method thereof
03/28/2012CN101901759B MOCVD (Metal-organic Chemical Vapor Deposition) growth method of nonpolar a-side GaN film on r-side based Al2O3 substrate
03/28/2012CN101850944B Method for sedimentating silicon nitride thin film by using 13.56 MHz radio frequency power source
03/28/2012CN101736310B Gas delivery system applied to tungsten chemical vapor deposition technology
03/28/2012CN101370963B High temperature ald inlet manifold
03/27/2012US8143660 Method for manufacturing oxide film having high dielectric constant, capacitor having dielectric film formed using the method, and method for manufacturing the same
03/27/2012US8143594 Method of depositing protective structures
03/27/2012US8143431 Low temperature thermal conductive inks
03/27/2012US8143174 Post-deposition treatment to enhance properties of Si-O-C low K films
03/27/2012US8142989 Textured chamber surface
03/27/2012US8142862 Method of forming conformal dielectric film having Si-N bonds by PECVD
03/27/2012US8142848 Coated cutting insert for milling
03/27/2012US8142847 Precursor compositions and methods
03/27/2012US8142846 Method of forming phase change material layer using Ge(II) source, and method of fabrication phase change memory device
03/27/2012US8142845 Process for the manufacturing of dense silicon carbide
03/27/2012US8142621 Insert for milling of cast iron
03/27/2012US8142609 Plasma processing apparatus
03/27/2012US8142608 Atmospheric pressure plasma reactor
03/27/2012US8142607 High density helicon plasma source for wide ribbon ion beam generation
03/27/2012US8142606 Apparatus for depositing a uniform silicon film and methods for manufacturing the same
03/27/2012US8142569 Apparatus for forming structured material for energy storage device and method
03/27/2012US8142568 Apparatus for synthesizing a single-wall carbon nanotube array
03/27/2012US8142567 Vacuum processing apparatus
03/27/2012US8141514 Plasma processing apparatus, plasma processing method, and storage medium
03/27/2012CA2583683C Surface reconstruction method for silicon carbide substrate
03/22/2012WO2012036537A2 Apparatus and method for manufacturing graphene using a flash lamp or laser beam, and graphene manufactured by same
03/22/2012WO2012035842A1 High-frequency power supply device, plasma processing device and method for producing thin film
03/22/2012WO2012034587A1 A system and a method for processing a flexible substrate
03/22/2012WO2012034160A1 Reactor for chemical syntheses
03/22/2012WO2012010146A3 Electrode for producing a plasma, plasma chamber having said electrode, and method for analyzing or processing a layer or the plasma in situ
03/22/2012WO2009117670A3 Self-aligned barrier layers for interconnects
03/22/2012US20120071003 Vacuum Processing Apparatus, Vacuum Processing Method, and Micro-Machining Apparatus
03/22/2012US20120071001 Vaporizing and feed apparatus and vaporizing and feed method
03/22/2012US20120071000 Manufacturing apparatus and method for semiconductor device
03/22/2012US20120070997 Gas switching section including valves having different flow coefficient's for gas distribution system
03/22/2012US20120070963 Plasma deposition
03/22/2012US20120070741 High capacity battery electrode structures
03/22/2012US20120070685 Compositions comprising polymers coated with metallic layers and methods of manufacture and use thereof
03/22/2012US20120070590 Plasma enhanced atomic layer deposition apparatus and the controlling method thereof
03/22/2012US20120070582 Deposition of ternary oxide films containing ruthenium and alkali earth metals
03/22/2012US20120070581 Vapor deposition systems and methods
03/22/2012US20120070580 Fluoropolymer compositions and treated substrates
03/22/2012US20120070579 Method and apparatus for coating glass substrate
03/22/2012US20120070578 Method for producing titanium metal
03/22/2012US20120070577 Film-forming apparatus and film-forming method
03/22/2012US20120070576 Coated porous metal medium
03/22/2012US20120070572 Vapor Delivery System For Use in Imprint Lithography
03/22/2012US20120070565 Operationally reliable coating device for powdery material
03/22/2012US20120070564 Bake Plate Exhaust Monitor
03/22/2012US20120069487 Stacked structure and method of manufacturing the same
03/22/2012US20120068074 Method of manufacturing scintillator panel, scintillator panel, and radiation image detector
03/22/2012US20120067871 Device Package and Methods for the Fabrication Thereof
03/22/2012US20120067521 Vacuum processing system
03/22/2012US20120067287 Evaporation boat for vacuum vapor deposition and vacuum vapor deposition system
03/22/2012US20120067286 Vapor deposition reactor system and methods thereof
03/22/2012US20120067285 Thermal spraying apparatus
03/22/2012US20120067284 Apparatus
03/22/2012US20120067283 Systems and Methods for Forming Metal Oxide Layers
03/22/2012US20120067282 Reactor lid assembly for vapor deposition
03/22/2012US20120067274 Film forming apparatus, wafer holder, and film forming method
03/22/2012US20120066956 Terminal fly fishing tackle
03/22/2012DE102010045670A1 Device, useful for the thermal protection of feed through in and out of process chamber, comprising disc shaped cooling elements, which are held by connection means in spacing and mold to each other with recesses for the rod-shaped element
03/22/2012DE102010041110A1 Substrate treatment plant for treating e.g. glass substrate, has flap valve installed at vertical chamber wall or bulkhead wall, that is selectively opened and closed through opening for allowing passage of substrates
03/21/2012EP2431505A2 Equipment for manufacturing silicon carbide single crystal
03/21/2012EP2431504A1 Method for manufacturing an organic thin fim transistor using a nano-crystalline diamond film