Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
04/2012
04/11/2012CN102409318A 热化学气相沉积反应器以及提高反应器中热辐射率的方法 The method of thermal chemical vapor deposition reactor and increase reactor thermal emissivity
04/11/2012CN102409317A 具有可拆卸式进出气结构的成膜装置 Removable film forming apparatus having the structure out of gas
04/11/2012CN102409315A 输送机构及具有该输送机构的镀膜设备 Coating equipment transport mechanism and has the transport mechanism
04/11/2012CN102407352A 硬质包覆层具备优异韧性、耐崩刀性的表面包覆切削工具 The hard coating layer has excellent toughness and resistance to chipping of the surface-coated cutting tool
04/11/2012CN101685791B 基片支承装置及其静电释放方法 Substrate support apparatus and method for electrostatic discharge
04/11/2012CN101684550B 设计为用于气相沉积系统中的阱 Designed for a vapor deposition system well
04/11/2012CN101476114B 等离子体设备腔室维护前预处理的方法 The method of plasma equipment before maintenance pretreatment chamber
04/11/2012CN101298665B 用于平面显示器的化学气相沉积装置 Chemical vapor deposition apparatus for flat panel displays
04/11/2012CN101268212B 原料供给装置以及成膜装置 Raw material supply device and the film-forming apparatus
04/11/2012CN101128083B 等离子体生成装置、等离子体控制方法和基板制造方法 The plasma generating apparatus, the plasma control method and substrate manufacturing method
04/10/2012US8153833 Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride
04/10/2012US8153831 Organometallic compounds, processes for the preparation thereof and methods of use thereof
04/10/2012US8153281 Metalorganic chemical vapor deposition (MOCVD) process and apparatus to produce multi-layer high-temperature superconducting (HTS) coated tape
04/10/2012US8153280 Composition comprising silicon carbide
04/10/2012US8152971 Cutting tool
04/10/2012US8152927 CVD coating device
04/10/2012US8152926 Vacuum processing apparatus
04/10/2012US8152925 Baffle plate and substrate processing apparatus
04/10/2012US8152924 CVD reactor comprising a gas inlet member
04/10/2012US8152923 Gas treatment systems
04/10/2012US8152922 Gas mixer and manifold assembly for ALD reactor
04/10/2012US8151814 Method for controlling flow and concentration of liquid precursor
04/10/2012US8151729 Mask assembly and method of fabricating the same
04/05/2012WO2012044658A1 System for and method of fast pulse gas delivery
04/05/2012WO2012044580A1 Heater with liquid heating element
04/05/2012WO2012044284A1 Directionally recrystallized graphene growth substrates
04/05/2012WO2012044251A1 Method for growing white color diamonds by using diborane and nitrogen in combination in a microwave plasma chemical vapor deposition system
04/05/2012WO2012043474A1 POLYCRYSTALLINE ALUMINUM NITRIDE SUBSTRATE FOR GROWING GaN-BASED SEMICONDUCTOR CRYSTAL, AND GaN-BASED-SEMICONDUCTOR MANUFACTURING METHOD USING SAME
04/05/2012WO2012043441A1 Ceramic member
04/05/2012WO2012043250A1 Method and device for forming insulation film
04/05/2012WO2012043154A1 METHOD FOR FORMING Ge-Sb-Te FILM AND STORAGE MEDIUM
04/05/2012WO2012042772A1 Thin film manufacturing method and thin film manufacturing apparatus
04/05/2012WO2012042035A1 Thermalizing gas injectors, material deposition systems, and related methods
04/05/2012WO2012008789A9 Method for producing graphene at a low temperature, method for direct transfer of graphene using same, and graphene sheet
04/05/2012WO2011156749A3 Graphene deposition
04/05/2012WO2011146913A3 Germanium antimony telluride materials and devices incorporating same
04/05/2012WO2011133562A3 Methods and apparatus for an induction coil arrangement in a plasma processing system
04/05/2012WO2011127207A3 Simple method for producing superhydrophobic carbon nanotube array
04/05/2012US20120083105 Method for boron doping silicon wafers
04/05/2012US20120083101 Systems and methods for forming semiconductor materials by atomic layer deposition
04/05/2012US20120083100 Thermalizing gas injectors for generating increased precursor gas, material deposition systems including such injectors, and related methods
04/05/2012US20120083060 Integration of cluster mocvd and hvpe reactors with other process chambers
04/05/2012US20120082802 Power loading substrates to reduce particle contamination
04/05/2012US20120082787 Method for producing graphene film, method for manufacturing electronic element, and method for transferring graphene film to substrate
04/05/2012US20120082778 Vacuum deposition system and vacuum deposition method
04/05/2012US20120080407 Multi-Source Plasma Focused Ion Beam System
04/05/2012US20120079985 Method for processing substrate and substrate processing apparatus
04/05/2012US20120079984 Gas mixer and manifold assembly for ald reactor
04/05/2012DE102010030608B4 Vorrichtung zur plasmagestützten Bearbeitung von Substraten Apparatus for plasma-assisted processing of substrates
04/05/2012DE102010017354A9 Verfahren zum Herstellen eines warmgeformten und gehärteten, mit einer metallischen Korrosionsschutzbeschichtung überzogenen Stahlbauteils aus einem Stahlflachprodukt A method for producing a thermoformed and cured, coated with a metallic anti-corrosion coating the steel member from a steel flat product
04/05/2012CA2812616A1 Method of producing white colour monocrystalline diamonds
04/04/2012EP2436802A1 Structure of substrate supporting table, and plasma processing apparatus
04/04/2012EP2436801A1 Systems and methods for forming semiconductor materials by atomic layer deposition
04/04/2012EP2436800A1 High-throughput deposition system for oxide thin film growth by reactive coevaporation
04/04/2012EP2436798A1 Masking material, masking device, method for masking a substrate and method for coating a substrate
04/04/2012EP2435598A1 Method for forming an organic material layer on a substrate
04/04/2012EP2435597A1 Arrangement for processing substrate and substrate carrier
04/04/2012EP2106461B1 Container having improved ease of discharge product residue, and method for the production thereof
04/04/2012EP1401013B1 Plasma processing device
04/04/2012CN202181352U 连续沉积系统 Continuous deposition system
04/04/2012CN202181351U Air filtering rotary shaft
04/04/2012CN202181350U 一种热丝化学气相沉积设备 A thermal filament chemical vapor deposition equipment
04/04/2012CN102405518A Method for forming ge-sb-te film, and storage medium
04/04/2012CN102405305A Method for forming metal oxide film, metal oxide film, and apparatus for forming metal oxide film
04/04/2012CN102405304A Ni膜的成膜方法 Ni film forming method
04/04/2012CN102400113A 远程脉冲射频电感耦合放电等离子体增强原子层沉积装置 Remote pulsed RF inductively coupled discharge plasma enhanced atomic layer deposition apparatus
04/04/2012CN102400112A 一种控制工艺腔体内温度的系统 A process chamber temperature control system
04/04/2012CN102400111A 一种lpcvd工艺腔加热系统 One kind lpcvd process chamber heating system
04/04/2012CN102400110A Diversion dustproof gas control tray for vapor deposition and clean production method in vapor deposition furnace
04/04/2012CN102400109A 一种用聚苯乙烯固态碳源低温化学气相沉积生长大面积层数可控石墨烯的方法 A controlled growth of large-area graphene layers deposited by low-temperature chemical vapor polystyrene solid-state carbon
04/04/2012CN102398051A 硬质包覆层发挥优异的耐崩刀性的表面包覆切削工具 The hard coating layer exhibits excellent chipping resistance of the surface-coated cutting tool
04/04/2012CN102398049A 耐崩刀的表面包覆切削工具 Resistance to chipping of the surface coating of the cutting tool
04/04/2012CN101807585B Tft-lcd阵列基板及其制造方法 Tft-lcd array substrate and a method of manufacturing
04/04/2012CN101647104B 成膜装置和成膜方法 Film forming apparatus and film forming method
04/04/2012CN101622376B 使用超临界溶剂在半导体基片上形成金属膜的组合物和方法 Using supercritical solvent compositions and methods for forming a metal film on a semiconductor substrate
04/04/2012CN101597754B 形成高质量的低温氮化硅膜的方法和设备 Methods and apparatus for forming a high quality low temperature silicon nitride film
04/04/2012CN100999811B 掩模、成膜方法、发光装置以及电子设备 Mask film forming method, a light emitting device and an electronic device
04/03/2012US8148012 Active material containing metal with oxygen, nitrogen, carbon and current collector ; irradiating with x-rays
04/03/2012US8147992 AL2O3 ceramic tools with diffusion bonding enhanced layer
04/03/2012US8147969 Substrate with a stack having thermal properties
04/03/2012US8147953 Laminate and process for producing the same
04/03/2012US8147927 Methods of making multilayered structures
04/03/2012US8147909 Method of making and using alloy susceptor with improved properties for film deposition
04/03/2012US8147786 Gas exhaust system of film-forming apparatus, film-forming apparatus, and method for processing exhaust gas
04/03/2012US8147648 Composite showerhead electrode assembly for a plasma processing apparatus
04/03/2012US8147614 Multi-gas flow diffuser
04/03/2012CA2577304C Atmospheric pressure chemical vapor deposition
03/2012
03/29/2012WO2012040482A2 Adapter ring for silicon electrode
03/29/2012WO2012039885A2 System and method for current-based plasma excursion detection
03/29/2012WO2012039867A1 System and method for voltage-based plasma excursion detection
03/29/2012WO2012039833A2 Low temperature silicon carbide deposition process
03/29/2012WO2012039533A1 Graphene structure, method of forming the graphene structure, and transparent electrode including the graphene structure
03/29/2012WO2012039107A1 Thin film production process and thin film production device
03/29/2012WO2012038592A1 Thin film photovoltaic module and process for its production
03/29/2012WO2012038369A1 Unit for the treatment of an object, in particular the surface of a polymer object
03/29/2012WO2012038118A1 Use of diamond-like carbon layers for the application of semiconductor inks free of metal ions
03/29/2012WO2012037729A1 METHOD FOR MANUFACTURING P-TYPE ZnO-BASED MATERIAL
03/29/2012US20120076946 Amorphous Metal Formulations and Structured Coatings for Corrosion and Wear Resistance
03/29/2012US20120076937 Film deposition device and film deposition method
03/29/2012US20120076936 Substrate processing apparatus, gas nozzle and method of processing substrate