Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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04/18/2012 | CN202193842U 薄膜太阳能电池的沉积装置 Depositing a thin film solar cell device |
04/18/2012 | CN202193841U 新型原子层沉积设备 The new atomic layer deposition equipment |
04/18/2012 | CN1890034B 经处理以清除自由碳的半导体衬底加工装置的碳化硅部件 Silicon carbide component to remove free-carbon of the treated semiconductor substrate processing apparatus |
04/18/2012 | CN102422445A Epitaxial wafer for light emitting diode |
04/18/2012 | CN102421938A 表面波等离子体cvd设备以及成膜方法 Surface wave plasma deposition method and apparatus cvd |
04/18/2012 | CN102421937A Bodies coated by sic and method for creating sic-coated bodies |
04/18/2012 | CN102421936A 涂覆用于机械系统的具有高摩擦性能的微机械部件的方法 The method of coating for mechanical systems with micro-mechanical properties of high friction parts |
04/18/2012 | CN102421935A 锶钌氧化物界面 Strontium ruthenium oxide interface |
04/18/2012 | CN102421934A 高产量多晶片外延反应器 Multi-chip high yield epitaxy reactor |
04/18/2012 | CN102420272A 一种太阳能电池钝化层分层镀膜方法和装置 A solar cell passivation layer deposition method and apparatus for a hierarchical |
04/18/2012 | CN102420154A 基板位置检测装置、成膜装置以及基板位置检测方法 A substrate position detection apparatus, a film forming apparatus and a substrate position detection method |
04/18/2012 | CN102420120A 一种进气结构 One kind of intake structure |
04/18/2012 | CN102420109A Method for improving capacitance uniformity of MIM (Metal-Insulator-Metal) device |
04/18/2012 | CN102418143A 一种以H<sub>3</sub>PO<sub>4</sub>腐蚀衬底制备自剥离GaN单晶的方法 A to H <sub> 3 </ sub> PO <sub> 4 </ sub> substrate corrosion self-release preparation of GaN single crystal |
04/18/2012 | CN102418089A 一种三维TiO<sub>2</sub>晶体膜的制备方法 A method for preparing TiO <sub> 2 </ sub> crystal film three-dimensional |
04/18/2012 | CN102418088A PECVD (Plasma Enhanced Chemical Vapor Deposition) cavity with continuous modular design |
04/18/2012 | CN102418087A 一种加热板支撑定位装置 A heating plate support positioning device |
04/18/2012 | CN102418086A 一种实现气体隔离和均匀化的喷淋头装置 An implementation of gas separation and homogenization of the sprinkler system |
04/18/2012 | CN102418085A 一种微纳尺度粉体保护层包裹装置和方法 A micro and nanoscale powders protective layer wrapping apparatus and method |
04/18/2012 | CN102418084A 一种源气隔离的固态源原子层沉积装置和方法 A solid-state source of atomic layer deposition apparatus and method for isolating the gas source |
04/18/2012 | CN102418083A 一种lpcvd工艺中的防污染系统及方法 A process for the anti-pollution system and method lpcvd |
04/18/2012 | CN102418082A 薄膜涂层微纳米织构制备方法及其装置 Nano-textured thin film coating method and apparatus for preparing |
04/18/2012 | CN102418081A Internally-connected PECVD (Plasma Enhanced Chemical Vapor Deposition) cavity |
04/18/2012 | CN102418080A 一种玻璃衬底绒面结构ZnO薄膜的制备方法及其应用 Method for preparing a glass substrate textured structure of ZnO thin films and its application |
04/18/2012 | CN102071405B 一种多晶硅薄膜制备方法 One kind of a method for preparing polycrystalline silicon thin film |
04/18/2012 | CN101896639B Hvpe反应器装置 Hvpe reactor apparatus |
04/18/2012 | CN101857953B Face feed electrode for thin-film solar cell deposition |
04/18/2012 | CN101772833B 气体供给装置 Gas supply means |
04/18/2012 | CN101634014B 通过cvd方法在半导体晶片上沉积层的方法以及用于实施该方法的室 By cvd deposited layer on a semiconductor wafer in a chamber and the method for implementing the |
04/18/2012 | CN101593724B 通孔形成方法 The method for forming the through-hole |
04/18/2012 | CN101542749B 太阳能电池的制造方法及太阳能电池的制造装置 The method of manufacturing apparatus for manufacturing a solar cell and solar cell |
04/18/2012 | CN101506561B 组合式气体分配盘装置 Combined gas distribution plate means |
04/18/2012 | CN101339897B 真空处理装置和真空处理方法 Vacuum processing apparatus and vacuum processing method |
04/18/2012 | CN101310039B 使用含硅前驱物和原子氧进行高质量流体状硅氧化物的化学气相沉积 Silicon containing precursor and atomic oxygen fluid-like high-quality chemical vapor deposition of silicon oxide |
04/18/2012 | CN101195288B 涂层切削刀具刀片 Coated cutting tool insert |
04/18/2012 | CN101194040B 旋转基板支撑件及其使用方法 Rotating the substrate support member and method of use |
04/18/2012 | CN101128402B 薄片的阻挡保护层 Thin layer of barrier protection |
04/17/2012 | US8158217 CNT-infused fiber and method therefor |
04/17/2012 | US8158204 Method of producing thin, poorly soluble coatings |
04/17/2012 | US8158200 Methods of forming graphene/(multilayer) boron nitride for electronic device applications |
04/17/2012 | US8158199 Method for making individually coated and twisted carbon nanotube wire-like structure |
04/17/2012 | US8158198 Method for forming tantalum nitride film |
04/17/2012 | US8158197 Method for forming tantalum nitride film |
04/17/2012 | US8157976 Apparatus for cathodic vacuum-arc coating deposition |
04/17/2012 | US8157953 Plasma processing apparatus |
04/17/2012 | US8157951 Capacitively coupled plasma reactor having very agile wafer temperature control |
04/17/2012 | US8157916 Apparatus for fabricating display device |
04/17/2012 | US8157915 CVD reactor having a process-chamber ceiling which can be lowered |
04/17/2012 | US8156892 Edge profiling for process chamber shields |
04/17/2012 | US8156888 Chemical mechanical vapor deposition device for production of bone substitute material |
04/17/2012 | CA2496627C Method, equipment, and material for creating a surface on a metal |
04/12/2012 | WO2012047945A2 Wear resistant coating, article, and method |
04/12/2012 | WO2012047695A2 Mechanically fluidized reactor systems and methods, suitable for production of silicon |
04/12/2012 | WO2012047531A2 Substrate processing system with multiple processing devices deployed in shared ambient emvironment and associated methods |
04/12/2012 | WO2012046778A1 Method for producing laminate by forming film by means of plasma cvd |
04/12/2012 | WO2012046776A1 Film-formation device and film-formation method |
04/12/2012 | WO2012046676A1 Epitaxial wafer, light-receiving element, optical sensor device, and method for manufacturing epitaxial wafer and light-receiving element |
04/12/2012 | WO2012046675A1 Method for manufacturing semiconductor device and semiconductor device |
04/12/2012 | WO2012021325A3 Plasma deposition of amorphous semiconductors at microwave frequencies |
04/12/2012 | WO2012012744A3 Substrate transport mechanism contacting a single side of a flexible web substrate for roll-to-roll thin film deposition |
04/12/2012 | WO2012010747A8 Method for manufacturing an electrode for medical use, and electrode obtained |
04/12/2012 | US20120088845 Synthesis, capping and dispersion of nanocrystals |
04/12/2012 | US20120088370 Substrate Processing System with Multiple Processing Devices Deployed in Shared Ambient Environment and Associated Methods |
04/12/2012 | US20120088093 Method for coating a sliding element and sliding element, in particular a piston ring |
04/12/2012 | US20120088047 Housing and method for manufacturing same |
04/12/2012 | US20120088038 Method and Device for High-Rate Coating by Means of High-Pressure Evaporation |
04/12/2012 | US20120088031 Gas discharge pipe and associated method |
04/12/2012 | US20120088030 Film forming apparatus, film forming method, and recording medium |
04/12/2012 | US20120087954 Ion substituted calcium phosphate coatings |
04/12/2012 | US20120086107 Semiconductor device manufacturing method, substrate processing apparatus and semiconductor device |
04/12/2012 | US20120085285 Semiconductor growth apparatus |
04/12/2012 | US20120085284 Mechanically fluidized reactor systems and methods, suitable for production of silicon |
04/12/2012 | US20120085283 Correction plate and coating device using same |
04/12/2012 | US20120085278 High productivity thin film deposition method and system |
04/12/2012 | US20120084993 Method and apparatus to condition polymers utilizing multiple processing systems |
04/12/2012 | DE10032210B4 Kondensator für Halbleiterspeicherbauelement und Verfahren zu dessen Herstellung Capacitor for the semiconductor memory device and method for its production |
04/12/2012 | CA2813884A1 Mechanically fluidized reactor systems and methods, suitable for production of silicon |
04/11/2012 | EP2439316A1 Nitride semiconductor crystal and method for manufacturing same |
04/11/2012 | EP2438207A1 Coating installation and coating method |
04/11/2012 | EP2438206A1 Coating installation and method |
04/11/2012 | EP2438205A1 Coating installation and coating method |
04/11/2012 | EP2438204A1 Metal-coated polymer article of high durability and vacuum and/or pressure integrity |
04/11/2012 | EP2437935A1 Metal-clad polymer article |
04/11/2012 | EP2310554B8 Process and installation for depositing films onto a substrate |
04/11/2012 | EP1996988B1 Pressure control system with optimized performance |
04/11/2012 | EP1981822B1 Coated substrates having undercoating layers that exhibit improved photocatalytic activity |
04/11/2012 | CN202187063U 一种沉积工艺腔内的硅片传送装置 A process wafer transfer device deposition chamber |
04/11/2012 | CN202187062U 双面卷对卷真空镀膜设备 Double-sided roll-to-roll vacuum coating equipment |
04/11/2012 | CN1733444B Method for manufacturing forming die for optical element, forming die for optical element and optical element |
04/11/2012 | CN102414824A Ald系统和方法 Ald system and method |
04/11/2012 | CN102414808A 被处理体的输送方法和被处理体处理装置 The method of treating body is transported to be processed and the processing device |
04/11/2012 | CN102414796A 制作晶片产品的方法及制作氮化镓基半导体光元件的方法 The method of production of the product wafer and a method of fabricating a gallium nitride-based semiconductor optical element |
04/11/2012 | CN102414795A Method of deposition of chemical compound semiconductor and device |
04/11/2012 | CN102414782A Preparation unit for lithogrpahy machine |
04/11/2012 | CN102414351A 氮化物半导体基板的制造方法 The method of manufacturing a nitride semiconductor substrate, |
04/11/2012 | CN102414342A 用于在气动传输期间在颗粒上进行原子或分子层沉积的设备和方法 Used during the pneumatic conveying apparatus and method of atomic or molecular layer deposition on the particulate |
04/11/2012 | CN102414341A 涂层方法 Coating Method |
04/11/2012 | CN102412803A 一种AlN薄膜为中间层的高频声表面波器件及制备方法 One kind of AlN thin intermediate layer high-frequency surface acoustic wave devices and preparation methods |
04/11/2012 | CN102412503A 利用两根半导体纳米线耦合的单纵模激光器及制备方法 The use of two semiconductor nanowires coupled single longitudinal mode lasers and preparation methods |
04/11/2012 | CN102412118A 一种预防在热处理时硅消耗的方法 A method of preventing consumption of silicon during the heat treatment |