| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/02/2012 | CN102437071A Vertical heat treatment apparatus |
| 05/02/2012 | CN102437053A Method to increase the compressive stress of PECVD silicon nitride films |
| 05/02/2012 | CN102433586A Method for epitaxial growth of wafer-level graphene on 4H/6H-SiC (0001) surface |
| 05/02/2012 | CN102433562A Optical film processing die and manufacturing method thereof |
| 05/02/2012 | CN102433553A Coating device |
| 05/02/2012 | CN102433552A Reaction gas transmission system |
| 05/02/2012 | CN102433551A Reaction chamber spraying system |
| 05/02/2012 | CN102433550A Method for spraying cracked selenium source on surface of substrate |
| 05/02/2012 | CN102433549A Process of making an optical film by atomic layer deposition (ALD) at atmospheric pressure |
| 05/02/2012 | CN102433548A Uniform gas flow gas inlet device and uniform gas inlet method for vapor deposition |
| 05/02/2012 | CN102433547A Film deposition device and film deposition method |
| 05/02/2012 | CN102433546A Film formation method and film formation apparatus |
| 05/02/2012 | CN102433545A Suede-structured ZnO film prepared by alternative growth technology and application thereof |
| 05/02/2012 | CN102433544A Method for growing large-area graphene by utilizing multi-benzene-ring carbon source low-temperature chemical vapor deposition |
| 05/02/2012 | CN102433543A Multi-deposition-chamber CVI (chemical vapor infiltration) device for compacting carbon/carbon crucible and method using same |
| 05/02/2012 | CN102433542A Preparation method of carbon/aluminium composite material |
| 05/02/2012 | CN102433539A 腔系列 Chamber series |
| 05/02/2012 | CN102433535A Plasma equipment with function of treating coiled circuit board material |
| 05/02/2012 | CN102162115B Color regulation and control method based on porous alumina and single atom deposition technology |
| 05/02/2012 | CN101899652B Gas supply system and method |
| 05/02/2012 | CN101787521B Method for preparing metal sulfide diamond-like carbon composite film |
| 05/02/2012 | CN101582461B Novel multilayer transparent conductive film structure and preparation method thereof |
| 05/02/2012 | CN101454880B Plasma cvd method, method for forming silicon nitride film, method for manufacturing semiconductor device and plasma cvd device |
| 05/02/2012 | CN101403108B Chemical vapor deposition reactor and chemical vapor deposition method |
| 05/02/2012 | CN101403103B Method for aluminising the hollow metal parts of a turbomachine in vapour phase |
| 05/02/2012 | CN101319309B Methods and apparatus for depositing a uniform silicon film with flow gradient designs |
| 05/02/2012 | CN101138900B Coated cutting tool and method for producing the same |
| 05/01/2012 | US8170404 Bubbler for constant vapor delivery of a solid chemical |
| 05/01/2012 | US8169013 Metal-insulator-metal (MIM) capacitor having capacitor dielectric material selected from a group consisting of ZRO2, HFO2, (ZRX, HF1-X)O2 (0<x<1), (ZRy, Ti (O<y<1), (Hfz, Ti-z)O2 (O<z<1) and (Zrk, Ti1, Hfm)O2 (O<K, 1, m<1, K+1+m=1) |
| 05/01/2012 | US8168957 Magnetically enhanced, inductively coupled plasma source for a focused ion beam system |
| 05/01/2012 | US8168270 Film formation method and apparatus for semiconductor process |
| 05/01/2012 | US8168269 Plasma, UV and ion/neutral assisted ALD or CVD in a batch tool |
| 05/01/2012 | US8168268 Thin film deposition via a spatially-coordinated and time-synchronized process |
| 05/01/2012 | US8168256 Formation of selenide, sulfide or mixed selenide-sulfide films on metal or metal coated substrates |
| 05/01/2012 | US8168250 Ejection rate measurement method, ejection rate adjustment method, liquid ejection method, method of manufacturing color filter, method of manufacturing liquid crystal display device, and method of manufacturing electro-optic device |
| 05/01/2012 | US8168128 Plasma reactor |
| 05/01/2012 | US8168002 Device for clamping and positioning an evaporator boat |
| 05/01/2012 | US8168001 Film-forming apparatus and film-forming method |
| 05/01/2012 | US8166914 Plasma processing apparatus of batch type |
| 05/01/2012 | US8166621 Method of stabilizing a frequency of a piezoelectric vibration element |
| 04/26/2012 | WO2012054688A2 Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes |
| 04/26/2012 | WO2012054538A1 Formation of barrier layer on device using atomic layer deposition |
| 04/26/2012 | WO2012054323A1 Deposition of layer using depositing apparatus with reciprocating susceptor |
| 04/26/2012 | WO2012053774A2 Method for performing an antistatic treatment on a surface of a work stage, and work stage to the surface of which an antistatic treatment is applied according to the method |
| 04/26/2012 | WO2012052858A1 Etching of oxide materials |
| 04/26/2012 | WO2012052428A1 Modular coater separation |
| 04/26/2012 | WO2012052182A1 Device and process for coating a substrate |
| 04/26/2012 | WO2012051975A1 Method and device for plasma-treating workpieces |
| 04/26/2012 | WO2012051799A1 Gate dielectric material of high dielectric constant and method for preparing same |
| 04/26/2012 | WO2011152873A3 Glassy calcium phosphate particulates, coatings and related bone graft materials |
| 04/26/2012 | US20120100722 Substrate processing apparatus and semiconductor device manufacturing method |
| 04/26/2012 | US20120100644 Organic layer deposition apparatus, and method of manufacturing organic light-emitting display apparatus using the same |
| 04/26/2012 | US20120100629 Device For Investigating Chemical Interactions And Process Utilizing Such Device |
| 04/26/2012 | US20120100491 Semiconductor Production Equipment Including Fluorine Gas Generator |
| 04/26/2012 | US20120100311 Apparatus for forming deposited film and method for forming deposited film |
| 04/26/2012 | US20120100310 Coating device and coating method |
| 04/26/2012 | US20120100309 Plasma treatment apparatus and plasma cvd apparatus |
| 04/26/2012 | US20120100307 Shower Plate Having Different Aperture Dimensions and/or Distributions |
| 04/26/2012 | US20120100300 Plasma coating system and method for coating or treating the surface of a substrate |
| 04/26/2012 | US20120100292 Gas injection unit and a thin-film vapour-deposition device and method using the same |
| 04/26/2012 | US20120100060 Reactor and method for production of silicon |
| 04/26/2012 | US20120098146 Formation of barrier layer on device using atomic layer deposition |
| 04/26/2012 | US20120098107 Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species |
| 04/26/2012 | US20120097641 Method and device for plasma treatment of a flat substrate |
| 04/26/2012 | US20120097336 Template treatment apparatus and imprint system |
| 04/26/2012 | US20120097328 Apparatus for fabricating semiconductor wafers and apparatus for the deposition of materials by evaporation using a molecular beam |
| 04/26/2012 | US20120097222 Transparent conducting oxide films with improved properties |
| 04/26/2012 | US20120097159 Medicinal inhalation devices and components thereof |
| 04/26/2012 | US20120097106 Physical vapor deposition device for coating workpiece |
| 04/26/2012 | US20120097105 Molecular beam epitaxy apparatus for producing wafers of semiconductor material |
| 04/26/2012 | US20120097104 Rf impedance matching network with secondary dc input |
| 04/26/2012 | US20120097103 Physical vapor deposition device for coating workpiece |
| 04/26/2012 | US20120097102 Apparatus for depositing a thin film of material on a substrate and regeneration process for such an apparatus |
| 04/25/2012 | EP2444997A1 Plasma processing apparatus and plasma processing method |
| 04/25/2012 | EP2444521A1 Gas discharge structure, and device and method for plasma processing |
| 04/25/2012 | EP2444520A1 Dlc film-forming method and dlc film |
| 04/25/2012 | EP2444519A1 Diamond-like carbon thin film containing silicon, preparation method thereof, and use thereof |
| 04/25/2012 | EP2444407A1 Metal compounds for deposition of chalcogenide films at low temperature |
| 04/25/2012 | EP2443274A1 Method for equipping an epitaxy reactor |
| 04/25/2012 | EP2443267A1 Protective coating, a coated member having a protective coating as well as method for producing a protective coating |
| 04/25/2012 | EP2442908A1 Method of surface treating microfluidic devices |
| 04/25/2012 | EP1945831B1 Partition-type heating apparatus |
| 04/25/2012 | CN202205725U 提高硅片背封时硅片厚度均匀性的托盘 When silicon wafers back closure improve thickness uniformity of the tray |
| 04/25/2012 | CN202201975U 设有外支撑的射频连接结构 RF connector provided with an outer support structure |
| 04/25/2012 | CN202201974U 用于气相沉积反应腔的射频连接结构 RF connection structure for vapor deposition reaction chamber |
| 04/25/2012 | CN202201973U 化学气相反应腔内等离子气体管路 Plasma chemical vapor reaction chamber gas line |
| 04/25/2012 | CN202201972U 嵌入式反应腔 Embedded reaction chamber |
| 04/25/2012 | CN202201971U 非晶硅薄膜化学气相沉积系统 The amorphous silicon thin film by chemical vapor deposition system |
| 04/25/2012 | CN202201970U 大容积等离子化学气相沉积反应腔的抽真空系统 Large volume plasma chemical vapor deposition reaction chamber vacuum system |
| 04/25/2012 | CN202201969U 一种反应腔室及应用该反应腔室的等离子体加工设备 A reaction to the reaction chamber and application of plasma processing equipment chamber |
| 04/25/2012 | CN202201968U 用于真空镀膜的嵌入式反应腔 Embedded reaction chamber for vacuum coating |
| 04/25/2012 | CN202201967U 非晶硅薄膜化学气相沉积吹扫装置 The amorphous silicon thin film by chemical vapor deposition apparatus purge |
| 04/25/2012 | CN202201960U 一种真空镀膜机用定位架 A vacuum coating machine with a spacer |
| 04/25/2012 | CN1958878B Method of using film formation apparatus |
| 04/25/2012 | CN1701417B Substrate-processing apparatus and method of producing semiconductor device |
| 04/25/2012 | CN1606145B Particle sticking prevention apparatus and plasma processing apparatus |
| 04/25/2012 | CN102428515A 碳膜的形成方法、磁记录介质的制造方法和碳膜的形成装置 The method for forming the carbon film, a magnetic recording medium manufacturing method and the carbon film forming apparatus |
| 04/25/2012 | CN102428216A MOCVD reactor having a ceiling panel coupled locally differently to a heat dissipation member |
| 04/25/2012 | CN102428210A Mems装置的防腐和润滑 Anti-corrosion and lubricating device Mems |
| 04/25/2012 | CN102428028A 用于硅生长棒的容纳锥形件 For accommodating the growth cone piece of silicon rods |