| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
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| 05/17/2012 | US20120118234 Metal organic chemical vapor deposition equipment |
| 05/17/2012 | US20120118233 Systems for forming semiconductor materials by atomic layer deposition |
| 05/17/2012 | US20120118231 Substrate processing method, storage medium, and substrate processing apparatus |
| 05/17/2012 | US20120118224 Transfer chamber metrology for improved device yield |
| 05/17/2012 | US20120118204 Method for preparing low k material and film thereof |
| 05/16/2012 | EP2453466A1 Vacuum processing apparatus |
| 05/16/2012 | EP2453043A1 Method of manufacturing nitride semiconductor substrate |
| 05/16/2012 | EP2453038A1 Method for coating micromechanical parts with dual diamond coating |
| 05/16/2012 | EP2451989A2 Bis-ketoiminate copper precursors for deposition of copper-containing films |
| 05/16/2012 | EP2451819A1 Solution based precursors |
| 05/16/2012 | EP2334842B1 Apparatus and method for atomic layer deposition |
| 05/16/2012 | DE102011055381A1 Plasmabehandeltes Filter Plasma-treated filter |
| 05/16/2012 | DE102011000092A1 Schichtabscheidesystem,Schichtabscheideverfahren und dabei verwendete Gaszuführungsvorrichtung Schichtabscheidesystem, layer deposition and gas supply apparatus used therein |
| 05/16/2012 | DE102010043949A1 Device for coating of surfaces e.g. metal surface, comprises burner with burner input and burner output having precursor feeding unit for supplying precursor into burner, and gas supply unit for supplying carrier gas and/or fuel gas |
| 05/16/2012 | DE102006043542B4 Verfahren zum Beschichten von Oberflächen A method for coating surfaces |
| 05/16/2012 | CN202220200U Reactor used for chemical vapor deposition process |
| 05/16/2012 | CN202219325U Powder injection mould |
| 05/16/2012 | CN1906326B Thermal chemical vapor deposition of silicon nitride |
| 05/16/2012 | CN102460665A Ge-Sb-Te膜的成膜方法和存储介质 Film-forming method and the storage medium Ge-Sb-Te film |
| 05/16/2012 | CN102460653A 成膜方法、前处理装置和处理系统 Film-forming method, the pretreatment device and processing system |
| 05/16/2012 | CN102460648A Roll-to-roll chemical vapor deposition system |
| 05/16/2012 | CN102460635A 对容器进行等离子体处理的装置和方法 The containers are plasma processing apparatus and method |
| 05/16/2012 | CN102459702A Protective coating, method for protecting a substrate and use for the same |
| 05/16/2012 | CN102459695A Vapor deposition reactor and method for forming thin film |
| 05/16/2012 | CN102459694A 涂布设备和涂布方法 Coating equipment and coating methods |
| 05/16/2012 | CN102459693A 使用有机硅前体的pecvd涂层 Use pecvd coating organosilicon precursors |
| 05/16/2012 | CN102459692A 涂布设备和涂布方法 Coating equipment and coating methods |
| 05/16/2012 | CN102459691A System and method for vapor phase reflow of a conductive coating |
| 05/16/2012 | CN102459688A 保护性涂层、具有保护性涂层的涂覆构件以及生产保护性涂层的方法 Protective coating, coated with a protective coating of components and the production of protective coating method |
| 05/16/2012 | CN102459109A 用于涂覆玻璃基材的方法和设备 Methods and apparatus for coating a glass substrate |
| 05/16/2012 | CN102456777A Manufacturing method of solid semiconductor |
| 05/16/2012 | CN102456546A 对半导体衬底凹陷区进行等离子体放电预处理的方法 Recessed area of the semiconductor substrate plasma discharge pretreatment method |
| 05/16/2012 | CN102456533A 等离子体处理装置及等离子体cvd装置 Plasma processing apparatus and plasma cvd apparatus |
| 05/16/2012 | CN102453913A Method for preparing fullerene-like carbon-based lubrication film material |
| 05/16/2012 | CN102453888A Film deposition apparatus and film deposition method |
| 05/16/2012 | CN102453887A Plasma-assisted atomic layer deposition apparatus and controlling method thereof |
| 05/16/2012 | CN102453886A Film forming method, film forming apparatus, and method for manufacturing a semiconductor device |
| 05/16/2012 | CN102453885A Method and system for cleaning plasma reaction chamber |
| 05/16/2012 | CN102453884A Method for forming an aluminum nitride thin film |
| 05/16/2012 | CN102453883A Method for preparing inner wall coating with barrier action and good biological compatibility |
| 05/16/2012 | CN102453866A High-dielectric-constant gate dielectric material and preparation method thereof |
| 05/16/2012 | CN101958249B Method for improving current carrier migration rate of MOS transistor |
| 05/16/2012 | CN101871097B Simple preparation method of compact PbSe polycrystal film |
| 05/16/2012 | CN101413113B Vertical plasma processing apparatus and use method thereof |
| 05/16/2012 | CN101366099B Placement table construction, and heat treatment equipment |
| 05/16/2012 | CN101358338B Vacuum chucking heater of axisymmetrical and uniform thermal profile |
| 05/16/2012 | CN101276731B Semiconductor manufacturing apparatus, and semiconductor wafer manufacturing method using this apparatus |
| 05/16/2012 | CN101248118B Glazing system for vehicle tops and windows |
| 05/15/2012 | USRE43387 Anchored oxide coatings on hard metal cutting tools |
| 05/15/2012 | US8178820 Method and heat treatment apparatus for uniformly heating a substrate during a bake process |
| 05/15/2012 | US8178819 Thermal flux processing by scanning a focused line beam |
| 05/15/2012 | US8178446 Strained metal nitride films and method of forming |
| 05/15/2012 | US8178170 applying coatings to plastic substrates by plasma enhanced chemical vapor deposition; coatings having hardness and flexibility |
| 05/15/2012 | US8178162 Controlled deposition of silicon-containing coatings adhered by an oxide layer |
| 05/15/2012 | US8177912 Evaporation source and vacuum evaporator using the same |
| 05/15/2012 | US8177901 Porous inorganic materials of silcon and oxygen |
| 05/15/2012 | US8176871 Substrate processing apparatus |
| 05/15/2012 | CA2517598C Method of depositing silicon |
| 05/10/2012 | WO2012061278A1 Radical reactor with multiple plasma chambers |
| 05/10/2012 | WO2012060428A1 (amide amino alkane) metal compound, method of manufacturing metal-containing thin film using said metal compound |
| 05/10/2012 | WO2012060424A1 Gas-barrier laminate film |
| 05/10/2012 | WO2012060379A1 Method for manufacturing semiconductor device, method for processing substrate and apparatus for processing substrate |
| 05/10/2012 | WO2012060023A1 Protective film, magnetic recording medium comprising said protective film, and production method for protective film |
| 05/10/2012 | WO2012059967A1 Sheet-like structure and process for production thereof |
| 05/10/2012 | WO2012059881A1 Bis-pyrroles-2-aldiminate manganese precursors for deposition of manganese containing films |
| 05/10/2012 | WO2012059203A1 Apparatus for treatment of substrates |
| 05/10/2012 | WO2012058828A1 Chemical vapor deposition deviceand cooling box thereof |
| 05/10/2012 | WO2012058822A1 Method for passivating black silicon |
| 05/10/2012 | WO2012040482A3 Adapter ring for silicon electrode |
| 05/10/2012 | WO2012039833A3 Low temperature silicon carbide deposition process |
| 05/10/2012 | WO2011156625A4 Full-enclosure, controlled-flow mini-environment for thin film chambers |
| 05/10/2012 | US20120115402 Chemical mechanical planarization pad conditioner and methods of forming thereof |
| 05/10/2012 | US20120115317 Plasma doping method and apparatus thereof |
| 05/10/2012 | US20120115315 Low temperature gst process |
| 05/10/2012 | US20120115314 Plasma processing apparatus and method of producing amorphous silicon thin film using same |
| 05/10/2012 | US20120114964 Coated-surface sliding part having excellent coating adhesion and method for producing the same |
| 05/10/2012 | US20120114925 Method of fabricating a membrane having a tapered pore |
| 05/10/2012 | US20120114877 Radical Reactor with Multiple Plasma Chambers |
| 05/10/2012 | US20120114868 Method of fabricating a component using a fugitive coating |
| 05/10/2012 | US20120114856 Deposition apparatus |
| 05/10/2012 | US20120114855 Coating installation and coating method |
| 05/10/2012 | US20120114854 Vacuum processing apparatus and vacuum processing method |
| 05/10/2012 | US20120114840 Vacuum vapor deposition system |
| 05/10/2012 | US20120114839 Vacuum vapor deposition system |
| 05/10/2012 | US20120114838 Film formation apparatus |
| 05/10/2012 | US20120114837 Film formation apparatus and film formation method |
| 05/10/2012 | US20120114836 Tpir apparatus for monitoring tungsten hexafluoride processing to detect gas phase nucleation, and method and system utilizing same |
| 05/10/2012 | US20120114834 Automatic stamping method and apparatus based on press roller and pin press |
| 05/10/2012 | US20120114833 Film formation apparatus and film formation method |
| 05/10/2012 | US20120114551 Production of graphene from metal alkoxide |
| 05/10/2012 | US20120111834 Plasma processing apparatus |
| 05/10/2012 | US20120111831 Method of depositing film with tailored comformality |
| 05/10/2012 | US20120111500 Plasma processing apparatus |
| 05/10/2012 | US20120111273 Cooled pvd shield |
| 05/10/2012 | US20120111272 Mocvd single chamber split process for led manufacturing |
| 05/10/2012 | US20120111271 Chemical vapor deposition reactor |
| 05/10/2012 | US20120111270 Plasma processing chamber having enhanced deposition uniformity |
| 05/10/2012 | DE102010052143A1 Tiegel zur Aufnahme eines Werkstoffs, der mit einem CVD- oder PVD-Verfahren verdampft werden soll A crucible for receiving material to be evaporated with a CVD or PVD process |
| 05/10/2012 | DE102010027063A9 Beschichtung zur Umwandlung von Strahlungsenergie Coating for the conversion of radiation energy |
| 05/10/2012 | DE102006043543B4 Homogenisator für der Beschichtung von Oberflächen dienende Gasströme Homogenizer for the coating of surfaces serving gas streams |