| Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892) |
|---|
| 06/06/2012 | EP2459766A1 Process for the preparation of a coated substrate, coated substrate, and use thereof |
| 06/06/2012 | EP2196565B1 Method for producing sic epitaxial substrate |
| 06/06/2012 | EP1951929B1 Composition for chemical vapor deposition film-formation and method for production of low dielectric constant film |
| 06/06/2012 | DE102010062357A1 Vorrichtung und Verfahren zur Herstellung eines mit zumindest einer Korrosionsschutzschicht beschichteten magnesiumhaltigen Substrats Apparatus and method for making a coated with at least one anti-corrosion layer containing magnesium substrate |
| 06/06/2012 | DE10042881B4 CVD-Einrichtung zum Bilden eines Halbleiterfilms auf einem Wafer und Verfahren zum Beurteilen von Wartungszeiten einer CVD- Einrichtung CVD apparatus for forming a semiconductor film on a wafer and method of judging a maintenance time CVD device |
| 06/06/2012 | CN202265608U 防绕射的太阳能电池沉积装置 Solar cell deposition device anti Diffraction |
| 06/06/2012 | CN202265607U 电阻化学气相沉积炉引电极密封装置 Electrode sealing means a chemical vapor deposition furnace induced resistance |
| 06/06/2012 | CN202265606U 金属带材真空密封装置 Vacuum sealing means of the metal strip |
| 06/06/2012 | CN102487106A Crystalline silica solar cell and manufacture method thereof |
| 06/06/2012 | CN102487001A Method for improving uniformity of dielectric layer |
| 06/06/2012 | CN102485953A Pallet device and crystallized film growth device |
| 06/06/2012 | CN102485952A Vaporizing device and vaporization method |
| 06/06/2012 | CN102485951A Method for depositing medium oxide between layers of metal front layer |
| 06/06/2012 | CN102485944A Epitaxial structure having epitaxial defect barrier layer |
| 06/06/2012 | CN102485937A Deposition device and method of film pattern |
| 06/06/2012 | CN102485357A Method and device for cleaning support plate and substrate film-plating device |
| 06/06/2012 | CN102485356A Method for removing contamination particles on electrostatic chuck in process chamber |
| 06/06/2012 | CN101916796B Method for making gradational diffusion photoelectric diode by using MOCVD epitaxial system |
| 06/06/2012 | CN101857952B Reaction chamber heating system of vapor phase deposition device |
| 06/06/2012 | CN101855719B Load lock apparatus and substrate cooling method |
| 06/06/2012 | CN101824606B Vertical shower type MOCVD reactor |
| 06/06/2012 | CN101812671B Gas path device for metal organic chemical vapor deposition equipment |
| 06/06/2012 | CN101802256B Exhaust system structure of film forming apparatus, film forming apparatus and method of disposing of exhaust gas |
| 06/06/2012 | CN101717923B Nonpolar GaN membrane and preparation method thereof |
| 06/06/2012 | CN101606227B Placing bed structure, treating apparatus using the structure, and method for using the apparatus |
| 06/06/2012 | CN101572997B Method for forming conducting wire on insulated heat-conducting metal substrate in a vacuum sputtering way |
| 06/06/2012 | CN101535523B Density-matching alkyl push flow for vertical flow rotating disk reactors |
| 06/06/2012 | CN101514209B Copper precursors for thin film deposition |
| 06/06/2012 | CN101191202B Heating system for metal organic substance chemical gaseous phase deposition device reaction cavity |
| 06/06/2012 | CN101190786B Nano metal particle and its nano carbon tube and its luminous element preparation method |
| 06/05/2012 | US8193623 Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
| 06/05/2012 | US8193473 Uniform temperature heater |
| 06/05/2012 | US8193101 Substrate processing apparatus and semiconductor device manufacturing method for forming film |
| 06/05/2012 | US8193011 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
| 06/05/2012 | US8192808 Using novel insert tube that is strategically positioned within quartz substrate tube during internal vapor deposition; high quality quartz reduces undesirable side effects such as deposition defects, contamination, formation of bubbles |
| 06/05/2012 | US8192793 Coated cutting insert for milling applications |
| 06/05/2012 | US8192576 Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processing |
| 06/05/2012 | US8192548 Arrangement for coating a substrate |
| 06/05/2012 | US8192547 Thermally isolated cryopanel for vacuum deposition systems |
| 06/05/2012 | US8192546 Deposition apparatus |
| 06/05/2012 | US8192545 Film formation apparatus, method for forming film, and method for manufacturing photoelectric conversion device |
| 06/05/2012 | US8192131 Architecture for high throughput semiconductor processing applications |
| 06/05/2012 | US8191505 Process gas introducing mechanism and plasma processing device |
| 06/05/2012 | US8191504 Coating apparatus and methods |
| 05/31/2012 | WO2012071507A1 Colloidal infrared reflective and transparent conductive aluminum-doped zinc oxide nanocrystals |
| 05/31/2012 | WO2012071302A2 Interchangeable pumping rings to control path of process gas flow |
| 05/31/2012 | WO2012071195A1 Extended reactor assembly with multiple sections for performing atomic layer deposition on large substrate |
| 05/31/2012 | WO2012071173A1 Method of forming conformal barrier layers for protection of thermoelectric materials |
| 05/31/2012 | WO2012070560A1 Film-forming apparatus, and method for cleaning film-forming apparatus |
| 05/31/2012 | WO2012069583A1 Apparatus for producing multilayer systems on tape-like substrates |
| 05/31/2012 | WO2012069451A2 Thermal gradient enhanced chemical vapour deposition (tge-cvd) |
| 05/31/2012 | WO2012068782A1 System and method for hydrogen production |
| 05/31/2012 | WO2012047945A3 Wear resistant coating, article, and method |
| 05/31/2012 | WO2012039885A3 System and method for current-based plasma excursion detection |
| 05/31/2012 | WO2012008789A3 Method for producing graphene at a low temperature, method for direct transfer of graphene using same, and graphene sheet |
| 05/31/2012 | WO2012002666A3 Graphene manufacturing apparatus and method |
| 05/31/2012 | US20120135612 Film forming method, pretreatment device, and processing system |
| 05/31/2012 | US20120135544 Method of Fabricating Semiconductor Device and Apparatus for Fabricating the Same |
| 05/31/2012 | US20120135164 Plasma processing apparatus and plasma processing method |
| 05/31/2012 | US20120135163 Method and apparatus for plasma induced coating at low pressure |
| 05/31/2012 | US20120135161 Method for preparing an oriented-porosity dielectric material on a substrate by means of electromagnetic and/or photonic treatment |
| 05/31/2012 | US20120135157 Coating and Ion Beam Mixing Apparatus and Method to Enhance the Corrosion Resistance of the Materials at the Elevated Temperature Using the Same |
| 05/31/2012 | US20120135155 Process chamber component having yttrium-aluminum coating |
| 05/31/2012 | US20120135145 Substrate-processing apparatus and substrate-processing method for selectively inserting diffusion plates |
| 05/31/2012 | US20120135144 Coating device and coating method |
| 05/31/2012 | US20120133868 Polarizing plate, method of manufacturing the same and liquid crystal display employing the same |
| 05/31/2012 | US20120132864 Carbon nanofiber/carbon nanocoil - coated substrate and nanocomposites |
| 05/31/2012 | US20120132723 Method and apparatus for liquid precursor atomization |
| 05/31/2012 | US20120132619 Gas exhaust structure, and apparatus and method for plasma processing |
| 05/31/2012 | US20120132618 Method and apparatus for modulating wafer treatment profile in uv chamber |
| 05/31/2012 | US20120132397 Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow |
| 05/31/2012 | US20120132368 Plasma treatment apparatus |
| 05/31/2012 | US20120132367 Processing apparatus |
| 05/31/2012 | US20120132366 Plasma processing apparatus |
| 05/31/2012 | US20120132353 Graphene Production Using Laser Heated Crystal Growth |
| 05/31/2012 | DE102011009347A1 Verfahren zur Herstellung eines kohlenstoffhaltigen Schichtsystems sowie Vorrichtung zur Durchführung des Verfahrens A process for producing a carbonaceous layer system, and device for carrying out the method |
| 05/31/2012 | DE102010062114A1 Gleitelement, insbesondere Kolbenring, mit einer Beschichtung Sliding element, in particular piston ring with a coating |
| 05/31/2012 | DE102010062082A1 Reinigen von Oberflächen in Vakuumapparaturen mittels Laser Cleaning of surfaces in vacuum apparatus with laser |
| 05/30/2012 | EP2458644A1 Photoelectric converter and method for producing same |
| 05/30/2012 | EP2456906A1 Compositions and methods of use for forming titanium- containing thin films |
| 05/30/2012 | EP1637624B1 Thin film forming apparatus |
| 05/30/2012 | CN202259398U Luminous device |
| 05/30/2012 | CN202246871U Integrated vacuum coating equipment with multi-cavity star-type structure |
| 05/30/2012 | CN202246859U Film solar battery depositing and producing equipment |
| 05/30/2012 | CN202246858U Plasma enhanced chemical vapor deposition equipment |
| 05/30/2012 | CN202246857U Carbon support plate for film coating of silicon chip |
| 05/30/2012 | CN202246856U Chemical vapor film depositing equipment |
| 05/30/2012 | CN202246855U ZnO film depositing equipment |
| 05/30/2012 | CN202246854U Novel plasma reinforced chemical vapor deposition vent hole device |
| 05/30/2012 | CN202246853U Cooling water distributing plate for flat silicon epitaxial furnace |
| 05/30/2012 | CN202246852U Combinative tubular plasma enhanced chemical vapor deposition device |
| 05/30/2012 | CN202246851U Deposition cavity |
| 05/30/2012 | CN202246850U Plasma reactor |
| 05/30/2012 | CN202246849U ZnO film depositing equipment |
| 05/30/2012 | CN202246848U Molybdenum matrix for manufacturing direct-current plasma jet-process diamond thick film |
| 05/30/2012 | CN202246847U Line-column type organic metal compound vapor deposition system |
| 05/30/2012 | CN202246834U Thin-film deposition device and soaking plate |
| 05/30/2012 | CN102484940A 局部等离子体约束和压强控制装置及其方法 Local plasma constraints and pressure control device and method |
| 05/30/2012 | CN102484939A 等离子体处理装置和基板处理方法 The substrate processing apparatus and plasma processing method |
| 05/30/2012 | CN102484049A 半导体元件用外延基板、半导体元件用外延基板的制造方法以及半导体元件 The method of manufacturing an epitaxial substrate for semiconductor device, a semiconductor element and a semiconductor epitaxial substrate elements |