Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2012
06/13/2012EP2463402A1 Apparatus for producing a thin-film lamination
06/13/2012EP2462626A2 Barrier-coated thin-film photovoltaic cells
06/13/2012EP2462612A2 Formation of silicon oxide using non-carbon flowable cvd processes
06/13/2012EP2462256A1 Apparatus
06/13/2012EP2462255A2 Connector for gas or liquid lines and use thereof
06/13/2012EP2462148A1 High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films
06/13/2012EP1516350B1 Plasma processor with electrode simultaneously responsive to plural frequencies
06/13/2012EP1017266B1 System for delivering a substantially constant vapor flow to a chemical process reactor
06/13/2012CN202272949U Control system for plasma chemical vapor deposition device
06/13/2012CN202272948U 一种复合型布气板 A composite type gas distribution plate
06/13/2012CN102498546A Film formation apparatus
06/13/2012CN102498545A Method for manufacturing silicon epitaxial wafer
06/13/2012CN102498237A Improved polyurethane foaming processes and foam properties using halogenated olefin blowing agent
06/13/2012CN102498236A Apparatus and method for atomic layer deposition
06/13/2012CN102498235A Protective film and method for producing same
06/13/2012CN102496658A Preparation method for antireflective film of solar cell
06/13/2012CN102492945A Ice coating prevention surface of bionic micro-nano composite structure and preparation method thereof
06/13/2012CN102492939A Atomic layer deposition apparatus integrated with Fourier transform infrared in-situ monitoring system
06/13/2012CN102492938A Single-contact rotation-revolution base boat
06/13/2012CN102492937A Inlet spray head used for reaction chamber of metal chemical vapor deposition equipment
06/13/2012CN102492936A Method for depositing antireflection film
06/13/2012CN102492935A Treatment method of silicon substrate for preparing GaN epitaxy material with low dislocation density
06/13/2012CN102492934A Apparatus and method used for preparing graphene, and obtained graphene
06/13/2012CN102492933A Two-step growth method for preparing microcrystalline silicon thin film without hatching layer
06/13/2012CN102492932A In-situ surface passivation method in ALD (atomic layer deposition) production of GaAs-based MOS (Metal Oxide Semiconductor) devices
06/13/2012CN101888736B Gas distributor and apparatus using the same
06/13/2012CN101836284B Plasma processing apparatus and gas exhaust method
06/13/2012CN101815807B Methods of preparing thin films by atomic layer deposition using monocyclopentadienyl trialkoxy hafnium and zirconium precursors
06/13/2012CN101785089B Vaporizer, material gas supply system including vaporizer and film forming apparatus using such system
06/13/2012CN101499415B Method for producing group III nitride-based compound semiconductor, wafer, and group III nitride-based compound semiconductor device
06/13/2012CN101448740B Amorphous carbon film, method for forming amorphous carbon film, electroconductive member comprising amorphous carbon film, and separator for fuel battery
06/13/2012CN101429649B Producing method of semiconductor device and substrate processing apparatus
06/13/2012CN101355018B Gas-tight module and exhaust method therefor
06/13/2012CN101333666B Plasma generating method, cleaning method, substrate processing method
06/12/2012US8197915 Method of depositing silicon oxide film by plasma enhanced atomic layer deposition at low temperature
06/12/2012US8197912 Precision separation of PV thin film stacks
06/12/2012US8197900 Coating method and coating apparatus
06/12/2012US8197898 Method and system for depositing a layer from light-induced vaporization of a solid precursor
06/12/2012US8197721 Thermochromic coatings II
06/12/2012US8197638 Semiconductor manufacturing device and method for manufacturing semiconductor devices
06/12/2012US8197636 Systems for plasma enhanced chemical vapor deposition and bevel edge etching
06/12/2012US8197635 Plasma processing apparatus including etching processing apparatus and ashing processing apparatus and plasma processing method using plasma processing apparatus
06/12/2012US8197634 Plasma processing apparatus
06/12/2012US8197603 Method and apparatus for treating a substrate with dense fluid and plasma
06/12/2012US8197601 Vaporizer, vaporization module and film forming apparatus
06/12/2012US8197600 Vaporizer and semiconductor processing system
06/12/2012US8197599 Gas head and thin-film manufacturing apparatus
06/12/2012US8197597 Gallium trichloride injection scheme
06/12/2012US8197591 Pearlescent pigments having a secondary coating comprising α-silanes and method for the production thereof
06/12/2012US8196600 High-temperature jointed assemblies and wear-resistant coating systems therefor
06/12/2012CA2622895C High performance alloys with improved metal dusting corrosion resistance
06/12/2012CA2512731C High-speed diamond growth using a microwave plasma in pulsed mode
06/07/2012WO2012075017A2 Apparatus and process for atomic layer deposition
06/07/2012WO2012073938A1 Method for manufacturing semiconductor device, method for processing substrate, and apparatus for processing substrate
06/07/2012WO2012073384A1 Plasma cvd device, magnetic recording medium and method for manufacturing same
06/07/2012WO2012072483A1 Sliding element, in particular a piston ring, having a coating
06/07/2012WO2012072246A1 Apparatus for coating a substrate
06/07/2012WO2012072215A1 Method for producing a carbon-containing layer system and apparatus for implementing the method
06/07/2012WO2012071929A1 Tray device and crystal membrane growth apparatus
06/07/2012WO2012071902A1 Preprocessing equipment and preprocessing method thereof
06/07/2012WO2012054688A3 Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes
06/07/2012WO2012033717A3 Embedded catalyst for atomic layer deposition of silicon oxide
06/07/2012WO2012031238A3 Uniform multilayer graphene by chemical vapor deposition
06/07/2012WO2011117234A3 Method for the supply of fluorine
06/07/2012US20120142197 Combinatorial process system
06/07/2012US20120142172 Pecvd deposition of smooth polysilicon films
06/07/2012US20120142138 Deposition box for silicon-based thin film solar cell
06/07/2012US20120142137 Movable jig for silicon-based thin film solar cell
06/07/2012US20120141818 Metal-resin composite, method for producing the same, busbar, module case, and resinous connector part
06/07/2012US20120141800 Method for coating micromechanical components of a micromechanical system, in particular a watch and related micromechanical coated component
06/07/2012US20120141783 Aluminum oxide coated body and method for the production thereof
06/07/2012US20120141766 Biaxially oriented cavitated polylactic acid film
06/07/2012US20120141700 Graphene structure and method of fabricating the same
06/07/2012US20120141693 Ion sources, systems and methods
06/07/2012US20120141677 Method of manufacturing thin film
06/07/2012US20120141676 Ald coating system
06/07/2012US20120141675 Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films
06/07/2012US20120141674 Evaporator and method for depositing organic material
06/07/2012US20120141667 Methods for forming barrier/seed layers for copper interconnect structures
06/07/2012US20120141666 Transparent carbon nanotube electrode using conductive dispersant and production method thereof
06/07/2012US20120141658 Coating method for spacers of liquid crystal substrate and manufacturing method for liquid crystal substrate
06/07/2012US20120141657 Apparatus and method for adjusting the track of a granule-coated sheet
06/07/2012US20120139416 Clamping unit for depositing thin film solar cell and signal feed-in method
06/07/2012US20120138952 High pressure chemical vapor deposition apparatuses, methods, and compositions produced therewith
06/07/2012US20120138849 Composite material for storing heat energy at high temperatures
06/07/2012US20120138526 Product for removing pollutants from a fluid, and method for producing same
06/07/2012US20120138472 Method of forming a process chamber component having electroplated yttrium containing coating
06/07/2012US20120138230 Systems and methods for moving web etch, cvd, and ion implant
06/07/2012US20120137976 Hot zone device
06/07/2012US20120137975 Gas flow guiding device for use in crystal-growing furnace
06/07/2012US20120137974 Method and Apparatus For Application of Metallic Alloy Coatings
06/07/2012US20120137973 Substrate processing apparatus and film forming system
06/06/2012EP2461373A1 Transparent conductive substrate for solar cells, and solar cell
06/06/2012EP2461372A1 Transparent conductive substrate for solar cell, and solar cell
06/06/2012EP2460914A1 Group iii nitride crystal and production method thereof
06/06/2012EP2460807A1 Metal-enolate precursors for depositing metal-containing films
06/06/2012EP2460179A2 Light-up prevention in electrostatic chucks
06/06/2012EP2459771A1 Coated cutting tool insert for turning of steels
06/06/2012EP2459768A1 Apparatus and method for atomic layer deposition
06/06/2012EP2459767A1 Cleaning of a process chamber