Patents for C23C 16 - Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (cvd) processes (71,892)
06/2012
06/21/2012US20120153265 Solid solution inducing layer for weak epitaxy growth of non-planar phthalocyanine
06/21/2012US20120153048 Method and apparatus to help promote contact of gas with vaporized material
06/21/2012US20120152294 Thermoelectric material including coating layers, method of preparing the thermoelectric material, and thermoelectric device including the thermoelectric material
06/21/2012US20120152172 Gas-discharging device and substrate-processing apparatus using same
06/21/2012US20120152171 Gas injection apparatus and substrate processing apparatus using same
06/21/2012US20120152170 Method of manufacturing semiconductor device and substrate processing apparatus
06/21/2012US20120152169 Plasma deposition device
06/21/2012US20120152168 Semiconductor device having oxidized metal film and manufacture method of the same
06/21/2012DE112010003311T5 Verfahren zur Herstellung von Silizium-Epitaxiewafern Process for the preparation of silicon epitaxial wafers
06/21/2012DE112010003306T5 Verfahren zur Herstellung eines epitaktischen Siliziumwafers A method for producing an epitaxial silicon wafer
06/21/2012DE102010055155A1 Verfahren zur Plasmabehandlung von Werkstücken sowie Werkstück mit Gasbarriereschicht Method for plasma treatment of workpieces and workpiece having a gas barrier layer
06/21/2012DE102010054854A1 Strukturiertes Colorshift-Sicherheitselement Structured color shift security element
06/20/2012EP2466665A1 Hybrid layers for use in coatings on electronic devices or other articles
06/20/2012EP2466633A1 High efficiency electrostatic chuck assembly for semiconductor wafer processing
06/20/2012EP2465972A2 Method and system for thin film deposition
06/20/2012EP2465971A2 Apparatus for forming layer
06/20/2012EP2465970A1 Diamond-coated tool
06/20/2012EP2465861A1 Amino vinylsilane precursors for compressively stressed SiN films
06/20/2012EP2465832A2 Method and device for manufacturing an anti-reflective coating
06/20/2012EP2464761A1 Sliding element, in particular a piston ring, having a coating
06/20/2012EP2464760A1 High pressure chemical vapor deposition apparatuses, methods, and compositions produced therewith
06/20/2012EP2464652A2 Hafnium- and zirconium-containing precursors and methods of using the same
06/20/2012EP2242870B1 Method using new metal precursors containing beta-diketiminato ligands
06/20/2012EP1807371B1 Method for producing a glass-ceramic article with barrier layer
06/20/2012EP1269528B1 Method of forming a dielectric film
06/20/2012CN202279857U 等离子辅助化学气相沉积设备 Plasma assisted chemical vapor deposition apparatus
06/20/2012CN202279856U 双波纹管结构的化学气相沉积设备 Chemical vapor deposition apparatus dual bellows configuration
06/20/2012CN1936073B Method of coating a substrate for adhesive bonding
06/20/2012CN1934287B Apparatuses and methods for atomic layer deposition of hafnium-containing high-k dielectric materials
06/20/2012CN102511075A Epitaxial substrate and method for producing same
06/20/2012CN102505115A Vacuum coating apparatus
06/20/2012CN102505114A Preparation method of graphene on SiC substrate based on Ni film-aided annealing
06/20/2012CN102505113A Preparation method of large-area graphene based on Cl2 reaction
06/20/2012CN102505112A Device and method for sticking graphene film
06/20/2012CN102505111A Method for preparing carbon nano-fiber thin film in one step by using copper substrate
06/20/2012CN102505107A Process method for plating film on surface of wooden pencil
06/20/2012CN101958284B Method for improving current carrier migration rate of MOS transistor
06/20/2012CN101919028B Polysilicon deposition apparatus
06/20/2012CN101910459B Film forming method and film forming apparatus
06/20/2012CN101796618B Method and apparatus for diagnosing status of parts in real time in plasma processing equipment
06/20/2012CN101770971B Wafer bearing device
06/20/2012CN101720363B Showerhead electrode assemblies for plasma processing apparatuses
06/20/2012CN101715602B Film forming method and film forming apparatus
06/20/2012CN101688303B Vacuum processing system
06/20/2012CN101608533B Drill bit impregnated with diamond film and manufacturing method thereof
06/20/2012CN101567230B Preparation method of transparent conductive thin film
06/20/2012CN101328578B Plasma reinforcement cyclic deposition method for depositing a metal silicon nitride film
06/19/2012US8203103 Plasma arc coating system and method
06/19/2012US8202809 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus
06/19/2012US8202621 Opaque low resistivity silicon carbide
06/19/2012US8202575 Vapor deposition systems and methods
06/19/2012US8202574 Process for the vapor phase aluminization of a turbomachine metal part and donor liner and turbomachine vane comprising such a liner
06/19/2012US8202565 Flux spraying system and method
06/19/2012US8202393 Alternate gas delivery and evacuation system for plasma processing apparatuses
06/19/2012US8202368 Apparatus and methods for manufacturing thin-film solar cells
06/19/2012US8202367 Atomic layer growing apparatus
06/19/2012US8202366 Atomic layer deposition system utilizing multiple precursor zones for coating flexible substrates
06/14/2012WO2012079066A2 Method for producing graphene oxide with tunable gap
06/14/2012WO2012078464A2 Article and method of making and using the same
06/14/2012WO2012078139A1 Process for manufacturing electro-mechanical systems
06/14/2012WO2012077680A1 Method for producing substrate, method for producing semiconductor device, and substrate treatment device
06/14/2012WO2012077513A1 Group iii nitride semiconductor device and method for producing same
06/14/2012WO2012077401A1 Method for manufacturing solar cell
06/14/2012WO2012077071A1 Apparatus and method for depositing a layer onto a substrate
06/14/2012WO2012076817A1 Method for producing lithium-based layers by cvd
06/14/2012WO2012076146A1 Rear-side cover of a photovoltaic module
06/14/2012WO2012075992A2 Process and apparatus for applying layers to a component
06/14/2012WO2012053774A3 Method for performing an antistatic treatment on a surface of a work stage, and work stage to the surface of which an antistatic treatment is applied according to the method
06/14/2012WO2012005983A3 Precise temperature control for teos application by heat transfer fluid
06/14/2012US20120149213 Bottom up fill in high aspect ratio trenches
06/14/2012US20120149212 Cvd method and cvd reactor
06/14/2012US20120149210 Systems, apparatuses, and methods for chemically processing substrates using the coanda effect
06/14/2012US20120149182 Dopant Applicator System and Method of Applying Vaporized Doping Compositions to PV Solar Wafers
06/14/2012US20120149176 Method and apparatus for forming a iii-v family layer
06/14/2012US20120148871 Magnesium Components with Improved Corrosion Protection
06/14/2012US20120148769 Method of fabricating a component using a two-layer structural coating
06/14/2012US20120148763 Surface wave plasma cvd apparatus and layer formation method
06/14/2012US20120148762 Nanocomposites containing nanodiamond
06/14/2012US20120148761 Integrated microwave wave guide with impedance transition
06/14/2012US20120148756 Method of producing compound nanorods and thin films
06/14/2012US20120148746 Method of manufacturing thin film
06/14/2012US20120148745 Aminovinylsilane for CVD and ALD SiO2 Films
06/14/2012US20120148744 Substrate processing apparatuses and systems
06/14/2012US20120148743 Method and apparatus for depositing led organic film
06/14/2012US20120148742 Combinatorial site-isolated deposition of thin films from a liquid source
06/14/2012US20120148728 Methods and apparatus for the production of high purity silicon
06/14/2012US20120148726 Alignment film printing method of lcd substrate and device thereof
06/14/2012US20120148475 Augmented reactor for chemical vapor deposition of ultra-long carbon nanotubes
06/14/2012US20120146500 Luminescent element, preparation method thereof and luminescence method
06/14/2012US20120146191 Apparatus and method for manufacturing compound semiconductor, and compound semiconductor manufactured thereby
06/14/2012US20120145215 Thermoelectric module and method of sealing the same
06/14/2012US20120145184 Self-cleaning catalytic chemical vapor deposition apparatus and cleaning method thereof
06/14/2012US20120145080 Substrate support unit, and apparatus and method for depositing thin layer using the same
06/14/2012US20120145079 Loadlock batch ozone cure
06/14/2012US20120145078 Showerhead integrating intake and exhaust
06/14/2012US20120145041 Methods and apparatus for particle processing
06/14/2012DE102011005834A1 Monitoring plasma or flame at atmospheric pressure, comprises measuring optical emission of plasma or flame by spectrometer and determining based on characteristics of plasma or flame, and using intensity-calibrated spectrometer
06/14/2012CA2757187A1 Augmented reactor for chemical vapor deposition of ultra-long carbon nanotubes
06/13/2012EP2463404A1 Aminovinylsilane for cvd and ald sio2 films
06/13/2012EP2463403A1 Product having functional layer and method for fabricating the same