Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2000
03/16/2000WO2000014017A1 Method for preparing suspensions and powders based on indium tin oxide and the use thereof
03/16/2000WO2000013860A1 Blades for cutting moving lines of material
03/16/2000DE19839299C1 Verfahren zum Herstellen einer elektrochromen Schicht A method for producing an electrochromic layer
03/15/2000EP0986091A2 Time of flight energy measurement apparatus for an ion beam implanter
03/15/2000EP0985745A1 Bond coat for a thermal barrier coating system
03/15/2000EP0985058A2 Stress tunable tantalum and tantalum nitride films
03/15/2000EP0985057A1 Method of forming diamond-like carbon coating in vacuum
03/15/2000EP0984877A1 Wiper blade rubber with a protective layer
03/15/2000EP0984876A1 Method for coating a rubber wiper blade
03/14/2000US6038525 Process control for pulsed laser deposition using raman spectroscopy
03/14/2000US6037313 Method and apparatus for depositing superconducting layer onto the substrate surface via off-axis laser ablation
03/14/2000US6037257 Sputter deposition and annealing of copper alloy metallization
03/14/2000US6037241 Apparatus and method for depositing a semiconductor material
03/14/2000US6037006 Using holder having plurality of web slats including device-engaging surfaces, the web slats movable in a pair of channels, the plurality of web slats secured at a first end of the channels, inserting a device to be coated
03/14/2000US6036828 Apparatus for steering the arc in a cathodic arc coater
03/14/2000US6036822 Thin-film solar cell manufacturing apparatus and manufacturing method
03/14/2000US6036821 Enhanced collimated sputtering apparatus and its method of use
03/14/2000US6036741 Process for producing high-purity ruthenium
03/14/2000US6035805 Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment
03/14/2000US6035804 Process chamber apparatus
03/14/2000CA2176906C Article having a protective coating simulating brass
03/09/2000WO2000013235A1 Ternary nitride-carbide barrier layers
03/09/2000WO2000013219A1 Apparatus for plasma processing
03/09/2000WO2000012775A1 Method and device for coating substrates in a vacuum
03/09/2000WO2000012774A1 Method for producing an electrochromic layer
03/09/2000WO2000012445A1 Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass and transparent electroconductive film
03/09/2000WO1999065800A3 Method and device for processing components
03/09/2000WO1999063127A3 Composition for production of a protective gradient coating on a metal substrate by electron beam evaporation and condensation under vacuum
03/09/2000DE19840951A1 Rakelstange für eine Beschichtungsvorrichtung Doctor rod for a coating device
03/09/2000DE19840950A1 Messer zum Schneiden laufender Materialbahnen Knife for cutting running webs
03/09/2000DE19840527A1 Production of indium-tin oxide suspensions and powders for production of coatings for microelectronic and optical products comprises precipitation and processing in presence of surface modifying agent
03/09/2000DE19839898A1 Apparatus for vertical transport of disk-shaped substrates comprises pivotable vertical shafts which are uniformly distributed on a circular and are provided with several flange-like elements with cut-off segments
03/08/2000EP0984076A1 Apparatus for coating substrates in a vacuum chamber
03/08/2000EP0984075A1 Film deposition apparatus or artificial lattice multi-layered film
03/08/2000EP0983608A2 Aluminum deposition shield
03/08/2000EP0983454A1 A sealing system
03/08/2000EP0983394A1 Method and apparatus for low pressure sputtering
03/08/2000EP0983393A1 Multilayered coated cutting tool
03/08/2000EP0729302B1 Anti-microbial materials
03/08/2000CN1050158C Method and apparatus for treating surface
03/07/2000US6033923 An optical constant such as a refractive index of the tin film is measured. if the refractive index relative to light having a wavelength of 700 nm is 2.0 or smaller, it is judged that a nitridation degree of the tin film is sufficiently high
03/07/2000US6033790 Protective coating having improved acid resistance comprising: nickel layer; layer comprised of zirconium, titanium or zirconium-titanium alloy; sandwich layer
03/07/2000US6033783 Ultrafine Al particle and production method thereof
03/07/2000US6033768 Hard material coating with yttrium and method for its deposition
03/07/2000US6033741 Thin film forming apparatus using laser
03/07/2000US6033734 Method of coating metallic and ceramic substrates
03/07/2000US6033620 Capable of retarding nodule formation, or particle generation.
03/07/2000US6033586 Apparatus and method for surface treatment
03/07/2000US6033582 Irregularly etched medical implant device is provided having random non-uniform relief patterns on the surface; roughened surface amenable to bioadhesion
03/07/2000US6033542 Electrode and its fabrication method for semiconductor devices, and sputtering target for forming electrode film for semiconductor devices
03/07/2000US6033541 Deposition process for coating or filling re-entry shaped contact holes
03/07/2000US6033538 Magneto-optical recording medium production method
03/07/2000US6033537 Sputtering target and method of manufacturing a semiconductor device
03/07/2000US6033536 Magnetron sputtering method and sputtering target
03/07/2000US6033535 Optical information recording disk and method for manufacturing the same
03/07/2000US6033533 Method of forming films over inner surface of cylindrical member
03/07/2000US6033532 Oxide film fabrication method and electronic device
03/07/2000US6033483 Electrically insulating sealing structure and its method of use in a high vacuum physical vapor deposition apparatus
03/02/2000WO2000011721A1 Electronic devices with barrier film and process for making same
03/02/2000WO2000011667A1 Hard disk vapor lube
03/02/2000WO2000011237A1 Drive mechanism for vacuum device and vacuum device
03/02/2000DE19940065A1 Slide element, e.g. an i. c. engine piston ring, has a slide surface with an ion plated chromium nitride coating containing boron for increased abrasion and wear resistance
03/02/2000DE19940064A1 Slide element, e.g. an i. c. engine piston ring, has a slide surface with an ion plated chromium nitride coating containing boron for increased detachment resistance
03/02/2000DE19639240C2 Magnetronzerstäubungsquelle und deren Verwendung Magnetron sputtering and the use thereof
03/01/2000EP0982604A2 Method for manufacturing optical filter
03/01/2000EP0982432A2 Method of dyeing plastic lens and a dyeing system used therein
03/01/2000EP0982411A2 Evaporation source, apparatus and method for the preparation of organic EL device
03/01/2000EP0981440A1 Multi-layer, drawn, heat-sealable, vacuum-plated polypropylene film
03/01/2000EP0550630B1 Abrasion wear resistant coated substrate product
03/01/2000CN1049924C Sealing device for inlet or outlet of atmosphere equipment
02/2000
02/29/2000US6031694 Magnetic head with protective film comprising amorphous CaMgSi2 b. O.su6, Mg2 SiO4 and/or MgAl2 O4
02/29/2000US6031290 Electronic circuit
02/29/2000US6031239 Filtered cathodic arc source
02/29/2000US6030514 Method of reducing sputtering burn-in time, minimizing sputtered particulate, and target assembly therefor
02/29/2000US6030511 Collimated sputtering method and system used therefor
02/29/2000US6030510 Hot reflow sputtering method and apparatus
02/29/2000US6030507 Reacting an indium/tin alloy melt and oxygen gas in a plasma arc of a plasma chamber and blast-cooling the resultant crystalline indium tin oxide in an indium matrix in a high velocity gas stream to form the powder;
02/29/2000US6030458 Cell for providing pure phosphorus vapor from solid phosphorus, where vacuum jacket encloses and supports an inner compartment containing a red phosphorus crucible, a condensing crucible for white phosphorus, a heater, a cracking tube
02/29/2000US6030455 Substrate holder
02/24/2000WO1998048168A3 In situ getter pump system and method
02/24/2000DE19924174A1 Composite material, e.g. high speed milling tool insert, electrical component or wear or heat protective component, comprises a microwave sintered cermet or hard metal with a modified surface layer and a lower density core
02/24/2000DE19853121C1 Treatment of substrates made of insulating materials in high-frequency plasmas involves production of a thin electrically conductive surface layer and using this layer as a high-frequency discharge electrode
02/24/2000DE19837715A1 High dielectric constant, low dielectric loss ceramic material, used as a charge storage material for DRAMs, comprises a mixture of strontium titanate and lead-magnesium niobate
02/24/2000DE19836125A1 Zerstäubungsvorrichtung mit einer Kathode mit Permanentmagnetanordnung Sputtering with a cathode with permanent magnet arrangement
02/23/2000EP0981171A2 Process for fabricating device comprising lead zirconate titanate
02/23/2000EP0981150A2 Device for depositing thin layers on substrates
02/23/2000EP0981044A2 Black roll for optical measurement, and apparatus and method for producing a thin film using such a roll
02/23/2000EP0980534A1 Transparent substrate provided with a stack of layers reflecting thermal radiation
02/23/2000EP0980272A1 Calcium-phosphate coated implant element
02/23/2000EP0776383A4 Electrochromic materials and devices, and method
02/23/2000EP0759893A4 Coating of substrates
02/22/2000US6028003 Method of forming an interconnect structure with a graded composition using a nitrided target
02/22/2000US6027796 Mesoporous ceramic film with one dimensional through channels and process for its production
02/22/2000US6027792 Coating film excellent in resistance to halogen-containing gas corrosion and halogen-containing plasma corrosion, laminated structure coated with the same, and method for producing the same
02/22/2000US6027766 Annealing the a glass float ribbon having a protective coating of tin and a vapor-deposited overcoating of a titanium dioxide precursor to produce a dimensiaonally-stable oxidation catalyst
02/22/2000US6027621 Thin film forming apparatus
02/22/2000US6027619 Fabrication of field emission array with filtered vacuum cathodic arc deposition
02/22/2000US6027618 Compact in-line film deposition system
02/22/2000US6026763 Thin-film deposition apparatus using cathodic arc discharge
02/22/2000US6026557 Method for laser bar facet coating
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