Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2000
04/06/2000WO2000019483A1 Vacuum treatment chamber and method for treating surfaces
04/06/2000WO2000018980A1 An in-line sputter deposition system
04/06/2000WO2000018979A1 Sputter deposition apparatus
04/06/2000WO2000018978A1 Apparatus and method for producing plane-parallel flakes
04/05/2000EP0991085A1 Corrosion-resisting permanent magnet and method for producing the same
04/05/2000EP0990716A1 Thermal barrier coating
04/05/2000EP0990715A1 Belt-type vapour deposition unit for the production of plane-parallel lamina
04/05/2000EP0990710A1 Magnesium alloy forging material and forged member, and method for manufacturing the forged member
04/05/2000EP0990251A2 Central coil design for ionized metal plasma deposition
04/05/2000EP0990061A1 Method and device for vacuum-coating a substrate
04/05/2000EP0989914A1 Multilayer metalized composite on polymer film product and process
04/05/2000EP0783596B1 Composite body, use of this composite body and process for its preparation
04/05/2000CN1249359A Vapor-deposited coating device for vacuum vapor-deposited coating apparatus
04/05/2000CN1249358A Vaporizing body
04/05/2000CN1249355A Magnesium alloy forged material and member, and method for mfg. forged member
04/04/2000US6046546 Stabilizer for switch-mode powered RF plasma
04/04/2000US6046403 Solar battery module
04/04/2000US6045713 Forming an underlying metal layer on an insulation film with a deposition layer formed by dry plating and a copper deposition layer formed by dry plating; applying a surface treatment using an alkaline solution; adhesive-free; defects
04/04/2000US6045672 Sputtering apparatus
04/04/2000US6045671 Systems and methods for the combinatorial synthesis of novel materials
04/04/2000US6045670 Back sputtering shield
04/04/2000US6045667 Process and system for the treatment of substrates using ions from a low-voltage arc discharge
04/04/2000US6045666 Hole is first filled with a barrier film comprising a layer of titanium nitride, conductive aluminum is coated into the hole with an ionized metal process in presence of high density plasma, then filled the hole using low density plasma
04/04/2000US6045665 Efficiently prevents peeling of deposits formed on the surface of the inner walls of the thin-film formation apparatus and suppresses particle production without contaminating the inside of the thin-film forming device
04/04/2000US6045634 High purity titanium sputtering target and method of making
04/04/2000US6044576 Vacuum processing and operating method using a vacuum chamber
04/04/2000US6044534 Semiconductor device manufacturing machine and method for manufacturing a semiconductor device by using the same manufacturing machine
03/2000
03/30/2000WO2000018198A1 Substrate electrode plasma generator and substance/material processing method
03/30/2000WO2000017905A1 Ion implantation device arranged to select neutral ions from the ion beam
03/30/2000WO2000017414A1 Tantalum films and methods for their deposition
03/30/2000WO2000005745A8 Physical vapor processing of a surface with non-uniformity compensation
03/30/2000WO2000004575A3 Collimated sputtering of semiconductor and other films
03/30/2000DE19936199A1 Plasma reactor has an electromagnet coil arranged around the antenna neighboring the substrate with a current supply connected to the coil
03/30/2000DE19850217C1 Coating of substrates in vacuum involves using a porous target which also functions for intermediate storage and/or passage of a gas or a gas mixture being supplied to the plasma
03/30/2000DE19844357A1 Bandbedampfungsanlage zur Herstellung von planparallelen Plättchen Strip vapor for the production of plane-parallel plates
03/30/2000DE19843819A1 Verdampferkörper Evaporator body
03/30/2000DE19843818A1 Bedampfungsvorrichtung für Vakuum-Bedampfungsanlagen Evaporating apparatus for vacuum vapor deposition
03/30/2000DE19833590C1 Verfahren zur Verschweißung eines ausgedehnten optischen Bauteils an eine Metallbefestigung, deren Verwendung sowie die optische Baugruppe Method for welding an extended optical component to a metal attachment, their use, and the optical assembly
03/29/2000EP0989201A1 Evaporator body
03/29/2000EP0989200A1 Evaporation device
03/29/2000EP0988412A1 Surface coatings
03/29/2000EP0988406A1 Method for making a non-sticking diamond like nanocomposite
03/29/2000EP0902843B1 Method for making a thin film of solid material, and uses thereof
03/29/2000CN2371198Y Magnetic controlled sputtering target chamber device
03/29/2000CN2371197Y Bias heat evaporator for vacuum coating film/depositing
03/29/2000CN1248640A Cathode sputterion device with permanent magnet structure
03/29/2000CN1248589A Resin case hardening process, case hardened resin and productive equipment and resin substrate
03/29/2000CN1050864C Sputtertarget for production of transparent conducting layer through cathode sputter
03/28/2000US6043437 Alumina insulation for coating implantable components and other microminiature devices
03/28/2000US6043137 Getter pump module and system
03/28/2000US6042950 Two stacked metal layers, first of nickel alloy, second of silver or alloy
03/28/2000US6042929 Multilayer metalized composite on polymer film product and process
03/28/2000US6042898 Cleaning oxides from a deposited m(ni,co,fe)craly bond coat on a superalloy substrate using an electric current; forming an adherent aluminum oxide scale and then a ceramic layer; blades, vanes of aircraft gas turbine engines
03/28/2000US6042878 Coating thermal insulating layer onto substrate by vapor deposition of a high purity, low density, yttria stabilized zirconia ceramic fired at low temperature
03/28/2000US6042777 Manufacturing of high density intermetallic sputter targets
03/28/2000US6042752 Tin oxide containing gallium oxide and indium oxide; wear resistance
03/28/2000US6042707 Multiple-coil electromagnet for magnetically orienting thin films
03/28/2000US6042706 Ionized PVD source to produce uniform low-particle deposition
03/28/2000US6042700 In first interval, sputtering material primarily from first disk-shaped target onto workpiece, in second interval sputtering from second ring-shaped target which is coil coupling radio frequency energy
03/28/2000US6042652 Atomic layer deposition apparatus for depositing atomic layer on multiple substrates
03/28/2000US6041735 Inductively coupled plasma powder vaporization for fabricating integrated circuits
03/23/2000WO2000016373A1 Target array for an arc vapor deposition chamber
03/23/2000WO2000015883A1 Effusion cell and method of use in molecular beam epitaxy
03/23/2000WO2000015864A1 Laser heater
03/23/2000WO2000015863A1 Low temperature sputter target bonding method and target assemblies produced thereby
03/23/2000WO2000015350A1 Reusable mask and method for coating substrate
03/23/2000WO1999058736A3 Zinc-tin alloy sputtering target
03/23/2000DE19944039A1 Blank for a phase shift photomask, useful in photolithographic circuit pattern transfer onto wafers, is produced by thin film reactive sputter deposition on a substrate moved repeatedly past a target
03/23/2000DE19842576A1 Non-contact coating of bulk materials in powder or granule form with multilayers takes place in vacuum or gas as they fall or fly past metallic vapor deposition sources
03/23/2000CA2342930A1 Reusable mask and method for coating substrate
03/22/2000EP0987774A2 An electrode having enhanced hole injection
03/22/2000EP0987700A1 Device and method for manufacturing an optical recording medium
03/22/2000EP0987345A1 Thermal barrier coating system
03/22/2000EP0987100A2 A degradable laminated body and a method for the preparation thereof
03/22/2000EP0986461A1 Method of forming a silicon layer on a surface
03/22/2000EP0677593B1 Transparent conductive film, transparent conductive base material, and conductive material
03/22/2000CN1248299A Power supply unit for sputtering device
03/22/2000CN1247907A Method for manufacture of sewing machine and its parts
03/22/2000CN1247906A Technological process of preparing alloy film by using magnetically controlled sputtering target of different material
03/21/2000US6040594 High permittivity ST thin film and a capacitor for a semiconductor integrated circuit having such a thin film
03/21/2000US6040521 N-type window layer for a thin film solar cell and method of making
03/21/2000US6040077 Catalyst for membrane electrode assembly and method of making
03/21/2000US6040052 Magnetic recording medium
03/21/2000US6040017 Forming a multilayer film polymer composites and evaporation, condensation, flash evaporation of mixtures, condensation and radiation curing
03/21/2000US6040000 Method and apparatus for a microchannel plate having a fissured coating
03/21/2000US6039855 Target for the sputtering cathode of a vacuum coating apparatus and method for its manufacture
03/21/2000US6039854 Substrate clamp design for minimizing substrate to clamp sticking during thermal processing of thermally flowable layers
03/21/2000US6039850 Sputtering of lithium
03/21/2000US6039849 Method for the manufacture of electronic components
03/21/2000US6039848 Magnetron sputtering system uses a backing plate assembly having an insulating spacer ring coupled between and hermetically sealed to the backing plate and an extender ring
03/21/2000US6039847 A material of ions is sputtered with cesium ions to generate negative ions and, negative ions are accelerated and mass-separated to obtain a negative ion beam and material of thin film is sputtered with negative ion to form a thin film
03/21/2000US6039810 High temperature vapor coating container
03/21/2000US6039806 Precision thickness optical coating system and method of operation thereof
03/21/2000US6039788 Melting and casting of high purity chromium with controlled oxygen content
03/21/2000US6039770 Semiconductor device manufacturing system having means for reducing a pressure difference between loadlock and processing chambers
03/21/2000US6038999 Device for the relative vacuum deposition of a material on parts in a loose state
03/16/2000WO2000014332A1 Doctor rod for a coating device
03/16/2000WO2000014300A1 Wear-resistant workpiece and method for producing same
03/16/2000WO2000014295A1 Optical lens support and method for using same
03/16/2000WO2000014294A1 Method for vacuum deposit on a curved substrate
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