| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 07/11/2000 | US6086210 Bendable mirrors and method of manufacture |
| 07/11/2000 | US6085966 Sputtering target assembly production method |
| 07/06/2000 | WO2000039842A1 Capacitor electrode structure |
| 07/06/2000 | WO2000039355A1 Method and device for coating substrates by means of bipolar pulse magnetron sputtering and the use thereof |
| 07/06/2000 | WO2000038862A1 Method of producing a silicom/aluminum sputtering target |
| 07/06/2000 | WO2000021079A3 Optical data storage disk |
| 07/06/2000 | DE19860474A1 Verfahren und Einrichtung zum Beschichten von Substraten mittels bipolarer Puls-Magnetron-Zerstäubung Method and apparatus for coating substrates with bipolar pulsed magnetron sputtering |
| 07/05/2000 | EP1017108A2 Semiconductor devices and methods of manufacturing the same |
| 07/05/2000 | EP1017085A2 Semiconductor device manufacturing apparatus employing vacuum system |
| 07/05/2000 | EP1016735A1 Method for coating an object |
| 07/05/2000 | EP1016122A1 Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages |
| 07/05/2000 | EP1016121A1 Vapour deposition coating apparatus |
| 07/05/2000 | EP1016120A1 Resistive heating of power coil to reduce transient heating/start up effects |
| 07/05/2000 | EP1016118A1 Apparatus and method for improved scanning efficiency in an ion implanter |
| 07/05/2000 | EP1015657A1 Apparatus and method for sputtering a magnetron target |
| 07/05/2000 | EP1015656A1 Titanium sputtering target and method of manufacture |
| 07/05/2000 | EP1015655A1 Skeletal columnar coatings |
| 07/05/2000 | EP1015654A1 METHOD FOR COATING SUBSTRATES WITH ALUMINUM OXIDE (Al 2?O 3?) AND COATING A WORK PIECE USING SAID METHOD |
| 07/05/2000 | EP0736109B1 Material of chemical compounds with a metal in group iv a of the periodic system, nitrogen and oxygen and process for producing it |
| 07/05/2000 | CN1054166C Method for producing controllable size nanometer grade silver particle inlaid on barium titanate film |
| 07/04/2000 | USRE36760 Method and apparatus for altering material using ion beams |
| 07/04/2000 | US6085025 Elliptical ceramic evaporators |
| 07/04/2000 | US6084763 Method of holding wafer, method of removing wafer and electrostatic chucking device |
| 07/04/2000 | US6084282 Low-stress and low-sensitivity metal film |
| 07/04/2000 | US6084241 Method of manufacturing semiconductor devices and apparatus therefor |
| 07/04/2000 | US6083818 Electronic devices with strontium barrier film and process for making same |
| 07/04/2000 | US6083628 Vacuum deposited, radiation polymerized acrylate monomer film; metallized packaging; heat, wear, and corrosion resistance |
| 07/04/2000 | US6083568 Reducing organic material to form carbides for semiconductor wafers by injection of gas into reactors to form plasma : |
| 07/04/2000 | US6083567 Vacuum deposition of coating, implanting ions din different layers to form seed and coating layers |
| 07/04/2000 | US6083566 Substrates loading into lock chambers, pumping, loading and transferring |
| 07/04/2000 | US6083561 Low scatter, high quality water clear zinc sulfide |
| 07/04/2000 | US6083557 System and method for making a conductive polymer coating |
| 07/04/2000 | US6083365 Method for forming a thin film and apparatus for the same |
| 07/04/2000 | US6083364 Magnetron sputtering apparatus for single substrate processing |
| 07/04/2000 | US6083361 Reactive gas atoms that react with the sputter particles released from the target produce a compound from the particle atoms and the reactive gas atoms that has a lower sticking characteristic to the side walls of the hole semiconductor |
| 07/04/2000 | US6083360 Reducing particle generation from the thin coating deposited on the internal surfaces of a deposition chamber which undergoes temperature variation greater than 100 degrees c. |
| 07/04/2000 | US6083359 Relative displacement between the surface of the target and the substrate surface to be coated such that the entirety of the surface of the target is constantly located opposite the surface of said substrate during sputtering |
| 07/04/2000 | US6083358 Multiple species sputtering for improved bottom coverage and improved sputter rate |
| 07/04/2000 | US6083357 Robotic arm assembly in a transport module is expansible to have an effector at its end receive a substrate in a cassette module and is then contracted and rotated with the effector to have the effector face a process module. |
| 07/04/2000 | US6083356 Method and device for pre-treatment of substrates |
| 07/04/2000 | US6083322 Modular coating fixture |
| 07/04/2000 | US6083321 Fluid delivery system and method |
| 07/04/2000 | US6082298 Substrate carrier for a vacuum coating apparatus |
| 07/04/2000 | US6082297 Encapsulated thermofoil heater apparatus and associated methods |
| 07/04/2000 | US6082296 Thin film deposition chamber |
| 07/04/2000 | US6082293 Plasma source |
| 06/29/2000 | WO2000038247A1 Reduced diffusion of a mobile specie from a metal oxide ceramic |
| 06/29/2000 | WO2000038214A1 Cathode having variable magnet configuration |
| 06/29/2000 | WO2000038213A2 Physical vapor deposition of semiconducting and insulating materials |
| 06/29/2000 | WO2000037710A1 Indium source reagent compositions |
| 06/29/2000 | WO2000037709A1 Protecting layer |
| 06/29/2000 | WO2000037708A1 Laminate structure and production method therefor |
| 06/29/2000 | WO2000037707A1 Local selective surface processing with magnetic mask holder |
| 06/29/2000 | WO2000037384A1 Methods and apparatus for producing silver based low emissivity coatings without the use of metal primer layers and articles produced thereby |
| 06/29/2000 | WO2000037382A1 Glazing panel |
| 06/29/2000 | WO2000037381A1 Glazing panel |
| 06/29/2000 | WO2000037380A1 Glazing panel |
| 06/29/2000 | WO2000037379A1 Glazing panel |
| 06/29/2000 | WO2000037378A1 Glazing panel |
| 06/29/2000 | WO2000037377A1 Soil-resistant coating for glass surfaces |
| 06/29/2000 | WO2000037376A1 Low-emissivity, soil-resistant coating for glass surfaces |
| 06/29/2000 | WO2000037375A1 Protective layer for coated substrate |
| 06/29/2000 | WO2000037251A1 Laminated structure, and method of manufacture thereof |
| 06/29/2000 | DE19859695A1 Coating plastic substrates with light reflective layer, e.g. in headlight reflector manufacture by precoating with low carbon content thin crosslinked hydrocarbon, silicon oxide, silicon nitride or silicon oxynitride barrier layer |
| 06/29/2000 | DE19859172A1 Selektive Oberflächenbehandlung durch magnetische Maskenhalterung Selective surface treatment by magnetic headgear |
| 06/29/2000 | CA2352845A1 Methods and apparatus for producing silver based low emissivity coatings without the use of metal primer layers and articles produced thereby |
| 06/28/2000 | EP1014763A2 Compact helical resonator coil for ion implanter linear accelerator |
| 06/28/2000 | EP1014422A1 Ion implantation control using charge collection, optical emission spectroscopy and mass analysis |
| 06/28/2000 | EP1013795A1 Method for applying improved durability thermal barrier coatings |
| 06/28/2000 | EP1013794A2 Vapor phase process for making aluminide |
| 06/28/2000 | EP1013793A2 Process and apparatus for material deposition |
| 06/28/2000 | EP1013792A1 Power supply unit for sputtering device |
| 06/28/2000 | EP1012869A1 Apparatus for coupling power through a workpiece in a semiconductor wafer processing system |
| 06/28/2000 | EP1012868A2 Ion accelerator for use in ion implanter |
| 06/28/2000 | EP1012865A1 Method and apparatus for controlling a workpiece in a vacuum chamber |
| 06/28/2000 | EP1012838A1 Method for regulating a coating process |
| 06/28/2000 | EP1012478A2 In situ getter pump system and method |
| 06/28/2000 | CN2384950Y 溅射靶 Sputtering target |
| 06/28/2000 | CN1258322A Method of forming diamond-like carbon coating in vacuum |
| 06/28/2000 | CN1053931C Method for depositing hard protective coating |
| 06/27/2000 | US6081652 Ceramic flash TV evaporator |
| 06/27/2000 | US6081414 Apparatus for improved biasing and retaining of a workpiece in a workpiece processing system |
| 06/27/2000 | US6080970 Wafer heating apparatus |
| 06/27/2000 | US6080679 High-speed soft evacuation process and system |
| 06/27/2000 | US6080665 Integrated nitrogen-treated titanium layer to prevent interaction of titanium and aluminum |
| 06/27/2000 | US6080341 Indium-tin alloy powder are reacted with oxygen in a plasma arc to obtain a indium tin oxide, quenching the oxide at outlet opening with a coolant gas to form indium tin oxide solid solution powder, cold pressing to obtain cold compact |
| 06/27/2000 | US6080292 Monitoring apparatus for plasma process |
| 06/27/2000 | US6080287 Sputtered material is ionized in a processing space between the target and a substrate by generating a dense plasma in the space with energy coupled from a coil located outside of the vacuum chamber behind a dielectric window in the chamber wall |
| 06/27/2000 | US6080286 Opening trigger gas feed system to increase flow rate of discharge gas into vacuum chamber and to attain constant pressure in chamber immediately before discharge is detected, closing trigger when sputtering is detected, reopening |
| 06/27/2000 | US6080285 Multiple step ionized metal plasma deposition process for conformal step coverage |
| 06/27/2000 | US6080284 Magnetron sputtering method employing a thin film manufacturing apparatus including in the sputtering portion of the vacuum chamber a multi-apertured partition separating film forming chamber from cathode chamber |
| 06/27/2000 | US6080246 Method of aluminising a superalloy |
| 06/27/2000 | US6079928 Dual plate gas assisted heater module |
| 06/27/2000 | CA2122562C Inorganic skin film and process for forming the same |
| 06/27/2000 | CA2073651C Non-stoichiometric titanium nitride coating |
| 06/27/2000 | CA2001805C Method and apparatus for sputter coating stepped wafers |
| 06/22/2000 | WO2000036178A1 Planetary system workpiece support and method for surface treatment of workpieces |
| 06/22/2000 | WO2000035602A1 Plasma enhanced chemical deposition of conjugated polymer |
| 06/22/2000 | CA2256847A1 Particle-free cathodic arc carbon ion source |
| 06/21/2000 | EP1010358A1 Doped amorphous and crystalline alkaline earth gallates as electroluminescent materials |