Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/1999
11/02/1999US5976327 Step coverage and overhang improvement by pedestal bias voltage modulation
11/02/1999US5976326 Method of sputtering selected oxides and nitrides for forming magnetic media
11/02/1999US5976308 High density plasma CVD and etching reactor
11/02/1999US5976255 Substrate holder for reducing non-uniform film characteristics resulting from support structures
11/02/1999US5975852 Thermal barrier coating system and method therefor
11/02/1999US5975014 Coaxial resonant multi-port microwave applicator for an ECR plasma source
11/02/1999US5975012 Deposition apparatus
11/02/1999CA2199424C Process for forming metal film on surface of synthetic resin substrate
11/02/1999CA2184022C Thin-film multilayered electrodes and method of fabricating same
11/02/1999CA2171020C Ternary compound film and manufacturing method therefor
11/02/1999CA1340811C Physical vapor deposition dual coating apparatus and process
10/1999
10/28/1999WO1999054927A1 Unprocessed material storing device and carry-in/out stage
10/28/1999WO1999054923A1 A titanium nitride diffusion barrier for use in non-silicon technologies and metallization method
10/28/1999WO1999054911A1 Means for controlling target erosion and sputtering in a magnetron
10/28/1999WO1999054910A1 Retaining ring and target and method for producing same
10/28/1999WO1999054909A1 Smaller diameter coil to enhance uniformity of metal film formed by inductively coupled plasma deposition
10/28/1999WO1999054890A1 Corrosion-resisting permanent magnet and method for producing the same
10/28/1999WO1999054520A1 Parts of a paper/board or finishing machine that are subjected to intensive wear and method for manufacture of such parts
10/28/1999WO1999054518A2 Oxidation resistance coating system for refractory metals
10/28/1999WO1999054060A2 Loading especially metallic or metal-ceramic technical surfaces with a fluoro-organic compound
10/28/1999DE19918045A1 Process for encapsulating thin film recording head for mass storage device
10/28/1999DE19818782A1 Coated high speed steel, hard metal and cermet tools
10/28/1999DE19809932C1 Method for coloring surgical instruments made of steel or heat resistant plastic
10/27/1999EP0952239A1 Sputtering target based on highly purified titanium
10/27/1999EP0952238A1 Hard multilayer coating
10/27/1999EP0952009A2 Method for manufacturing a thin metal film with embossed pattern
10/27/1999EP0951580A1 Coating for components and process for producing the same
10/27/1999EP0951579A2 Method of manufacturing hollow metal objects with elaborated cavities
10/27/1999EP0951578A1 Precision etching and coating system
10/27/1999EP0728230B1 Method of depositing monomolecular layers
10/26/1999US5973447 Gridless ion source for the vacuum processing of materials
10/26/1999US5973400 Used for micorprocessing and have high capability
10/26/1999US5972847 Method for making high-critical-current-density YBa2 Cu3 O7 superconducting layers on metallic substrates
10/26/1999US5972743 N-doping a material with antimony using antimony a precursor
10/26/1999US5972527 Transparent electrically conductive layer, electrically conductive transparent substrate and electrically conductive material
10/26/1999US5972526 A copper primary layer, a tin-copper-palladium alloy plate layer covering the primary plate layer, and a finishing plate layer composed of atlest one element selected from palladium, rhodium and platinum; free of nickel; multi or single color
10/26/1999US5972458 Optical recording element with an interfacial layer between the recording layer and the reflecting layer
10/26/1999US5972435 Formation of a plasma polymerization film as a surface protective film of a magnetic recording medium having a ferromagnetic metal thin film
10/26/1999US5972185 Cathodic arc vapor deposition apparatus (annular cathode)
10/26/1999US5972184 Heating system for high throughput sputtering
10/26/1999US5972183 Getter pump module and system
10/26/1999US5972179 Sputtering titanium layer onto silicon surface, chemical vapor deposition of first titanium nitride (tin) layer with good step coverage, sputtering second titanium nitride layer to improve morphology, coating with aluminum contact layer
10/26/1999US5972178 Continuous process for forming improved titanium nitride barrier layers
10/26/1999US5972069 Sintering a powdery raw material to form rod, machining rod, heating at low temperature and pressurization within sealed non-oxidizing atmosphere to compact material into filament
10/26/1999US5970908 Apparatus and improved polymerization gun for coating objects by vacuum deposit
10/21/1999WO1999053542A1 Method for forming a multi-layered aluminum-comprising structure on a substrate
10/21/1999WO1999053534A1 Process system
10/21/1999WO1999053506A1 Combination of magnets for generating a uniform external magnetic field
10/21/1999WO1999053118A1 Integrated ion implant scrubber system
10/21/1999WO1999053114A1 Continuous process for sputtering tantalum nitride films
10/21/1999WO1999039746A3 Radioactive seed implants
10/21/1999DE19917543A1 Large scale precision optical coating system useful for producing narrow bandpass filters for wavelength division multiplexing communication networks
10/21/1999DE19848614A1 Charging matrix production on machine tool, especially for incorporating lubricant
10/21/1999DE19848611A1 Surface treatment solution for substrate, especially metal, e.g. for vapor deposition or plasma coating
10/21/1999DE19848591A1 Surface treatment of substrate containing metal, especially vehicle windscreen or headlamp
10/21/1999DE19816818A1 Vakuumbeschichtungsanlage mit einer Beschichtungskammer, einer Quellenkammer und einer Laserstrahlquelle Vacuum coating system with a coating chamber, a source chamber and a laser beam source
10/21/1999DE19816739A1 Apparatus for loading/unloading a process reactor with components, in particular wafers
10/21/1999DE19816491A1 Mehrlagen-Hartstoffschicht Multi-layer hard coating
10/20/1999EP0951049A1 Retaining ring, target and its manufacturing procedure
10/20/1999EP0950258A1 Method and device for treating a semiconductor surface
10/20/1999CN1232511A Ion plating apparatus
10/19/1999US5970384 Nitrogen concentration is increased, dinitrogen monoxide
10/19/1999US5969935 Use of calcium and strontium dopants to improve retention performance in a PZT ferroelectric film
10/19/1999US5969423 Aluminum-containing films derived from using hydrogen and oxygen gas in sputter deposition
10/19/1999US5969419 Structure comprising platinum layer bound to a surface of a silicon oxide layer
10/19/1999US5968877 Article comprising substrate sequentially coated with epitaxial buffer layer(s) and high critical temperature (tc) yttrium-barium-copper oxide (ybco) layer
10/19/1999US5968627 Metal foil disk for high areal density recording in environments of high mechanical shock
10/19/1999US5968612 Method for the preparation of silicon compound thin film
10/19/1999US5968596 Magnetron sputtering; finishing; decoration
10/19/1999US5968383 Laser processing apparatus having beam expander
10/19/1999US5968333 Method of electroplating a copper or copper alloy interconnect
10/19/1999US5968328 Device for sputter deposition of thin layers on flat substrates
10/19/1999US5968327 Ionizing sputter device using a coil shield
10/19/1999US5968274 Continuous forming method for functional deposited films and deposition apparatus
10/14/1999WO1999051473A1 Wiper blade rubber with a protective layer
10/14/1999WO1999051471A1 Method for coating a rubber wiper blade
10/14/1999DE19903517A1 Buried transparent metal oxide layer production for use in electronics, optoelectronics, sensor technology and integrated optics
10/14/1999DE19847531C1 Application of protective layer onto a vacuum metallized metal substrate
10/13/1999EP0948672A1 Apparatus for growing silicon carbide crystals
10/13/1999EP0948663A1 Cathode pulverisation targets in aluminium alloy
10/13/1999EP0948662A1 A method for manufacturing an absorbent layer for solar collectors, a device for performing the method and an absorbent layer for solar collectors
10/13/1999EP0948661A1 Low friction coating
10/13/1999EP0843901A4 Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom
10/13/1999CN1231760A Process for the manufacture of a highly 'epsilon' dielectric or ferroelectric coating
10/13/1999CN1231505A Method and apparatus for making semiconductor device
10/13/1999CN1045637C Plasma immersion ion implantation apparatus for material surface modifying
10/12/1999US5965904 Semiconductor device comprising silicon semiconductor layer
10/12/1999US5965751 Process for hydrogenation of dihydrofurans to give tetrahydrofurans
10/12/1999US5965278 Method of making cathode targets comprising silicon
10/12/1999US5965253 Machining tools
10/12/1999US5965228 Information carrier, method for producing same
10/12/1999US5965217 Inserting an auxiliary electrode in the bore of the cylinder (bushing, bearing, piston reciprocate) and producing a plasma around it to form intermediate films and the diamondlike carbon film; adhesion; uniformity; wear resistance
10/12/1999US5965212 Method of producing metal quantum dots
10/12/1999US5964989 Ionized PVD device and method of manufacturing semiconductor device
10/07/1999WO1999050884A1 Use of variable impedance having rotating core to control coil sputter distribution
10/07/1999WO1999050472A1 Vacuum strip coating installation
10/07/1999WO1999050471A1 Method and apparatus for deposition of biaxially textured coatings
10/07/1999WO1999035306A3 Thermal barrier coating ceramic structure
10/07/1999WO1999027893B1 Carbon coatings, method and apparatus for applying them, and articles bearing such coatings
10/07/1999WO1999016390A3 Coated ophthalmic and implantable devices and methods for producing same