| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 08/24/1999 | CA2000171C Preparation method of amorphous superlattice alloys |
| 08/19/1999 | WO1999041425A1 Cathode arc vapor deposition |
| 08/19/1999 | WO1999031289A8 Sliding member having chromium nitride film formed thereon |
| 08/19/1999 | DE19905518A1 Piston ring combination for use in internal combustion engines |
| 08/19/1999 | CA2261403A1 Diboride coated pressing surfaces for abrasion resistant laminate and making pressing surfaces |
| 08/18/1999 | EP0936281A1 Method and apparatus for three-dimensional processing of filamentary substrates |
| 08/18/1999 | EP0935633A1 Acrylate coating methods |
| 08/18/1999 | CN2333716Y Plasma cathode arc source magnetron sputtering coating machine |
| 08/18/1999 | CN1226078A Combined ion injection method for quickly synthesized material chip |
| 08/17/1999 | US5939787 Semiconductor device having a multi-layer contact structure |
| 08/17/1999 | US5939361 Method of fabricating Tl or Hg-containing oxide superconductor film |
| 08/17/1999 | US5939225 Multilayer element with substrate and silicon, nitrogen withmetal layer |
| 08/17/1999 | US5939202 Non-magnetic base alloy containing tungsten, tantalum, hafnium, molybdenum, chromium, zirconium, niobium, nickel, and/or aluminum; direct current or radio frequency sputtering |
| 08/17/1999 | US5939189 Roll coaters. |
| 08/17/1999 | US5939186 Magnetic head |
| 08/17/1999 | US5939149 Method of forming hydrogen-free diamond like carbon (DLC) films |
| 08/17/1999 | US5939132 Alignment chips positioned in the peripheral part of the semiconductor substrate and method of manufacturing thereof |
| 08/17/1999 | US5938902 Disc-handling apparatus |
| 08/17/1999 | US5938897 Sputtering molybdenum silicide target in atmosphere containing nitrogen monoxide gas to form coating of molybdenum silicide oxynitride film on transparent substrate |
| 08/12/1999 | WO1999040233A1 Multilayer coated tool |
| 08/12/1999 | WO1999040232A1 Boride source and its use |
| 08/12/1999 | WO1999039860A1 Permanent magnet ecr plasma source with magnetic field optimization |
| 08/12/1999 | WO1999039746A2 Radioactive seed implants |
| 08/12/1999 | DE19824310C1 Bearing surface for metal bearing |
| 08/12/1999 | DE19805471A1 Method for repairing target base plates |
| 08/12/1999 | CA2319248A1 Radioactive seed implants |
| 08/12/1999 | CA2285460A1 Hard multilayer coated tool having increased toughness |
| 08/11/1999 | EP0935012A2 Process for producing zinc sulfide |
| 08/11/1999 | EP0935011A1 Method for forming film by plasma polymerization and apparatus for forming film by plasma polymerization |
| 08/11/1999 | EP0934127A1 Process for making a parylene coating |
| 08/11/1999 | CN1225482A Sputtering apparatus simulation method |
| 08/10/1999 | US5936829 Thermally conductive chuck for vacuum processor |
| 08/10/1999 | US5936481 System for impedance matching and power control for apparatus for high frequency plasma treatment |
| 08/10/1999 | US5936413 Method and device for measuring an ion flow in a plasma |
| 08/10/1999 | US5936346 Luminescent layer is composed of zinc sulfide with a fluoride or a luminescent center element added, wherein the x-ray diffraction spectrum thereof has only a single peak at an x-ray diffraction angle from the luminescent layer |
| 08/10/1999 | US5935702 Low emissivity stack with anti-solar properties having thin layers which perform optically and thermally and which retain these properties even if subjected to thermal treatment for tempering or bending |
| 08/10/1999 | US5935462 Repair of metal lines by electrostatically assisted laser ablative deposition |
| 08/10/1999 | US5935397 Physical vapor deposition chamber |
| 08/10/1999 | US5935396 Method for depositing metal |
| 08/10/1999 | US5935395 Substrate processing apparatus with non-evaporable getter pump |
| 08/10/1999 | US5935391 Disposing rod-like and ring-like electrodes in vacuum container; tube to be processed is disposed continuous to ring-like electrode and predetermined vacuum is set; electric power and magnetic field are applied to supply plasma to tube |
| 08/10/1999 | US5935324 Apparatus and method for forming I-III-VI2 thin-film layers |
| 08/10/1999 | US5934321 Valve unit for water mixing valve |
| 08/05/1999 | WO1999039398A1 Fuel cell with a proton conducting electrolyte |
| 08/05/1999 | WO1999039021A1 Process for metal plating liquid crystalline polymers and compositions related thereto |
| 08/05/1999 | WO1999028519A3 Method for producing a bc(n):h layer |
| 08/05/1999 | DE19804838A1 Plasma-assisted particle surface modification especially for sputter coating, activation and etching of catalyst particles |
| 08/05/1999 | DE19803278A1 Workpiece carrier and installation for treatment and/or coating of workpieces |
| 08/05/1999 | CA2316868A1 Process for metal plating liquid crystalline polymers and compositions related thereto |
| 08/04/1999 | EP0933654A2 Anti-reflection coatings |
| 08/04/1999 | EP0933444A1 Sheet-form magnetron sputtering device |
| 08/04/1999 | EP0932911A2 Control mechanisms for dosimetry control in ion implantation systems |
| 08/04/1999 | CN1224772A Synthesis of carbon-base film |
| 08/04/1999 | CN1224771A Apparatus for sputtering or arc evaporation |
| 08/03/1999 | US5932883 Ion implanter for implanting ion on wafer with low contamination |
| 08/03/1999 | US5932294 This invention relates, generally, to apparatus used in the manufacture of components in the compound semiconductor and related industries. |
| 08/03/1999 | US5932078 Cathodic arc vapor deposition apparatus |
| 08/03/1999 | US5931627 Wafer transport apparatus that can transfer multiple wafers in a short period of time |
| 08/03/1999 | US5931368 Long life bonding tool |
| 08/03/1999 | CA2149723C Reduced solvent island coating system |
| 07/29/1999 | WO1999038159A1 Method for preparing optical recording medium and preparation apparatus therefor |
| 07/29/1999 | WO1999037655A1 Tantalum amide precursors for deposition of tantalum nitride on a substrate |
| 07/29/1999 | WO1999027149A8 Electron beam deposition device and method of manufacturing thin film by using the deposition device |
| 07/29/1999 | DE19809663C1 Vacuum plasma coating installation and its application |
| 07/29/1999 | DE19802482A1 Sputter cathode target casting apparatus has a two-layer base plate |
| 07/29/1999 | DE19801424A1 High melting point heat insulating material especially for coating nickel base superalloy gas turbine blades or combustion chambers |
| 07/28/1999 | EP0932183A1 Linear microwave plasma source with permanent magnets |
| 07/28/1999 | EP0931852A1 Vapor deposition material |
| 07/28/1999 | EP0931851A1 Method for obtaining functional metallic, ceramic or ceramic/metallic layers on the internal wall of hollow bodies |
| 07/28/1999 | EP0931850A1 Method for treating the surfaces of plastic substrates |
| 07/28/1999 | EP0931334A1 Semiconductor device with a layer of precious metal and a process for production of same |
| 07/28/1999 | EP0931333A1 PROCESS FOR THE MANUFACTURE OF A HIGHLY $g(e) DIELECTRIC OR FERROELECTRIC COATING |
| 07/28/1999 | EP0931178A1 Composite body, production process and use |
| 07/28/1999 | EP0931175A1 Conveyor and delivery device |
| 07/28/1999 | EP0931174A1 Method and device to produce a heat insulating layer |
| 07/28/1999 | EP0792572B1 An apparatus for generation of a linear arc discharge for plasma processing |
| 07/28/1999 | CN1044358C Sputter coated glass products |
| 07/27/1999 | US5930046 That have a low net stress, alternating layers of a high refractive index material and silica which have a net stress that is significantly lower |
| 07/27/1999 | US5929456 Ion implantation system and method adapted for serial wafer processing |
| 07/27/1999 | US5928771 Coatings on surfaces such as tools, wear parts, and molds that are subjected to friction or wear. |
| 07/27/1999 | US5928750 Sputtered thermally cycled texture layers formed of high melting point materials |
| 07/27/1999 | US5928528 Plasma treatment method and plasma treatment system |
| 07/27/1999 | US5928480 Methods of sputter depositing of metals onto substrates, and methods of forming plasma |
| 07/27/1999 | CA2225063A1 Pulsed plate plasma implantation system |
| 07/27/1999 | CA2048642C Pyrotechnic materials |
| 07/22/1999 | WO1999036968A1 Methods for manufacturing semiconductor thin films using ion beam synthesis |
| 07/22/1999 | WO1999036952A1 Metallization process and apparatus |
| 07/22/1999 | WO1999036276A1 Surface modification of medical implants |
| 07/22/1999 | WO1999036255A1 A metal foil disk for high areal density recording in environments of high mechanical shock |
| 07/22/1999 | WO1999036193A1 Method and apparatus for providing a conductive, amorphous non-stick coating |
| 07/22/1999 | WO1999029435A3 Modification of surfaces in order to increase surface tension |
| 07/22/1999 | WO1999027147A3 Wear-resistant, mechanically highly stressed and low-friction boundary coating construction for titanium or the alloys thereof and a method for producing the same |
| 07/22/1999 | WO1999022398A3 Cathode arc source with target feeding apparatus |
| 07/22/1999 | WO1999022395A3 Cathode arc source for metallic and dielectric coatings |
| 07/22/1999 | CA2318290A1 A metal foil disk for high areal density recording in environments of high mechanical shock |
| 07/22/1999 | CA2318266A1 Method and apparatus for providing a conductive, amorphous non-stick coating |
| 07/22/1999 | CA2307612A1 Surface modification of medical implants |
| 07/21/1999 | EP0761011B1 Method of manufacturing an electronic multilayer component |
| 07/20/1999 | US5926736 Forming barrier layer within hole, forming metal plug, forming cap layer over plug, heating so that metal in hole flows to eliminate void |
| 07/20/1999 | US5925886 Ion source and an ion implanting apparatus using it |