Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2000
08/03/2000WO2000044959A1 Coated graphite crucible
08/03/2000WO2000044822A2 Fabrication of conductive/non-conductive nanocomposites by laser evaporation
08/03/2000DE19905881A1 Precious metal or non-precious metal jewelry article, especially a platinum article, is black coated by applying a layer containing or consisting of titanium nitride or titanium-aluminum nitride
08/02/2000EP1024526A1 An integrated circuit device having a planar interlevel dielectric layer
08/02/2000EP1024519A2 Ion beam implantation using conical magnetic scanning
08/02/2000CN1261947A A sealing system
08/02/2000CN1261926A Method and apparatus for forming thin functional film
08/01/2000US6096627 Method for introduction of an impurity dopant in SiC, a semiconductor device formed by the method and a use of a highly doped amorphous layer as a source for dopant diffusion into SiC
08/01/2000US6096438 Aluminum alloy film has not only a low resistivity and high hillock resistance but also a high dielectric strength when it is anodized into an anodic oxide film
08/01/2000US6096436 A coating on at least a portion of a substrate comprising a base layer, a boron and carbon containing intermediated layer and a carbon, boron and nitrogen containing layer adjacent to the intermediate layer
08/01/2000US6096426 A substrate having a leveling plastic coating, a decorative chrome/nickel alloy layer on the plastic coating and an acrylic coating over the chrome layer which provides a protective decorative coating
08/01/2000US6096391 Depositing a small amount of metal or metals from group viiia metals or group ia metals on a substrate of metal, metal alloys and/or metal oxide from group iva metals, group va metals, group via metals, aluminum, manganese, nickel, copper
08/01/2000US6096231 Chamber, at least for the transport of workpieces, a chamber combination, a vacuum treatment facility as well as a transport method
08/01/2000US6096180 Cathodic sputtering device
08/01/2000US6096176 Applying bias voltage to wafer while helicon wave plasma of high density generated between target and wafer by antenna
08/01/2000US6096175 Sputtering thin film of metal; etching
08/01/2000US6096174 Cathode sputtering; applying voltage to sustain gas discharge plasma between anode and cathode; rhythmic interruptions to short circuit; ion bombardment
08/01/2000CA2029755C Geometries and configurations for magnetron sputtering apparatus
07/2000
07/27/2000WO2000044207A1 Method for the excitation of a plasma and a use of the method
07/27/2000WO2000043565A1 Method and device for producing colored pigments
07/27/2000WO2000043564A1 Method of, and apparatus for, depositing materials
07/27/2000WO2000043119A1 Programmable apparatus for graded composition coating by co-deposition
07/27/2000WO2000008670A9 Dose monitor for plasma-monitor ion implantation doping system
07/27/2000DE19902908A1 Chalcogenide layers, especially copper chalcopyrite semiconductor films for thin film solar cells, are produced by interaction of metal and metal compound layers with selenium or sulfur ion beams
07/26/2000EP1022614A1 Photomask blank, photomask, methods of manufacturing the same, and method of forming micropattern
07/26/2000EP1021587A1 Automatic positive pressure seal access door
07/26/2000EP1021585A1 Selected adjustment of dropwise condensation on ion implanted surfaces
07/26/2000EP1021584A1 Tool with protective layer system
07/26/2000EP1021265A1 Intermetallic aluminides and silicides sputtering targets, and methods of making same
07/26/2000EP1021246A1 Catalyst for membrane electrode assembly and method of making
07/25/2000US6094295 Ultraviolet transmitting oxide with metallic oxide phase and method of fabrication
07/25/2000US6093903 Plasma burner device with adjustable anode and fixed cathode
07/25/2000US6093654 Process for forming interconnection of semiconductor device and sputtering system therefor
07/25/2000US6093445 Microscopic element manufacturing method and equipment for carrying out the same
07/25/2000US6093293 Magnetron sputtering source
07/25/2000US6093290 Method of generating a reciprocating plurality of magnetic fluxes on a target
07/25/2000US6093260 Surface alloyed high temperature alloys
07/25/2000US6092669 Equipment for producing thin-film solar cell
07/25/2000US6092485 Apparatus and method for processing substrate
07/25/2000US6092427 Method of testing a bond interface
07/25/2000US6092299 Vacuum processing apparatus
07/20/2000WO2000042633A1 A method and apparatus of continuously monitoring and recording parameters associated with pulsed ion beam surface treatment processes
07/20/2000WO2000022652A3 Superconducting structure including mixed rare earth barium-copper compositions
07/20/2000DE19901088A1 Vorrichtung zum Behandeln eines bandförmigen Substrates mit einem Gas An apparatus for treating a strip-shaped substrate with a gas
07/19/2000EP1021071A1 System and method for fabricating organic electroluminescent display devices
07/19/2000EP1020889A1 Process for forming non-evaporative getter and method of producing image forming apparatus
07/19/2000EP1020541A2 Vacuum arc evaporation source and deposition apparatus
07/19/2000EP1019946A2 Device for coating panel-shaped substrates
07/19/2000EP0904424B1 Coating device and process for coating a component with a heat insulating layer
07/19/2000EP0820424B1 Method for the chemical vapour infiltration of a material consisting of carbon and silicon and/or boron
07/19/2000CN1260842A Method and apparatus for low pressure sputtering
07/19/2000CN1260767A Photocatalytic-activated self-cleaning article and method of making same
07/19/2000CN1260406A Plasma treatment apparatus
07/19/2000CN1260232A Method for producing functional film, functional base plate and titanium oxide film
07/18/2000US6091046 Bonding and sputtering target by variable polarity plasma arc welding
07/18/2000US6090702 Embedded electroconductive layer and method for formation thereof
07/18/2000US6090481 Used for vehicle windows, especially for motor cars and railway carriages; carrying a coating including two metal layers formed of silver or silver alloy and three layers of a transparent dielectric non-absorbent material
07/18/2000US6090457 Apparatus for forming a thin film provided with a sputtering target and a vapour source
07/18/2000US6090456 Effective for coating zinc sulfide and zinc selenide infrared windows
07/18/2000US6090444 Base plater or vacuum deposition apparatus with individually and selectively controlled work holders and capacitively coupled crystal monitor
07/18/2000US6090381 Stimulation of an immune response with antibodies labeled with the . .alpha-galactosyl epitope
07/18/2000US6090248 Apparatus for coating substrates
07/18/2000US6090247 Apparatus for coating substrates
07/18/2000US6090246 Grounded collimator positioned between target material and a substrate in a sputtering chamber to restrict a plasma away from the substrate; voltage measurements near the substrate are taken, and parameters are adjusted in response
07/18/2000US6090207 Translational target assembly for thin film deposition system
07/18/2000US6089186 Vacuum coating forming device
07/18/2000US6089027 Fluid storage and dispensing system
07/18/2000US6088947 Member for fishing or sport tool
07/13/2000WO2000041235A1 Method of depositing a copper seed layer which promotes improved feature surface coverage
07/13/2000WO2000041205A1 Apparatus and method for monitoring and tuning an ion beam in ion implantation apparatus
07/13/2000WO2000040770A1 Diffusion bonded sputter target assembly and method of making same
07/13/2000WO2000040769A1 Sputtering target
07/13/2000WO2000040402A1 Layered product
07/13/2000DE10000019A1 Sputter deposition unit, useful for depositing titanium and titanium nitride coatings on semiconductor wafers, has a non-target material surface for receiving and re-sputtering target material onto a workpiece periphery
07/12/2000EP1018566A2 Sputtering target and method for the manufacture thereof
07/12/2000EP1018139A1 Adjustment of deposition uniformity in an inductively coupled plasma source
07/12/2000EP1017874A1 Colorless diamond-like carbon coatings
07/12/2000EP1017872A1 Device for applying layers of hard material by dusting
07/12/2000EP1017871A1 Multilayered coated cutting tool
07/12/2000EP1017870A1 Tool having a protective layer system
07/12/2000EP1017644A1 Glass-based copper-mirrors
07/12/2000EP1017643A1 Glass-based copper-mirrors
07/12/2000EP1017338A1 Method of producing a film coating by matrix assisted pulsed laser deposition
07/12/2000EP0694209B1 ENHANCED QUALITY THIN FILM Cu(In,Ga)Se 2 FOR SEMICONDUCTOR DEVICE APPLICATIONS BY VAPOR-PHASE RECRYSTALLIZATION
07/11/2000US6087014 Vapor deposition material comprising mixed oxide of yttrium and aluminum
07/11/2000US6086963 Method and device for control of a vacuum vaporization process
07/11/2000US6086962 Method for deposition of diamond-like carbon and silicon-doped diamond-like carbon coatings from a hall-current ion source
07/11/2000US6086960 Method for improving the quality of a titanium nitride layer including carbon and oxygen
07/11/2000US6086959 Boron and nitrogen containing coating and method for making
07/11/2000US6086944 Method for activating a plurality of photocathodes
07/11/2000US6086796 Diamond-like carbon over-coats for optical recording media devices and method thereof
07/11/2000US6086735 Contoured sputtering target
07/11/2000US6086734 Thin-film depositing apparatus
07/11/2000US6086730 Applying a voltage by a pulsed power supply
07/11/2000US6086729 Method of manufacturing thin metal membranes
07/11/2000US6086728 Cross flow metalizing of compact discs
07/11/2000US6086727 Movable flux regulator disposed between target and wafer for partially blocking portion of target material from being deposited on said wafer during deposition of target material, wherein movable flux regulator is tiltable in x,y, and z-axis
07/11/2000US6086726 Method of modifying a surface
07/11/2000US6086725 Composed primarily of a magnetically and electrically conductive, to-be-deposited metal, which metal has a tendency to form polycrystals of face-centered cubic structure, including textured polycrystals
07/11/2000US6086676 Programmable electrical interlock system for a vacuum processing system