Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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08/03/2000 | WO2000044959A1 Coated graphite crucible |
08/03/2000 | WO2000044822A2 Fabrication of conductive/non-conductive nanocomposites by laser evaporation |
08/03/2000 | DE19905881A1 Precious metal or non-precious metal jewelry article, especially a platinum article, is black coated by applying a layer containing or consisting of titanium nitride or titanium-aluminum nitride |
08/02/2000 | EP1024526A1 An integrated circuit device having a planar interlevel dielectric layer |
08/02/2000 | EP1024519A2 Ion beam implantation using conical magnetic scanning |
08/02/2000 | CN1261947A A sealing system |
08/02/2000 | CN1261926A Method and apparatus for forming thin functional film |
08/01/2000 | US6096627 Method for introduction of an impurity dopant in SiC, a semiconductor device formed by the method and a use of a highly doped amorphous layer as a source for dopant diffusion into SiC |
08/01/2000 | US6096438 Aluminum alloy film has not only a low resistivity and high hillock resistance but also a high dielectric strength when it is anodized into an anodic oxide film |
08/01/2000 | US6096436 A coating on at least a portion of a substrate comprising a base layer, a boron and carbon containing intermediated layer and a carbon, boron and nitrogen containing layer adjacent to the intermediate layer |
08/01/2000 | US6096426 A substrate having a leveling plastic coating, a decorative chrome/nickel alloy layer on the plastic coating and an acrylic coating over the chrome layer which provides a protective decorative coating |
08/01/2000 | US6096391 Depositing a small amount of metal or metals from group viiia metals or group ia metals on a substrate of metal, metal alloys and/or metal oxide from group iva metals, group va metals, group via metals, aluminum, manganese, nickel, copper |
08/01/2000 | US6096231 Chamber, at least for the transport of workpieces, a chamber combination, a vacuum treatment facility as well as a transport method |
08/01/2000 | US6096180 Cathodic sputtering device |
08/01/2000 | US6096176 Applying bias voltage to wafer while helicon wave plasma of high density generated between target and wafer by antenna |
08/01/2000 | US6096175 Sputtering thin film of metal; etching |
08/01/2000 | US6096174 Cathode sputtering; applying voltage to sustain gas discharge plasma between anode and cathode; rhythmic interruptions to short circuit; ion bombardment |
08/01/2000 | CA2029755C Geometries and configurations for magnetron sputtering apparatus |
07/27/2000 | WO2000044207A1 Method for the excitation of a plasma and a use of the method |
07/27/2000 | WO2000043565A1 Method and device for producing colored pigments |
07/27/2000 | WO2000043564A1 Method of, and apparatus for, depositing materials |
07/27/2000 | WO2000043119A1 Programmable apparatus for graded composition coating by co-deposition |
07/27/2000 | WO2000008670A9 Dose monitor for plasma-monitor ion implantation doping system |
07/27/2000 | DE19902908A1 Chalcogenide layers, especially copper chalcopyrite semiconductor films for thin film solar cells, are produced by interaction of metal and metal compound layers with selenium or sulfur ion beams |
07/26/2000 | EP1022614A1 Photomask blank, photomask, methods of manufacturing the same, and method of forming micropattern |
07/26/2000 | EP1021587A1 Automatic positive pressure seal access door |
07/26/2000 | EP1021585A1 Selected adjustment of dropwise condensation on ion implanted surfaces |
07/26/2000 | EP1021584A1 Tool with protective layer system |
07/26/2000 | EP1021265A1 Intermetallic aluminides and silicides sputtering targets, and methods of making same |
07/26/2000 | EP1021246A1 Catalyst for membrane electrode assembly and method of making |
07/25/2000 | US6094295 Ultraviolet transmitting oxide with metallic oxide phase and method of fabrication |
07/25/2000 | US6093903 Plasma burner device with adjustable anode and fixed cathode |
07/25/2000 | US6093654 Process for forming interconnection of semiconductor device and sputtering system therefor |
07/25/2000 | US6093445 Microscopic element manufacturing method and equipment for carrying out the same |
07/25/2000 | US6093293 Magnetron sputtering source |
07/25/2000 | US6093290 Method of generating a reciprocating plurality of magnetic fluxes on a target |
07/25/2000 | US6093260 Surface alloyed high temperature alloys |
07/25/2000 | US6092669 Equipment for producing thin-film solar cell |
07/25/2000 | US6092485 Apparatus and method for processing substrate |
07/25/2000 | US6092427 Method of testing a bond interface |
07/25/2000 | US6092299 Vacuum processing apparatus |
07/20/2000 | WO2000042633A1 A method and apparatus of continuously monitoring and recording parameters associated with pulsed ion beam surface treatment processes |
07/20/2000 | WO2000022652A3 Superconducting structure including mixed rare earth barium-copper compositions |
07/20/2000 | DE19901088A1 Vorrichtung zum Behandeln eines bandförmigen Substrates mit einem Gas An apparatus for treating a strip-shaped substrate with a gas |
07/19/2000 | EP1021071A1 System and method for fabricating organic electroluminescent display devices |
07/19/2000 | EP1020889A1 Process for forming non-evaporative getter and method of producing image forming apparatus |
07/19/2000 | EP1020541A2 Vacuum arc evaporation source and deposition apparatus |
07/19/2000 | EP1019946A2 Device for coating panel-shaped substrates |
07/19/2000 | EP0904424B1 Coating device and process for coating a component with a heat insulating layer |
07/19/2000 | EP0820424B1 Method for the chemical vapour infiltration of a material consisting of carbon and silicon and/or boron |
07/19/2000 | CN1260842A Method and apparatus for low pressure sputtering |
07/19/2000 | CN1260767A Photocatalytic-activated self-cleaning article and method of making same |
07/19/2000 | CN1260406A Plasma treatment apparatus |
07/19/2000 | CN1260232A Method for producing functional film, functional base plate and titanium oxide film |
07/18/2000 | US6091046 Bonding and sputtering target by variable polarity plasma arc welding |
07/18/2000 | US6090702 Embedded electroconductive layer and method for formation thereof |
07/18/2000 | US6090481 Used for vehicle windows, especially for motor cars and railway carriages; carrying a coating including two metal layers formed of silver or silver alloy and three layers of a transparent dielectric non-absorbent material |
07/18/2000 | US6090457 Apparatus for forming a thin film provided with a sputtering target and a vapour source |
07/18/2000 | US6090456 Effective for coating zinc sulfide and zinc selenide infrared windows |
07/18/2000 | US6090444 Base plater or vacuum deposition apparatus with individually and selectively controlled work holders and capacitively coupled crystal monitor |
07/18/2000 | US6090381 Stimulation of an immune response with antibodies labeled with the . .alpha-galactosyl epitope |
07/18/2000 | US6090248 Apparatus for coating substrates |
07/18/2000 | US6090247 Apparatus for coating substrates |
07/18/2000 | US6090246 Grounded collimator positioned between target material and a substrate in a sputtering chamber to restrict a plasma away from the substrate; voltage measurements near the substrate are taken, and parameters are adjusted in response |
07/18/2000 | US6090207 Translational target assembly for thin film deposition system |
07/18/2000 | US6089186 Vacuum coating forming device |
07/18/2000 | US6089027 Fluid storage and dispensing system |
07/18/2000 | US6088947 Member for fishing or sport tool |
07/13/2000 | WO2000041235A1 Method of depositing a copper seed layer which promotes improved feature surface coverage |
07/13/2000 | WO2000041205A1 Apparatus and method for monitoring and tuning an ion beam in ion implantation apparatus |
07/13/2000 | WO2000040770A1 Diffusion bonded sputter target assembly and method of making same |
07/13/2000 | WO2000040769A1 Sputtering target |
07/13/2000 | WO2000040402A1 Layered product |
07/13/2000 | DE10000019A1 Sputter deposition unit, useful for depositing titanium and titanium nitride coatings on semiconductor wafers, has a non-target material surface for receiving and re-sputtering target material onto a workpiece periphery |
07/12/2000 | EP1018566A2 Sputtering target and method for the manufacture thereof |
07/12/2000 | EP1018139A1 Adjustment of deposition uniformity in an inductively coupled plasma source |
07/12/2000 | EP1017874A1 Colorless diamond-like carbon coatings |
07/12/2000 | EP1017872A1 Device for applying layers of hard material by dusting |
07/12/2000 | EP1017871A1 Multilayered coated cutting tool |
07/12/2000 | EP1017870A1 Tool having a protective layer system |
07/12/2000 | EP1017644A1 Glass-based copper-mirrors |
07/12/2000 | EP1017643A1 Glass-based copper-mirrors |
07/12/2000 | EP1017338A1 Method of producing a film coating by matrix assisted pulsed laser deposition |
07/12/2000 | EP0694209B1 ENHANCED QUALITY THIN FILM Cu(In,Ga)Se 2 FOR SEMICONDUCTOR DEVICE APPLICATIONS BY VAPOR-PHASE RECRYSTALLIZATION |
07/11/2000 | US6087014 Vapor deposition material comprising mixed oxide of yttrium and aluminum |
07/11/2000 | US6086963 Method and device for control of a vacuum vaporization process |
07/11/2000 | US6086962 Method for deposition of diamond-like carbon and silicon-doped diamond-like carbon coatings from a hall-current ion source |
07/11/2000 | US6086960 Method for improving the quality of a titanium nitride layer including carbon and oxygen |
07/11/2000 | US6086959 Boron and nitrogen containing coating and method for making |
07/11/2000 | US6086944 Method for activating a plurality of photocathodes |
07/11/2000 | US6086796 Diamond-like carbon over-coats for optical recording media devices and method thereof |
07/11/2000 | US6086735 Contoured sputtering target |
07/11/2000 | US6086734 Thin-film depositing apparatus |
07/11/2000 | US6086730 Applying a voltage by a pulsed power supply |
07/11/2000 | US6086729 Method of manufacturing thin metal membranes |
07/11/2000 | US6086728 Cross flow metalizing of compact discs |
07/11/2000 | US6086727 Movable flux regulator disposed between target and wafer for partially blocking portion of target material from being deposited on said wafer during deposition of target material, wherein movable flux regulator is tiltable in x,y, and z-axis |
07/11/2000 | US6086726 Method of modifying a surface |
07/11/2000 | US6086725 Composed primarily of a magnetically and electrically conductive, to-be-deposited metal, which metal has a tendency to form polycrystals of face-centered cubic structure, including textured polycrystals |
07/11/2000 | US6086676 Programmable electrical interlock system for a vacuum processing system |