| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 09/20/2000 | CN1267061A Electrically conducting transparent film and its preparing process |
| 09/20/2000 | CN1266912A Super-lattice BaTiO3 material with new structure and multiple performance |
| 09/19/2000 | US6121647 A perovskite crystalline lead, titanium and a rare earth oxide used in a semiconductor device, e.g., nonvolatile memories; infrared sensors; optical modulators, switches, integrated circuits; reduced leakage; reverse polarity |
| 09/19/2000 | US6121630 Layer of a mixed oxide of yttrium or a lathanide, barium and copper deposited on a sapphire substrate and covered with a protective layer comprising a crystalline film of strontium titanate; high critical temperature; storage stability |
| 09/19/2000 | US6121178 Sintered ITO and an ITO sputtering target |
| 09/19/2000 | US6121161 Reduction of mobile ion and metal contamination in HDP-CVD chambers using chamber seasoning film depositions |
| 09/19/2000 | US6121134 High aspect ratio metallization structures and processes for fabricating the same |
| 09/19/2000 | US6120975 Methods for production of a plasma display panel |
| 09/19/2000 | US6120891 Comprises an oxide of at least one of niobium, titanium, tantalum, zirconium, cerium, tungsten, molybdenum, iron, or lead; chemical sensors and electrochromic devices |
| 09/19/2000 | US6120857 Low work function surface layers produced by laser ablation using short-wavelength photons |
| 09/19/2000 | US6120844 Depositing self-aligning epsilon layer ofdeposition material on workpiece; depositing conducting material over epsilon layer |
| 09/19/2000 | US6120660 Removable liner design for plasma immersion ion implantation |
| 09/19/2000 | US6120656 Topographically precise thin film coating system |
| 09/19/2000 | US6120286 Vaporizer boat for metal vaporizing |
| 09/19/2000 | US6119626 Vacuum apparatus for forming a thin-film and method for forming thin-film |
| 09/19/2000 | US6119485 Press-molding die, method for manufacturing the same and glass article molded with the same |
| 09/14/2000 | WO2000038213A3 Physical vapor deposition of semiconducting and insulating materials |
| 09/14/2000 | WO2000018980A8 An in-line sputter deposition system |
| 09/14/2000 | DE19910786A1 Magnetron cathode used in atomizing target, includes sealed liquid cooling system to prevent former corrosive damage, in construction dispensing with costly special fasteners |
| 09/13/2000 | EP1035757A1 Substrate electrode plasma generator and substance/material processing method |
| 09/13/2000 | EP1035589A2 Iridium composite barrier structure and method for same |
| 09/13/2000 | EP1035561A2 Refractory coated component for use in thin film deposition and method for making |
| 09/13/2000 | EP1035553A1 Laminate, capacitor, and method for producing laminate |
| 09/13/2000 | EP1034316A1 High purity cobalt sputter target and process of manufacturing the same |
| 09/13/2000 | EP0820359B1 Method and apparatus for circuit board treatment |
| 09/13/2000 | EP0811237B1 Deposition apparatus |
| 09/13/2000 | CN1266279A Method for forming barrier layer used for copper interconnection |
| 09/13/2000 | CN1266107A Apparatus for preparing diamond-like film |
| 09/13/2000 | CN1056465C Thin-film scandium series cathode and its preparation process |
| 09/12/2000 | US6117771 Method for depositing cobalt |
| 09/12/2000 | US6117572 A barrier dielectric in high critical temperature thin film superconductors, ferroelectrics, pyroelectrics, piezoelectrics and microwave devices |
| 09/12/2000 | US6117560 A ceramic surface coatings has a cubic pyrochlore structure |
| 09/12/2000 | US6117559 Double-sided reflector films |
| 09/12/2000 | US6117533 Substrate with a superhard coating containing boron and nitrogen and method of making the same |
| 09/12/2000 | US6117498 Single source thermal ablation method for depositing organic-inorganic hybrid films |
| 09/12/2000 | US6117283 Forming a slider body having a leading end, a trailing end, and an air-bearing surface, forming a single exterior layer of elemental silicon on air-bearing surface to form an exterior wear resistance protective contact layer |
| 09/12/2000 | US6117282 Method of producing amorphous Co-Tb magnetic recording thin films |
| 09/12/2000 | US6117281 A magnetron sputtering target is formed with radially extending grooves to reduce particle contamination during sputtering, which attract redeposited material for resputtering during early stages fine particle nucleation |
| 09/12/2000 | US6117280 Duplex coated steel composite products and method of manufacturing them |
| 09/12/2000 | US6117279 Method and apparatus for increasing the metal ion fraction in ionized physical vapor deposition |
| 09/12/2000 | US6117238 End effector assembly for inclusion in a system for producing uniform deposits on a wafer |
| 09/12/2000 | CA2190086C An electron jet vapor deposition system |
| 09/08/2000 | WO2000052734A1 Method and apparatus for ionized physical vapor deposition |
| 09/08/2000 | WO2000052221A1 Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
| 09/08/2000 | WO2000052220A1 Method and device for coating a product |
| 09/08/2000 | WO2000029636A3 High purity tantalum targets for sputtering |
| 09/08/2000 | CA2363470A1 Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
| 09/07/2000 | DE19913802C1 Thermal barrier coatings are electron beam vapor deposited on high temperature substrates using transport units coupled to media supplies within chambers and briefly uncoupled for transport to the next chamber |
| 09/06/2000 | EP1033745A2 Method for forming a barrier layer for use in a copper interconnect |
| 09/06/2000 | EP1033417A1 Process and apparatus for coating a product, especially a high temperature gas turbine component |
| 09/06/2000 | EP1033416A1 Decorative corrosion and abrasion resistant coating |
| 09/06/2000 | EP1033355A1 Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass and transparent electroconductive film |
| 09/06/2000 | EP1033068A1 Plasma processing apparatus having rotating magnets |
| 09/06/2000 | EP1032947A1 Uhv-compatible in-situ pre-metallization clean and metallization of semiconductor wafers |
| 09/06/2000 | EP1032944A1 Planar magnetron with moving magnet assembly |
| 09/06/2000 | EP1032727A1 Thin films having a rock-salt-like structure deposited on amorphous surfaces |
| 09/06/2000 | EP1032721A2 Wear-resistant, mechanically highly stressed and low-friction boundary coating construction for titanium or the alloys thereof and a method for producing the same |
| 09/06/2000 | CN1265714A Surface coatings |
| 09/06/2000 | CN1265431A Vapor deposition device |
| 09/05/2000 | US6113993 Contacting the gas flow of calcium compounds and phosphate compounds and plasma with a heated substrat at a minimum temperature to decompose the precursor and forming calcium phosphate compund coating having specific thickness |
| 09/05/2000 | US6113985 In the lower temperature zone, the solid reactant is vaporized and transported toward the molten metal, the reaction occurs in higher temperature zone, where metal reacts with halide to produce desired metal nitride and by-products |
| 09/05/2000 | US6113761 Copper sputtering target assembly and method of making same |
| 09/05/2000 | US6113754 Sputtering apparatus having a target backing plate equipped with a cooling line and sputtering method using the same |
| 09/05/2000 | US6113753 Systems and methods for making a magnetic recording medium on a flexible metal substrate |
| 09/05/2000 | US6113752 Sputtering |
| 09/05/2000 | US6113751 Electromagnetic beam assisted deposition method for depositing a material on an irradiated substrate |
| 09/05/2000 | US6113750 Method of forming thin metal films |
| 09/05/2000 | US6113749 Sputtering method in multi-chambered device |
| 09/05/2000 | US6113702 Wafer support system |
| 09/05/2000 | US6113700 Gas diffuser having varying thickness and nozzle density for semiconductor device fabrication and reaction furnace with gas diffuser |
| 09/05/2000 | US6112431 Vacuum processing and operating method |
| 08/31/2000 | WO2000051139A1 Transparent conductive laminate, its manufacturing method, and display comprising transparent conductive laminate |
| 08/31/2000 | WO2000050663A1 Diffusion method for coating high temperature nickel chromium alloy products |
| 08/31/2000 | WO2000050662A1 Magnetron sputtering method and apparatus |
| 08/31/2000 | WO2000028103A3 Vapor source having linear aperture and coating process |
| 08/30/2000 | EP1032032A2 Tailoring of a wetting/barrier layer to reduce electromigration in an aluminium interconnect |
| 08/30/2000 | EP1031639A1 Apparatus for gas flow sputtering |
| 08/30/2000 | EP1030880A1 Electrically conductive filler and method for the production thereof |
| 08/30/2000 | EP0907764B1 Cutting tool and manufacturing method therefor |
| 08/30/2000 | CN1265222A Method and appts. for ionized sputtering of materials |
| 08/30/2000 | CN1265052A Method and appts. for zone lubrication of magnetic media |
| 08/29/2000 | US6111648 Black roll for optical measurement, thin film forming apparatus including the dame, and thin film forming method using the same |
| 08/29/2000 | US6110844 Reduction of particle deposition on substrates using temperature gradient control |
| 08/29/2000 | US6110840 Method of passivating the surface of a Si substrate |
| 08/29/2000 | US6110821 Sputtering metal material from target while maintaining power to coil, shutting off power to target and passing gas through substrate support to backside, powering target and coil and passing gas to backside of substrate to heat to form silicide |
| 08/29/2000 | US6110604 Metallic article having a thermal barrier coating and a method of application thereof |
| 08/29/2000 | US6110598 Low resistive tantalum thin film structure and method for forming the same |
| 08/29/2000 | US6110571 Having a first diffusion layer formed of steel alloy with nitrogen atoms diffused therein, and a second layer of a hard film which contains at least one of a nitride, carbide or carbonitride of a metal |
| 08/29/2000 | US6110337 Sputtering method and apparatus with optical monitoring |
| 08/29/2000 | US6110330 Process for bonding lubricant to magnetic disk |
| 08/29/2000 | US6110329 Method of manufacturing a composite material |
| 08/29/2000 | US6110328 Method of an apparatus for sputtering |
| 08/29/2000 | US6110291 Thin film forming apparatus using laser |
| 08/29/2000 | US6110204 Implant substrate being coated with a material which contains chemical compounds between one or more metals of group iv a of the periodic system, nitrogen and oxygen |
| 08/29/2000 | US6109880 Getter pump module and system including focus shields |
| 08/29/2000 | US6109207 Process for fabricating semiconductor device with shallow p-type regions using dopant compounds containing elements of high solid solubility |
| 08/29/2000 | US6108929 Vacuum processing apparatus |
| 08/25/2000 | CA2299482A1 Magnetron sputtering method and apparatus |
| 08/24/2000 | WO2000049201A1 Method for providing machining tools with a protective coating and associated tool set |
| 08/24/2000 | WO2000049196A1 Plasma deposition method and apparatus with magnetic bucket and concentric plasma and material source |