| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 06/21/2000 | EP1010199A1 Method of forming a barrier layer in a contact structure |
| 06/21/2000 | EP1010194A1 Vacuum sputtering apparatus |
| 06/21/2000 | DE19858913A1 High temperature fretting protective layer, especially for vane foot-disk groove regions of titanium alloy gas turbine engine guide vanes, consists of a copper-aluminum alloy containing chromium and optionally iron |
| 06/21/2000 | DE19857979A1 Vacuum chamber for drying, melting, surface treatment, PVD and CVD coating, etching and other plasma processes comprises functional units flange-connected to frame structure of interlocked profiles |
| 06/21/2000 | CN1257135A Metal indium-stannic oxide compound transparent electricity conductive film and preparation process thereof |
| 06/21/2000 | CN1053712C Rotary target column type magnetic controlled sputtering device |
| 06/20/2000 | US6078133 Field emission device having an amorphous multi-layered structure |
| 06/20/2000 | US6077781 Single step process for blanket-selective CVD aluminum deposition |
| 06/20/2000 | US6077779 Multi-step deposition to improve the conformality of ionized PVD films |
| 06/20/2000 | US6077775 Barrier film of metal ions left behind after annealing of metal halide film |
| 06/20/2000 | US6077621 Method of forming robust metal, metal oxide, and metal alloy layers on ion-conductive polymer membranes |
| 06/20/2000 | US6077596 Coated hard tool having multi-layer coating |
| 06/20/2000 | US6077571 Conformal pure and doped aluminum coatings and a methodology and apparatus for their preparation |
| 06/20/2000 | US6077569 Cleaning, etching, vacuum deposition; ion bombardment and ion beam sputtering |
| 06/20/2000 | US6077407 Sputtering cathode based on the magnetron principle |
| 06/20/2000 | US6077406 Sputtering system |
| 06/20/2000 | US6077403 Sputtering device used in the fabrication of various types of semiconductor articles |
| 06/20/2000 | US6077402 Method and apparatus for generating a plasma to sputter deposit a layer of material in the fabrication of semiconductor devices |
| 06/20/2000 | US6077344 Sol-gel deposition of buffer layers on biaxially textured metal substances |
| 06/20/2000 | US6077157 Process chamber exhaust system |
| 06/20/2000 | US6076264 Coated manicure implement |
| 06/20/2000 | CA2204008C Optical device having low visual light transmission and low visual light reflection |
| 06/15/2000 | WO2000034997A1 Plasma preclean with argon, helium, and hydrogen gases |
| 06/15/2000 | WO2000034991A2 Method of producing a metal oxide film or a structured metal oxide film |
| 06/15/2000 | WO2000034548A1 Multiple-thickness gate oxide formed by oxygen implantation |
| 06/15/2000 | DE19857201A1 Sluice valve for simultaneously closing or opening aligned vacuum chamber passage slits, e.g. of a glass sputtering coating unit, comprises a freely moving slide with a reciprocating body for moving opposite valve plates |
| 06/15/2000 | DE19851062C1 Verfahren zum Beschichten von Magnetspeicherplatten und danach hergestellte Magnetspeicherplatte A process for coating of magnetic storage disks, and then prepared magnetic recording disk |
| 06/15/2000 | CA2290236A1 Method for applying improved durability thermal barrier coatings |
| 06/14/2000 | EP1008868A1 Optical-thin-film material, process for its production, and optical device making use of the optical-thin-film material |
| 06/14/2000 | EP1008670A1 Sputtering target for forming optical disk protective film |
| 06/14/2000 | EP1008669A1 Apparatus for electron beam physical vapor deposition |
| 06/14/2000 | EP1008668A1 Method and apparatus for manufacturing thin film, thin-film laminate, and electronic parts |
| 06/14/2000 | EP1008553A1 Surface functionalized diamond crystals and methods for producing same |
| 06/14/2000 | EP1007762A1 Method and apparatus for detecting the endpoint of a chamber cleaning |
| 06/14/2000 | EP1007759A1 Modulated power for ionized metal plasma deposition |
| 06/14/2000 | EP1007758A1 Method for manufacturing a multilayer film for using in a magnetic head for recording information |
| 06/14/2000 | EP1007757A1 Plastic containers with an external gas barrier coating |
| 06/14/2000 | EP1007756A1 Coatings with a silver layer |
| 06/14/2000 | EP1007755A1 Method and apparatus for making high refractive index (hri) film |
| 06/14/2000 | EP1007754A1 Glancing angle deposition of thin films |
| 06/14/2000 | EP1007569A1 STIMULATION OF AN IMMUNE RESPONSE WITH ANTIBODIES LABELED WITH THE $g(a)-GALACTOSYL EPITOPE |
| 06/14/2000 | EP0979315A4 Titanium crystal and titanium |
| 06/14/2000 | CN1256717A 包装材料 Packaging Materials |
| 06/14/2000 | CN1256324A Vacuum plasma gas-phase deposit process to form multielement and multilayer discrete coating |
| 06/13/2000 | US6074894 Mounting method of semiconductor device |
| 06/13/2000 | US6074768 Process for forming the oxide superconductor thin film and laminate of the oxide superconductor thin films |
| 06/13/2000 | US6074740 Filler may comprise oxidized polyarylene sulfide polyarylene sulfide, polyimide, aromatic polyester, or polyether ketone. |
| 06/13/2000 | US6074730 Optical thickness of the third layer from the substrate is less than one quarter of a wavelength in the center of the low-reflection band, and the second and fourth layers are made of silicon dioxide; inline magnetron sputtering machine |
| 06/13/2000 | US6074538 Thin film forming equipment |
| 06/13/2000 | US6073830 Sputter target/backing plate assembly and method of making same |
| 06/13/2000 | US6073578 RF induction plasma source generating apparatus |
| 06/13/2000 | US6073576 Substrate edge seal and clamp for low-pressure processing equipment |
| 06/08/2000 | WO2000032839A1 Enhanced plasma mode, method, and system for plasma immersion ion implantation |
| 06/08/2000 | WO2000032719A1 Method for forming films or layers |
| 06/08/2000 | WO2000032347A1 Insert target assembly and method of making same |
| 06/08/2000 | WO2000023201A9 Superalloy component with abrasive grit-free coating |
| 06/08/2000 | WO2000008670A3 Dose monitor for plasma-monitor ion implantation doping system |
| 06/08/2000 | WO2000008228A9 Dual collimator physical-vapor deposition apparatus |
| 06/08/2000 | WO2000007223A3 Method for reducing particle emission or absorption on a surface |
| 06/08/2000 | DE19856227A1 Activating fluoropolymer surface for promoting bonding involves modifying surface with plasma activated gas followed by plasma polymer coating |
| 06/08/2000 | DE19856084A1 Verfahren zur Herstellung einer Metalloxidschicht bzw. einer strukturierten Metalloxidschicht A process for producing a metal oxide layer or a structured metal oxide |
| 06/08/2000 | DE19855726A1 Zerstäubungskathode für die Beschichtung von Substraten Sputtering cathode for coating substrates |
| 06/08/2000 | CA2352882A1 Method for forming films or layers |
| 06/07/2000 | EP1006558A1 Sputtering cathode for substrate deposition |
| 06/07/2000 | EP1006211A1 Method and apparatus for plasma treatment of substrates |
| 06/07/2000 | EP1005639A1 Apparatus and method for in-situ thickness and stoichiometry measurement of thin films |
| 06/07/2000 | EP1005577A1 Metallic chromium-tantalum oxide composition, sputtering targets and magnetic recording media |
| 06/07/2000 | EP1005440A1 Silicon oxynitride protective coatings |
| 06/07/2000 | CN1256003A Method for preparing optical recording medium and preparing appts. therefor |
| 06/07/2000 | CN1255553A Multi-layer compounded superhard C3N4/MN film and its synthesizing equipment and process |
| 06/06/2000 | US6071811 Deposition of titanium nitride films having improved uniformity |
| 06/06/2000 | US6071621 Metallized film with continuous opaque layer of metal on polyurethane substrate |
| 06/06/2000 | US6071595 Substrate with low secondary emissions |
| 06/06/2000 | US6071572 Forming tin thin films using remote activated specie generation |
| 06/06/2000 | US6071560 Vapor deposition, adjustment of pressure and bias voltage |
| 06/06/2000 | US6071556 Method of coating an article of manufacturing having a substrate formed of a nickel or cobalt-based superalloy |
| 06/06/2000 | US6071390 Sputtering apparatus |
| 06/06/2000 | US6071389 Diffusion bonded sputter target assembly and method of making |
| 06/06/2000 | US6071350 Semiconductor device manufacturing apparatus employing vacuum system |
| 06/06/2000 | US6071323 Given amount of rare earth element and transition metal element including at least one of iron, nickel and cobalt, homogeneous sintered structure; regenerating by pulverizing, mixing with specific alloy blend used to make target, firing |
| 06/06/2000 | US6070735 Sputtering apparatus simulation method |
| 06/06/2000 | US6070551 Deposition chamber and method for depositing low dielectric constant films |
| 06/06/2000 | US6070341 Vacuum processing and operating method with wafers, substrates and/or semiconductors |
| 06/02/2000 | WO2000031316A1 Co-Ti ALLOY SPUTTERING TARGET AND MANUFACTURING METHOD THEREOF |
| 06/02/2000 | WO2000031315A1 Apparatus and method for pulsed laser deposition of materials on wires and pipes |
| 06/02/2000 | WO2000031310A1 High purity tantalum and products containing the same like sputter targets |
| 06/02/2000 | CA2352336A1 High purity tantalum and products containing the same like sputter targets |
| 05/31/2000 | EP1004687A1 Transparent conductive film, sputtering target and substrate equipped with the transparent conductive film |
| 05/31/2000 | EP1004686A2 High temperature vapor coating container |
| 05/31/2000 | EP1004683A1 Bearing material |
| 05/31/2000 | EP1004498A2 Joining structure and method of vehicle panel sheets |
| 05/31/2000 | EP1004369A1 Sealing lock for a vaccum chamber |
| 05/31/2000 | EP1004136A1 Plasma processing apparatus |
| 05/31/2000 | EP0870070B1 Process for producing organically mofified oxide, oxynitride or nitride layers by vacuum deposition |
| 05/31/2000 | DE19949291A1 Corrosion resistant hard material coating, for nickel electroplated substrates, comprises plasma-assisted deposited chromium and chromium nitride layers |
| 05/31/2000 | CN1052943C Coextruded metallizable cast film for high Al adhesion |
| 05/30/2000 | US6069436 Boron nitride cold cathode |
| 05/30/2000 | US6069369 Superconducting device |
| 05/30/2000 | US6069073 Method for forming diffusion barrier layers |
| 05/30/2000 | US6068890 Method for gloss coating articles |