Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/2000
05/30/2000US6068742 Target arrangement with a circular plate, magnetron for mounting the target arrangement, and process for coating a series of circular disc-shaped workpieces by means of said magnetron source
05/30/2000US6068739 Method of manufacturing data recording medium made of ordered alloy thin film
05/30/2000US6068738 Method and apparatus for thin film coating an article
05/25/2000WO2000030185A1 Quantum well thermoelectric material on very thin substrate
05/25/2000WO2000030155A1 Buffer chamber and method for integrating physical and chemical vapor deposition chambers together in a processing system
05/25/2000WO2000030149A1 Apparatus for providing rf return current path control in a semiconductor wafer processing system
05/25/2000WO2000030147A1 Method and apparatus for ionized physical vapor deposition
05/25/2000WO2000030141A1 Self-oriented bundles of carbon nanotubes and method of making same
05/25/2000WO2000029636A2 High purity tantalum targets for sputtering
05/25/2000WO2000028969A2 Methods for preparing coated drug particles and pharmaceutical formulations thereof
05/25/2000DE19853605A1 Verfahren und Anordnung zur Herstellung einer Leuchtschicht Method and apparatus for producing a luminescent layer
05/25/2000DE19853418A1 Vacuum deposition apparatus used for coating films by condensation of the metal vapor has a gas lance for guiding a cooling gas stream against the film arranged in the winding chamber approximately over the width of the film
05/24/2000EP1002888A2 Method and apparatus for high frequency plasma treatment of a substrate
05/24/2000EP1002887A1 Method and apparatus for producing a luminescent layer
05/24/2000EP1002573A2 The combinatorial synthesis of novel materials
05/24/2000EP1002572A2 The combinatorial synthesis of novel materials
05/24/2000EP1002331A1 Plasma vapor deposition with coil sputtering
05/24/2000EP1002140A1 A phosphorus effusion cell for producing molecular beams to be deposited on a substrate
05/24/2000CN1254191A Production method of high-temp. superconducting film
05/24/2000CN1253878A Thermal resistance coating system and its material
05/24/2000CA2254460A1 Systems and methods for the combinatorial synthesis of novel materials
05/23/2000US6066892 Copper alloy seed layer for copper metallization in an integrated circuit
05/23/2000US6066538 Methods and apparatus for forming integrated circuit capacitors having composite oxide-nitride-oxide dielectric layers therein
05/23/2000US6066392 Vacuum containers, semiconductors; anodic oxidation film on aluminum alloy
05/23/2000US6066361 Method for coating a filament
05/23/2000US6066358 Blanket-selective chemical vapor deposition using an ultra-thin nucleation layer
05/23/2000US6066242 Conical sputtering target
05/23/2000US6066240 Method and device for manufacturing a thin film and magnetic recording medium
05/23/2000CA2051378C Method for producing a heatable and refrigerable element for a system handling small quantities of liquid, and an element manufactured by the method
05/18/2000WO2000028105A1 Apparatus and method for coating objects through pvd
05/18/2000WO2000028104A1 Sputtering apparatus and process for high rate coatings
05/18/2000WO2000028103A2 Vapor source having linear aperture and coating process
05/17/2000EP1001468A1 Rare earth oxide layer on a GaAs- or GaN-based semiconductor body
05/17/2000EP1001448A2 Thin film DC plasma processing system
05/17/2000EP1001051A1 Thin film forming method and thin film forming apparatus
05/17/2000EP1000291A1 Fluid storage and dispensing system
05/17/2000EP1000182A2 Thin films
05/16/2000US6064686 Arc-free electron gun
05/16/2000US6063512 Soft magnetic thin film having Co, Ni and Fe as main ingredients, method of manufacturing the same and magnetic head and magnetic storage unit using the soft magnetic thin film
05/16/2000US6063455 Using pulsed laser generating system
05/16/2000US6063440 Method for aligning a wafer
05/16/2000US6063436 Use of multiple masks to control uniformity in coating deposition
05/16/2000US6063435 Vapor deposition; heating; rotation
05/16/2000US6063254 Method for producing titanium crystal and titanium
05/16/2000US6063248 Process chamber isolation system in a deposition apparatus
05/16/2000US6063246 Membrane is used in ion projection lithography, by itself or as part of a lithography stencil mask
05/16/2000US6063245 Magnetron sputtering method and apparatus utilizing a pulsed energy pattern
05/16/2000US6063244 Dual chamber ion beam sputter deposition system
05/16/2000US6063200 Three-dimensional micro fabrication device for filamentary substrates
05/16/2000CA2048641C Pyrotechnic materials
05/16/2000CA1340995C Amorphous oxide film and article having such film thereon
05/11/2000WO2000027175A1 Adhesion-promoting layer for generating conductor structures with good adhesive properties on insulating material used in electronics
05/11/2000WO2000026953A1 Thin film forming method, and semiconductor light emitting device manufacturing method
05/11/2000WO2000026950A1 Method and device for ion implanting
05/11/2000WO2000026939A1 Apparatus for coupling power through a workpiece in a semiconductor wafer processing system
05/11/2000WO2000026938A1 Apparatus for ion implantation
05/11/2000WO2000026434A1 Improved corrosion resistant coating
05/11/2000WO2000026431A1 Gas cluster ion beams for formation of nitride films
05/11/2000WO2000026430A1 Sputtering apparatus
05/11/2000WO2000008671A3 Device for coating panel-shaped substrates
05/11/2000DE19952273A1 Copper connection film, e.g. for an ultra large scale integration, is produced by high pressure grain growth heat treatment of a deposited film while suppressing pore formation
05/11/2000DE19950852A1 Low resistance thin film, especially a transparent conductive electrode for a display or solar cell, is arc discharge ion plated using h.f. bias voltage application to the anode or cathode
05/11/2000DE19948389A1 Sputter target for protective layer deposition on optical recording media, e.g. optical diskettes, comprises a sintered body of zinc sulfide, silicon dioxide and a mixed zinc and silicon oxide
05/11/2000DE19852325C1 Continuous gallium(I) compound vapor stream, especially for doping x-ray absorbing phosphors produced by reducing divalent or trivalent gallium compound vapor with gallium metal in a closed crucible having a small vapor outlet
05/11/2000DE19851579A1 Metallized plastic for metallizing decorative plastics, for shower fittings, and as housings for computers and mobile phones shows strong adhesion of the metal coating to the plastics surface especially when activated
05/10/2000EP0999291A1 Method for producing thin film coated magnetic disks and thin film magnetic disks thus obtained
05/10/2000EP0999290A1 Wear-resistant coated member
05/10/2000EP0998687A1 Improved anti-reflective composite
05/10/2000EP0998592A2 Method of using hydrogen and oxygen gas in sputter deposition of aluminum-containing films and aluminum-containing films derived therefrom
05/10/2000EP0998310A1 Coronary stent with a radioactive, radiopaque coating
05/10/2000EP0830218A4 Structures having enhanced biaxial texture and method of fabricating same
05/10/2000CN1252893A Method for producing silicon oxide film, method for making semiconductor device, semiconductor device, display, and infrared irradiating device
05/10/2000CN1252844A In situ getter pump system and method
05/09/2000US6060836 Plasma generating apparatus and ion source using the same
05/09/2000US6060755 Aluminum-doped zirconium dielectric film transistor structure and deposition method for same
05/09/2000US6060182 Hard coating material, sliding member covered with hard coating material and manufacturing method thereof
05/09/2000US6060175 A polyimide film surface having a non-continuous random distribution of metal oxide from the group of oxides of iron, chromium, nickel, molybdenum, manganese, and/or zirconium; a metal layer, a sputtered chromium layer; printing
05/09/2000US6060127 Mechanically restricted laser deposition
05/09/2000US6060036 Radioactive seed implants
05/09/2000US6059945 Sputter target for eliminating redeposition on the target sidewall
05/09/2000US6059940 Method for fabricating dual layer protective barrier copper metallization
05/09/2000US6059938 Ionic bombardment from discharge of gas flow onto target plate; then detaching
05/09/2000US6059872 Smooth titanium nitride films having low resistivity
05/09/2000US6059517 End effector assembly for inclusion in a system for producing uniform deposits on a wafer
05/09/2000US6058740 Glass substrate deposition system having lateral alignment mechanism
05/04/2000WO2000025347A1 Plasma treatment apparatus and method
05/04/2000WO2000025005A1 Product with a heat insulating layer and method for the production of a heat insulating layer
05/04/2000WO2000024967A1 Barrier coatings
05/04/2000WO2000024947A1 Sliding member and manufacturing method therefor
05/04/2000WO2000024946A1 Process for making metal flakes
05/04/2000WO2000024686A1 Layered films for transparent substrates
05/04/2000WO2000024527A1 Method for producing adhesive surface coatings
05/04/2000DE19950381A1 Verfahren und Vorrichtungen zum Sputtern Methods and apparatus for sputtering
05/04/2000DE19850424A1 Apparatus to apply differential and integral coatings to a substrate by PVD has a mask with structured openings for the coatings to give a single sample body for post-process analysis
05/04/2000CA2348378A1 Method for producing adhesive surface coatings
05/03/2000EP0997552A1 Method and apparatus for forming thin functional film
05/03/2000EP0997432A1 A method for forming an ultra microparticle-structure
05/03/2000EP0996972A1 Method for targeted production on n-type conductive areas in diamond layers by ion implantation
05/03/2000EP0996966A1 Fluid delivery system and method
05/03/2000EP0996964A1 Apparatus and method for delivering a gas
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