Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2000
11/01/2000CN1272072A Multilayer metalized composite on polymer film product and process
11/01/2000CN1271784A Method of depositing film on substrate surface and substrate made by said method
10/2000
10/31/2000US6140909 Heat-generating resistor and use thereof
10/31/2000US6140236 High throughput A1-Cu thin film sputtering process on small contact via for manufacturable beol wiring
10/31/2000US6139984 Sliding member
10/31/2000US6139969 Reactive sputtering of silicon and transition metal
10/31/2000US6139968 Optical filter
10/31/2000US6139964 Plasma enhancement apparatus and method for physical vapor deposition
10/31/2000US6139936 Discrete track media produced by underlayer laser ablation
10/31/2000US6139706 Sputter cathode
10/31/2000US6139702 Performed before etching a dielectric layer to expose a metal silicide layer.
10/31/2000US6139701 Copper target for sputter deposition
10/31/2000US6139699 Controlling particular process variables during deposition of the film.
10/31/2000US6139696 Method and apparatus for forming a layer on a substrate
10/31/2000US6139695 For fabrication of integrated circuits from silicon wafers, and particularly in the production of magnetic recording media.
10/31/2000US6139649 Diffusion method for coating high temperature nickel chromium alloy products
10/31/2000US6139191 Half bearing
10/31/2000US6139022 A diamond-like carbon hard overcoatings with dispersed carbides of one or more elements selected from the group consisting of silicon, titanium, tungsten, chromium, molybdenum, niobium, and vanadium; use in internal combustion
10/31/2000US6138745 Two-stage sealing system for thermally conductive chuck
10/31/2000US6138606 Ion implanters for implanting shallow regions with ion dopant compounds containing elements of high solid solubility
10/26/2000WO2000063953A1 Method of manufacturing semiconductor device and manufacturing line thereof
10/26/2000WO2000063947A1 Temperature controller for plasma processing
10/26/2000WO2000063460A1 Method for vacuum treatment of workpieces and vacuum treatment facility
10/26/2000WO2000063459A1 Method and apparatus for deposition of diamond like carbon
10/26/2000WO2000063458A2 Method and simulator for simulating the development of residual stress in iapvd films
10/26/2000WO2000062943A1 Release layer, method for producing the same and its use
10/26/2000WO2000062830A2 Coating medical devices using air suspension
10/26/2000DE4018665A1 Einrichtung zum Aufbringen von Keramikschichten Means for applying ceramic layers
10/26/2000DE19934030A1 Heat generating resistor, for an ink jet head, consists of ruthenium and tantalum layers or a tantalum-ruthenium alloy layer
10/26/2000DE19900437A1 Surface coating and/or implantation of solid objects or human or animal tissue is carried out using one or more laser beams coaxial with ion beam from electron cyclotron resonance ion source
10/26/2000CA2368962A1 Coating medical devices using air suspension
10/26/2000CA2366953A1 Release layer, method for producing the same and its use
10/25/2000EP1047116A2 Backside gas delivery system for a semiconductor wafer processing system
10/25/2000EP1047105A2 Ion implanter
10/25/2000EP1047102A2 Ion implanter with vacuum piston counterbalance
10/25/2000EP1047101A2 Ion implanter
10/25/2000EP1046727A2 Method of film deposition on substrate surface and substrate produced by the method
10/25/2000EP1046726A2 Sputtering method for the formation of carbon films
10/25/2000EP1046183A1 Ion implantation device arranged to select neutral ions from the ion beam
10/25/2000CN1271420A Improved anti-reflective composite
10/25/2000CN1270878A Amorphous diamond coating of knife blade
10/25/2000CN1270872A Vacuum laser machining equipment
10/25/2000CN1057799C Method for preparing titanium nitride layer
10/24/2000US6137112 Time of flight energy measurement apparatus for an ion beam implanter
10/24/2000US6136693 Method for planarized interconnect vias using electroless plating and CMP
10/24/2000US6136463 HSPES membrane electrode assembly
10/24/2000US6136431 Soft magnetic thin film and magnetic head
10/24/2000US6136403 A recording medium on a hard disk includes a magnetic data recording layer on the disk, a hydrogenated carbon buffer layer over the data recording layer and a nitrogenated overcoat layer over the buffer layer; durability
10/24/2000US6136385 Surface reforming method of a metal product
10/24/2000US6136168 Clean transfer method and apparatus therefor
10/24/2000US6136167 Portable apparatus for thin deposition
10/24/2000US6136166 Apparatus for producing a uniform magnetic field over a large surface area of a wafer
10/24/2000US6136165 Apparatus for inductively-coupled-plasma-enhanced ionized physical-vapor deposition
10/24/2000US6136164 Apparatus for detecting position of collimator in sputtering processing chamber
10/24/2000US6136162 Method and apparatus for depositing zinc oxide film and method for producing photoelectric converter device
10/24/2000US6136161 Fabrication of electrochromic device with plastic substrates
10/24/2000US6136160 Heat treatment of substrate under vacuum after sputtering carbon in a nitrogen atmosphere to increase compressive strain resistance of carbon film
10/24/2000US6136159 Method for depositing metal
10/24/2000US6136156 Cooling/condensation to uniformly agglomerate laser ablated silicon/metal target material in an oxygen atmosphere to form three-dimensional web of porous mixed oxide nanoparticles
10/24/2000US6136095 Apparatus for filling apertures in a film layer on a semiconductor substrate
10/24/2000US6135128 Method for in-process cleaning of an ion source
10/24/2000US6135051 End effector assembly for inclusion in a system for producing uniform deposits on a wafer
10/24/2000US6134972 Air data sensing probe with chromium surface treatment
10/20/2000CA2268479A1 Metalized paperboard
10/19/2000WO2000062329A1 Method and apparatus for radio frequency isolation of liquid heat transfer medium supply and discharge lines
10/19/2000WO2000062327A2 Rectangular cathodic arc source and method of steering an arc spot
10/19/2000WO2000062326A1 Method and apparatus for ion implantation
10/19/2000WO2000062325A1 Method and apparatus for ion implantation
10/19/2000WO2000061841A1 Slicing of single-crystal films using ion implantation
10/19/2000WO2000061832A1 Method and getter devices for use in deposition of thin layers
10/19/2000DE19933230A1 Release layer used, e.g., for production of nanoparticles, pigments, paint, embossed sheet or structured surfaces contains an organic monomer, e.g. melamine, deposited by vacuum vapor deposition
10/19/2000DE19916938A1 Cooling system, for e.g. a magnetron cathode target useful for CD coating, has a flat bearing ring with grooves for the limbs of an U-shaped piston to form a cooling channel between the ring and the piston interior
10/19/2000DE19916666A1 Vacuum chamber, especially a lock chamber for a flat glass coating unit, has substrate transport rollers additionally supported by middle bearings mounted on rams
10/19/2000CA2365992A1 Slicing of single-crystal films using ion implantation
10/18/2000EP1045464A1 Electrochemical hydrogen storage alloys
10/18/2000EP1045423A2 Electron beam gun
10/18/2000EP1045232A2 Infrared sensor and method of manufacturing the same
10/18/2000EP1044934A2 Solar-shading light-transmissive panel and solar-shading multi-layer light-tranmissive panel using same
10/18/2000EP1044459A1 Plasma device including a powered non-magnetic metal member between a plasma ac excitation source and the plasma
10/18/2000EP1044367A1 Production of the chalcogenide glass layer of a heavy metal electrode by means of laser ablation
10/18/2000CN1270640A Device and method for detecting and preventing arcing in RF plasma systems
10/18/2000CN1057572C Compound target body and making method thereof
10/17/2000US6133127 Method for manufacturing a semiconductor device
10/17/2000US6132805 Can be activated to confine or interrupt plasma distributions, including line-of-sight transmissions between physical-vapor deposition target electrodes and substrates; used to isolate transmissions between process energy source and substrate
10/17/2000US6132576 Vacuum sputtering apparatus
10/17/2000US6132575 Magnetron reactor for providing a high density, inductively coupled plasma source for sputtering metal and dielectric films
10/17/2000US6132568 Manufacturing method of samarium sulfide thin films
10/17/2000US6132567 By depositing a metalloid on a light rare earth-transition metal alloy using a sputtering method
10/17/2000US6132566 Device for shielding a plasma energy source from a plasma region during semiconductor processing; method for depositing titanium nitride and titanium onto a workpiece in a plasma chamber
10/17/2000US6132564 In-situ pre-metallization clean and metallization of semiconductor wafers
10/17/2000US6132563 Reactive sputtering process
10/17/2000US6132562 Method and device for transporting cylindrical substrates to be coated
10/17/2000US6132517 Multiple substrate processing apparatus for enhanced throughput
10/17/2000US6132516 Vacuum deposition apparatus
10/17/2000CA2061602C Process for producing plastic lens
10/12/2000WO2000060657A1 Endpoint detection in the fabrication of electronic devices
10/12/2000DE19850592C1 Haftvermittlerschicht zur Erzeugung haftfester Leiterstrukturen auf Isoliermaterialien der Elektronik Adhesive layer to produce adherent conductor structures on insulating the electronics
10/11/2000EP1043765A1 Thin film forming method, and semiconductor light emitting device manufacturing method
10/11/2000EP1043606A1 Light transmitting electromagnetic wave filter and process for producing the same
10/11/2000EP1043418A2 Method for forming thin film
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