Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
08/2000
08/24/2000WO2000048725A1 Method for preparation of libraries using a combinatorial molecular beam epitaxy (combe) apparatus
08/24/2000DE19906676A1 Bedampfungsvorrichtung A steamer
08/23/2000EP1030364A2 Laminated ceramic with multilayer electrodes and method of fabrication
08/23/2000EP1030344A2 Continuously variable aperture for high-energy ion implanter
08/23/2000EP1030343A2 Method & system for operating a variable aperture in an ion implanter
08/23/2000EP1029945A1 Method for coating tools
08/23/2000EP1029942A1 Drive mechanism for vacuum device and vacuum device
08/23/2000EP1029941A2 Thin film deposition plant with differentiated sectors for plasma assisted techniques
08/23/2000EP1029661A1 Composite film and process for its manufacture
08/23/2000EP1029371A1 CONSTRUCTION WITH HIGH T c? SUPERCONDUCTOR MATERIAL AND METHOD FOR PRODUCING SAID CONSTRUCTION
08/23/2000EP1029105A1 PVD Al 2?O 3? COATED CUTTING TOOL
08/23/2000EP1029104A1 GAZ JET PVD METHOD FOR PRODUCING A LAYER WITH MoSi 2?
08/23/2000EP1029103A1 Coating method and device
08/23/2000EP1029102A1 Organic coated materials for reflectors and decorative purposes
08/23/2000EP1028824A1 Refractory metal silicide alloy sputter targets, use and manufacture thereof
08/23/2000CN1264432A Method and device for vacuum-coating substrate
08/23/2000CN1263952A Device for forming vacuum coating
08/23/2000CN1055658C Foil and method of making same
08/22/2000US6108144 Method of welding an optical component to a metal attachment element and an optical assembly incorporating the metal attachment element
08/22/2000US6107688 Aluminum-containing films derived from using hydrogen and oxygen gas in sputter deposition
08/22/2000US6107199 Method for improving the morphology of refractory metal thin films
08/22/2000US6107195 Method for depositing a low-resistivity titanium-oxynitride (TiON) film that provides for good texture of a subsequently deposited conductor layer
08/22/2000US6107192 Reactive preclean prior to metallization for sub-quarter micron application
08/22/2000US6106958 Coating provides color of brass to articles such as door knobs, handles, trivets, lampes and other brass articles and also provides abrasion and corrosion protection
08/22/2000US6106933 Transparent gas barrier biaxially oriented polypropylene film, a laminate film, and a production method thereof
08/22/2000US6106894 Protective coatings on aluminum for corrosion resistance
08/22/2000US6106890 Method for forming a thin film of ultra-fine particles and an apparatus for the same
08/22/2000US6106682 Thin-film processing electromagnet for low-skew magnetic orientation
08/22/2000US6106681 ITO sputtering target and its cleaning method
08/22/2000US6106677 Method of creating low resistance contacts in high aspect ratio openings by resputtering
08/22/2000US6106676 Method and apparatus for reactive sputtering employing two control loops
08/22/2000US6106631 Plasma processing apparatus
08/22/2000US6106627 Apparatus for producing metal coated polymers
08/22/2000CA2208162C Reactive pvd with neg pump
08/17/2000WO2000048238A1 Multilayer structure with controlled internal stresses and method for making same
08/17/2000WO2000048226A1 High-density plasma source for ionized metal deposition
08/17/2000WO2000048204A1 Conductive nitride film, process for producing the same, and antireflection object
08/17/2000WO2000047530A1 Improvements in coating glass
08/17/2000WO2000047357A1 Method for producing a cutting tool and a cutting tool
08/17/2000WO2000018979A8 Sputter deposition apparatus
08/17/2000DE19905735A1 Verfahren zum Herstellen eines Zerspanungswerkzeugs sowie Zerspanungswerkzeug A method of manufacturing a cutting tool and cutting tool
08/16/2000EP1028176A1 Substrate holder and method for its use
08/16/2000EP1028174A1 Web coating apparatus
08/16/2000EP1028173A2 Titanium nitride barrier layers
08/16/2000EP1027726A1 Method for optimising the etch rate of a polycrystalline layer
08/16/2000EP1027463A1 Metal article with fine uniform structures and textures and process of making same
08/16/2000EP1027172A1 Protective overcoat for replicated diffraction gratings
08/16/2000EP0628212B1 Dc power supply for a plasma processing system
08/16/2000EP0435980B2 Bearings
08/15/2000US6104025 Ion implanting apparatus capable of preventing discharge flaw production on reverse side surface of wafer
08/15/2000US6103620 Method for producing titanium silicide
08/15/2000US6103607 Manufacture of MOSFET devices
08/15/2000US6103597 Method of obtaining a thin film of semiconductor material
08/15/2000US6103357 Comprising body of sintered cemented carbide or cermet, ceramic or high speed steel on which one of the functioning parts of the surface of the body, a thin, adherent, hard and wear resistant metal nitride or carbide coating is applied
08/15/2000US6103330 Comprising a phase change type recording layer containing at least one element selected from indium, silver, tellurium and antimony; the recording layer is formed by sputtering
08/15/2000US6103321 Method of manufacturing an ultraviolet resistant object
08/15/2000US6103320 A metallic ultra-thin film vacuum deposited on a substrate is contacted with a electrically neutral activated species of a reactive gas, e.g. nitrogen, fluorine, to convert the metal to an ultra-thin film of a metal compound; multilayers compound;
08/15/2000US6103318 Physical deposition, e.g. evaporation, of a mask layer of silicon on a silica substrate, the mask having a thickness of >1 mu m; bombarding the mask layer with ions while depositing to reduce a compressive or tensile stress; etching
08/15/2000US6103305 Depositing an amorphous diamond film with specific atomic structure and bonding to a substrate; annealing the film at sufficiently high temperature about 650 degrees c. to relieve the compressive stress in said film without softening
08/15/2000US6103298 Method for making a low work function electrode
08/15/2000US6103079 Anti-leakage apparatus
08/15/2000US6103074 Placing in vacuum chamber; depressurization; applying anti-parallel magnetic field; arc discharging
08/15/2000US6103073 Masking, etching; side reading and writing; accuracy
08/15/2000US6103070 Insulative, inter-turn shield positioned at a channel defining coil windings; confining generated plasma
08/15/2000US6103069 Hermetic sealing, sputtering; semiconductors
08/15/2000US6103019 Advanced technique to grow single crystal films on amorphous and/or non-single crystal surfaces
08/15/2000US6103010 Method of depositing a ferromagnetic film on a waveguide and a magneto-optic component comprising a thin ferromagnetic film deposited by the method
08/15/2000US6101971 Ion implantation control using charge collection, optical emission spectroscopy and mass analysis
08/15/2000US6101816 Fluid storage and dispensing system
08/10/2000WO2000047023A1 Method and apparatus for deposition of diamond-like carbon coatings from a hall-current ion source
08/10/2000WO2000046432A1 Tungsten doped crucible and method for preparing same
08/10/2000WO2000046420A1 Thermal barrier coating resistant to sintering
08/10/2000WO2000046418A1 Device for coating substrates with a vaporized material under low pressure or in a vacuum using a vaporized material source
08/10/2000WO2000045892A1 Method for intravascular radiation therapy
08/10/2000WO1999056057A9 Fluid storage and dispensing system
08/09/2000EP1026723A2 Vacuum coating forming device
08/09/2000EP1026284A1 Sputtering target and part for thin film-forming apparatus
08/09/2000EP1026283A1 Method for preparing high purity ruthenium sputtering target and high purity ruthenium sputtering target
08/09/2000EP1025277A1 Vacuum coating installation and coupling device
08/09/2000EP1025276A1 Device and method for detecting and preventing arcing in rf plasma systems
08/09/2000EP0842004B1 Cutting tool
08/09/2000EP0686093B1 Metal on plastic films with adhesion-promoting layer
08/08/2000US6101316 Evaporation apparatus, organic material evaporation source, and method of manufacturing thin organic film
08/08/2000US6100628 Electron emissive film and method
08/08/2000US6100200 Sputtering process for the conformal deposition of a metallization or insulating layer
08/08/2000US6099982 Starting powders for ITO production, ITO sinters and processes for producing such starting powders and ITO sinters
08/08/2000US6099939 Adhesion of metal by vapor depositon on substrate from organic dielectric layer
08/08/2000US6099917 Pretreatment of oxide substrates and radiation reactive n2+ ion beams on oxide substrates
08/08/2000US6099896 Method and apparatus for zone lubrication of magnetic media
08/08/2000US6099706 Magnetic film forming apparatus which applies a parallel magnetic field across a substrate
08/08/2000US6099705 Physical vapor deposition device for forming a uniform metal layer on a semiconductor wafer
08/08/2000US6099700 Overcoming the blistering problem by increasing the added amount of hydrogen, propagation velocity and electromechanical coupling coefficient.
08/08/2000US6099699 Thin encapsulation process for making thin film read/write heads
08/08/2000US6099698 Having micro-waviness on a fabrication surface of a substrate for reducing dynamic friction and controlling head float,
08/08/2000US6099667 Uniformly discharging gas over the width of the steel substrate, and dissipating electrical power from the plasma discharges into the steel resulting in uniform heating
08/08/2000US6099598 Fabrication system and fabrication method
08/08/2000US6099457 Endocurietherapy
08/08/2000US6098655 Alleviating sticking of normally closed valves in nuclear reactor plants
08/03/2000WO2000045422A2 Inflatable slit/gate valve
08/03/2000WO2000044960A1 Matrix assisted pulsed laser evaporation direct write