Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
10/2000
10/11/2000EP1042795A1 Precleaning step prior to metallization for sub-quarter micron application
10/11/2000EP1042788A1 Vacuum treatment installation
10/11/2000EP1042541A1 Method for producing abrasive tips for gas turbine blades
10/11/2000EP1042527A1 Coated cemented carbide cutting tool and method of coating it with diamond
10/11/2000EP1042526A1 Magnetron sputtering source
10/11/2000EP1042247A1 Layered films for transparent substrates
10/11/2000EP0931175B1 Conveyor and delivery device
10/11/2000CN1269905A Method for regulating coating process
10/11/2000CN1269847A Method of depositing electrocatalyst and electrodes formed by such method
10/11/2000CN1269699A Light-penerating electromagnetic wavefilter and mfg. technology thereof
10/11/2000CN1269609A Method for forming transparent conductive film and transparent conductive film formed therefrom
10/11/2000CN1269427A Zone-selecting polymer film-coating method
10/11/2000CN1057347C Method for preparing multi-arc ion sputtering alloy coatings
10/10/2000US6130002 Process for producing organically modified oxide, oxynitride or nitride layers by vacuum deposition
10/10/2000US6129951 Apparatus and method for matrix coating fibres with metal vapour
10/10/2000US6129856 Process for surface-finishing inner surfaces of hollow bodies and apparatus for carrying out the process
10/10/2000US6129046 Substrate processing apparatus
10/09/2000CA2304028A1 Method for forming thin film, spheroid coated with thin film, light bulb using the spheroid and equipment for film formation
10/05/2000WO2000059048A1 Method and device for coating both sides of a substrate
10/05/2000WO2000058995A2 Apparatus for improving plasma distribution and performance in an inductively coupled plasma
10/05/2000WO2000058049A1 Arc-free electron gun
10/05/2000WO2000058030A1 Methods for making polyurethanes as thin films
10/05/2000WO2000058029A1 Vacuum deposition and curing of oligomers and resins
10/05/2000DE10000592A1 Production of reflective pigments is carried out by continuous simultaneous vapor deposition of applied highly-refractive transparent layer and light-absorbing metal
10/04/2000EP1041644A2 Transparent and conductive zinc oxide film with low growth temperature
10/04/2000EP1041170A2 Nickel/vanadium sputtering target with ultra-low alpha emission
10/04/2000EP1041169A1 Apparatus for coating substrates by a PVD process
10/04/2000EP1007755A4 Method and apparatus for making high refractive index (hri) film
10/04/2000EP0914488A4 Magnetic disk substrates formed of ceramic-metal matrix composites with or without metal cladding
10/04/2000CN2399402Y Super-high vacuum multifunctional magnetic controlled sputtering appts.
10/04/2000CN2399401Y Continuous film coating appts. for plane display
10/04/2000CN2399400Y Ion beam sputtering film coating machine
10/04/2000CN1269046A Device and method for mfg. optical recording medium
10/04/2000CN1268922A Method for forming a silicon layer on a surface
10/04/2000CN1268672A New type rapid photoelectric response material metal/insulator embedded cluster film and its preparation method
10/04/2000CN1268581A Composite evaporation deposition coating prodn. method, and composite evaporation deposition materials and method for producing same
10/04/2000CN1268535A Corrosion resistance and wear-resistance decoration coatings
10/03/2000US6128087 System for evaluating thin film coatings
10/03/2000US6127914 A thin-film temperature-sensitive resistor material comprises, at a temperature-sensitive resistor portion, a mixed crystal of a vanadium oxynitride
10/03/2000US6127048 The invention relates to a superalloy substrate, a thermal barrier layer and a layer anchoring the thermal barrier layer onto the substrate; used for gas turbines
10/03/2000US6127016 Capable of recording, reproducing and erasing information by application of electromagnetic waves, such as a laser beam; erasability and sensitivities, minimum jitter, and shelf stability and repetition reliability
10/03/2000US6127006 Heat-insulating layers on monocrystalline and polycrystalline metal substrates having an improved crystallographic relationship between layer and substrate
10/03/2000US6126995 Process for producing stable divalent scandium
10/03/2000US6126793 Electrodepositing a multilayer in one vacuum vessel
10/03/2000US6126792 Vapor depositing in a vacuum chamber by supplying the excitation gas through a tube directed to the plastic eyeglass substrate
10/03/2000US6126791 Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target
10/03/2000US6126790 Method of magnetically orienting thin magnetic films with a multiple-coil electromagnet
10/03/2000US6126760 Evaporation material
10/03/2000US6126744 Method and system for adjusting semiconductor processing equipment
10/03/2000US6125530 Method and apparatus for handling laser bar
09/2000
09/28/2000WO2000056949A1 Method for the vacuum arc-processing of a metallic wire (cable, strip), device for realising the same and variants
09/28/2000WO2000056948A1 Systems and methods for making a magnetic recording medium on a flexible metal substrate
09/28/2000WO2000056947A1 Vacuum arc evaporation method, vacuum arc evaporation system, and rotary cutting tool
09/28/2000WO2000056946A1 Wear resistant coating
09/28/2000DE19914129A1 Verfahren zum doppelseitigen Beschichten eines Substrates mit insbesondere einem HTS-Material durch Materialabscheidung und Vorrichtung zur Durchführung des Verfahrens A method for double-sided coating a substrate with a particular HTS material by material deposition and apparatus for carrying out the method
09/27/2000EP1039531A2 Interconnection in semiconductor device and method of manufacturing the same
09/27/2000EP1038306A1 Method and device for improving surfaces
09/27/2000EP1038051A2 Thermal barrier coating ceramic structure
09/27/2000EP1038046A1 Plasma reactor with a deposition shield
09/27/2000EP1038045A1 A method and apparatus for magnetically enhanced sputtering
09/27/2000EP1038044A2 Wear- and friction reducing layer, substrate with such a layer and method for producing such a layer
09/27/2000EP1037717A1 Modification of surfaces in order to increase surface tension
09/27/2000CN1267912A Semi-conductor and its producing method
09/27/2000CN1267745A Preparation of solar energy photovoltaic material-carbon film
09/26/2000US6124027 Method for making porous zeolitic films
09/26/2000US6124020 Magnetic recording medium and production method thereof
09/26/2000US6124003 Film depositing method and film depositing apparatus
09/26/2000US6123997 Method for forming a thermal barrier coating
09/26/2000US6123986 Metal layer is rendered porous because it is deposited on a porosity inducing surface, the porosity inducing surface being the surface of a porous primer layer or a surface which has been roughened
09/26/2000US6123816 Electrode and preparation thereof
09/26/2000US6123814 Producing substrates with optical layers, sputtering targets, rotation
09/26/2000US6123791 Dielectric windows supported on walls, ceramics, pedestals. power sources and gas introducing assembly
09/26/2000US6123787 Process for manufacturing ITO alloy articles
09/26/2000US6123494 Process for the loading and unloading of an evacuatable treatment chamber and handling device for carrying out the process
09/26/2000US6122921 Shield to prevent cryopump charcoal array from shedding during cryo-regeneration
09/21/2000WO2000055655A1 Adhesion layer for metal oxide uv filters
09/21/2000WO2000055654A1 Ultraviolet filters with enhanced weatherability and method of making
09/21/2000WO2000055389A1 Method of making a multilayer article by arc plasma deposition
09/21/2000WO2000055388A2 Method and apparatus for arc deposition
09/21/2000WO2000055386A1 Heating device
09/21/2000WO2000054969A1 Flexible laminate for flexible circuit
09/21/2000WO2000054899A1 A method for a repetitive ion beam processing with a by carbon containing ion beam
09/21/2000WO2000030185A8 Quantum well thermoelectric material on very thin substrate
09/21/2000WO2000022648A9 Ionized metal plasma source, comprising a centrally arranged additional rf coil
09/21/2000DE19912707A1 Behandlungsanlage für flache Substrate Treatment plant for flat substrates
09/21/2000CA2332789A1 Flexible laminate for flexible circuit
09/20/2000EP1037255A2 Scanning wheel for ion implantation process chamber
09/20/2000EP1036863A1 Method for synthesizing n-type diamond having low resistance
09/20/2000EP1036859A1 Improved copper target for sputter deposition
09/20/2000EP1036858A1 Method and apparatus for fabricating a wafer spacing mask on a substrate support chuck
09/20/2000EP1036850A1 Ni-BASED SINGLE CRYSTAL ALLOY HAVING COATING FILM FOR PREVENTING RECRYSTALLIZATION FRACTURE
09/20/2000EP1036774A1 Glass substrate having transparent conductive film
09/20/2000EP1036213A1 Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning
09/20/2000EP1036212A1 Device for vacuum coating slide bearings
09/20/2000EP1036211A1 Sputtering target
09/20/2000EP1036210A1 Apparatus for surface modification of polymer, metal and ceramic materials using ion beam
09/20/2000EP1036208A2 Carbon coatings, method and apparatus for applying them, and articles bearing such coatings
09/20/2000EP0823944A4 Sputtering device
09/20/2000CN2397127Y Metal low temp. infiltrating device
09/20/2000CN1267398A Controlled conversion of metal oxyfluorides into superconducting oxides