Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
11/2000
11/23/2000DE19922873A1 Bottle conveyor for moving bottles into and out of treatment chamber has rotor and pairs of star wheels arranged around its circumference with gripping devices and transfer component to transfer bottles between them
11/22/2000EP1054438A2 System and method for cleaning silicon-coated surfaces in an ion implanter
11/22/2000EP1054075A1 Sliding part covered with lubrication promoting oxides stabilized by trace elements
11/22/2000EP1053810A2 Sputtering target and method of making same
11/22/2000EP1053377A1 Vehicle door latch mechanism
11/22/2000CN2407016Y Apparatus for depositing film by electric arc process with pulse assistant filtering
11/22/2000CN2407015Y Device for eliminating semi-save orifices of edge filters in short wave communication
11/21/2000US6151532 Method and apparatus for predicting plasma-process surface profiles
11/21/2000US6150720 Semiconductor device having manufacturing wiring structure with buried plugs
11/21/2000US6150047 Polymer electrolyte membrane assembly for fuel cells
11/21/2000US6150039 A structure providing overcoating on gold, comprising a thin metallic binder layer bonded to gold; and alternating low and high indices of refraction dielectric overcoating layers adhered to the thin metallic binder layer
11/21/2000US6150034 Biaxially textured article comprising a substrate of nickel or copper, the substrate surface exhibiting biaxial texture; and a buffer layer of yttrium oxide (y2o3) or ytterbium oxide (yb2o3) epitaxially disposed on the textured surface
11/21/2000US6150030 Substrate coated with an MgO-layer
11/21/2000US6149785 Apparatus for coating powders
11/21/2000US6149784 Sputtering chamber shield promoting reliable plasma ignition
11/21/2000US6149783 Vacuum treatment apparatus
11/21/2000US6149777 Method of producing smooth titanium nitride films having low resistivity
11/21/2000US6149776 Copper sputtering target
11/21/2000US6149367 End effector assembly for inclusion in a system for producing uniform deposits on a wafer
11/21/2000US6149162 Sliding member
11/16/2000WO2000068981A1 Method for the growth of a thin silicon oxide layer on a silicon substrate surface and double reactor machine
11/16/2000WO2000068461A2 Thermal barrier coating
11/16/2000WO2000068456A1 Sputtering target and production method therefor
11/16/2000WO2000068455A1 Composite coatings
11/16/2000WO2000068454A1 Pvd al2o3 coated cutting tool
11/16/2000WO2000068453A1 Pvd coated cutting tool and method of its production
11/16/2000WO2000068452A1 Method of making a pvd al2o3 coated cutting tool
11/16/2000WO2000068451A2 Magnetron negative ion sputter source
11/16/2000WO2000045422A3 Inflatable slit/gate valve
11/16/2000WO2000034991A3 Method of producing a metal oxide film or a structured metal oxide film
11/16/2000DE19922523A1 Hydrophobic layer formation on optical substrates for e.g. lenses, comprises thermally vaporizing alkali(ne earth) metal fluoride outer layer with polyfluorohydrocarbons
11/16/2000DE19920745A1 Process for coating a substrate comprises heating a material in a chamber to produce a material vapor, arranging the substrate in a further chamber and feeding the vapor from the one chamber to the other to coat the substrate
11/16/2000DE10022224A1 Deponiervorrichtung A depository
11/16/2000DE10006426A1 Piston ring of internal combustion engine, has layer consisting of chromium nitride as main component and specific amount of boron, formed on sliding surface by ion plating
11/15/2000EP1052676A2 System and method for cleaning contaminated surfaces in an ion implanter
11/15/2000EP1052307A2 Heat transfer surface
11/15/2000EP1051768A1 Fuel cell with a proton conducting electrolyte
11/15/2000EP1051534A1 Process for metal plating liquid crystalline polymers and compositions related thereto
11/14/2000US6148145 Multi-temperature control system and fluid temperature control device applicable to the same system
11/14/2000US6147407 Article comprising fluorinated amorphous carbon and process for fabricating article
11/14/2000US6147033 Apparatus and method for forming a film on a tape substrate
11/14/2000US6146998 Forming a first titanium nitride layer on the titanium layer without introducing oxygen; forming a titanium oxynitride layer on the first titanium nitride layer; forming a second titanium nitride layer on the titanium oxynitride layer
11/14/2000US6146907 Titanium dioxide, barium, strontium, and calcium, preferably tio2, baco3, srco3 and caco3, are deposited by pulse laser deposition. following the deposition of the various carbonates the deposited film is heated
11/14/2000US6146906 DC magnetron sputtering method for manufacturing electrode of ferroelectric capacitor
11/14/2000US6146767 Self-assembled organic monolayers
11/14/2000US6146765 Transparent conductive film and method for its production, and sputtering target
11/14/2000US6146734 Optical recording disk and method for manufacturing the same
11/14/2000US6146714 Method of forming metal, ceramic or ceramic/metal layers on inner surfaces of hollow bodies using pulsed laser deposition
11/14/2000US6146508 Sputtering method and apparatus with small diameter RF coil
11/14/2000US6146505 Sputtering method for producing layered aluminium fine particles and use thereof
11/14/2000US6146504 Substrate support and lift apparatus and method
11/14/2000US6146480 Depositing a layer of cu on a first side of a polyimide film having a metal layer on that side; modifying the second side to increase the surface energy thereof; applying an adhesive to the second side and curing
11/14/2000US6146462 Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same
11/14/2000US6146135 Oxide film forming method
11/14/2000US6146019 Plain bearing
11/14/2000US6145470 Apparatus for electron beam physical vapor deposition
11/14/2000US6145469 Plasma processing apparatus and processing method
11/09/2000WO2000028969A3 Methods for preparing coated drug particles and pharmaceutical formulations thereof
11/09/2000DE19921000A1 Device for processing workpieces made of highly pure metal comprises several vacuum processing stations for desorption, coating and homogenizing the workpieces
11/09/2000DE19920304A1 Target used for sputtering cathodes of vacuum deposition devices has protrusions extending into the target material
11/09/2000DE10017233A1 Verfahren zum Deponieren einer Schicht A method for depositing a layer
11/08/2000EP1050598A2 Vacuum coating apparatus
11/08/2000EP1050597A2 Vacuum coating apparatus
11/08/2000EP1050596A1 Electron beam evaporator for vacuum coating apparatus
11/08/2000EP1050064A2 Implantation of radioactive ?32 p atoms
11/08/2000EP1049544A1 Method and apparatus for providing a conductive, amorphous non-stick coating
11/08/2000EP0897591B1 Magnet array
11/08/2000EP0784545B1 Multilayer material, in particular transfer strip
11/08/2000CN1058301C Ion-sputtering metallic cementation process
11/07/2000US6144057 Semiconductor memory device including a field effect transistor
11/07/2000US6144050 Electronic devices with strontium barrier film and process for making same
11/07/2000US6143437 Vapor deposition material which is a molded body composed of powdery zirconia and a stabilizer; employed for heat-resistant coating of parts of aircraft engines and like parts
11/07/2000US6143427 Laminated material
11/07/2000US6143375 Method for preparing a substrate for a magnetic disk
11/07/2000US6143149 Magnetron with plurality of targets in correspondence to shield members
11/07/2000US6143148 Device for feeding substrates to vacuum systems for deposit of surface coating on the substrates
11/07/2000US6143143 Masking means and cleaning techniques for surfaces of substrates
11/07/2000US6143142 Comprising carbon and another second element, which can be deposited at higher thickness while having good hardness; by generating an arc between cathode target and anode of the source and depositing positive target ions to form a coating
11/07/2000US6143141 Heating a film of rhenium on a superalloy substrate to cause some to penetrate the surface and on further heating to diffuse, which forms a barrier to keep aluminum from the overlay alloy from diffusing into the substrate; turbines
11/07/2000US6143140 Method and apparatus to improve the side wall and bottom coverage in IMP process by using magnetic field
11/07/2000US6143086 Apparatus for full wafer deposition
11/07/2000US6143040 Comprises a semiconductor wafer processing chamber, a wafer transfer device, a wafer cassette holding unit, a wafer cassette transfer device and a wafer cassette bringing in/out section disposed in this order and a housing
11/07/2000US6142742 Getter pump module and system
11/07/2000US6142642 Bendable mirrors and method of manufacture
11/07/2000US6142481 A piston ring having a hard film comprises diamond-like carbon in which are dispersed one or more elements selected from the group consisting of silicon, titanium, tungsten, chromium, molybdenum, niobium and vanadium
11/07/2000US6142097 Optical membrane forming apparatus and optical device produced by the same
11/02/2000WO2000065631A2 Apparatus and method for exposing a substrate to plasma radicals
11/02/2000WO2000018980A9 An in-line sputter deposition system
11/02/2000EP1049133A2 Enhancing adhesion of deposits on exposed surfaces in process chamber
11/02/2000EP1048750A1 Coated cutting tool
11/02/2000EP1048062A1 Metallization process and apparatus
11/02/2000EP1047806A1 Method for coating foil comprised of nickel or nickel alloy
11/02/2000EP1047805A1 Method for coating foil comprised of nickel or nickel alloy
11/02/2000EP1047563A1 Surface modification of medical implants
11/02/2000EP1047548A1 A metal foil disk for high areal density recording in environments of high mechanical shock
11/02/2000EP1028824A4 Refractory metal silicide alloy sputter targets, use and manufacture thereof
11/02/2000DE19919742A1 Doped silicon substrates are coated with an anti-reflection layer, especially of silicon nitride for solar cells, by sputter deposition using silicon electrodes alternately connected as cathode and anode
11/02/2000DE19919010A1 Ceramic coating process, especially PVD or PECVD of silicon carbide e.g. for cutting tools, semiconductor devices and space travel applications, comprises depositing an amorphous ceramic layer at well below the ceramic melting temperature
11/01/2000CN1272212A Corrosion-resisting permanent magnet and method for producing same
11/01/2000CN1272141A Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning
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