| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 02/14/2001 | EP1076355A2 Method and apparatus for cleaning a chamber configured for copper deposition |
| 02/14/2001 | EP1076354A2 Vacuum processing apparatus and operating method therefor |
| 02/14/2001 | EP1076352A2 High-density plasma source for ionized metal deposition |
| 02/14/2001 | EP1076110A1 Cooling gas used with a self-sputtering method |
| 02/14/2001 | EP1076108A1 Process for treating the surface of a component, made from a Ni based superalloy, to be coated |
| 02/14/2001 | EP1076106A1 Process for masking cooling holes of a gas turbine component |
| 02/14/2001 | EP1075707A1 Apparatus for improved biasing and retaining of a workpiece in a workpiece processing system |
| 02/14/2001 | EP0828696B1 Mixed oxide high index optical coating material and method |
| 02/14/2001 | CN1284136A Modification of surfaces in order to increase surface tension |
| 02/14/2001 | CN1283952A Method for mag. electroluminescence display and appts. for forming film |
| 02/14/2001 | CN1283895A Film Resonator device and its mfg. method |
| 02/14/2001 | CN1283709A Method for treating Ni-based high temp alloy parts surface of ready-plating coat |
| 02/13/2001 | US6188134 Electronic devices with rubidium barrier film and process for making same |
| 02/13/2001 | US6187682 Inert plasma gas surface cleaning process performed insitu with physical vapor deposition (PVD) of a layer of material |
| 02/13/2001 | US6187453 Article having a durable ceramic coating |
| 02/13/2001 | US6187445 In compact disk(cd) players and digital video disk(dvd) players |
| 02/13/2001 | US6187253 Annealing powder mixture consisting of coprecipitated indium oxide and tin oxide to form solid solution of specified grain size, partially reducing, compacting by hot isostatic pressing |
| 02/13/2001 | US6187160 Apparatus for the coating of substrates in a vacuum chamber |
| 02/13/2001 | US6187159 Mechanism for setting optical lens base material on holder |
| 02/13/2001 | US6187158 Device for coating plate-shaped substrates |
| 02/13/2001 | US6187151 Method of in-situ cleaning and deposition of device structures in a high density plasma environment |
| 02/13/2001 | US6187101 Substrate processing device |
| 02/13/2001 | US6187089 Depositing tungsten on the inside surface of the crucible and diffusing the tungsten into the inside surface and depositing tungsten on the outside surface of the crucible and diffusing the tungsten into the outside surface |
| 02/13/2001 | US6186091 Shielded platen design for plasma immersion ion implantation |
| 02/13/2001 | US6186090 Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
| 02/08/2001 | WO2001009406A1 Method of surface modification for metal product |
| 02/08/2001 | WO2001009052A1 Transparent conductor and means for making same |
| 02/08/2001 | WO2001009051A1 Decorative coating |
| 02/08/2001 | DE19938945C1 Application of carbon layers to a substrate for producing hard carbon layers for e.g. barcodes, infra-red absorbers, comprises an evacuated chamber containing a graphite target, argon gas and an applied electric field |
| 02/08/2001 | DE19935181A1 Organische Schutzschicht für vakuumtechnisch bearbeitete Produkte Organic protective layer for vacuum-processed products |
| 02/08/2001 | DE19930312C1 Process for treating a surface of a workpiece comprises implanting ions into the workpiece at a specified temperature up to a specified depth |
| 02/08/2001 | CA2345365A1 Method of surface modification for metal product |
| 02/07/2001 | EP1075023A1 Unprocessed material storing device and carry-in/out stage |
| 02/07/2001 | EP1074639A1 Fabrication of clad hollow cathode magnetron sputter targets |
| 02/07/2001 | EP1074638A1 Process for coating an article |
| 02/07/2001 | EP1074637A1 Method for forming a thermal barrier coating by electron beam physical vapor deposition |
| 02/07/2001 | EP1074045A1 Method for forming a multi-layered aluminum-comprising structure on a substrate |
| 02/07/2001 | EP1073776A1 Method for electron beam applying leader free coating |
| 02/07/2001 | CN1283213A Electrically conductive filer and method for the preparation thereof |
| 02/07/2001 | CN1282980A Method of manufacturing semi-conductor device |
| 02/06/2001 | US6184550 For use as conductive barrier layers in integrated circuit memory cell structures including ferroelectric or high permittivity capacitors; the nitride-carbide material includes specified metal(s) |
| 02/06/2001 | US6184536 Ion implantation process |
| 02/06/2001 | US6184532 Ion source |
| 02/06/2001 | US6184157 Stress-loaded film and method for same |
| 02/06/2001 | US6183884 Metallic article having a thermal barrier coating and a method of application thereof |
| 02/06/2001 | US6183883 Soldering and brazing material comprising metal base and halide layer having specified thickness formed on surface of said metal base |
| 02/06/2001 | US6183843 Method for producing low reflectance diamond and products therefor |
| 02/06/2001 | US6183831 Hard disk vapor lube |
| 02/06/2001 | US6183820 Method of internally coating a metal tube by explosive evaporation of the coating substance |
| 02/06/2001 | US6183686 Sputter target assembly having a metal-matrix-composite backing plate and methods of making same |
| 02/06/2001 | US6183614 Rotating sputter magnetron assembly |
| 02/06/2001 | US6183613 Sputter target/backing plate assembly and method of making same |
| 02/06/2001 | US6183612 Sputtering cathode |
| 02/06/2001 | US6183606 Manufacture method of high coercivity FePt-Si3N4 granular composite thin films |
| 02/06/2001 | US6183605 Sputtering dielectrics |
| 02/06/2001 | US6183564 Buffer chamber for integrating physical and chemical vapor deposition chambers together in a processing system |
| 02/06/2001 | US6183552 Vapor deposition |
| 02/06/2001 | US6182604 Hollow cathode for plasma doping system |
| 02/01/2001 | WO2001008199A1 Substrate and workpiece support for receiving a substrate |
| 02/01/2001 | WO2001007249A2 Protective organic layer for vacuum technology processed products |
| 02/01/2001 | WO2001007197A1 Apparatuses and methods for applying an indelible and contrasting pattern onto a carrier |
| 02/01/2001 | DE19932444C1 Production of a texture layer made of an oxide material on a substrate comprises partially fading out sputter ions that are scattered back from the sputtering target so that the larger part |
| 02/01/2001 | CA2379397A1 Apparatuses and methods for applying an indelible and contrasting pattern onto a carrier |
| 01/31/2001 | EP1073198A2 Thin film resonator apparatus and method of making same |
| 01/31/2001 | EP1073197A2 Method for producing oriented piezoelectric films |
| 01/31/2001 | EP1073114A2 Integrated circuit capacitor including anchored metal plug |
| 01/31/2001 | EP1073102A2 Liners formed by ionized metal plasma deposition for gate electrode applications |
| 01/31/2001 | EP1072692A2 Method and assembly for assessing quality of a coating process |
| 01/31/2001 | EP1072418A2 High efficiency printhead containing a nitride-based resistor system |
| 01/31/2001 | EP1072055A1 Means for controlling target erosion and sputtering in a magnetron |
| 01/31/2001 | EP1072054A1 Retaining ring and target and method for producing same |
| 01/31/2001 | EP1071832A1 Organic substrate having optical layers deposited by magnetron sputtering and method for preparing it |
| 01/31/2001 | CN2417168Y Self-cleaning type glass sheet |
| 01/31/2001 | CN1282384A Magnetron sputtering source |
| 01/31/2001 | CN1282091A Method for manufacturing display base plate and display base plate made by said method |
| 01/31/2001 | CN1061387C Method for forming diamond-like carbon film (DLC), DLC film formed thereby, use of the same, field emitter array and field emitter cattodes |
| 01/31/2001 | CN1061386C 密封装置 Sealing device |
| 01/30/2001 | US6181727 Coating for reducing operating temperatures of chamber components of a coating apparatus |
| 01/30/2001 | US6180954 Dual-walled exhaust tubing for vacuum pump |
| 01/30/2001 | US6180912 Fan-out beams for repairing an open defect |
| 01/30/2001 | US6180570 Biaxially textured articles formed by plastic deformation |
| 01/30/2001 | US6180253 Brazing or soldering material and production method thereof |
| 01/30/2001 | US6179976 Surface treatment and method for applying surface treatment to suppress secondary electron emission |
| 01/30/2001 | US6179975 Method of monitoring target/component consumption for dual use titanium/titanium nitride sputtering |
| 01/30/2001 | US6179974 Apparatus and methods for sputtering |
| 01/30/2001 | US6179923 Deposition apparatus for an organic thin-film light-emitting element |
| 01/30/2001 | US6179921 Backside gas delivery system for a semiconductor wafer processing system |
| 01/29/2001 | CA2314302A1 Method for producing oriented piezoelectric films |
| 01/25/2001 | WO2001006318A1 Phase shifter film and production method therefor |
| 01/25/2001 | WO2001006284A1 Solderable thin film |
| 01/25/2001 | WO2001006033A1 Method of coating an article |
| 01/25/2001 | WO2001006032A1 Method for forming metallic tungsten film |
| 01/25/2001 | WO2001006030A1 High throughput thin film deposition for optical disk processing |
| 01/25/2001 | WO2001006029A1 Sputtering target |
| 01/25/2001 | WO2001006026A2 Aluminium-titanium alloy with high specular reflectivity, reflecting coatings comprising same and mirrors and parts comprising said coating |
| 01/25/2001 | WO2000058995A3 Apparatus for improving plasma distribution and performance in an inductively coupled plasma |
| 01/25/2001 | DE19934418A1 Verfahren zum Beschichten einer lokal unterschiedlich beanspruchten Komponente A method for coating a locally differently stressed component |
| 01/25/2001 | DE19934114A1 Substrate carrier used to holding thin layer substrates during the manufacture of high pressure sensor elements comprises a base element for receiving the substrate arranged on a handling element having covering elements |
| 01/25/2001 | DE10022274A1 Production of corrosion resistant layers on steel substrates comprises etching the substrate with niobium or tantalum ions before coating using a PVD process |
| 01/25/2001 | CA2379704A1 Method of coating an article |