| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 03/08/2001 | WO2001016388A1 Coated grooving or parting insert |
| 03/08/2001 | WO2001015866A1 Method and device for treating the surface of a part |
| 03/08/2001 | DE19942025A1 Corrosion-protected sheet steel used, e.g., for a vehicle chassis consists of sheet steel with a layer of zinc or zinc alloy coated with a protective layer made of a mixture of silicon oxide and silicon applied in a vacuum |
| 03/08/2001 | CA2383082A1 Method and device for the surface threatment of a component |
| 03/07/2001 | EP1081751A2 Methods of pre-cleaning dielectric layers of substrates |
| 03/07/2001 | EP1081718A1 Transparent conductive laminate, its manufacturing method, and display comprising transparent conductive laminate |
| 03/07/2001 | EP1081248A2 ARC type evaporation source |
| 03/07/2001 | EP1081247A2 Arc type ion plating apparatus |
| 03/07/2001 | EP1080522A1 Reliable modular production quality narrow-band high rep rate f 2? laser |
| 03/07/2001 | EP1080248A1 Tool coating and method for the production thereof |
| 03/07/2001 | EP1080245A2 Zinc-tin alloy sputtering target |
| 03/07/2001 | EP1080244A1 Anti-adherent coating and method for the production thereof |
| 03/07/2001 | CN2422291Y Vacuum coating film device |
| 03/07/2001 | CN1286892A Substrate electrode plasma generator and substance/material processing method |
| 03/07/2001 | CN1062916C Sputtering pole |
| 03/06/2001 | US6197471 Flowing argon and hydrogen gas; capacitively coupling radio frequency generator; electrically coupling direct-current supply; forming photoconductive layer by sputter-depositing amorphous containing silicon and hydrogen |
| 03/06/2001 | US6197438 Foodware with ceramic food contacting surface |
| 03/06/2001 | US6197391 Pyrolytic boron nitride container and manufacture thereof |
| 03/06/2001 | US6197367 Magnetic recording medium, method of fabricating magnetic recording medium, and magnetic storage |
| 03/06/2001 | US6197167 Step coverage and overhang improvement by pedestal bias voltage modulation |
| 03/06/2001 | US6197166 Method for inductively-coupled-plasma-enhanced ionized physical-vapor deposition |
| 03/06/2001 | US6197165 Method and apparatus for ionized physical vapor deposition |
| 03/06/2001 | US6197164 In fabrication of multilayered thin film structures such as magnetoresistive sensors wherein thickness uniformity of multiple layers deposited on substrate are controlled by controlling atom flux deposited on substrate |
| 03/06/2001 | US6197134 Processes for producing fcc metals |
| 03/06/2001 | US6197132 Method of manufacturing ferritic stainless FeCrA1-steel strips |
| 03/06/2001 | US6196936 Coating with a corrosion-resistant, wear-resistant, impact-resistant material, such as zirconium nitride by physical vapor deposition such as cathodic arc process; color of coating can be varied |
| 03/06/2001 | US6196155 Plasma processing apparatus and method of cleaning the apparatus |
| 03/06/2001 | US6196154 Air lock for introducing substrates to and/or removing them from a treatment chamber |
| 03/01/2001 | WO2001014607A1 Aluminum alloy thin film and target material and method for forming thin film using the same |
| 03/01/2001 | WO2000058995B1 Apparatus for improving plasma distribution and performance in an inductively coupled plasma |
| 03/01/2001 | DE19952465C1 Production of an adhesive-tight amorphous hydrocarbon layer on a substrate surface for cutting tools uses ion-supported deposition during which the surface of the substrate electrode is temporarily cooled |
| 03/01/2001 | DE19939700A1 Process for characterizing and improving defect-adhered boundary surfaces in heterostructures on silicon comprises inserting foreign atoms into the heterostructure and detecting by a deep profiling process as boundary surface accumulation |
| 02/28/2001 | EP1079418A2 Vacuum processing apparatus and operating method therefor |
| 02/28/2001 | EP1078999A2 System and method for fabricating organic electroluminescent display devices |
| 02/28/2001 | EP1078998A2 Dielectric film with a perovskite structure and method of fabricating the same |
| 02/28/2001 | EP1078733A1 Transparent conductive film and touch panel |
| 02/28/2001 | EP1078111A1 Apparatus for sputter deposition |
| 02/28/2001 | EP1078110A1 Tool or machine component and method for increasing the resistance to wear of said component |
| 02/28/2001 | EP1077764A1 Method for preparation of libraries using a combinatorial molecular beam epitaxy (combe) apparatus |
| 02/28/2001 | EP0998592A4 Method of using hydrogen and oxygen gas in sputter deposition of aluminum-containing films and aluminum-containing films derived therefrom |
| 02/28/2001 | EP0821770B1 Concave sliding element and production process therefor |
| 02/28/2001 | CN1285952A Laminate, capacitor, and method for producing laminate |
| 02/28/2001 | CN1285419A Electric arc type evaparation source |
| 02/28/2001 | CN1285253A Electric arc type ion plating device |
| 02/28/2001 | CN1062673C Magnetic recording disk for contact recording |
| 02/27/2001 | US6194783 Hillock-free aluminum-containing film consisting of aluminum having trace oxygen content formed by placing substrate in vacuum deposition chamber including aluminum-containing target, evacuating, applying electricity, introducing hydrogen |
| 02/27/2001 | US6194734 Method and system for operating a variable aperture in an ion implanter |
| 02/27/2001 | US6194680 Microwave plasma processing method |
| 02/27/2001 | US6194353 Substrate is heated and an oxidizing gas is locally supplied to the proximity of the substrate so that the pressure of the proximity of the substrate becomes 6 times 10sup6 to 8 times 10sup5 torr at a background pressure |
| 02/27/2001 | US6194076 Method of forming adherent metal components on a polyimide substrate |
| 02/27/2001 | US6194031 Vapor deposition; adjusting cross-section of vaporizer aperture |
| 02/27/2001 | US6194026 Dissolving embedded abrasive particles with hydroxide |
| 02/27/2001 | US6193856 Sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula mox as the main component, wherein mox is a metal oxide deficient in oxygen |
| 02/27/2001 | US6193855 Use of modulated inductive power and bias power to reduce overhang and improve bottom coverage |
| 02/27/2001 | US6193854 Extended plasma is formed over a very high percentage of the surface of the target, thereby creating an erosion profile that is highly uniform and encompasses essentially the entire face of the target; maximizes utilization of target |
| 02/27/2001 | US6193853 Elongate emitter used as cathode to coat cylindrical workpiece by magnetron sputterinig; where inside surface of workpiece is coated, workpiece itself is used as vacuum sputtering chamber; overlap between plasma and magnetic fields creates coat zone |
| 02/27/2001 | US6193821 Tantalum billets, deformation and size reduction |
| 02/27/2001 | US6193811 Baking a semiconductor and isolation |
| 02/27/2001 | US6193804 Apparatus and method for sealing a vacuum chamber |
| 02/27/2001 | US6193801 Apparatus for coating lenticular articles |
| 02/22/2001 | WO2001013371A1 Light-transmitting film and sputtering target for forming the light-transmitting film |
| 02/22/2001 | WO2001012874A1 Surface preparation of a substrate for thin film metallization |
| 02/22/2001 | WO2001012863A1 Steel sheet for heat shrink band and method for producing the same |
| 02/22/2001 | WO2001012358A1 Titanium material superior in upset-forgeability and method of producing the same |
| 02/22/2001 | WO2001012246A1 Medical devices with metal/polymer composites |
| 02/22/2001 | WO2001012131A1 Work piece and method for producing and utilizing said work piece |
| 02/22/2001 | DE19937864A1 Werkstück und Verfahren zum Herstellen und zum Verwerten des Werkstückes Workpiece and method for producing and for making use of the workpiece |
| 02/21/2001 | EP1077483A2 Method of making an integrated circuit device having a planar interlevel dielectric layer |
| 02/21/2001 | EP1077270A1 Transition metal boride coatings |
| 02/21/2001 | EP1076911A1 Method and apparatus for ionized physical vapor deposition |
| 02/21/2001 | EP1076729A1 Low pressure purging method |
| 02/21/2001 | EP1076728A1 A low friction coating for a cutting tool |
| 02/21/2001 | EP0865513A4 Sputtering of lithium |
| 02/21/2001 | EP0833957B1 Hard material coating with yttrium and method for its deposition |
| 02/21/2001 | EP0809659A4 Plasma deposited film networks |
| 02/21/2001 | CN1284742A Method for manufacturing semiconductor device with semiconductor layer |
| 02/20/2001 | US6192330 Method and apparatus for string model simulation of a physical semiconductor process including use of specific depth angles and segment list with removal of redundant segments |
| 02/20/2001 | US6190998 Method for achieving a thin film of solid material and applications of this method |
| 02/20/2001 | US6190752 Thin films having rock-salt-like structure deposited on amorphous surfaces |
| 02/20/2001 | US6190737 Metalized elastomers |
| 02/20/2001 | US6190517 Magnet array |
| 02/20/2001 | US6190516 High magnetic flux sputter targets with varied magnetic permeability in selected regions |
| 02/20/2001 | US6190514 Decorative laminate from resin impregnated paper; wear resistant overcaoting with boride |
| 02/20/2001 | US6190512 Soft plasma ignition in plasma processing chambers |
| 02/20/2001 | US6190511 Sputtering; vacuum chamber, baffle, pump for pumping gases, screen chemical |
| 02/20/2001 | US6189806 Metallizing device for vacuum metallizing |
| 02/16/2001 | WO2001012872A1 Method for deposition of wear-resistant coatings and for increasing the lifespan of parts |
| 02/15/2001 | WO2001011676A2 Sputtering process |
| 02/15/2001 | WO2001011109A1 Electron beam physical vapor deposition apparatus |
| 02/15/2001 | WO2001011108A1 Electron beam physical vapor deposition apparatus and method |
| 02/15/2001 | WO2001011107A1 Electron beam physical vapor deposition apparatus |
| 02/15/2001 | WO2001011106A1 Electron beam physical vapor deposition apparatus |
| 02/15/2001 | WO2001011105A1 Electron beam physical vapor deposition apparatus with ingot magazine |
| 02/15/2001 | WO2001011104A1 Ion beam processing of a substrate |
| 02/15/2001 | WO2001011103A2 Electron beam physical vapor deposition apparatus and control panel therefor |
| 02/15/2001 | WO2001010795A1 Silicon nitride components with protective coating |
| 02/15/2001 | WO2000065631A3 Apparatus and method for exposing a substrate to plasma radicals |
| 02/15/2001 | DE19738118C2 Montageverfahren für ein Halbleiterbauelement A mounting method of a semiconductor device |
| 02/15/2001 | DE10035719A1 Verfahren zum Herstellen von intermetallischen Sputtertargets A method for producing of intermetallic sputter targets |
| 02/15/2001 | CA2381199A1 Sputtering process |