| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 03/29/2001 | DE19947935A1 Apparatus for magnetron sputtering comprises targets surrounded by a plasma electrode open to the substrate and peripheral to its sputtering surface |
| 03/29/2001 | DE19946182A1 Production of carbon nanotubes used in microelectronics comprises focussing laser pulses onto surface of carbon-containing material, vaporizing and decomposing carbon-containing molecules and growing carbon nanotubes |
| 03/29/2001 | DE19936896C1 Production of nanometer thick antiferromagnetic or pinning layers in the form of oxidized, pure or alloyed transition metal layers in magnetic multiple layer systems comprises using a thin |
| 03/28/2001 | EP1087431A2 Method and apparatus for forming a sputtered doped seed layer |
| 03/28/2001 | EP1087033A1 Extended life sputter targets |
| 03/28/2001 | EP1087032A1 Sputtering target and its manufacturing method |
| 03/28/2001 | EP1087031A2 Hard film, sliding member covered with hard film and manufacturing method thereof |
| 03/28/2001 | EP1086776A1 Laminated ribbon and method and apparatus for producing same |
| 03/28/2001 | EP1086482A1 Gas distribution system |
| 03/28/2001 | EP1086355A1 Ellipsometric method and control device for making a thin-layered component |
| 03/28/2001 | EP1086260A1 Oxygen-argon gas mixture for precleaning in vacuum processing system |
| 03/28/2001 | EP1086258A1 Substrate support and lift apparatus and method |
| 03/28/2001 | CN2425091Y Hard carbon film deposition plant |
| 03/28/2001 | CN1289376A Process for method plating liquid crystalline polymers and compositions related thereto |
| 03/28/2001 | CN1063808C Knitting parts of knitting machine |
| 03/27/2001 | US6208095 Compact helical resonator coil for ion implanter linear accelerator |
| 03/27/2001 | US6207964 Continuously variable aperture for high-energy ion implanter |
| 03/27/2001 | US6207963 Ion beam implantation using conical magnetic scanning |
| 03/27/2001 | US6207959 Ion implanter |
| 03/27/2001 | US6207932 Heater block for heating wafer |
| 03/27/2001 | US6207589 Method of forming a doped metal oxide dielectric film |
| 03/27/2001 | US6207558 For improved via fill in high aspect ratio sub-micron apertures at low temperature, particularly at the contact level on a substrate. |
| 03/27/2001 | US6207536 Method for forming a thin film of a composite metal compound and apparatus for carrying out the method |
| 03/27/2001 | US6207499 Semiconductor device, method of fabricating the same, and sputtering apparatus |
| 03/27/2001 | US6207305 Corrosion-resistant members against a chlorine-based gas |
| 03/27/2001 | US6207263 Anti-reflection film and process for preparation thereof |
| 03/27/2001 | US6207239 Plasma enhanced chemical deposition of conjugated polymer |
| 03/27/2001 | US6207219 Method for manufacturing thin-film solar cell |
| 03/27/2001 | US6207035 Method for manufacturing a metallic composite strip |
| 03/27/2001 | US6207029 Apparatus for vapor deposition and evaporator |
| 03/27/2001 | US6207028 Sputtering device with a cathode with permanent magnet system |
| 03/27/2001 | US6207027 Flowing gas into process chamber at first flow rate or at two different flow rates during gas stabilization and then pumping down chamber following deposition |
| 03/27/2001 | US6207026 Cooling system coupled to process chamber comprising cooling cavity, rotating member disposed therein having upper and lower surfaces with two or more magnet pieces disposed between surfaces, motor coupled to rotating member, deflection member |
| 03/27/2001 | US6207005 Cluster tool apparatus using plasma immersion ion implantation |
| 03/27/2001 | US6206985 A1 alloy films and melting A1 alloy sputtering targets for depositing A1 alloy films |
| 03/27/2001 | US6206975 Vacuum treatment system for application of thin, hard layers |
| 03/27/2001 | US6206969 Method and apparatus for fabricating semiconductor |
| 03/27/2001 | US6206065 Glancing angle deposition of thin films |
| 03/27/2001 | US6205948 Modulator for plasma-immersion ion implantation |
| 03/27/2001 | CA2194323C Apparatus and method for plasma processing |
| 03/22/2001 | WO2001020953A1 Method and apparatus for producing bulk quantities of nano-sized materials by electrothermal gun synthesis |
| 03/22/2001 | WO2001020652A1 Method and apparatus for cleaning film deposition device |
| 03/22/2001 | WO2001020055A1 A method for the manufacturing of a matrix and a matrix manufactured according to the method |
| 03/22/2001 | WO2001020054A1 Method for coating a metal strip and an installation for carrying out said method |
| 03/22/2001 | WO2001007197B1 Apparatuses and methods for applying an indelible and contrasting pattern onto a carrier |
| 03/22/2001 | US20010000048 Vacuum processing apparatus and operating method therefor |
| 03/22/2001 | DE10042623A1 Verfahren zum Testen einer Verbindungszwischenfläche A method of testing a bond interface |
| 03/22/2001 | CA2382107A1 Method and apparatus for producing bulk quantities of nano-sized materials by electrothermal gun synthesis |
| 03/21/2001 | EP1085109A1 Thermal barrier coating composition with low thermal conductivity, superalloy mechanical part with ceramic coating of said composition and method for obtaining such coating |
| 03/21/2001 | EP1084768A1 Bright Surface structure and a manufacturing method thereof |
| 03/21/2001 | EP1084512A1 Plasma treatment for ex-situ contact fill |
| 03/21/2001 | EP1084283A1 Vacuum strip coating installation |
| 03/21/2001 | CN1288489A Method for coating foil comprised of nickel or nickel alloy |
| 03/21/2001 | CN1288488A Method for coating foil comprised of nickel or nickel alloy |
| 03/21/2001 | CN1288072A Technology for mfg. ion implantation by electrical contact metallic vapor cacuum arc source |
| 03/20/2001 | US6204560 Titanium nitride diffusion barrier for use in non-silicon technologies and method |
| 03/20/2001 | US6204508 Toroidal filament for plasma generation |
| 03/20/2001 | US6204402 Organometallic compound |
| 03/20/2001 | US6204173 Multiple implantation and grain growth method |
| 03/20/2001 | US6204171 Providing surface layer on semiconductor substrate; sputtering layer of diffusion barrier material on surface layer in environment comprising a production gaseous nitrogen content; growing grains of nitride of diffusion barrier |
| 03/20/2001 | US6203931 Lead frame material and process for manufacturing the same |
| 03/20/2001 | US6203927 Substrate with ceramic coating on surface and sintering |
| 03/20/2001 | US6203926 Corrosion resistant multilayer metal structure with cushionsand diffusion barriers then gold layer and encapsulation |
| 03/20/2001 | US6203860 Thin film of potassium niobate process for producing the thin film and optical device using the thin film |
| 03/20/2001 | US6203853 Vapor depositing layer of silicon or silicon oxide |
| 03/20/2001 | US6203852 Vaporizing lithium, depositing on aluminum substrate, controllably heating to diffuse lithium |
| 03/20/2001 | US6203677 Sputtering device for coating an essentially flat disk-shaped substrate |
| 03/20/2001 | US6203674 Sputtering titanium film onto substrate; introducing nitrogen; controlling flow rate of nitrogen; pressurization to sputter titanium nitride; depressurization |
| 03/20/2001 | US6203632 Oxidation-resistant metal foil, its use and method for its production |
| 03/20/2001 | US6203621 Vacuum chuck for holding thin sheet material |
| 03/20/2001 | US6203618 Exhaust system and vacuum processing apparatus |
| 03/20/2001 | US6202592 Substrate holder |
| 03/20/2001 | US6202591 Linear aperture deposition apparatus and coating process |
| 03/20/2001 | CA2030648C Flash vaporizer system for delivering reactants for flame hydrolysis deposition and method of forming optical waveguide preforms therewith |
| 03/15/2001 | WO2001018277A1 In-situ formation of multiphase electron beam physical vapor deposited barrier coatings for turbine components |
| 03/15/2001 | WO2001018272A1 Coated cemented carbide insert |
| 03/15/2001 | WO2001018127A1 Methods and apparatus for producing enhanced interference pigments |
| 03/15/2001 | WO2000075393A8 Carbon plasma pulsed source |
| 03/15/2001 | DE19943379A1 Production of metallized plastic foils comprises vaporizing the metal to be applied in the vaporizing chamber of the strip vaporization plant strip with ignition of a plasma |
| 03/15/2001 | DE19913578A1 Multiple layer system has a covering layer, a chromium layer and a graded transition region to the covering layer |
| 03/15/2001 | DE10004786A1 Vacuum deposition apparatus comprises several sections arranged next to each other via a lock and evacuated via a suction opening connected directly or via a pipe system to a vacuum pump |
| 03/14/2001 | EP1082181A1 Process for the preparation of uv protective coatings by plasma-enhanced deposition |
| 03/14/2001 | EP0757598A4 Pulsed ion beam assisted deposition |
| 03/14/2001 | EP0652828B1 Abrasion wear resistant coated substrate product |
| 03/14/2001 | CN1287684A Thin film forming method, and semiconductor light emitting device manufacturing method |
| 03/14/2001 | CN1287578A Sputtering target assembly of oxide sintered body |
| 03/14/2001 | CN1287545A Target for transparent electroconductive film, transparent electroconductive material, transparent electroconductive glass and transparent electroconductive film |
| 03/13/2001 | US6201557 Thermal printing head, process for producing thermal printing head, recorder, sinter and target |
| 03/13/2001 | US6201219 Chamber and cleaning process therefor |
| 03/13/2001 | US6200883 Ion implantation method |
| 03/13/2001 | US6200694 Molybdenum (mo) and tungsten (w) at a ratio in specific range having low resistivity and high workability. |
| 03/13/2001 | US6200691 Oxidation resistance coating system for refractory metals |
| 03/13/2001 | US6200649 Method of making titanium boronitride coatings using ion beam assisted deposition |
| 03/13/2001 | US6200441 Multiple station vacuum deposition apparatus for texturing a substrate using a scanning beam |
| 03/13/2001 | US6200433 Depositing a barrier layer in a plasma chamber having an inductive coil and a target comprising the material to be sputtered, one or more plasma gases having high molar masses relative to target material such as xenon or krypton |
| 03/13/2001 | US6200432 Method of handling a substrate after sputtering and sputtering apparatus |
| 03/13/2001 | US6200431 Reactive sputtering apparatus and process for forming thin film using same |
| 03/13/2001 | US6199259 Autoclave bonding of sputtering target assembly |
| 03/08/2001 | WO2001016394A1 Stable high rate reactive sputtering |
| 03/08/2001 | WO2001016393A1 Method and apparatus for deposition of thin films |