| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
|---|
| 04/18/2001 | EP1092991A2 Adhesion layer for optical coatings |
| 04/18/2001 | EP1092787A2 Process for coating plastic surfaces in a vacuum |
| 04/18/2001 | EP1092515A1 Atomically sharp edged cutting blades and methods for making same |
| 04/18/2001 | EP1092109A1 Vacuum tight coupling for tube sections |
| 04/18/2001 | EP1092050A1 Contoured sputtering target |
| 04/18/2001 | EP0909341B1 Process for the production of metallic coatings on semiconductor structures |
| 04/18/2001 | CN1291939A Metal foil disk for high areal density recording in environments of high mechanical shock |
| 04/18/2001 | CN1291825A Method of producing piezoelectric film with orientation |
| 04/18/2001 | CN1291660A Process for preparing mask for organic vacuum coating |
| 04/18/2001 | CN1064720C Vacuum evaporation apparatus |
| 04/17/2001 | US6218033 Such as chromium titanium copper or chromium titanium vanadium alloys |
| 04/17/2001 | US6218029 Thermal barrier coating for a superalloy article and a method of application thereof |
| 04/17/2001 | US6218028 High coercivity magnetic recording medium comprising a sputter textured layer |
| 04/17/2001 | US6217969 A sputtering target disk is made of silicon carbide, obtained by sintering a uniform mixture of a powder of silicon carbide and nonmetallic auxillary sintering agent; useful for sputtering treatment for forming thin protective films |
| 04/17/2001 | US6217952 Method of forming films over inner surface of cylindrical member |
| 04/17/2001 | US6217730 Sputtering device |
| 04/17/2001 | US6217724 Coated platen design for plasma immersion ion implantation |
| 04/17/2001 | US6217723 Method of manufacturing a multilayer film |
| 04/17/2001 | US6217721 Filling plug having high aspect ratio by precoating interior of plug hole or other aperture with liner layer deposited by physical vapor deposition utilizing high-density plasma |
| 04/17/2001 | US6217720 Multi-layer reactive sputtering method with reduced stabilization time |
| 04/17/2001 | US6217719 Forming thin film having refractive index varying stepwise or continuously in thickness direction by sputtering while introducing nitrogen-containing gas, oxygen-containing gas and fluorine-containing gas with varying flow rate ratio |
| 04/17/2001 | US6217718 Apparatus having plasma generating coil positioned within processing chamber so as to prevent or minimize variations about center axis of processing chamber in quantity of ions delivered to workpiece |
| 04/17/2001 | US6217717 Periodically clearing thin film plasma processing system |
| 04/17/2001 | US6217716 Apparatus and method for improving target erosion in hollow cathode magnetron sputter source |
| 04/17/2001 | US6217715 Coating of vacuum chambers to reduce pump down time and base pressure |
| 04/17/2001 | US6217714 Sputtering apparatus in vacuum chamber having gas supply, having three discrete separated electrodes, with associated targets and magnets, fixed substrate support, variable power supplies connected to electrodes |
| 04/17/2001 | US6217272 In-line sputter deposition system |
| 04/17/2001 | US6216631 Robotic manipulation system utilizing patterned granular motion |
| 04/17/2001 | CA2238319C Sputtering of lithium using alternating sputtering potential |
| 04/17/2001 | CA2089147C Cantilever mount for rotating cylindrical magnetrons |
| 04/12/2001 | WO2001025501A1 Method for producing cobalt-based alloy sputter target |
| 04/12/2001 | WO2001025500A1 Method and device for production of plane-parallel wafers |
| 04/12/2001 | WO2001006026A3 Aluminium-titanium alloy with high specular reflectivity, reflecting coatings comprising same and mirrors and parts comprising said coating |
| 04/12/2001 | DE10049536A1 Ion source arrangement has ion source movable relative to chamber along fixed curve essentially in horizontal plane to enable access to inner wall of chamber |
| 04/12/2001 | DE10038290A1 SIMOX semiconductor structure e.g., wafer comprises a silicon substrate, a doped glass layer produced by ion implantation on the substrate and a silicon layer on the substrate |
| 04/11/2001 | EP1091387A2 Coil for sputter deposition |
| 04/11/2001 | EP1091360A2 Multilayer film structure for soft X-ray optical elements |
| 04/11/2001 | EP1091017A2 Coating apparatus having reflective inside coating |
| 04/11/2001 | EP1091016A2 Self ionized plasma for sputtering copper |
| 04/11/2001 | EP1091015A1 Co-Ti ALLOY SPUTTERING TARGET AND MANUFACTURING METHOD THEREOF |
| 04/11/2001 | EP1091014A1 Ex-situ coating of refractory metal on IMP coils |
| 04/11/2001 | EP1090420A1 Endpoint detection in the fabrication of electronic devices |
| 04/11/2001 | EP1090416A2 Collimated sputtering of semiconductor and other films |
| 04/11/2001 | EP1090158A1 Spraying method to form a thick coating and products obtained |
| 04/11/2001 | EP1090153A1 Tantalum sputtering target and method of manufacture |
| 04/11/2001 | EP1089945A1 Thermochromic coating |
| 04/11/2001 | EP0892861B1 Boron and nitrogen containing coating and method for making |
| 04/11/2001 | EP0832310A4 Electrically tunable coatings |
| 04/11/2001 | EP0779941B1 A process for treating aluminium alloys |
| 04/11/2001 | CN1291241A Apparatus and method for depositing a semiconductor material |
| 04/11/2001 | CN1064294C Method for producing shaving blades |
| 04/10/2001 | US6215188 Low temperature aluminum reflow for multilevel metallization |
| 04/10/2001 | US6214772 Process for preparing polycrystalline thin film, process for preparing oxide superconductor, and apparatus therefor |
| 04/10/2001 | US6214720 Plasma process enhancement through reduction of gaseous contaminants |
| 04/10/2001 | US6214712 Heating semiconductor surface and introducing hydrogen gas into high vacuum environment to develop conditions favorable for growing desired metal oxide, yet unfavorable for formation of any native oxides |
| 04/10/2001 | US6214711 Method of low angle, low energy physical vapor of alloys including redepositing layers of different compositions in trenches |
| 04/10/2001 | US6214479 Covered member and method of producing the same |
| 04/10/2001 | US6214474 Oxidation protective coating for refractory metals |
| 04/10/2001 | US6214422 Cleaning and preparing surface of substrate comprising polymer film by in-line plasma treatment under vacuum; forming polymer film on plasma-treated surface of polymer film by in-line evaporation of monomer in vacuum and radiation curing |
| 04/10/2001 | US6214413 Stencil used to control deposition of material in a physical vapor deposition (pvd) system |
| 04/10/2001 | US6214408 Method for the operation of an electron beam |
| 04/10/2001 | US6214184 Insulated wafer pedestal |
| 04/10/2001 | US6214183 Combined ion-source and target-sputtering magnetron and a method for sputtering conductive and nonconductive materials |
| 04/10/2001 | US6214177 Heating, pressurization; liquid phase |
| 04/10/2001 | US6214120 High throughput multi-vacuum chamber system for processing wafers and method of processing wafers using the same |
| 04/10/2001 | US6213075 Roller follower assembly for an internal combustion engine |
| 04/10/2001 | CA2099132C Device and process for the vaporisation of material |
| 04/05/2001 | WO2001023830A1 Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source |
| 04/05/2001 | WO2001023642A2 Thermal barrier coatings for turbine components |
| 04/05/2001 | WO2001023636A1 Method and apparatus for controlling chamber surfaces in a semiconductor processing reactor |
| 04/05/2001 | WO2001023635A1 Tungsten target for sputtering and method for preparing thereof |
| 04/05/2001 | WO2001023634A1 Rotating magnet array and sputter source |
| 04/05/2001 | DE10028594A1 Rollenfolgeanordnung für einen Verbrennungsmotor Roller follower arrangement for a combustion engine |
| 04/04/2001 | EP1088787A1 Process for producing metal oxide, target comprising the metal oxide for forming thin metal oxide film, process for producing the same, and process for producing thin metal oxide film |
| 04/04/2001 | EP1088597A2 Radiation cured island coating system |
| 04/04/2001 | EP1088316A1 Thin electret layer and corresponding production method |
| 04/04/2001 | EP1088116A1 Method for applying a coating system to surfaces |
| 04/04/2001 | EP1088115A1 Metal article with fine uniform structures and textures and process of making same |
| 04/04/2001 | EP1088114A1 A composite material comprising a substrate with a barrier layer |
| 04/04/2001 | CN1290308A Plasma reactor with a deposition shield |
| 04/04/2001 | CN1289861A Evaporation coating process with cathode arc for depositing diamond-like carbon film |
| 04/03/2001 | US6211080 Repair of dielectric-coated electrode or circuit defects |
| 04/03/2001 | US6211066 Electronic devices with barium barrier film and process for making same |
| 04/03/2001 | US6210780 Diamond wafer, method of estimating a diamond wafer and diamond surface acoustic wave device |
| 04/03/2001 | US6210755 Method and evaporation chamber for generating a continuous vapor stream containing a compound having monovalent gallium therein, and a vacuum coating apparatus |
| 04/03/2001 | US6210749 Applying fillerless coating formulation comprising hydrogen silsesquioxane resin onto substrate to form film; heating film in inert or oxygen containing atmosphere to produce insoluble coating free of cracks; depositing silicon dioxide layer |
| 04/03/2001 | US6210745 Method of quality control for chemical vapor deposition |
| 04/03/2001 | US6210744 Placing component in coating chamber with an atmosphere having controllable atmosphere composition; maintaining component at constant temperature; establishing vacuum in coating chamber; controlling; depositing material forming thermal barrier |
| 04/03/2001 | US6210726 Hardness, wear resistance; for metal machining |
| 04/03/2001 | US6210634 Highly purified titanium material, method for preparation of it and sputtering target using it |
| 04/03/2001 | US6210545 Method for forming a perovskite thin film using a sputtering method with a fully oxidized perovskite target |
| 04/03/2001 | US6210542 Process for producing thin film, thin film and optical instrument including the same |
| 04/03/2001 | US6210541 Process and apparatus for cold copper deposition to enhance copper plating fill |
| 04/03/2001 | US6210540 Method and apparatus for depositing thin films on vertical surfaces |
| 04/03/2001 | US6210502 Processing method for high-pure titanium |
| 04/03/2001 | US6209481 Sequential ion implantation and deposition (SIID) system |
| 04/03/2001 | CA2196589C Titanium nitride doped with boron, substrate coating based on this new compound, with good hardness conferring very good resistance to wear, and parts bearing such a coating |
| 03/29/2001 | WO2001022470A1 Ion beam vacuum sputtering apparatus and method |
| 03/29/2001 | WO2001021852A1 A METHOD FOR PRODUCING NiTiHf ALLOY FILMS BY SPUTTERING |
| 03/29/2001 | WO2001021851A1 Production of ternary shape-memory alloy films by sputtering |