| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
|---|
| 05/29/2001 | US6238526 Ion-beam source with channeling sputterable targets and a method for channeled sputtering |
| 05/29/2001 | US6238494 Polycrystalline, metallic sputtering target |
| 05/29/2001 | US6238488 Method of cleaning film forming apparatus, cleaning system for carrying out the same and film forming system |
| 05/29/2001 | US6237529 Source for thermal physical vapor deposition of organic electroluminescent layers |
| 05/29/2001 | US6237526 Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
| 05/29/2001 | CA2205052C Method of producing reactive element modified-aluminide diffusion coatings |
| 05/29/2001 | CA2090109C Abrasion wear resistant coated substrate product |
| 05/25/2001 | WO2001037313A1 Plasma processing apparatus with an electrically conductive wall |
| 05/25/2001 | WO2001037310A2 Method and apparatus for ionized physical vapor deposition |
| 05/25/2001 | WO2001036712A1 Coated tool and method of making |
| 05/25/2001 | WO2001036704A2 Method and apparatus for forming carbonaceous film |
| 05/25/2001 | WO2001036701A1 High target utilization magnetic arrangement for a truncated conical sputtering target |
| 05/25/2001 | WO2000079630A3 Fuel cell membrane electrode assemblies with improved power outputs and poison resistance |
| 05/25/2001 | CA2397737A1 Coated tool and method of making |
| 05/24/2001 | US20010001438 High purity cobalt sputter target and process of manufacturing the same |
| 05/24/2001 | US20010001437 Capable of preventing a work piece from being excessively heated and capable of stably machining the work piece; holding unit comprises holder for holding a work piece, pressing member, heat insulating member |
| 05/24/2001 | US20010001436 Process for applying protectiive and decorative coating on an article |
| 05/24/2001 | US20010001401 Process for producing a metal article |
| 05/23/2001 | EP1102305A1 Plasma processing apparatus with an electrically conductive wall |
| 05/23/2001 | EP1102285A2 Magneto-optical member |
| 05/23/2001 | EP1101836A1 Vacuum coating apparatus for depositing coatings on optical substrates |
| 05/23/2001 | EP1101835A1 Method and apparatus for physical vapor deposition using modulated power |
| 05/23/2001 | EP1101834A2 Method of depositing materials on substrates |
| 05/23/2001 | EP1100750A1 Method for forming an oxide film with non-uniform thickness at a silicon substrate surface |
| 05/23/2001 | EP0931178B1 Composite body, production process and use |
| 05/23/2001 | DE19953470A1 Rohrtarget Tube target |
| 05/23/2001 | DE10024827A1 Electrode arrangement for multi-layer plasma coating of PET bottles or film strip has a cathode material surface divided into active and inactive parts |
| 05/23/2001 | DE10006121C1 Glass pane coating station using cathode sputtering has a pane transport box or frame with a metal woven material against the rear surface of the glass to prevent the deposit of particles on the rear side of the pane |
| 05/23/2001 | CN2431289Y Vacuum magneto-controlled sputtering machine for coating foamed plastics with nickel |
| 05/22/2001 | US6236113 Iridium composite barrier structure and method for same |
| 05/22/2001 | US6235615 Generation of low work function, stable compound thin films by laser ablation |
| 05/22/2001 | US6235415 Chromium nitride |
| 05/22/2001 | US6235411 Process for coating a substrate with metallic layer |
| 05/22/2001 | US6235402 Multilayer |
| 05/22/2001 | US6235172 System for and method of providing a controlled deposition on wafers |
| 05/22/2001 | US6235171 Vacuum film forming/processing apparatus and method |
| 05/22/2001 | US6235170 Conical sputtering target |
| 05/22/2001 | US6235169 Modulated power for ionized metal plasma deposition |
| 05/22/2001 | US6235165 Method of making a light quantity correction filter and method of manufacturing a color cathode ray tube using the light quantity correction filter made by the method |
| 05/22/2001 | US6235164 Low-pressure processing system for magnetic orientation of thin magnetic film |
| 05/22/2001 | US6235163 Methods and apparatus for ionized metal plasma copper deposition with enhanced in-film particle performance |
| 05/22/2001 | US6235118 Method for forming a thin film of ultra-fine particles, and an apparatus for the same |
| 05/22/2001 | US6234107 Auxiliary vacuum chamber and vacuum processing unit using same |
| 05/17/2001 | WO2001034870A1 Sputtering target and method for grinding sputtering target |
| 05/17/2001 | WO2001034869A1 Sputtering target and method for preparation thereof |
| 05/17/2001 | WO2001034868A1 Correction method and device for sputtering target/packing plate assembly |
| 05/17/2001 | WO2001034382A1 Aerogel substrate and method for preparing the same |
| 05/17/2001 | WO2001034339A1 Hermetic sealing of target/backing plate assemblies using electron beam melted indium or tin |
| 05/17/2001 | US20010001190 Generating high density plasma containing ionized gas particles in reaction chamber, accelerating ionized gas particles toward device structure during cleaning phase, accelerating ionized gas toward target in deposition phase |
| 05/17/2001 | US20010001185 Plasma processing apparatus and method of cleaning the apparatus |
| 05/17/2001 | DE10053834A1 Production of an aluminum nitride thin layer used in thin film technology comprises subjecting the thin layer to a microwave plasma after is has been deposited |
| 05/17/2001 | DE10018639C1 Process for ion-promoted high rate vaporization of a substrate comprises feeding a gas into a coating chamber through an anode formed as a hollow anode near to the vaporizer surface |
| 05/17/2001 | CA2325901A1 An electrode arrangement |
| 05/16/2001 | EP1099777A1 Sputter target |
| 05/16/2001 | EP1099776A1 Plasma cleaning step in a salicide process |
| 05/16/2001 | EP1099242A1 Dc sputtering process for making smooth electrodes and thin film ferroelectric capacitors having improved memory retention |
| 05/16/2001 | EP1099227A1 Light colored, electrically conductive coated particles |
| 05/16/2001 | EP1099183A1 Material delivery system for miniature structure fabrication |
| 05/16/2001 | EP1099009A2 Method for covering bodies made of light metal or light metal alloys by means of a plasma activated process |
| 05/16/2001 | EP1099004A1 Thin film stent |
| 05/16/2001 | EP1099003A1 Pvd coated cutting tool and method of its production |
| 05/16/2001 | EP1099002A2 Composition for production of a protective gradient coating on a metal substrate by electron beam evaporation and condensation under vacuum |
| 05/16/2001 | EP0686210B1 Vacuum-vapour-phase deposited barrier layer for the packaging industry and vaporized substance for producing the same |
| 05/16/2001 | CN1295628A Method and apparatus for deposition of biaxially textured coatings |
| 05/16/2001 | CN1065849C Method of surface bonding meterials together by use of metal matrix composite |
| 05/15/2001 | US6232706 Self-oriented bundles of carbon nanotubes and method of making same |
| 05/15/2001 | US6232242 Method of forming a crystalline insulation layer on a silicon substrate |
| 05/15/2001 | US6232003 Sliding member |
| 05/15/2001 | US6231998 Thermal barrier coating |
| 05/15/2001 | US6231991 Ceramic on superalloy turbine |
| 05/15/2001 | US6231956 Wear-resistance edge layer structure for titanium or its alloys which can be subjected to a high mechanical load and has a low coefficient of friction, and method of producing the same |
| 05/15/2001 | US6231925 Controlled heating |
| 05/15/2001 | US6231777 Surface treatment method and system |
| 05/15/2001 | US6231774 Plasma processing method |
| 05/15/2001 | US6231732 Cylindrical carriage sputtering system |
| 05/15/2001 | US6231727 Using a vacuum; applying alternating current |
| 05/15/2001 | US6231726 Plasma processing apparatus |
| 05/15/2001 | US6231725 Apparatus for sputtering material onto a workpiece with the aid of a plasma |
| 05/15/2001 | US6231673 Manufacturing method of semiconductor wafer, semiconductor manufacturing apparatus, and semiconductor device |
| 05/10/2001 | WO2001033643A1 BAND GAP ENGINEERING OF AMORPHOUS Al-Ga-N ALLOYS |
| 05/10/2001 | WO2001033615A2 Method and apparatus for supercritical processing of multiple workpieces |
| 05/10/2001 | WO2001033604A1 Method and apparatus for ion implantation |
| 05/10/2001 | US20010000865 Wafer produced by method of quality control for chemical vapor deposition |
| 05/10/2001 | DE19958643C1 Apparatus for coating an object, e.g. turbine blades comprises an inner chamber made of a heat-resistant material of low heat conductivity arranged in a vacuum chamber and a sputtering source |
| 05/10/2001 | DE19953433A1 Coating, useful as a barrier layer, is prepared by irradiation of a metal, semi-metal or metal oxide deposit on a treated substrate, precoated with an ethylenically unsaturated photoinitiator. |
| 05/10/2001 | DE19951991A1 Process for charging a substrate wafer onto a heated susceptor or a susceptor segment of a deposition reactor with comprises holding the wafer and susceptor or susceptor segment away from each other before contacting them |
| 05/10/2001 | DE10054115A1 Forming barrier layer in elongated recess in dielectric layer on semiconductor disc |
| 05/10/2001 | CA2387341A1 Method and apparatus for supercritical processing of multiple workpieces |
| 05/09/2001 | EP1098354A2 Apparatus for controlling temperature in a semiconductor processing system |
| 05/09/2001 | EP1098353A2 Substrate processing system |
| 05/09/2001 | EP1098014A1 Substrate with chrome nitride layer |
| 05/09/2001 | EP1097778A2 Method for manufacturing objects of metallic material and objects manufactured with this method |
| 05/09/2001 | EP1097766A1 Tubular sputtering target |
| 05/09/2001 | EP1097252A1 Multi-position load lock chamber |
| 05/09/2001 | EP1097250A1 Method of making a pvd al 2?o 3? coated cutting tool |
| 05/09/2001 | EP0974162A4 a low-stress metal film with low electrical resistivity |
| 05/09/2001 | EP0802988B1 Method of forming diamond-like carbon film (dlc) |
| 05/09/2001 | CN1294638A Tungsten super fine particle and method for producing same |
| 05/09/2001 | CN1065645C Protective film material and magnetic head comprising protective film made of material |
| 05/09/2001 | CN1065572C Target of sputting cathode for vacuum coating equipment and mfg. method thereof |