Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
06/2001
06/13/2001EP1106709A2 Pulsed-mode RF bias for side-wall coverage improvement
06/13/2001EP1106708A2 Two step AIN-PVD for improved film properties
06/13/2001EP1105908A1 Ion beam generation apparatus
06/13/2001EP1105547A1 Dual collimator physical-vapor deposition apparatus
06/13/2001EP1105328A1 Device for introducing and/or eliminating containers
06/13/2001EP1105245A1 Bonding of dissimilar metals
06/13/2001EP1036212B1 Device for vacuum coating slide bearings
06/13/2001EP0880607B1 Oxidation protective coating for refractory metals
06/13/2001EP0824604A4 Apparatus for reducing arcing during sputtering
06/13/2001DE19956811A1 Keramischer Flash-TV-Verdampfer Ceramic flash TV evaporator
06/13/2001CN2434311Y Magnetic controlled spurting foam nickel winding film coater
06/13/2001CN2434310Y Probe support structure of crystal oscillator
06/13/2001CN1298962A Process for preparing La-Ca-Mn-O film with sequencial surface structure
06/13/2001CN1067118C Magnetic controlled tube sputtering apparatus
06/13/2001CN1067117C Evaporator for substrate coating apparatus
06/12/2001US6246586 Method and apparatus for manufacturing a thin film, thin-film laminate, and electronic parts
06/12/2001US6245668 Sputtered tungsten diffusion barrier for improved interconnect robustness
06/12/2001US6245451 Ferroelectric material, method of manufacturing the same, semiconductor memory, and method of manufacturing the same
06/12/2001US6245446 Hard metallic material
06/12/2001US6245435 Decorative corrosion and abrasion resistant coating
06/12/2001US6245394 Film growth method and film growth apparatus capable of forming magnesium oxide film with increased film growth speed
06/12/2001US6245280 Method and apparatus for forming polycrystalline particles
06/12/2001US6245249 Micro-structure and manufacturing method and apparatus
06/12/2001US6245203 BaxSr1-xTiO3-y target materials for sputtering
06/12/2001US6244212 Electron beam evaporation assembly for high uniform thin film
06/12/2001US6244210 Strength coil for ionized copper plasma deposition
06/07/2001WO2001041183A1 Dose monitor for plasma doping system
06/07/2001WO2001041177A2 Production of a microwave device by applying a coating of yttrium-iron-garnet to the surface of the device to suppress secondary electron emission
06/07/2001WO2001040542A1 Method for producing composite layers using a plasma jet source
06/07/2001WO2001040539A2 Method and system relating to flux distribution and film deposition
06/07/2001WO2001040538A1 Method and system relating to thickness control of film vapor deposition
06/07/2001WO2001040536A1 Polycrystalline thin film and method for preparation thereof, and superconducting oxide and method for preparation thereof
06/07/2001WO2001040535A2 System and method relating to vapor deposition
06/07/2001WO2001040534A2 Device and method for coating objects at a high temperature
06/07/2001WO2001002620A8 Loading system for pvd coating of cutting inserts
06/07/2001US20010003016 Placing the replica in a vacuum chamber, depressurizing, depositing overcoat of aluminum and an overcoat of a dielectric material; layers are deposited at thicknesses to increase normal reflectivity of reflective faces
06/07/2001US20010002744 Combination of piston ring for use in internal combustion engine
06/07/2001US20010002584 Susceptor adapted to secure work piece thereon, radio frequency source overlying susceptor provides inductive discharge to form plasma from gas within chamber, magnetic source provides focused magnetic field lines toward susceptor
06/07/2001US20010002583 Useful for producing different patterns by shaping the pattern carrier in th form of endless pattern band and guiding the pattern carrier in revolving fashion by means of several deflection rollers
06/07/2001US20010002517 Vacuum processing apparatus and operating method therefor
06/07/2001US20010002510 Cavity-filling method for reducing surface topography and roughness
06/07/2001DE19958473A1 Verfahren zur Herstellung von Kompositschichten mit einer Plasmastrahlquelle A process for the production of composite layers with a plasma beam source
06/07/2001DE19955428A1 Electron beam vaporizer, used for vaporizing aluminum, comprises high temperature container made of electrically-conducting ceramic for receiving vaporized material inserted into liquid-cooled crucible
06/07/2001DE10056541A1 Verfahren zum Reinigen von Quarzsubstraten unter Verwendung von leitenden Lösungen A method for purifying quartz substrates using conductive solutions
06/06/2001EP0863889B1 Process for hydrogenating dihydrofuranes to tetrahydrofuranes
06/06/2001EP0814853B1 Novel biocompatible prosthetic material, prostheses or prosthetic systems consisting of said material, and method for preparing same by dual calcium and phosphorus ion implantation
06/06/2001CN2433262Y Multi-targat magnetic-control sputtering coiling film coating machine
06/06/2001CN1298368A Process for producing metal oxide, target comprising the metal oxide for forming thin metal oxide film, process for producing the same, and process for producing thin metal oxide film
06/06/2001CN1298207A Semiconductor device and its producing method
06/06/2001CN1298036A Ceramic flash evaporimeter for television
06/06/2001CN1066783C Process for producing antibiotic material containing antibiotic metal
06/06/2001CN1066782C Process for producing cathode sputtering target and the similar targets
06/06/2001CN1066781C Sliding member and its producing method
06/06/2001CN1066780C Method & apparatus for melt evaporation plating film without metal belt
06/06/2001CN1066778C Process for improving corrosion resistance of aluminium plated surface
06/05/2001US6242804 Fabrication process of a semiconductor device having a nitride film
06/05/2001US6242325 Method for optimising the etch rate of polycrystalline layer
06/05/2001US6242100 Chrome coating having a top layer thereon
06/05/2001US6242068 Recordable optical media with a silver-palladium reflective layer
06/05/2001US6241858 Methods and apparatus for producing enhanced interference pigments
06/05/2001US6241857 Placing target and substrate in chamber spaced fixed distance from and inclined relative to one another with planar surface of substrate oriented substantially perpendicularly to direction along which most particles are released from target
06/05/2001US6241824 Apparatus for the coating of substrates in a vacuum chamber
06/05/2001US6241477 In-situ getter in process cavity of processing chamber
06/05/2001US6241431 Process for the protective coating of machining tools and tool sets
05/2001
05/31/2001WO2001039250A2 Conductive interconnection
05/31/2001WO2001038599A1 Sputtering target, transparent conductive oxide, and method for preparing sputtering target
05/31/2001WO2001038598A1 Titanium target for sputtering
05/31/2001WO2001038597A2 Method for regulating sputtering processes
05/31/2001WO2000068461A3 Thermal barrier coating
05/31/2001US20010002278 Heating the substrate to a deposition temperature by a cureent flow through heater filaments, discontinuing current flow to the heater filament, initiating deopositon of material layer subsequent to discontinuing current flow
05/31/2001US20010002002 Deposition apparatus
05/31/2001US20010002000 Appylying at room temperature a wear resistance ceramic coating of transition metal nitrides to a substrate without deforming the substrate; implantable medical devices, kitchen utensils, gears, diffusion barriers for medical devices
05/31/2001US20010001951 Particulary of all types of storage disks for reactive and nonreactive processes; a carrousel-type conveyor for rotating about an axis and a transport element to be moved out and back radially and controlled at given positions; apertures
05/31/2001US20010001948 High-speed, continuous coating of an electronic conductor alternatively deposting an element of a determined thickness in a zone, and in a reaction zone implanting an ionized plasma into the deposit over the entire thickness
05/31/2001US20010001945 Producing composite films at low temperature and great efficiency by spraying a solution of each material from each of the spray nozzles into a high-vacuum vessel to deposit followed by heating
05/31/2001US20010001902 Vacuum processing apparatus and operating method therefor
05/31/2001US20010001901 Vacuum processing apparatus and operating method therefor
05/31/2001US20010001897 Method of forming hollow channels within a component
05/31/2001DE10055636A1 Transparent conducting film having a specified thickness used in production of electrodes for controlling liquid crystals in display elements for computers comprises indium-tin oxide containing nitrogen and formed on substrate
05/31/2001DE10051687A1 Slide mechanism for sewing machine, has coating layer composed of carbide and carbon, formed between slide face of needle bar and slide face of bushing
05/30/2001EP1103631A2 Apparatus and method for depositing material on a substrate
05/30/2001EP1103630A1 Electrode assembly
05/30/2001EP1103629A1 Ceramic evaporator
05/30/2001EP1103625A1 Magnetic alloy and magnetic recording medium and method for preparation thereof, and target for forming magnetic film and magnetic recording device
05/30/2001EP1103076A1 Zinc oxide films containing p-type dopant and process for preparing same
05/30/2001EP1103063A2 Dose monitor for plasma-immersion ion implantation doping system
05/30/2001CN1297575A Means for controlling target erosion and sputtering in magnetron
05/30/2001CN1297474A Clear or translucent aqueous fabric softener compositions contg. high electrolyte content and optional phase stabilizer
05/29/2001US6239541 RFQ accelerator and ion implanter to guide beam through electrode-defined passage using radio frequency electric fields
05/29/2001US6238803 Titanium nitride barrier layers
05/29/2001US6238786 Polished article surface coated with a magnetron atomized gloss coating of a metal, alloy, or metal compound on a corrosion inhibiting base coat and overcoated with a wear resistant protective clear coat; vehicle wheels
05/29/2001US6238776 Radiation cured island coating system
05/29/2001US6238730 Gas introduction pipe and magnetic recording medium production method using the pipe
05/29/2001US6238686 Anti-microbial coating for medical devices
05/29/2001US6238537 Ion assisted deposition source
05/29/2001US6238533 Integrated PVD system for aluminum hole filling using ionized metal adhesion layer
05/29/2001US6238532 Radio-frequency coil for use in an ionized physical vapor deposition apparatus
05/29/2001US6238531 Method and apparatus to improve the properties of ion beam deposited films in an ion beam sputtering system
05/29/2001US6238528 Sputtering; forming semiconductors
05/29/2001US6238527 Thin film forming apparatus and method of forming thin film of compound by using the same